Enhanced Field Emission from Ultrananocrystalline Diamond-Decorated Carbon Nanowalls Prepared by a Self-Assembly Seeding Technique

Vertically aligned nanographite structures, the so-called carbon nanowalls (CNWs), are decorated with ultrananocrystalline diamond particles by an electrostatic self-assembly seeding technique, followed by short-term growth in plasma chemical vapor deposition, to enhance field emission efficiency and stability. A nanodiamond suspension diluted with a dispersion medium with high wettability on CNWs enables seeding of diamond nanograins consisting of nanoparticles of 3-5 nm in diameter on CNWs with high uniformity and minimal aggregation and control of their number density. The field emission turn-on field depends upon the density of diamond nanograins and decreases from 3.0 V μm^-1 for bare CNWs to 1.8 V μm^-1 for diamond-decorated CNWs together with about an order of magnitude increase in current density. Finite element modeling indicates that only a part of decorating diamond located at the top of nanowalls actually contributes to field amplification and emission. The diamond-decorated CNWs show also higher emission stability with much larger time constants of current degradation than the bare CNWs for long-term duration. The enhanced emission efficiency is explained by larger field amplification rather than lowering of the tunneling barrier, while the enhanced emission stability is attributed to the higher robustness of diamond.

Physical properties of carbon nanowalls synthesized by the ICP-PECVD method vs. the growth time

Investigation of the physical properties of carbon nanowall (CNW) films is carried out in correlation with the growth time. The structural, electronic, optical and electrical properties of CNW films are investigated using electron microscopy, Raman spectroscopy, X-ray photoelectron spectroscopy, ultraviolet photoelectron spectroscopy, UV-Vis spectroscopy, Hall Effect measurement system, Four Point Probing system, and thermoelectric measurements. Shorter growth time results in thinner CNW films with a densely spaced labyrinth structure, while a longer growth time results in thicker CNW films with a petal structure. These changes in morphology further lead to changes in the structural, optical, and electrical properties of the CNW.

One-Step Plasma Synthesis of Nitrogen-Doped Carbon Nanomesh

A one-step method for plasma synthesis of nitrogen-doped carbon nanomesh is presented. The method involves a molten polymer, which is a source of carbon, and inductively coupled nitrogen plasma, which is a source of highly reactive nitrogen species. The method enables the deposition of the nanocarbon layer at a rate of almost 0.1 µm/s. The deposited nanocarbon is in the form of randomly oriented multilayer graphene nanosheets or nanoflakes with a thickness of several nm and an area of the order of 1000 nm². The concentration of chemically bonded nitrogen on the surface of the film increases with deposition time and saturates at approximately 15 at.%. Initially, the oxygen concentration is up to approximately 10 at.% but decreases with treatment time and finally saturates at approximately 2 at.%. Nitrogen is bonded in various configurations, including graphitic, pyridinic, and pyrrolic nitrogen.

Effect of different nitric acid concentrations on manganese/activated carbon-modified catalysts for the catalytic ozonation of toluene

In this work, the effect of nitric acid modification on activated carbon (AC) and on properties of Mn/AC ozone catalysts was studied.

Oriented Carbon Nanostructures by Plasma Processing: Recent Advances and Future Challenges

Carbon, one of the most abundant materials, is very attractive for many applications because it exists in a variety of forms based on dimensions, such as zero-dimensional (0D), one-dimensional (1D), two-dimensional (2D), and-three dimensional (3D). Carbon nanowall (CNW) is a vertically-oriented 2D form of a graphene-like structure with open boundaries, sharp edges, nonstacking morphology, large interlayer spacing, and a huge surface area. Plasma-enhanced chemical vapor deposition (PECVD) is widely used for the large-scale synthesis and functionalization of carbon nanowalls (CNWs) with different types of plasma activation. Plasma-enhanced techniques open up possibilities to improve the structure and morphology of CNWs by controlling the plasma discharge parameters. Plasma-assisted surface treatment on CNWs improves their stability against structural degradation and surface chemistry with enhanced electrical and chemical properties. These advantages broaden the applications of CNWs in electrochemical energy storage devices, catalysis, and electronic devices and sensing devices to extremely thin black body coatings. However, the controlled growth of CNWs for specific applications remains a challenge. In these aspects, this review discusses the growth of CNWs using different plasma activation, the influence of various plasma-discharge parameters, and plasma-assisted surface treatment techniques for tailoring the properties of CNWs. The challenges and possibilities of CNW-related research are also discussed.

