Classic, liquid, and matrix-assisted dip-pen nanolithography for materials research

Scanning Probe Lithography: State-of-the-Art and Future Perspectives

High-throughput and high-accuracy nanofabrication methods are required for the ever-increasing demand for nanoelectronics, high-density data storage devices, nanophotonics, quantum computing, molecular circuitry, and scaffolds in bioengineering used for cell proliferation applications. The scanning probe lithography (SPL) nanofabrication technique is a critical nanofabrication method with great potential to evolve into a disruptive atomic-scale fabrication technology to meet these demands. Through this timely review, we aspire to provide an overview of the SPL fabrication mechanism and the state-the-art research in this area, and detail the applications and characteristics of this technique, including the effects of thermal aspects and chemical aspects, and the influence of electric and magnetic fields in governing the mechanics of the functionalized tip interacting with the substrate during SPL. Alongside this, the review also sheds light on comparing various fabrication capabilities, throughput, and attainable resolution. Finally, the paper alludes to the fact that a majority of the reported literature suggests that SPL has yet to achieve its full commercial potential and is currently largely a laboratory-based nanofabrication technique used for prototyping of nanostructures and nanodevices.

Scanning Probe-Directed Assembly and Rapid Chemical Writing Using Nanoscopic Flow of Phospholipids

Nanofluidic systems offer a huge potential for discovery of new molecular transport and chemical phenomena that can be employed for future technologies. Herein, we report on the transport behavior of surface-reactive compounds in a nanometer-scale flow of phospholipids from a scanning probe. We have investigated microscopic deposit formation on polycrystalline gold by lithographic printing and writing of 1,2-dioleoyl-sn-glycero-3-phosphocholine and eicosanethiol mixtures, with the latter compound being a model case for self-assembled monolayers (SAMs). By analyzing the ink transport rates, we found that the transfer of thiols was fully controlled by the fluid lipid matrix allowing to achieve a certain jetting regime, i.e., transport rates previously not reported in dip-pen nanolithography (DPN) studies on surface-reactive, SAM-forming molecules. Such a transport behavior deviated significantly from the so-called molecular diffusion models, and it was most obvious at the high writing speeds, close to 100 μm s^-1. Moreover, the combined data from imaging ellipsometry, scanning electron microscopy, atomic force microscopy (AFM), and spectroscopy revealed a rapid and efficient ink phase separation occurring in the AFM tip-gold contact zone. The force curve analysis indicated formation of a mixed ink meniscus behaving as a self-organizing liquid. Based on our data, it has to be considered as one of the co-acting mechanisms driving the surface reactions and self-assembly under such highly nonequilibrium, crowded environment conditions. The results of the present study significantly extend the capabilities of DPN using standard AFM instrumentation: in the writing regime, the patterning speed was already comparable to that achievable by using electron beam systems. We demonstrate that lipid flow-controlled chemical patterning process is directly applicable for rapid prototyping of solid-state devices having mesoscopic features as well as for biomolecular architectures.

Micrometer to 15 nm Printing of Metallic Inks with Fountain Pen Nanolithography

The field of printed electronics is continually trying to reduce the dimensions of the electrical components. Here, a method of printing metallic lines with widths as small as 15 nm and up to a few micrometers using fountain pen nanolithography (FPN) is shown. The FPN technique is based on a bent nanopipette with atomic force feedback that acts similar to a nanopen. The geometry of the nanopen allows for rapid placement accuracy of the printing tip, on any desired location, with the highest of optical sub-micrometer resolution. Using this nanopen, investigations of various inks are undertaken together with instrumental and script-tool development that allows accurate printing of multiple layers. This has led to the printing of conductive lines using inks composed of silver nanoparticles and salt solutions of silver and copper. In addition, it is shown that the method can be applied to substrates of various materials with minimal effect on the dimension of the line. The line widths are varied by using nanopens with different orifices or by tailoring the wetting properties of the ink on the substrate. Metallic interconnections of conducting lines are reported.

Scanning Probe Photonic Nanojet Lithography

The use of nano/microspheres or beads for optical nanolithography is a consolidated technique for achieving subwavelength structures using a cost-effective approach; this method exploits the capability of the beads to focus electromagnetic waves into subwavelength beams called photonic nanojets, which are used to expose the photoresist on which the beads are placed. However, this technique has only been used to produce regular patterns based on the spatial arrangement of the beads on the substrate, thus considerably limiting the pool of applications. Here, we present a novel microsphere-based optical lithography technique that offers high subwavelength resolution and the possibility of generating any arbitrary pattern. The presented method consists of a single microsphere embedded in an AFM cantilever, which can be controlled using the AFM motors to write arbitrary patterns with subwavelength resolution (down to 290 nm with a 405 nm laser). The performance of the proposed technique can compete with those of commercial high-resolution standard instruments, with the advantage of a one-order-of-magnitude reduction in costs. This approach paves the way for direct integration of cost-effective, high-resolution optical lithography capabilities into several existing AFM systems.

