The Development and Atomic Structure of Zinc Oxide Crystals Grown within Polymers from Vapor Phase Precursors

Sequential infiltration synthesis (SIS), also known as vapor phase infiltration (VPI), is a quickly expanding technique that allows growth of inorganic materials within polymers from vapor phase precursors. With an increasing materials library, which encompasses numerous organometallic precursors and polymer chemistries, and an expanding application space, the importance of understanding the mechanisms that govern SIS growth is ever increasing. In this work, we studied the growth of polycrystalline ZnO clusters and particles in three representative polymers: poly(methyl methacrylate), SU-8, and polymethacrolein using vapor phase diethyl zinc and water. Utilizing two atomic resolution methods, high-resolution scanning transmission electron microscopy and synchrotron X-ray absorption spectroscopy, we probed the evolution of ZnO nanocrystals size and crystallinity level inside the polymers with advancing cycles─from early nucleation and growth after a single cycle, through the formation of nanometric particles within the films, and to the coalescence of the particles upon polymer removal and thermal treatment. Through in situ Fourier transform infrared spectroscopy and microgravimetry, we highlight the important role of water molecules throughout the process and the polymers' hygroscopic level that leads to the observed differences in growth patterns between the polymers, in terms of particle size, dispersity, and the evolution of crystalline order. These insights expand our understanding of crystalline materials growth within polymers and enable rational design of hybrid materials and polymer-templated inorganic nanostructures.

Sequential Infiltration Synthesis of Silicon Dioxide in Polymers with Ester Groups-Insight from In Situ Infrared Spectroscopy

New strategies to synthesize nanometer-scale silicon dioxide (SiO2) patterns have drawn much attention in applications such as microelectronic and optoelectronic devices, membranes, and sensors, as we are approaching device dimensions shrinking below 10 nm. In this regard, sequential infiltration synthesis (SIS), a two-step gas-phase molecular assembly process that enables localized inorganic material growth in the targeted reactive domains of polymers, is an attractive process. In this work, we performed in situ Fourier transform infrared spectroscopy (FTIR) measurements during SiO2 SIS to investigate the reaction mechanism of trimethylaluminum (TMA) and tri(tert-pentoxy) silanol (TPS) precursors with polymers having ester functional groups (poly(methyl methacrylate) (PMMA), poly(ethyl methacrylate) (PEMA), polycaprolactone (PCL), and poly(t-butyl methacrylate) (PBMA)), for the purpose of growing patterned nanomaterials. The FTIR results show that for PMMA and PEMA, a lower percentage of functional groups participated in the reactions and formed weak and unstable complexes. In contrast, almost all functional groups in PCL and PBMA participated in the reactions and showed stable and irreversible interactions with TMA. We discovered that the amount of SiO2 formed is not directly correlated with the number of interacting functional groups. These insights into the SiO2 SIS mechanism will enable nanopatterning of SiO2 for low-dimensional applications.

Stearic Acid as an Atomic Layer Deposition Inhibitor: Spectroscopic Insights from AFM-IR

Modern-day chip manufacturing requires precision in placing chip materials on complex and patterned structures. Area-selective atomic layer deposition (AS-ALD) is a self-aligned manufacturing technique with high precision and control, which offers cost effectiveness compared to the traditional patterning techniques. Self-assembled monolayers (SAMs) have been explored as an avenue for realizing AS-ALD, wherein surface-active sites are modified in a specific pattern via SAMs that are inert to metal deposition, enabling ALD nucleation on the substrate selectively. However, key limitations have limited the potential of AS-ALD as a patterning method. The choice of molecules for ALD blocking SAMs is sparse; furthermore, deficiency in the proper understanding of the SAM chemistry and its changes upon metal layer deposition further adds to the challenges. In this work, we have addressed the above challenges by using nanoscale infrared spectroscopy to investigate the potential of stearic acid (SA) as an ALD inhibiting SAM. We show that SA monolayers on Co and Cu substrates can inhibit ZnO ALD growth on par with other commonly used SAMs, which demonstrates its viability towards AS-ALD. We complement these measurements with AFM-IR, which is a surface-sensitive spatially resolved technique, to obtain spectral insights into the ALD-treated SAMs. The significant insight obtained from AFM-IR is that SA SAMs do not desorb or degrade with ALD, but rather undergo a change in substrate coordination modes, which can affect ALD growth on substrates.