Process-specific mechanisms of vertically oriented graphene growth in plasmas

Applications of plasma-produced vertically oriented graphene nanosheets (VGNs) rely on their unique structure and morphology, which can be tuned by the process parameters to understand the growth mechanism. Here, we report on the effect of the key process parameters such as deposition temperature, discharge power and distance from plasma source to substrate on the catalyst-free growth of VGNs in microwave plasmas. A direct evidence for the initiation of vertical growth through nanoscale graphitic islands is obtained from the temperature-dependent growth rates where the activation energy is found to be as low as 0.57 eV. It is shown that the growth rate and the structural quality of the films could be enhanced by (a) increasing the substrate temperature, (b) decreasing the distance between the microwave plasma source and the substrate, and (c) increasing the discharge power. The correlation between the wetting characteristics, morphology and structural quality is established. It is also demonstrated that morphology, crystallinity, wettability and sheet resistance of the VGNs can be varied while maintaining the same sp³ content in the film. The effects of the substrate temperature and the electric field in vertical alignment of the graphene sheets are reported. These findings help to develop and optimize the process conditions to produce VGNs tailored for applications including sensing, field emission, catalysis and energy storage.

Controllable Synthesis of Graphene by Plasma-Enhanced Chemical Vapor Deposition and Its Related Applications

Graphene and its derivatives hold a great promise for widespread applications such as field-effect transistors, photovoltaic devices, supercapacitors, and sensors due to excellent properties as well as its atomically thin, transparent, and flexible structure. In order to realize the practical applications, graphene needs to be synthesized in a low-cost, scalable, and controllable manner. Plasma-enhanced chemical vapor deposition (PECVD) is a low-temperature, controllable, and catalyst-free synthesis method suitable for graphene growth and has recently received more attentions. This review summarizes recent advances in the PECVD growth of graphene on different substrates, discusses the growth mechanism and its related applications. Furthermore, the challenges and future development in this field are also discussed.

Charged particle-induced synthesis of carbon nanowalls and characterization

High deposition rate, control of domain size, detailed characterization and charged particle-induced growth mechanism of CNW films are reported.

Plasma-enhanced chemical vapor deposition synthesis of vertically oriented graphene nanosheets

Vertically oriented graphene (VG) nanosheets have attracted growing interest for a wide range of applications, from energy storage, catalysis and field emission to gas sensing, due to their unique orientation, exposed sharp edges, non-stacking morphology, and huge surface-to-volume ratio. Plasma-enhanced chemical vapor deposition (PECVD) has emerged as a key method for VG synthesis; however, controllable growth of VG with desirable characteristics for specific applications remains a challenge. This paper attempts to summarize the state-of-the-art research on PECVD growth of VG nanosheets to provide guidelines on the design of plasma sources and operation parameters, and to offer a perspective on outstanding challenges that need to be overcome to enable commercial applications of VG. The review starts with an overview of various types of existing PECVD processes for VG growth, and then moves on to research on the influences of feedstock gas, temperature, and pressure on VG growth, substrate pretreatment, the growth of VG patterns on planar substrates, and VG growth on cylindrical and carbon nanotube (CNT) substrates. The review ends with a discussion on challenges and future directions for PECVD growth of VG.

Carbon nanowalls amplify the surface-enhanced Raman scattering from Ag nanoparticles

We report surface-enhanced Raman scattering (SERS) from Ag nanoparticles decorated on thin carbon nanowalls (CNWs) grown by microwave plasma chemical vapor deposition. The Ag morphology is controlled by exposing the CNWs to oxygen plasma and through the electrodeposition process by varying the number of deposition cycles. The SERS substrates are capable of detecting low concentrations of rhodamine 6G and bovine serum albumin, showing much higher Raman enhancement than ordinary planar HOPG with Ag decoration. The major factors contributing to this behavior include: high density of Ag nanoparticles, large surface area, high surface roughness, and the underlying presence of vertically oriented CNWs. The relatively simple procedure of substrate preparation and nanoparticle decoration suggests that this is a promising approach for fabricating ultrasensitive SERS substrates for biological and chemical detection at the single-molecule level, while also enabling the study of fundamental SERS phenomena.

Room-temperature ferromagnetism in graphitic petal arrays

We report room-temperature ferromagnetism of graphitic petal arrays grown on Si substrates by microwave plasma chemical vapor deposition without catalyst. The samples have been characterized by Raman and X-ray photoelectron spectroscopy to confirm the absence of possible ferromagnetic impurities. The petals exhibit ferromagnetic hysteresis with saturation magnetization of ∼4.67 emu cm(-3) and coercivity of ∼105 Oe at 300 K, comparable to the reported behavior of few-layer graphene. Upon O2 annealing the saturation magnetization and coercivity decreased to 2.1 emu cm(-3) and ∼75 Oe respectively. The origin of ferromagnetism is believed to arise from the edge defects and vacancies in the petals.