Interaction of Slow Electrons with Thermally Evaporated Manganese(II) Acetylacetonate Complexes

Complexes of metal acetylacetonate are used as general precursors for the synthesis of metal oxide nanomaterials. In the present work, we study the interaction of low-energy (<10 eV) electrons, produced abundantly as secondary electrons during the bombardment of the substrate by the primary particles, with thermally evaporated manganese(II) acetylacetonate complexes. We found that the acetylacetonate anion ([acac]^-) is the major anionic species produced, while the second most abundant is the parent anion [Mn(II)(acac)₂]^-. This observation differs from those reported from electron attachment to Cu(acac)₂, for which [Cu(II)(acac)₂]^- is the predominant anion [Kopyra et al. Phys. Chem. Chem. Phys. 2018, 20, 7746]. The experimental data are supported by theory to provide information on the physical-chemistry processes initiated by slow electrons to the organometallic precursor and to interpret the different behavior of Mn(acac)₂ compared to Cu(acac)₂.

Interaction of gas phase copper(ii) acetylacetonate with slow electrons

Understanding the fundamental processes underlying the interaction of organometallic compounds with low energy electrons is desirable for optimizing methodologies for nanoscale applications.

Electron beam induced deposition of silacyclohexane and dichlorosilacyclohexane: the role of dissociative ionization and dissociative electron attachment in the deposition process

We present first experiments on electron beam induced deposition of silacyclohexane (SCH) and dichlorosilacyclohexane (DCSCH) under a focused high-energy electron beam (FEBID). We compare the deposition dynamics observed when growing pillars of high aspect ratio from these compounds and we compare the proximity effect observed for these compounds. The two precursors show similar behaviour with regards to fragmentation through dissociative ionization in the gas phase under single-collision conditions. However, while DCSCH shows appreciable cross sections with regards to dissociative electron attachment, SCH is inert with respect to this process. We discuss our deposition experiments in context of the efficiency of these different electron-induced fragmentation processes. With regards to the deposition dynamics, we observe a substantially faster growth from DCSCH and a higher saturation diameter when growing pillars with high aspect ratio. However, both compounds show similar behaviour with regards to the proximity effect. With regards to the composition of the deposits, we observe that the C/Si ratio is similar for both compounds and in both cases close to the initial molecular stoichiometry. The oxygen content in the DCSCH deposits is about double that of the SCH deposits. Only marginal chlorine is observed in the deposits of from DCSCH. We discuss these observations in context of potential approaches for Si deposition.

Nudged elastic band method and density functional theory calculation for finding a local minimum energy pathway of p-benzoquinone and phenol fragmentation in mass spectrometry

Analysis of the fragmentation pathways of molecules in mass spectrometry gives a fundamental insight into gas-phase ion chemistry. However, the conventional intrinsic reaction coordinates method requires knowledge of the transition states of ion structures in the fragmentation pathways. Herein, we use the nudged elastic band method, using only the initial and final state ion structures in the fragmentation pathways, and report the advantages and limitations of the method. We found a minimum energy path of p-benzoquinone ion fragmentation with two saddle points and one intermediate structure. The primary energy barrier, which corresponded to the cleavage of the C-C bond adjacent to the CO group, was calculated to be 1.50 eV. An additional energy barrier, which corresponded to the cleavage of the CO group, was calculated to be 0.68 eV. We also found an energy barrier of 3.00 eV, which was the rate determining step of the keto-enol tautomerization in CO elimination from the molecular ion of phenol. The nudged elastic band method allowed the determination of a minimum energy path using only the initial and final state ion structures in the fragmentation pathways, and it provided faster than the conventional intrinsic reaction coordinates method. In addition, this method was found to be effective in the analysis of the charge structures of the molecules during the fragmentation in mass spectrometry.

P. R, Fairbrother DH, Ingólfsson O. The role of low-energy electrons in focused electron beam induced deposition: four case studies of representative precursors

Focused electron beam induced deposition (FEBID) is a single-step, direct-write nanofabrication technique capable of writing three-dimensional metal-containing nanoscale structures on surfaces using electron-induced reactions of organometallic precursors. Currently FEBID is, however, limited in resolution due to deposition outside the area of the primary electron beam and in metal purity due to incomplete precursor decomposition. Both limitations are likely in part caused by reactions of precursor molecules with low-energy (<100 eV) secondary electrons generated by interactions of the primary beam with the substrate. These low-energy electrons are abundant both inside and outside the area of the primary electron beam and are associated with reactions causing incomplete ligand dissociation from FEBID precursors. As it is not possible to directly study the effects of secondary electrons in situ in FEBID, other means must be used to elucidate their role. In this context, gas phase studies can obtain well-resolved information on low-energy electron-induced reactions with FEBID precursors by studying isolated molecules interacting with single electrons of well-defined energy. In contrast, ultra-high vacuum surface studies on adsorbed precursor molecules can provide information on surface speciation and identify species desorbing from a substrate during electron irradiation under conditions more representative of FEBID. Comparing gas phase and surface science studies allows for insight into the primary deposition mechanisms for individual precursors; ideally, this information can be used to design future FEBID precursors and optimize deposition conditions. In this review, we give a summary of different low-energy electron-induced fragmentation processes that can be initiated by the secondary electrons generated in FEBID, specifically, dissociative electron attachment, dissociative ionization, neutral dissociation, and dipolar dissociation, emphasizing the different nature and energy dependence of each process. We then explore the value of studying these processes through comparative gas phase and surface studies for four commonly-used FEBID precursors: MeCpPtMe3, Pt(PF3)4, Co(CO)3NO, and W(CO)6. Through these case studies, it is evident that this combination of studies can provide valuable insight into potential mechanisms governing deposit formation in FEBID. Although further experiments and new approaches are needed, these studies are an important stepping-stone toward better understanding the fundamental physics behind the deposition process and establishing design criteria for optimized FEBID precursors.

Acetone and the precursor ligand acetylacetone: distinctly different electron beam induced decomposition?

In focused electron beam induced deposition (FEBID) acetylacetone plays a role as a ligand in metal acetylacetonate complexes. As part of a larger effort to understand the chemical processes in FEBID, the electron-induced reactions of acetylacetone were studied both in condensed layers and in the gas phase and compared to those of acetone. X-ray photoelectron spectroscopy (XPS) shows that the electron-induced decomposition of condensed acetone layers yields a non-volatile hydrocarbon residue while electron irradiation of acetylacetone films produces a non-volatile residue that contains not only much larger amounts of carbon but also significant amounts of oxygen. Electron-stimulated desorption (ESD) and thermal desorption spectrometry (TDS) measurements reveal striking differences in the decay kinetics of the layers. In particular, intact acetylacetone suppresses the desorption of volatile products. Gas-phase studies of dissociative electron attachment and electron impact ionization suggest that this effect cannot be traced back to differences in the initial fragmentation reactions of the isolated molecules but is due to subsequent dissociation processes and to an efficient reaction of released methyl radicals with adjacent acetylacetone molecules. These results could explain the incorporation of large amounts of ligand material in deposits fabricated by FEBID processes using acetylacetonate complexes.