An H2 O-Initiated Crosslinking Strategy for Ultrafine-Nanoclusters-Reinforced High-Toughness Polymer-In-Plasticizer Solid Electrolyte

Incorporating plasticizers is an effective way to facilitate conduction of ions in solid polymer electrolytes (SPEs). However, this conductivity enhancement often comes at the cost of reduced mechanical properties, which can make the electrolyte membrane more difficult to process and increase safety hazards. Here, a novel crosslinking strategy, wherein metal-alkoxy-terminated polymers can be crosslinked by precisely controlling the content of H2 O as an initiator, is proposed. As a proof-of-concept, trimethylaluminum (TMA)-functionalized poly(ethylene oxide) (PEO) is used to demonstrate that ultrafine Al-O nanoclusters can serve as nodes to crosslink PEO chains with a wide range of molecular weights from 10 000 to 8 000 000 g mol-1 . The crosslinked polymer network can incorporate a high concentration of plasticizers, with a total weight percentage over 75%, while still maintaining excellent stretchability (4640%) and toughness (3.87 × 104  kJ m-3 ). The resulting electrolyte demonstrates high ionic conductivity (1.41 mS cm-1 ), low interfacial resistance toward Li metal (48.1 Ω cm2 ), and a wide electrochemical window (>4.8 V vs Li+ /Li) at 30 °C. Furthermore, the LiFePO4 /Li battery shows stable cycle performance with a capacity retention of 98.6% (146.3 mAh g-1 ) over 1000 cycles at 1C (1C = 170 mAh g-1 ) at 30 °C.

Incorporating Binary Metal Oxides in Poly(ethylene oxide)-Based Solid Electrolytes by Vapor Phase Infiltration

Vapor phase infiltration (VPI) derived from atomic layer deposition (ALD) enables inorganic materials to nucleate and grow within the free volume of polymers, which has shown promising prospects in the field of composite solid polymer electrolytes (CSPEs). However, there are only a few types of metal oxides that can be incorporated into the polymer matrix by VPI, let alone binary metal oxides, due to the limited knowledge of the VPI synthesis process. To combine the merits of different metal oxides, we investigate the VPI method to prepare ZnO-Al₂O₃ composites in poly(ethylene oxide) (PEO). When the introducing order is Al₂O₃/ZnO (AZO), due to the extremely high reactivity of trimethyl aluminum (TMA) with PEO, VPI-Al₂O₃ will accumulate near the surface of PEO. The surface Al₂O₃ layer inhibits the further diffusion of the diethyl zinc (DEZ) into the PEO matrix, leading to weak polymer-filler interactions and limited improvement of the Li⁺ conduction. In the incorporation order of ZnO/Al₂O₃ (ZAO), the moderate reactivity of DEZ renders the uniform distribution of VPI-ZnO within PEO, and the following TMA can both react with PEO and VPI-ZnO particles near the surface of PEO, which not only preserves the interactions between VPI-ZnO and PEO but also better inhibits the growth of lithium dendrites. The incorporation order plays a crucial role in the morphology and composition of binary metal oxides synthesized by VPI.

Sequential Infiltration Synthesis of Al2O3 in Biodegradable Polybutylene Succinate: Characterization of the Infiltration Mechanism

The introduction of inorganic materials into biopolymers has been envisioned as a viable option to modify the optical and structural properties of these polymers and promote their exploitation in different application fields. In this work, the growth of Al2O3 in freestanding ∼30-μm-thick poly(butylene succinate) (PBS) films by sequential infiltration (SIS) at 70 °C via trimethylaluminum (TMA) and H2O precursors was investigated for the first time. The incorporation of Al2O3 into the PBS matrix was clearly demonstrated by XPS analysis and SEM-EDX cross-sectional images showing a homogeneous Al2O3 distribution inside the PBS films. Raman measurements on infiltrated freestanding PBS show a reduction of the signal related to the ester carbonyl group as compared to pristine freestanding PBS films. Accordingly, FTIR and NMR characterization highlighted that the ester group is involved in polymer-precursor interaction, leading to the formation of an aliphatic group and the concomitant rupture of the main polymeric chain. Al2O3 mass uptake as a function of the number of SIS cycles was studied by infiltration in thin PBS films spin-coated on Si substrates ranging from 30 to 70 nm. Mass uptake in the PBS films was found to be much higher than in standard poly(methyl methacrylate) (PMMA) films, under the same process conditions. Considering that the density of reactive sites in the two polymers is roughly the same, the observed difference in Al2O3 mass uptake is explained based on the different free volume of these polymers and the specific reaction mechanism proposed for PBS. These results assessed the possibility to use SIS as a tool for the growth of metal oxides into biopolymers, paving the way to the synthesis of organic-inorganic hybrid materials with tailored characteristics.

