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Rasritat A, Tapakidareekul M, Saego K, Meevasana W, Sangtawesin S. Formation of oxygen protective layer on monolayer MoS 2 via low energy electron irradiation. RSC Adv 2024; 14:21999-22005. [PMID: 38993507 PMCID: PMC11238566 DOI: 10.1039/d4ra03362k] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 05/07/2024] [Accepted: 06/27/2024] [Indexed: 07/13/2024] Open
Abstract
Monolayer molybdenum disulfide (MoS2) semiconductors are the new generation of two-dimensional materials that possess several advantages compared to graphene due to their tunable bandgap and high electron mobility. Several approaches have been used to modify their physical properties for optical device applications. Here, we report a facile and non-destructive surface modification method for monolayer MoS2 via electron irradiation at a low, 5 kV accelerating voltage. After electron irradiation, the results of Raman and photoluminescence spectroscopy confirmed that the structure remains unchanged. However, when the modified surface was illuminated with a 532 nm laser for a prolonged period, the PL intensity was quenched as a result of oxygen desorption. Interestingly, the PL intensity can be recovered when left in ambient conditions for 10 h. The analysis of the PL spectrum revealed a decrease of trion, which is consistent with the readsorbed O2 molecules on the surface that deplete electrons and lead to PL recovery. We attribute this effect to the enhancement of the n-type character of monolayer MoS2 after electron irradiation. The sensitive nature of the modified surface to oxygen suggests that this approach may be used as a tool for the fabrication of MoS2 oxygen sensors.
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Affiliation(s)
- Aissara Rasritat
- School of Physics, Suranaree University of Technology Nakhon Ratchasima 30000 Thailand
| | | | - Kritsana Saego
- School of Physics, Suranaree University of Technology Nakhon Ratchasima 30000 Thailand
| | - Worawat Meevasana
- School of Physics, Suranaree University of Technology Nakhon Ratchasima 30000 Thailand
| | - Sorawis Sangtawesin
- School of Physics, Suranaree University of Technology Nakhon Ratchasima 30000 Thailand
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2
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Cao ZL, Guo XH, Yao KL, Zhu L. Sub-9 nm high-performance and low-power transistors based on an in-plane NbSe 2/MoSe 2/NbSe 2 heterojunction. NANOSCALE 2023; 15:17029-17035. [PMID: 37846516 DOI: 10.1039/d3nr04514e] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 10/18/2023]
Abstract
Due to the ability to reduce the gate length of field-effect transistors (FETs) down to sub-10 nm without obviously affecting the performance of the device, the utilization of two-dimensional (2D) semiconductor materials as channel materials for FETs is of great interest. However, in-plane 2D/2D heterojunction FETs have received less attention in previous studies than vertical van der Waals heterojunction devices. Based on the above reasons, this study has investigated the transport properties of an in-plane NbSe2/MoSe2/NbSe2 heterojunction FET with different gate lengths by using ab initio quantum transport simulation. The results reveal that a gate length of sub-9 nm gives the device a low subthreshold swing down to 62 mV dec-1 and a high on-state current up to 1040 μA μm-1. Most importantly, the on-state current, delay time, and power dissipation of the FET with the optimized channel length can nearly meet or even exceed the high-performance and low-power requirements of the International Technology Roadmap for Semiconductors. The findings for this FET can provide the design and development guidance for other in-plane heterojunction electrical devices in the post-Moore era.
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Affiliation(s)
- Zeng-Lin Cao
- School of Physics and Wuhan National High Magnetic Field Center, Huazhong University of Science and Technology, Wuhan 430074, People's Republic of China.
| | - Xiao-Hui Guo
- School of Physics and Wuhan National High Magnetic Field Center, Huazhong University of Science and Technology, Wuhan 430074, People's Republic of China.
| | - Kai-Lun Yao
- School of Physics and Wuhan National High Magnetic Field Center, Huazhong University of Science and Technology, Wuhan 430074, People's Republic of China.
| | - Lin Zhu
- School of Physics and Wuhan National High Magnetic Field Center, Huazhong University of Science and Technology, Wuhan 430074, People's Republic of China.
