Eugenol, a Promising Building Block for Biobased Polymers with Cutting-Edge Properties

Biobased materials, derived from biomass building blocks, are essential in the pursuit of sustainable materials. Eugenol, a natural phenol obtained from clove oil, but also from lignin depolymerization, possesses a chemical structure that allows its easy modification to obtain a broad and versatile platform of biobased monomers. In this Perspective, an overview of the variety of reactions that have been executed on the allylic double bond, phenol hydroxyl group, aromatic ring, and methoxy group is given, focusing our attention on those to obtain monomers suitable for different polymerization reactions. Furthermore, possible applications and perspectives on the eugenol-derived materials are provided.

Light and Hydrogels: A New Generation of Antimicrobial Materials

Nosocomial diseases are becoming a scourge in hospitals worldwide, and new multidrug-resistant microorganisms are appearing at the forefront, significantly increasing the number of deaths. Innovative solutions must emerge to prevent the imminent health crisis risk, and antibacterial hydrogels are one of them. In addition to this, for the past ten years, photochemistry has become an appealing green process attracting continuous attention from scientists in the scope of sustainable development, as it exhibits many advantages over other methods used in polymer chemistry. Therefore, the combination of antimicrobial hydrogels and light has become a matter of course to design innovative antimicrobial materials. In the present review, we focus on the use of photochemistry to highlight two categories of hydrogels: (a) antibacterial hydrogels synthesized via a free-radical photochemical crosslinking process and (b) chemical hydrogels with light-triggered antibacterial properties. Numerous examples of these new types of hydrogels are described, and some notions of photochemistry are introduced.

Sustainable near UV-curable acrylates based on natural phenolics for stereolithography 3D printing

Photocured polymers have recently gained tremendous interest for a wide range of applications especially industrial prototyping/additive manufacturing. This work aims to develop natural phenolic-based (meth)acrylates to expand the use of sustainable and mechanically robust 3D printable formulations.

Oxygen insensitive thiol–ene photo-click chemistry for direct imprint lithography of oxides

UV-nanoimprint lithography (UV-NIL) is a promising technique for direct fabrication of functional oxide nanostructures. Since it is mostly carried out in aerobic conditions, the free radical polymerization during imprinting is retarded due to the radical scavenging ability of oxygen. Therefore, it is highly desirable to have an oxygen-insensitive photo-curable resin that not only alleviates the requirement of inert conditions but also enables patterning without making substantial changes in the process. Here we demonstrate the formulation of metal-containing resins that employ oxygen-insensitive thiol–ene photo-click chemistry. Allyl acetoacetate (AAAc) has been used as a bifunctional monomer that, on one hand, chelates with the metal ion, and on the other hand, offers a reactive alkene group for polymerization. Pentaerythritol tetrakis(3-mercaptopropionate) (PETMP), a four-arm thiol derivative, is used as a crosslinker as well as an active component in the thiol–ene photo-click chemistry. The FT-IR analyses on the metal-free and metal-containing resin formulations revealed that the optimum ratio of alkene to thiol is 1 : 0.5 for an efficient photo-click chemistry. The thiol–ene photo-click chemistry has been successfully demonstrated for direct imprinting of oxides by employing TiO₂ and Ta₂O₅ as candidate systems. The imprinted films of metal-containing resins were subjected to calcination to obtain the corresponding patterned metal oxides. This technique can potentially be expanded to other oxide systems as well.

Metal-containing oxygen-insensitive photocurable resin formulations are designed based on thiol–ene click chemistry that are suitable for UV nanoimprinting to directly pattern oxides.