Toposelective vapor deposition of hybrid and inorganic materials inside nanocavities by polymeric templating and vapor phase infiltration

Selective deposition of hybrid and inorganic materials inside nanostructures could enable major nanotechnological advances. However, inserting ready-made composites inside nanocavities may be difficult, and therefore, stepwise approaches are needed. In this paper, a poly(ethyl acrylate) template is grown selectively inside cavities via condensation-controlled toposelective vapor deposition, and the polymer is then hybridized by alumina, titania, or zinc oxide. The hybridization is carried out by infiltrating the polymer with a vapor-phase metalorganic precursor and water vapor either via a short-pulse (atomic layer deposition, ALD) or a long-pulse (vapor phase infiltration, VPI) sequence. When the polymer-MO _x hybrid material is calcined at 450 °C in air, an inorganic phase is left as the residue. Various suspected confinement effects are discussed. The infiltration of inorganic materials is reduced in deeper layers of the cavity-grown polymer and is dependent on the cavity geometry. The structure of the inorganic deposition after calcination varies from scattered particles and their aggregates to cavity-capping films or cavity-filling low-density porous deposition, and the inorganic deposition is often anisotropically cracked. A large part of the infiltration is achieved already during the short-pulse experiments with a commercial ALD reactor. Furthermore, the infiltrated polymer is more resistant to dissolution in acetone whereas the inorganic component can still be heavily affected by phosphoric acid.

Influence of different ester side groups in polymers on the vapor phase infiltration with trimethyl aluminum

The vapor phase infiltration (VPI) process of trimethyl aluminum (TMA) into poly(4-acetoxystyrene) (POAcSt), poly(nonyl methacrylate) (PNMA) and poly(tert-butyl methacrylate) (PtBMA) is reported. Depth-profiling X-ray photoelectron spectroscopy (XPS) measurements are used for the first time for VPI based hybrid materials to determine the aluminum content over the polymer film thickness. An understanding of the reaction mechanism on the interaction of TMA infiltrating into the different polymers was obtained through infrared (IR) spectroscopy supported by density functional theory (DFT) studies. It is shown that the loading with aluminum is highly dependent on the respective ester side group of the used polymer, which is observed to be the reactive site for TMA during the infiltration. IR spectroscopy hints that the infiltration is incomplete for POAcSt and PNMA, as indicated by the characteristic vibration bands of the aluminum coordination to the carbonyl groups within the polymers. In this context, two different reaction pathways are discussed. One deals with the formation of an acetal, the other is characterized by the release of a leaving group. Both were found to be in direct concurrence dependent on the polymer side group as revealed by DFT calculations of the IR spectra, as well as the reaction energies of two possible reaction paths. From this study, one can infer that the degree of infiltration in a VPI process strongly depends on the polymer side groups, which facilitates the choice of the polymer for targeted applications.

Highly-stable PEN as a gas-barrier substrate for flexible displays via atomic layer infiltration

Polymer substrates with superior barrier properties are of great importance for the development of highly-stable flexible displays. The atomic layer infiltration (ALI) method has been utilized to integrate nanoscale inorganic materials in the subsurface of commercial PEN substrates, and the in-suit quartz crystal microbalance (QCM) is employed to study the growth behaviour as the process parameters vary, in which the nucleation and infiltration stages have been demonstrated. The O₂ plasma pre-treatment prior to Al₂O₃ infiltration was used to determine its effect on the water vapor transmission rate (WVTR), and significantly improved barrier properties were observed compared to those of the ones without the O₂ plasma pre-treatment via the electrical Ca tests, which was attributed to the surface clean and improved film adhesion. The lowest WVTR value measured was 1.28 × 10^-5 g m^-2 day^-1 for the O₂ plasma pre-treated PEN substrate coated with 100 ALI cycles, which improved 3-4 orders of magnitude compared to that of the pristine ones. Besides, the infiltrated PEN substrate with O₂ plasma pre-treatment exhibited good mechanical stability, with only a slight increase of the WVTR value which was observed after the bending fatigue test with a radius of 5 mm. Furthermore, when applied to the encapsulation of organic light-emitting diodes (OLEDs), the normalized luminance remained above 94% after storage for 800 hours.

Atomic Layer Deposition on Polymer Thin Films: On the Role of Precursor Infiltration and Reactivity

Inorganic barriers grown by atomic layer deposition (ALD) can overcome the stability issues originating from the permeation of foreign species (water and oxygen) into polymer thin films. Alternatively, infiltration of ALD species into the bulk of the polymer can be used to modify its characteristic properties. In this study, the feasibility of growing an inorganic barrier with ALD on polystyrene, poly(methyl methacrylate), and poly(ethylene terephthalate glycol) thin films is evaluated. The nucleation and growth of the ALD layer, including the infiltration into the polymer thin film, are monitored in situ using spectroscopic ellipsometry, Fourier transform infrared spectroscopy, and X-ray photoelectron spectroscopy for Al₂O₃-ALD with trimethylaluminum as the Al precursor and H₂O as the reactant. The results show that the deposition temperature and the presence and location of functional groups in the polymer chain exert the strongest influence on the infiltration behavior and as such allow us to manipulate (i.e. to prevent or expedite) the infiltration into the polymer thin film.