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3
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Liu X, Choi MS, Hwang E, Yoo WJ, Sun J. Fermi Level Pinning Dependent 2D Semiconductor Devices: Challenges and Prospects. ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2022; 34:e2108425. [PMID: 34913205 DOI: 10.1002/adma.202108425] [Citation(s) in RCA: 30] [Impact Index Per Article: 15.0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 10/20/2021] [Revised: 11/29/2021] [Indexed: 06/14/2023]
Abstract
Motivated by the high expectation for efficient electrostatic modulation of charge transport at very low voltages, atomically thin 2D materials with a range of bandgaps are investigated extensively for use in future semiconductor devices. However, researchers face formidable challenges in 2D device processing mainly originated from the out-of-plane van der Waals (vdW) structure of ultrathin 2D materials. As major challenges, untunable Schottky barrier height and the corresponding strong Fermi level pinning (FLP) at metal interfaces are observed unexpectedly with 2D vdW materials, giving rise to unmodulated semiconductor polarity, high contact resistance, and lowered device mobility. Here, FLP observed from recently developed 2D semiconductor devices is addressed differently from those observed from conventional semiconductor devices. It is understood that the observed FLP is attributed to inefficient doping into 2D materials, vdW gap present at the metal interface, and hybridized compounds formed under contacting metals. To provide readers with practical guidelines for the design of 2D devices, the impact of FLP occurring in 2D semiconductor devices is further reviewed by exploring various origins responsible for the FLP, effects of FLP on 2D device performances, and methods for improving metallic contact to 2D materials.
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Affiliation(s)
- Xiaochi Liu
- School of Physics and Electronics, Central South University, Changsha, 410083, China
| | - Min Sup Choi
- SKKU Advanced Institute of Nano Technology, Sungkyunkwan University, Suwon, 16419, South Korea
| | - Euyheon Hwang
- SKKU Advanced Institute of Nano Technology, Sungkyunkwan University, Suwon, 16419, South Korea
| | - Won Jong Yoo
- SKKU Advanced Institute of Nano Technology, Sungkyunkwan University, Suwon, 16419, South Korea
| | - Jian Sun
- School of Physics and Electronics, Central South University, Changsha, 410083, China
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4
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Hou C, Deng J, Guan J, Yang Q, Yu Z, Lu Y, Xu Z, Yao Z, Zheng J. Photoluminescence of monolayer MoS 2 modulated by water/O 2/laser irradiation. Phys Chem Chem Phys 2021; 23:24579-24588. [PMID: 34704573 DOI: 10.1039/d1cp03651c] [Citation(s) in RCA: 3] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/21/2022]
Abstract
The low photoluminescence (PL) quantum yields of transition metal dichalcogenide monolayers have been a limiting factor for their optoelectronic applications. Various and even inconsistent mechanisms have been proposed to modulate their PL efficiencies. Herein, we use PL/Raman microspectroscopy and the corresponding in situ mapping, atomic force microscopy, and field-effect transistor (FET) characterization to investigate the changes in the structural and optical properties of monolayer MoS2. Relatively low power density (<4.08 × 105 W cm-2) of laser irradiation in ambient air can cause a slight PL suppression effect on monolayer MoS2, whereas relatively high power density (∼1.02 × 106 W cm-2) of laser irradiation brings significant PL enhancement. Experiments under different atmospheres reveal that the laser-irradiation-induced enhancement only occurs in the atmosphere containing O2 and is more remarkable in pure O2. In addition, physically adsorbed water can also induce PL enhancement of monolayer MoS2. FET devices suggest that the adsorbed water produces a p-doping effect on MoS2, and the laser irradiation in ambient air generates an n-doping effect, and both types of doping can enhance the PL intensity. The island-shaped defects caused by laser irradiation can be stabilized by oxygen atoms and act as trapping centers for excited trions or electrons, thus reducing the non-radiative recombination ratio and enhancing the PL intensity. The physically adsorbed water works in a similar way. A low power density of laser irradiation can sweep away the originally adsorbed H2O on the surface, thus reducing the PL.
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Affiliation(s)
- Chao Hou
- College of Chemistry and Molecular Engineering, Beijing National Laboratory for Molecular Sciences, Peking University, Beijing 100871, China.
| | - Jingwen Deng
- College of Chemistry and Molecular Engineering, Beijing National Laboratory for Molecular Sciences, Peking University, Beijing 100871, China.
| | - Jianxin Guan
- College of Chemistry and Molecular Engineering, Beijing National Laboratory for Molecular Sciences, Peking University, Beijing 100871, China.
| | - Qirong Yang
- College of Chemistry and Molecular Engineering, Beijing National Laboratory for Molecular Sciences, Peking University, Beijing 100871, China.
| | - Zhihao Yu
- College of Chemistry and Molecular Engineering, Beijing National Laboratory for Molecular Sciences, Peking University, Beijing 100871, China.
| | - Yilin Lu
- Institutes of Physical Science and Information Technology, Anhui University, Hefei 230601, China
| | - Zihan Xu
- Shenzhen Sixcarbon Technology, Shenzhen 518106, China
| | - Zefan Yao
- College of Chemistry and Molecular Engineering, Beijing National Laboratory for Molecular Sciences, Peking University, Beijing 100871, China.
| | - Junrong Zheng
- College of Chemistry and Molecular Engineering, Beijing National Laboratory for Molecular Sciences, Peking University, Beijing 100871, China.
