Fractal growth of platinum electrodeposits revealed by in situ electron microscopy

Noble metal nanodendrites: growth mechanisms, synthesis strategies and applications

Inorganic nanodendrites (NDs) have become a kind of advanced nanomaterials with broad application prospects because of their unique branched architecture. The structural characteristics of nanodendrites include highly branched morphology, abundant tips/edges and high-index crystal planes, and a high atomic utilization rate, which give them great potential for usage in the fields of electrocatalysis, sensing, and therapeutics. Therefore, the rational design and controlled synthesis of inorganic (especially noble metals) nanodendrites have attracted widespread attention nowadays. The development of synthesis strategies and characterization methodology provides unprecedented opportunities for the preparation of abundant nanodendrites with interesting crystallographic structures, morphologies, and application performances. In this review, we systematically summarize the formation mechanisms of noble metal nanodendrites reported in recent years, with a special focus on surfactant-mediated mechanisms. Some typical examples obtained by innovative synthetic methods are then highlighted and recent advances in the application of noble metal nanodendrites are carefully discussed. Finally, we conclude and present the prospects for the future development of nanodendrites. This review helps to deeply understand the synthesis and application of noble metal nanodendrites and may provide some inspiration to develop novel functional nanomaterials (especially electrocatalysts) with enhanced performance.

Fractal Growth of Quasi Two-Dimensional Copper Dendrites by Template-free Electrodeposition

Fractal dendrites are extensively observed in industry, especially in the electrochemical deposition process. The fractal dendrite electrodeposition behavior of quasi-two-dimensional Cu (Q2D-Cu) metal based on the wire is examined via direct electrodeposition using a thin layer reactor. Here, to explain the fractal growth mechanism, the directional migration and random walking of ions are introduced in the traditional diffusion-limited aggregation model, and fractal patterns consistent with the experimental results are successfully simulated. In addition, the Cu fractal dendrite structure is finely adjusted by varying electrodeposition conditions, demonstrating its great potential for further optimization. The CuO/Q2D-Cu fractal dendrite photothermal device fabricated through in situ assembly of CuO nanowires on Cu fractal dendrite has good photothermal conversion ability. Therefore, metal fractal dendrites, which are considered harmful in the electroplating industry, have application prospects in the photothermal field.

Electrode Surface Coverage with Deposit Generated Under Conditions of Electrochemical Nucleation and Growth. A Mathematical Analysis

The theory of the diffusion limited electrochemical nucleation and growth of a deposit consisting of isolated 3D hemispherical nuclei has been re-analysed. The analysis focuses on a widely discussed model which assumes formation of “diffusion zones” around the growing nuclei. It has been proposed in the literature that the deposit-free fraction of the surface area of the substrate can be directly calculated from the substrate coverage with the “diffusion zones”. The aim of this work is to analyse whether such an approach can be applied for the growth of isolated 3D hemispherical nuclei. This is accomplished by evaluation of equations which describe nuclei radii at various stages of the deposition process. The formulae allow determining the substrate surface coverage with the growing deposit. This, in turn, allows simulating and analysing faradaic currents due to other than the electrodeposition reactions which take place at the deposit-free fraction of the substrate surface. Both instantaneous and progressive modes of the nucleation are discussed and the influence of the nucleation type on the faradaic currents is outlined. A comparison with other approaches reported in the literature indicates that the deposit-free fraction of the substrate surface may not always be determined by means of recalculation of the substrate coverage with the “diffusion zones”.

Graphical abstract

Nanoscale focused electron beam induced etching of nickel using a liquid reactant

Nickel nanostructures have found widespread application as both functional components, e.g. in magnetic systems, and as part of the lithographic pattern transfer process as etch masks, EUV mask absorbers, and imprint templates. Electron-beam induced etching of nickel is highly desirable for the repair and editing of masks and templates with high resolution and without substrate damage. However, there are no known gas-phase reactants that produce volatile nickel products under e-beam irradiation. Here we report the successful local etching of nickel by a focused electron beam in an environmental scanning electron microscope using a liquid reactant, aqueous sulfuric acid. Sulfuric acid did not spontaneously etch nickel under ESEM conditions, but nickel was etched in areas exposed to the electron beam. Etching parameters such as dose, refresh time, and addition of a surfactant were investigated. The extent of the etch increases with dose before terminating at sub-micron feature sizes. The etch resolution improves with the addition of surfactant. This approach enables local nickel patterning with complete film removal but without damaging underlying layers. With further refinement, the process may enable nickel absorber repair and editing and remove a significant obstacle to the use of nickel in EUV lithography.

The radiation chemistry of focused electron-beam induced etching of copper in liquids

Well-controlled, focused electron-beam induced etching of copper thin films has been successfully conducted on bulk substrates in an environmental scanning electron microscope by controlling liquid-film thickness with an in situ correlative interferometry system. Knowledge of the liquid-film thickness enables a hybrid Monte Carlo/continuum model of the radiation chemistry to accurately predict the copper etch rate using only electron scattering cross-sections, radical yields, and reaction rates from previous studies. Etch rates depended strongly on the thickness of the liquid film and simulations confirmed that this was a result of increased oxidizing radical generation. Etch rates also depended strongly, but non-linearly, on electron beam current, and simulations showed that this effect arises through the dose-rate dependence of reactions of radical species.

Quantitative investigation of the formation and growth of palladium fractal nanocrystals by liquid-cell transmission electron microscopy

Liquid-cell transmission electron microscopy reveals the early formation stage of fractal nanocrystals and the effects of supersaturation on their growth dynamics.