Nano-Laminated Metal Oxides/Polyamide Stretchable Moisture- and Gas-Barrier Films by Integrated Atomic/Molecular Layer Deposition

Stretchable barrier films capable of maintaining high levels of moisture- and gas-barrier performance under significant mechanical strains are a critical component for wearable/flexible electronics and other devices, but realization of stretchable moisture-barrier films has not been possible due to the inevitable issues of strain-induced rupturing compounded with moisture-induced swelling of a stretched barrier film. This study demonstrates nanolaminated polymer/metal oxide stretchable moisture-barrier films fabricated by a novel molecular layer deposition (MLD) process of polyamide-2,3 (PA-2,3) integrated with atomic layer deposition (ALD) metal oxide processes and an in situ surface-functionalization technique. The PA-2,3 surface upon in situ functionalization with H₂O₂ vapor offers adequate surface chemisorption sites for rapid nucleation of ALD oxides, minimizing defects at the PA-2,3/oxide interfaces in the nanolaminates. The integrated ALD/MLD process enables facile deposition and precise structural control of many-layered oxide/PA-2,3 nanolaminates, where the large number of PA-2,3 nanolayers provide high tolerance against mechanical stretching and flexing thanks to their defect-decoupling and stress-buffering functions, while the large number of oxide nanolayers shield against swelling by moisture. Specifically, a nanolaminate with 72 pairs of alternating 2 nm (5 cycles) PA-2,3 and 0.5 nm HfO₂ (five cycles) maintains its water vapor transmission rate (WVTR) at the 10^-6 g/m² day level upon 10% tensile stretching and 2 mm-radius bending, a significant breakthrough for the wearable/flexible electronics technologies.

Poly(styrene)-block-Maltoheptaose Films for Sub-10 nm Pattern Transfer: Implications for Transistor Fabrication

Sequential infiltration synthesis (SIS) into poly(styrene)-block-maltoheptaose (PS-b-MH) block copolymer using vapors of trimethyl aluminum and water was used to prepare nanostructured surface layers. Prior to the infiltration, the PS-b-MH had been self-assembled into 12 nm pattern periodicity. Scanning electron microscopy indicated that horizontal alumina-like cylinders of 4.9 nm diameter were formed after eight infiltration cycles, while vertical cylinders were 1.3 nm larger. Using homopolymer hydroxyl-terminated poly(styrene) (PS-OH) and MH films, specular neutron reflectometry revealed a preferential reaction of precursors in the MH compared to PS-OH. The infiltration depth into the maltoheptaose homopolymer film was found to be 2.0 nm after the first couple of cycles. It reached 2.5 nm after eight infiltration cycles, and the alumina incorporation within this infiltrated layer corresponded to 23 vol % Al2O3. The alumina-like material, resulting from PS-b-MH infiltration, was used as an etch mask to transfer the sub-10 nm pattern into the underlying silicon substrate, to an aspect ratio of approximately 2:1. These results demonstrate the potential of exploiting SIS into carbohydrate-based polymers for nanofabrication and high pattern density applications, such as transistor devices.

Surface Diffusion Control Enables Tailored-Aspect-Ratio Nanostructures in Area-Selective Atomic Layer Deposition

Area-selective atomic layer deposition is a key technology for modern microelectronics as it eliminates alignment errors inherent to conventional approaches by enabling material deposition only in specific areas. Typically, the selectivity originates from surface modifications of the substrate that allow or block precursor adsorption. The control of the deposition process currently remains a major challenge as the selectivity of the no-growth areas is lost quickly. Here, we show that surface modifications of the substrate strongly manipulate surface diffusion. The selective deposition of TiO₂ on poly(methyl methacrylate) and SiO₂ yields localized nanostructures with tailored aspect ratios. Controlling the surface diffusion allows tuning such nanostructures as it boosts the growth rate at the interface of the growth and no-growth areas. Kinetic Monte-Carlo calculations reveal that species move from high to low diffusion areas. Further, we identify the catalytic activity of TiCl₄ during the formation of carboxylic acid on poly(methyl methacrylate) as the reaction mechanism responsible for the loss of selectivity and show that process optimization leads to higher selectivity. Our work enables the precise control of area-selective atomic layer deposition on the nanoscale and offers new strategies in area-selective deposition processes by exploiting surface diffusion effects.

Is Poly(methyl methacrylate) (PMMA) a Suitable Substrate for ALD?: A Review

Poly (methyl methacrylate) (PMMA) is a thermoplastic synthetic polymer, which displays superior characteristics such as transparency, good tensile strength, and processability. Its performance can be improved by surface engineering via the use of functionalized thin film coatings, resulting in its versatility across a host of applications including, energy harvesting, dielectric layers and water purification. Modification of the PMMA surface can be achieved by atomic layer deposition (ALD), a vapor-phase, chemical deposition technique, which permits atomic-level control. However, PMMA presents a challenge for ALD due to its lack of active surface sites, necessary for gas precursor reaction, nucleation, and subsequent growth. The purpose of this review is to discuss the research related to the employment of PMMA as either a substrate, support, or masking layer over a range of ALD thin film growth techniques, namely, thermal, plasma-enhanced, and area-selective atomic layer deposition. It also highlights applications in the selected fields of flexible electronics, biomaterials, sensing, and photocatalysis, and underscores relevant characterization techniques. Further, it concludes with a prospective view of the role of ALD in PMMA processing.