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Joshi J, Zhou T, Krylyuk S, Davydov AV, Zutic I, Vora PM. Localized Excitons in NbSe 2-MoSe 2 Heterostructures. ACS NANO 2020; 14:8528-8538. [PMID: 32639717 PMCID: PMC8171581 DOI: 10.1021/acsnano.0c02803] [Citation(s) in RCA: 3] [Impact Index Per Article: 0.8] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/29/2023]
Abstract
Neutral and charged excitons (trions) in atomically thin materials offer important capabilities for photonics, from ultrafast photodetectors to highly efficient light-emitting diodes and lasers. Recent studies of van der Waals (vdW) heterostructures comprised of dissimilar monolayer materials have uncovered a wealth of optical phenomena that are predominantly governed by interlayer interactions. Here, we examine the optical properties in NbSe2-MoSe2 vdW heterostructures, which provide an important model system to study metal-semiconductor interfaces, a common element in optoelectronics. Through low-temperature photoluminescence (PL) microscopy, we discover a sharp emission feature, L1, that is localized at the NbSe2-capped regions of MoSe2. L1 is observed at energies below the commonly studied MoSe2 excitons and trions and exhibits temperature- and power-dependent PL consistent with exciton localization in a confining potential. This PL feature is robust, observed in a variety of samples fabricated with different stacking geometries and cleaning procedures. Using first-principles calculations, we reveal that the confinement potential required for exciton localization naturally arises from the in-plane band bending due to the changes in the electron affinity between pristine MoSe2 and NbSe2-MoSe2 heterostructure. We discuss the implications of our studies for atomically thin optoelectronics devices with atomically sharp interfaces and tunable electronic structures.
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Affiliation(s)
- Jaydeep Joshi
- Department of Physics and Astronomy, George Mason University, Fairfax, Virginia 22030, United States
- Quantum Science and Engineering Center, George Mason University, Fairfax, Virginia 22030, United States
| | - Tong Zhou
- Department of Physics, University at Buffalo, Buffalo, New York 14260, United States
| | - Sergiy Krylyuk
- Materials Science and Engineering Division, National Institute of Standards and Technology, Gaithersburg, Maryland 20899, United States
| | - Albert V. Davydov
- Materials Science and Engineering Division, National Institute of Standards and Technology, Gaithersburg, Maryland 20899, United States
| | - Igor Zutic
- Department of Physics, University at Buffalo, Buffalo, New York 14260, United States
| | - Patrick M. Vora
- Department of Physics and Astronomy, George Mason University, Fairfax, Virginia 22030, United States
- Quantum Science and Engineering Center, George Mason University, Fairfax, Virginia 22030, United States
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6
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Byrley P, Liu M, Yan R. Photochemically Induced Phase Change in Monolayer Molybdenum Disulfide. Front Chem 2019; 7:442. [PMID: 31263694 PMCID: PMC6584976 DOI: 10.3389/fchem.2019.00442] [Citation(s) in RCA: 5] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 02/21/2019] [Accepted: 05/29/2019] [Indexed: 11/23/2022] Open
Abstract
Monolayer transition metal dichalcogenide (TMDs) are promising candidates for two-dimensional (2D) ultrathin, flexible, low-power, and transparent electronics and optoelectronics. However, the performance of TMD-based devices is still limited by the relatively low carrier mobility and the large contact resistance between the semiconducting 2D channel material and the contact metal electrodes. Phase-engineering in monolayer TMDs showed great promise in enabling the fabrication of high-quality hetero-phase structures with controlled carrier mobilities and heterojunction materials with reduced contact resistance. However, to date, general methods to induce phase-change in monolayer TMDs either employ highly-hostile organometallic compounds, or have limited compatibility with large-scale, cost-effective device fabrication. In this paper, we report a new photochemical method to induce semiconductor to metallic phase transition in monolayer MoS2 in a benign chemical environment, through a bench-top, cost-effective solution phase process that is compatible with large-scale device fabrication. It was demonstrated that photoelectrons produced by the band-gap absorption of monolayer MoS2 have enough chemical potential to activate the phase transition in the presence of an electron-donating solvent. This novel photochemical phase-transition mechanism advances our fundamental understanding of the phase transformation in 2D transition metal dichalcogenides (TMDs), and will open new revenues in the fabrication of atomically-thick metal-semiconductor heterostructures for improved carrier mobility and reduced contact resistance in TMD-based electronic and optoelectronic devices.