Polymeric lithography editor: Editing lithographic errors with nanoporous polymeric probes

A new lithographic editing system with an ability to erase and rectify errors in microscale with real-time optical feedback is demonstrated. The erasing probe is a conically shaped hydrogel (tip size, ca. 500 nm) template-synthesized from track-etched conical glass wafers. The "nanosponge" hydrogel probe "erases" patterns by hydrating and absorbing molecules into a porous hydrogel matrix via diffusion analogous to a wet sponge. The presence of an interfacial liquid water layer between the hydrogel tip and the substrate during erasing enables frictionless, uninterrupted translation of the eraser on the substrate. The erasing capacity of the hydrogel is extremely high because of the large free volume of the hydrogel matrix. The fast frictionless translocation and interfacial hydration resulted in an extremely high erasing rate (~785 μm2/s), which is two to three orders of magnitude higher in comparison with the atomic force microscopy-based erasing (~0.1 μm2/s) experiments. The high precision and accuracy of the polymeric lithography editor (PLE) system stemmed from coupling piezoelectric actuators to an inverted optical microscope. Subsequently after erasing the patterns using agarose erasers, a polydimethylsiloxane probe fabricated from the same conical track-etched template was used to precisely redeposit molecules of interest at the erased spots. PLE also provides a continuous optical feedback throughout the entire molecular editing process-writing, erasing, and rewriting. To demonstrate its potential in device fabrication, we used PLE to electrochemically erase metallic copper thin film, forming an interdigitated array of microelectrodes for the fabrication of a functional microphotodetector device. High-throughput dot and line erasing, writing with the conical "wet nanosponge," and continuous optical feedback make PLE complementary to the existing catalog of nanolithographic/microlithographic and three-dimensional printing techniques. This new PLE technique will potentially open up many new and exciting avenues in lithography, which remain unexplored due to the inherent limitations in error rectification capabilities of the existing lithographic techniques.

Patterning Electrospun Nanofibers via Agarose Hydrogel Stamps to Spatially Coordinate Cell Orientation in Microfluidic Device

A straightforward, inexpensive, and reliable approach to pattern electrospun nanofibers via solvent-containing agarose hydrogel stamps is reported. Complex hierarchical microstructures can be further constructed via appropriate multistep permutation of microcontact patterning and electrospinning. As a proof-of-concept application, the patterned electrospun nanofibers are employed to spatially coordinate cell orientation in microfluidic devices.

Reactions in ultra-small droplets by tip-assisted chemistry

The confinement of chemical reactions within small droplets has received much attention in the last few years. This approach has been proved successful for the in-depth study of naturally occurring chemical processes as well as for the synthesis of different sets of nanomaterials with control over their size, shape and properties. Different approaches such as the use of self-contained structures or microfluidic generated droplets have been followed over the years with success. However, novel approaches have emerged during the last years based on the deposition of femtolitre-sized droplets on surfaces using tip-assisted lithographic methods. In this feature article, we review the advances made towards the use of these ultra-small droplets patterned on surfaces as confined nano-reactors.

Hard Transparent Arrays for Polymer Pen Lithography

Patterning nanoscale features across macroscopic areas is challenging due to the vast range of length scales that must be addressed. With polymer pen lithography, arrays of thousands of elastomeric pyramidal pens can be used to write features across centimeter-scales, but deformation of the soft pens limits resolution and minimum feature pitch, especially with polymeric inks. Here, we show that by coating polymer pen arrays with a ∼175 nm silica layer, the resulting hard transparent arrays exhibit a force-independent contact area that improves their patterning capability by reducing the minimum feature size (∼40 nm), minimum feature pitch (<200 nm for polymers), and pen to pen variation. With these new arrays, patterns with as many as 5.9 billion features in a 14.5 cm(2) area were written using a four hundred thousand pyramid pen array. Furthermore, a new method is demonstrated for patterning macroscopic feature size gradients that vary in feature diameter by a factor of 4. Ultimately, this form of polymer pen lithography allows for patterning with the resolution of dip-pen nanolithography across centimeter scales using simple and inexpensive pen arrays. The high resolution and density afforded by this technique position it as a broad-based discovery tool for the field of nanocombinatorics.