Chiral Templating of Polycarbonate Membranes by Pinene Using the Modified Atomic Layer Deposition Approach

In this article, chiral templating of a polycarbonate (PC) membrane by (-)-α-pinene using the atomic layer deposition (ALD) approach is investigated. The templating with the enantiomer of (-)-α-pinene, used as a case compound, was performed either on the original commercial PC membrane or on the PC membrane with a beforehand deposited Al₂O₃ layer. The efficiency of the templating was assessed by a difference in the membrane ability to adsorb/absorb (-)-α-pinene, (+)-α-pinene, and their racemic mixture, using a very sensitive gas sorption analyzer. The results clearly show that the solution-diffusion mechanism rather than the sieving mechanism applied for adsorption/absorption of (-/+)-α-pinene enantiomers, which have the same size of the molecule. The PC membrane with the predeposited Al₂O₃ before the (-)-α-pinene templating shows significantly higher sorption of (-)-α-pinene compared to (+)-α-pinene and racemate, which clearly demonstrates the presence of a chiral recognition effect.

Selective Infiltration in Polymer Hybrid Thin Films as a Gas-Encapsulation Layer for Stretchable Electronics

The infiltration depth and water vapor transmission rate (WVTR) were explored in a variety of Al₂O₃-polymer hybrid layers as thin gas barrier films by filling the free volumes of polymers in the subsurface region with Al₂O₃ using the atomic layer infiltration (ALI) method. Among all, the prepared Al₂O₃-polyethylene terephthalate (PET), Al₂O₃-polyimide, and Al₂O₃-Nylon 6 hybrid thin layers with the infiltration depth in the nanometer ranges showed extremely low WVTR values (<10^-6 g m^-2 day^-1) in a Ca dot corrosion test. Furthermore, we observed selective infiltration among the two polymers [perfluoroalkoxy alkane (PFA) and PET] by a preferential growth of Al₂O₃ in the PET polymer that might be based on effective functional group anchoring in the ALI process. Then, we demonstrated a novel strategy by employing such a selective infiltration procedure and encapsulating individual segments of 144 Ca dots by Al₂O₃-PET hybrid thin films on the PFA polymer substrate rather than wrapping the whole thing together for the stretchable gas-encapsulation film. Regardless of stretching, it showed an extremely low WVTR (<10^-7 g m^-2 day^-1) and is proposed as a highly promising hermetic sealing alternative in stretchable, flexible, and foldable electronic display technologies.

The chemical physics of sequential infiltration synthesis-A thermodynamic and kinetic perspective

Sequential infiltration synthesis (SIS) is an emerging materials growth method by which inorganic metal oxides are nucleated and grown within the free volume of polymers in association with chemical functional groups in the polymer. SIS enables the growth of novel polymer-inorganic hybrid materials, porous inorganic materials, and spatially templated nanoscale devices of relevance to a host of technological applications. Although SIS borrows from the precursors and equipment of atomic layer deposition (ALD), the chemistry and physics of SIS differ in important ways. These differences arise from the permeable three-dimensional distribution of functional groups in polymers in SIS, which contrast to the typically impermeable two-dimensional distribution of active sites on solid surfaces in ALD. In SIS, metal-organic vapor-phase precursors dissolve and diffuse into polymers and interact with these functional groups through reversible complex formation and/or irreversible chemical reactions. In this perspective, we describe the thermodynamics and kinetics of SIS and attempt to disentangle the tightly coupled physical and chemical processes that underlie this method. We discuss the various experimental, computational, and theoretical efforts that provide insight into SIS mechanisms and identify approaches that may fill out current gaps in knowledge and expand the utilization of SIS.

Enhanced Interfacial Toughness of Thermoplastic-Epoxy Interfaces Using ALD Surface Treatments

Interfacial fracture and delamination of polymer interfaces can play a critical role in a wide range of applications, including fiber-reinforced composites, flexible electronics, and encapsulation layers for photovoltaics. However, owing to the low surface energy of many thermoplastics, adhesion to dissimilar material surfaces remains a critical challenge. In this work, we demonstrate that surface treatments using atomic layer deposition (ALD) on poly(methyl methacrylate) (PMMA) and fluorinated ethylene propylene (FEP) lead to significant increases in surface energy, without affecting the bulk mechanical response of the thermoplastic. After ALD film growth, the interfacial toughness of the PMMA-epoxy and FEP-epoxy interfaces increased by factors of up to 7 and 60, respectively. These results demonstrate the ability of ALD to engineer the adhesive properties of chemically inert surfaces. However, in the present case, the interfacial toughness was observed to decrease significantly with an increase in humidity. This was attributed to the phenomenon of stress-corrosion cracking associated with the reaction between Al₂O₃ and water and might have a significant implication for the design of these tailored interfaces.

