Surface Coupling of Octaethylporphyrin with Silicon Tetrachloride

The surface assembly of 2,3,7,8,12,13,17,18-octaethylporphyrin (OEP) using silicon tetrachloride as a coupling agent was investigated using atomic force microscopy (AFM). Nanopatterned films of Si-OEP were prepared by protocols of colloidal lithography to evaluate the morphology, thickness, and molecular orientation for samples prepared on Si(111). The natural self-stacking of porphyrins can pose a challenge for molecular patterning. When making films on surfaces, porphyrins will self-associate to form co-planar configurations of random stacks of molecules. There is a tendency for the flat molecules to orient spontaneously in a side-on arrangement that is mediated by physisorption to the substrate as well as by π-π interactions between macrocycles to form a layered arrangement of packed molecules, analogous to a stack of coins. When silicon tetrachloride is introduced to the reaction vessel, the coupling between the surface and porphyrins is mediated through covalent Si-O bonding. For these studies, surface structures of Si-OEP were formed that are connected with a Si-O-Si motif to a silicon atom coordinated to the center of the porphyrin macrocycles. Protocols of colloidal lithography were used as a tool to prepare surface structures and films of Si-OEP to facilitate surface characterizations. Conceptually, by arranging the macrocycles of porphyrins with defined orientation, local AFM surface measurements can be enabled to help address mechanistic questions about how molecules self-assemble and bind to substrates.

Phthalocyanine Photoregeneration for Low Power Consumption Chemiresistors

It is well-known that the applicability of phthalocyanine chemiresistors suffers from long recovery time after NO₂ exposure. This circumstance enforces the necessity to operate the sensors at elevated temperatures (150-200 °C), which shortens the sensor lifetime and increases its power consumption (regardless, a typical measurement period is longer than 15 min). In this paper, we propose a new method for fast and effective recovery by UV-vis illumination at a low temperature (55 °C). The method is based on short illumination following short NO₂ exposure. To support and optimize the method, we investigated the effects of light in the wavelength and intensity ranges of 375-850 nm and 0.2-0.8 mW/mm², respectively, on the rate of NO₂ desorption from the phthalocyanine sensitive layer during the recovery period. This investigation was carried out for a set of phthalocyanine materials (ZnPc, CuPc, H₂Pc, PbPc, and FePc) operating at slightly elevated temperatures (55-100 °C) and was further supported by the analysis of UV-vis and FTIR spectral changes. We found out that the light with the wavelength shorter than 550 nm significantly accelerates the NO₂ desorption from ZnPc, CuPc, and FePc, and allows bringing the measurement period under 2 min and decreasing the sensor power consumption by 75%. Possible mechanisms of the light-stimulated desorption are discussed.