Synthesis of Nanoscale Coordination Polymers in Femtoliter Reactors on Surfaces

In the present work, AFM-assisted lithography was used to perform the synthesis of a coordination polymer inside femtoliter droplets deposited on surfaces. For this, solutions of the metal salt and the organic ligand were independently transferred to adjacent tips of the same AFM probe array and were sequentially delivered on the same position of the surface, creating femtoliter-sized reaction vessels where the coordination reaction and particle growth occurred. Alternatively, the two reagents were mixed in the cantilever array by loading an excess of the inks, and transferred to the surface immediately after, before the precipitation of the coordination polymer took place. The in situ synthesis allowed the reproducible obtaining of round-shaped coordination polymer nanostructures with control over their XY positioning on the surface, as characterized by microscopy and spectroscopy techniques.

Seeing is believing: atomic force microscopy imaging for nanomaterial research

Atomic force microscopy can image nanomaterial properties such as the topography, elasticity, adhesion, friction, electrical properties, and magnetism.

Hydrodynamic thermal confinement: creating thermo-chemical microenvironments on surfaces

We present a new, general concept termed Hydrodynamic Thermal Confinement (HTC), and its implementation for the creation of microscale dynamic thermo-chemical microenvironments on biological surfaces. We demonstrate selective DNA denaturation of single spots on a microarray using a 15% formamide solution at 60 °C.

Combination of Universal Mechanical Testing Machine with Atomic Force Microscope for Materials Research

Surface deformation and fracture processes of materials under external force are important for understanding and developing materials. Here, a combined horizontal universal mechanical testing machine (HUMTM)-atomic force microscope (AFM) system is developed by modifying UMTM to combine with AFM and designing a height-adjustable stabilizing apparatus. Then the combined HUMTM-AFM system is evaluated. Finally, as initial demonstrations, it is applied to analyze the relationship among macroscopic mechanical properties, surface nanomorphological changes under external force, and fracture processes of two kinds of representative large scale thin film materials: polymer material with high strain rate (Parafilm) and metal material with low strain rate (aluminum foil). All the results demonstrate the combined HUMTM-AFM system overcomes several disadvantages of current AFM-combined tensile/compression devices including small load force, incapability for large scale specimens, disability for materials with high strain rate, and etc. Therefore, the combined HUMTM-AFM system is a promising tool for materials research in the future.

The influence of thiolate readsorption on the quality of mixed monolayers formed through an electrochemcial method

Lateral Force Microscopy (LFM) was used to probe the quality of binary mixed monolayers formed on planar polycrystalline gold through an electrochemical method. In the approach, portions of a self-assembled monolayer (SAM) composed of 2-aminoethanethiol (AET) were removed from the Au(111) surface facets by selective reductive desorption which maintained undisrupted regions of AET elsewhere on the polycrystalline surface. Monolayer voids created by this method were backfilled with 11-mercaptoundecanoic acid (MUA) and the interface characterized with ex situ LFM. This produced images with domains of high and low friction corresponding to isolated zones of MUA and AET respectively. Reverse sequence mixed monolayers were also prepared with MUA as the starting layer and rendered LFM images that mirrored the AET based layers. This demonstrates flexibility of the electrochemical method to produce heterogeneous binary SAMs, and to further probe the quality of mixed monolayers, a number of experimental conditions including desorption time, electrode configuration, and initial incubation period were studied. AET/MUA layers that produced the most enhanced LFM images were formed on a planar electrode that was vertically submerged into the electrolyte while maintaining a selective desorption potential for 5 min before backfilling with MUA. This condition allowed for the effective diffusion of AET away from the interface and created well-defined monolayer voids for backfilling. At desorption times lower than 1 min, some of the AET molecules that remained near the interface would readsorb onto the surface and interfere with the backfilling process thereby creating lower contrast LFM images. Structural features of these layers were independent of initial incubation time (10 min and 16 h); however, the contrast between domains was improved when using AET layers formed over a longer incubation period. Interestingly, the contrast was significantly reduced when mixed layers were created on electrodes set in a hanging meniscus with the electrolyte. Here, electrochemical evidence pointed to prolonged readsorption of thiolates creating less well-defined voids for backfilling, and the event was most pronounced for MUA based layers.

Dynamic enhancement in adhesion forces of truncated and nanosphere tips on substrates

Both AFM tip shape and substrate have obvious effects on the dynamic adhesion forces of truncated and nanosphere tips on four different substrates (mica, sapphire, silicon wafer, and highly oriented pyrolytic graphite).