Ultraviolet Functionalization of Electrospun Scaffolds to Activate Fibrous Runways for Targeting Cell Adhesion

A critical challenge in scaffold design for tissue engineering is recapitulating the complex biochemical patterns that regulate cell behavior in vivo. In this work, we report the adaptation of a standard sterilization methodology-UV irradiation-for patterning the surfaces of two complementary polymeric electrospun scaffolds with oxygen cues able to efficiently immobilize biomolecules. Independently of the different polymer chain length of poly(ethylene oxide terephthalate)/poly(butylene terephthalate) (PEOT/PBT) copolymers and PEOT/PBT ratio, it was possible to easily functionalize specific regions of the scaffolds by inducing an optimized and spatially controlled adsorption of proteins capable of boosting the adhesion and spreading of cells along the activated fibrous runways. By allowing an efficient design of cell attachment patterns without inducing any noticeable change on cell morphology nor on the integrity of the electrospun fibers, this procedure offers an affordable and resourceful approach to generate complex biochemical patterns that can decisively complement the functionality of the next generation of tissue engineering scaffolds.

Particle atomic layer deposition

The functionalization of fine primary particles by atomic layer deposition (particle ALD) provides for nearly perfect nanothick films to be deposited conformally on both external and internal particle surfaces, including nanoparticle surfaces. Film thickness is easily controlled from several angstroms to nanometers by the number of self-limiting surface reactions that are carried out sequentially. Films can be continuous or semi-continuous. This review starts with a short early history of particle ALD. The discussion includes agitated reactor processing, both atomic and molecular layer deposition (MLD), coating of both inorganic and polymer particles, nanoparticles, and nanotubes. A number of applications are presented, and a path forward, including likely near-term commercial products, is given.

Improve the Stability of Hybrid Halide Perovskite via Atomic Layer Deposition on Activated Phenyl-C61 Butyric Acid Methyl Ester

Atomic layer deposition (ALD) of oxide film on [6,6]-phenyl-C₆₁ butyric acid methyl ester (PCBM) shows a great promise to dramatically improve the ambient stability of hybrid halide perovskite. The nucleation of an ALD oxide on PCBM is critical to reliably apply this strategy. In this paper, we present the first study of the nucleation behavior of ALD oxides, including Al₂O₃ and ZnO, on PCBM. We find that PCBM film acts a gas diffusion barrier blocking the ALD reactants (diethyl zinc) from etching the underlying CH₃NH₃PbI₃. However, ZnO is not able to nucleate on PCBM. We further identify that trimethyl aluminum, a strongly Lewis acid, reacts readily with C═O on PCBM to generate a seeding layer for nucleating ZnO ALD. This new chemical route is highly reliable and can be used to synthesize ALD ZnO coatings over PCBM. The synthesized PCBM/Al₂O₃-ZnO dramatically improves the stability of CH₃NH₃PbI₃ against the ambience and even against liquid water. The result signifies the importance of understanding of nucleation of ALD in enabling reliable barrier coatings for hybrid halide perovskites.

Polymeric platform for the growth of chemically anchored ZnO nanostructures by ALD

The synthesis of hybrid nano-composites in which an inorganic layer is grown on a polymeric surface via chemical bonds, is a challenging goal for many applications from photocatalysis, to sensing and optoelectronics.

Reversible Low-Temperature Metal Node Distortion during Atomic Layer Deposition of Al2O3 and TiO2 on UiO-66-NH2 Metal-Organic Framework Crystal Surfaces

Metal-organic frameworks (MOFs) are chemically functionalized micro- and mesoporous materials with high surface areas and are attractive for multiple applications including filtration, gas storage, and catalysis. Postsynthetic modification (PSM), via solution or vapor-based techniques, is a way to impart additional complexity and functionality into these materials. There is a desire to shift toward vapor-phase methods in order to ensure more controlled modification and more efficient reagent and solvent removal from the modified MOF material. In this work we explore how the metal precursors titanium tetrachloride (TiCl₄) and trimethylaluminum (TMA), commonly used in atomic layer deposition, react with UiO-66-NH₂ MOF. Using in situ quartz crystal microbalance (QCM) and Fourier transform infrared spectroscopy (FTIR) at 150 and 250 °C, we find that the ALD precursors react with μ₃-OH hydroxyl and μ₃-O bridging oxygen groups on Zr₆ nodes, as well as oxygen from carboxylate linker groups. The reactions occur predominantly at the crystal surface at μ₃-OH hydroxyl sites, with TiCl₄ exhibiting greater diffusion into the MOF subsurface. FTIR analysis suggests that, at 150 °C, both TiCl₄ and TMA reversibly dehydroxylate the hydroxylated UiO-66-NH₂, which is accompanied by distortion of the zirconium metal clusters. Finally, we show that TiCl₄ is able to react with the dehydroxylated UiO-66-NH₂ structure, suggesting that TiCl₄ is also able to react directly with the bridging oxygens in the metal clusters or carboxylate groups on the organic ligand. A better understanding of chemical and thermally driven MOF dehydroxylation reactions can be important for improved postsynthetic modification of MOFs.