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Affiliation(s)
- Peter Byrley
- Department of Chemical and Environmental Engineering, University of California, Riverside, Riverside, CA, United States
| | - Ming Liu
- Department of Electrical and Computer Engineering, University of California, Riverside, Riverside, CA, United States
| | - Ruoxue Yan
- Department of Chemical and Environmental Engineering, University of California, Riverside, Riverside, CA, United States.,Material Science and Engineering Program, Bourns College of Engineering, University of California, Riverside, Riverside, CA, United States
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7
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Kumar V, O'Donnell SC, Sang DL, Maggard PA, Wang G. Harnessing Plasmon-Induced Hot Carriers at the Interfaces With Ferroelectrics. Front Chem 2019; 7:299. [PMID: 31139615 PMCID: PMC6527762 DOI: 10.3389/fchem.2019.00299] [Citation(s) in RCA: 15] [Impact Index Per Article: 3.0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 02/25/2019] [Accepted: 04/12/2019] [Indexed: 11/30/2022] Open
Abstract
This article reviews the scientific understanding and progress of interfacing plasmonic particles with ferroelectrics in order to facilitate the absorption of low-energy photons and their conversion to chemical fuels. The fundamental principles of hot carrier generation and charge injection are described for semiconductors interfaced with metallic nanoparticles and immersed in aqueous solutions, forming a synergistic juncture between the growing fields of plasmonically-driven photochemistry and semiconductor photocatalysis. The underlying mechanistic advantages of a metal-ferroelectric vs. metal-nonferroelectric interface are presented with respect to achieving a more optimal and efficient control over the Schottky barrier height and charge separation. Notable recent examples of using ferroelectric-interfaced plasmonic particles have demonstrated their roles in yielding significantly enhanced photocurrents as well as in the photon-driven production of molecular hydrogen. Notably, plasmonically-driven photocatalysis has been shown to occur for photon wavelengths in the infrared range, which is at lower energies than typically possible for conventional semiconductor photocatalysts. Recent results thus demonstrate that integrated ferroelectric-plasmonic systems represent a potentially transformative concept for use in the field of solar energy conversion.
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Affiliation(s)
- Vineet Kumar
- Department of Chemistry, North Carolina State University, Raleigh, NC, United States
| | - Shaun C O'Donnell
- Department of Chemistry, North Carolina State University, Raleigh, NC, United States
| | - Daniel L Sang
- Department of Chemistry, North Carolina State University, Raleigh, NC, United States
| | - Paul A Maggard
- Department of Chemistry, North Carolina State University, Raleigh, NC, United States
| | - Gufeng Wang
- Department of Chemistry, North Carolina State University, Raleigh, NC, United States
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8
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Wang Y, Wei W, Huang B, Dai Y. Functionalized MXenes as ideal electrodes for Janus MoSSe. Phys Chem Chem Phys 2019; 21:70-76. [DOI: 10.1039/c8cp06257a] [Citation(s) in RCA: 19] [Impact Index Per Article: 3.8] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 12/12/2022]
Abstract
Combining functionalized MXenes and mirror asymmetric MoSSe can form ideal electrical contacts.
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Affiliation(s)
- Yuanyuan Wang
- School of Physics
- State Key Laboratory of Crystal Materials
- Shandong University
- Jinan 250100
- China
| | - Wei Wei
- School of Physics
- State Key Laboratory of Crystal Materials
- Shandong University
- Jinan 250100
- China
| | - Baibiao Huang
- School of Physics
- State Key Laboratory of Crystal Materials
- Shandong University
- Jinan 250100
- China
| | - Ying Dai
- School of Physics
- State Key Laboratory of Crystal Materials
- Shandong University
- Jinan 250100
- China
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9
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Zhao P, Jin H, Lv X, Huang B, Ma Y, Dai Y. Modified MXene: promising electrode materials for constructing Ohmic contacts with MoS2for electronic device applications. Phys Chem Chem Phys 2018; 20:16551-16557. [DOI: 10.1039/c8cp02300j] [Citation(s) in RCA: 26] [Impact Index Per Article: 4.3] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 01/13/2023]
Abstract
Promising electrode materials for constructing Ohmic contact with MoS2for electronic device application.
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Affiliation(s)
- Pei Zhao
- School of Physics
- State Key Laboratory of Crystal Materials
- Shandong University
- 250100 Jinan
- People's Republic of China
| | - Hao Jin
- College of Physics and Energy
- Shenzhen University
- 518060 Shenzhen
- People's Republic of China
| | - Xingshuai Lv
- School of Physics
- State Key Laboratory of Crystal Materials
- Shandong University
- 250100 Jinan
- People's Republic of China
| | - Baibiao Huang
- School of Physics
- State Key Laboratory of Crystal Materials
- Shandong University
- 250100 Jinan
- People's Republic of China
| | - Yandong Ma
- School of Physics
- State Key Laboratory of Crystal Materials
- Shandong University
- 250100 Jinan
- People's Republic of China
| | - Ying Dai
- School of Physics
- State Key Laboratory of Crystal Materials
- Shandong University
- 250100 Jinan
- People's Republic of China
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