Directing Hybrid Structures by Combining Self-Assembly of Functional Block Copolymers and Atomic Layer Deposition: A Demonstration on Hybrid Photovoltaics

The simplicity and versatility of block copolymer self-assembly offers their use as templates for nano- and meso-structured materials. However, in most cases, the material processing requires multiple steps, and the block copolymer is a sacrificial building block. Here, we combine a self-assembled block copolymer template and atomic layer deposition (ALD) of a metal oxide to generate functional hybrid films in a simple process with no etching or burning steps. This approach is demonstrated by using the crystallization-induced self-assembly of a rod-coil block copolymer, P3HT-b-PEO, and the ALD of ZnO. The block copolymer self-assembles into fibrils, ∼ 20 nm in diameter and microns long, with crystalline P3HT cores and amorphous PEO corona. The affinity of the ALD precursors to the PEO corona directs the exclusive deposition of crystalline ZnO within the PEO domains. The obtained hybrid structure possesses the properties desired for photovoltaic films: donor-acceptor continuous nanoscale interpenetrated networks. Therefore, we integrated the films into single-layer hybrid photovoltaics devices, thus demonstrating that combining self-assembly of functional block copolymers and ALD is a simple approach to direct desired complex hybrid morphologies.

Thermal stability of gold nanoparticles embedded within metal oxide frameworks fabricated by hybrid modifications onto sacrificial textile templates

The stability and spatial separation of nanoparticles (NP's) is essential for employing their advantageous nanoscale properties. This work demonstrates the entrapment of gold NP's embedded in a porous inorganic matrix. Initially, gold NP's are decorated on fibrous nylon-6, which is used as an inexpensive sacrificial template. This is followed by inorganic modification using a novel single exposure cycle vapor phase technique resulting in distributed NP's embedded within a hybrid organic-inorganic matrix. The processing is extended to the synthesis of porous nanoflakes after calcination of the modified nylon-6 yielding a porous metal oxide framework surrounding the disconnected NP's with a surface area of 250 m(2)/g. A unique feature of this work is the use of a transmission electron microscope (TEM) equipped with an in situ annealing sample holder. The apparatus affords the opportunity to explore the underlying nanoscopic stability of NP's embedded in these frameworks in a single step. TEM analysis indicates thermal stability up to 670 °C and agglomeration characteristics thereafter. The vapor phase processes developed in this work will facilitate new complex NP/oxide materials useful for catalytic platforms.

Feasibility of novel (H3C)nX(SiH3)3−ncompounds (X = B, Al, Ga, In): structure, stability, reactivity, and Raman characterization from ab initio calculations

Stability of the (H₃C)_nX(SiH₃)_3−ncompounds.

Atomic layer deposition of Al2O3 process emissions

The ALD process emissions and the associated chemical reaction mechanism inside the ALD of Al₂O₃ system are studied and reported.

Role of zinc interstitials and oxygen vacancies of ZnO in photocatalysis: a bottom-up approach to control defect density

Oxygen vacancies (V(O)s) in ZnO are well-known to enhance photocatalytic activity (PCA) despite various other intrinsic crystal defects. In this study, we aim to elucidate the effect of zinc interstitials (Zn(i)) and V(O)s on PCA, which has applied as well as fundamental interest. To achieve this, the major hurdle of fabricating ZnO with controlled defect density requires to be overcome, where it is acknowledged that defect level control in ZnO is significantly difficult. In the present context, we fabricated nanostructures and thoroughly characterized their morphological (SEM, TEM), structural (XRD, TEM), chemical (XPS) and optical (photoluminescence, PL) properties. To fabricate the nanostructures, we adopted atomic layer deposition (ALD), which is a powerful bottom-up approach. However, to control defects, we chose polysulfone electrospun nanofibers as a substrate on which the non-uniform adsorption of ALD precursors is inevitable because of the differences in the hydrophilic nature of the functional groups. For the first 100 cycles, Zn(i)s were predominant in ZnO quantum dots (QDs), while the presence of V(O)s was negligible. As the ALD cycle number increased, V(O)s were introduced, whereas the density of Zn(i) remained unchanged. We employed PL spectra to identify and quantify the density of each defect for all the samples. PCA was performed on all the samples, and the percent change in the decay constant for each sample was juxtaposed with the relative densities of Zn(i)s and V(O)s. A logical comparison of the relative defect densities of Zn(i)s and V(O)s suggested that the former are less efficient than the latter because of the differences in the intrinsic nature and the physical accessibility of the defects. Other reasons for the efficiency differences were elaborated.

Temperature-dependent infiltration of polymers during sequential exposures to trimethylaluminum

Atomic layer deposition provides the opportunity to introduce nanoscale inorganic coatings to organic polymers creating coatings of varied compositions of finish with distinctive interfaces. Prior research has shown that ALD materials nucleation on polymers varies in composition and structure based on how the precursor interacts with the polymer chemistry and the process conditions. To study this in more detail, in situ quartz crystal microgravimetry is employed to understand the infiltration and saturation behavior of trimethylaluminum in polyamide-6, poly(acrylic acid), poly(ethylene terephthalate), and poly(methyl methacrylate). Emphasis is placed on understanding reactive vapor diffusion into these polymers as the exposure temperature is varied. Finally, we propose potential growth mechanisms based on the temperature-dependent observations in this work that enables the ability to produce a customized interface for ALD materials growth on polymer substrates.

Atomic layer deposition of metal oxide patterns on nonwoven fiber mats using localized physical compression

Patterning is an essential part of many industrial processes from printing to semiconductor manufacturing. In this work, we demonstrate a new method to pattern and selectively coat nonwoven textiles by atomic layer deposition (ALD) using compressive mask patterning. A physical mask combined with mechanical compression allows lateral definition and fidelity of the ALD coating to be controlled. We produce features of several sizes on different nonwoven fiber materials and demonstrate the ability to limit diffusion effects to within <200 μm of the pattern edge. Lateral and vertical penetration of reactive growth species into nonwoven mats is investigated by plan-view and cross-sectional imaging. Vertical growth is also analyzed by imaging coating depth into fiber mat stacks. We develop a fully quantitative transport model that describes well the effect of fiber structure and mechanical compression on the extent of coating under the physical mask. This method could be implemented for high-volume patterning for applications including flexible electronics.

Stabilizing chromophore binding on TiO2 for long-term stability of dye-sensitized solar cells using multicomponent atomic layer deposition

Dye sensitized solar cells (DSSCs) are coated with subnanometer oxide coatings to prevent device degradation in ambient humidity and high temperatures.

Polymer-inorganic core-shell nanofibers by electrospinning and atomic layer deposition: flexible nylon-ZnO core-shell nanofiber mats and their photocatalytic activity

Polymer-inorganic core-shell nanofibers were produced by two-step approach; electrospinning and atomic layer deposition (ALD). First, nylon 6,6 (polymeric core) nanofibers were obtained by electrospinning, and then zinc oxide (ZnO) (inorganic shell) with precise thickness control was deposited onto electrospun nylon 6,6 nanofibers using ALD technique. The bead-free and uniform nylon 6,6 nanofibers having different average fiber diameters (∼80, ∼240 and ∼650 nm) were achieved by using two different solvent systems and polymer concentrations. ZnO layer about 90 nm, having uniform thickness around the fiber structure, was successfully deposited onto the nylon 6,6 nanofibers. Because of the low deposition temperature utilized (200 °C), ALD process did not deform the polymeric fiber structure, and highly conformal ZnO layer with precise thickness and composition over a large scale were accomplished regardless of the differences in fiber diameters. ZnO shell layer was found to have a polycrystalline nature with hexagonal wurtzite structure. The core-shell nylon 6,6-ZnO nanofiber mats were flexible because of the polymeric core component. Photocatalytic activity of the core-shell nylon 6,6-ZnO nanofiber mats were tested by following the photocatalytic decomposition of rhodamine-B dye. The nylon 6,6-ZnO nanofiber mat, having thinner fiber diameter, has shown better photocatalytic efficiency due to higher surface area of this sample. These nylon 6,6-ZnO nanofiber mats have also shown structural stability and kept their photocatalytic activity for the second cycle test. Our findings suggest that core-shell nylon 6,6-ZnO nanofiber mat can be a very good candidate as a filter material for water purification and organic waste treatment because of their photocatalytic properties along with structural flexibility and stability.

Mesoporous metal oxides by vapor infiltration and atomic layer deposition on ordered surfactant polymer films

Catalysis, chemical separations, and energy conversion devices often depend on well-defined mesoporous materials as supports or active component elements. Herein, we show that ordered assembled organic surfactant films can directly template porous inorganic solids with surface area exceeding 1000 m(2)/g by infusing the polymers with reactive inorganic vapors, followed by anneal. The specific surface area, pore size, chemical composition, and overall shape of the product material are tuned by choice of the polymer and precursor materials as well as the influsion and postinfusion treatment conditions. X-ray diffraction, infrared spectroscopy, and electron microscopy show that vapor infusion changes both the physical and chemical structure of the starting ordered polymer films, consistent with quantified trends in specific surface area and pore size distribution measured by nitrogen adsorption after film annealing. This method yields porous TiO(2) films, for example, that function as an anode layer in a dye-sensitized solar cell.