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Chen BY, Chen BW, Uen WY, Chen C, Chuang C, Tsai DS. Magnetoresistance properties in nickel-catalyzed, air-stable, uniform, and transfer-free graphene. NANOTECHNOLOGY 2024; 35:205706. [PMID: 38286015 DOI: 10.1088/1361-6528/ad2381] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 08/25/2023] [Accepted: 01/29/2024] [Indexed: 01/31/2024]
Abstract
A transfer-free graphene with high magnetoresistance (MR) and air stability has been synthesized using nickel-catalyzed atmospheric pressure chemical vapor deposition. The Raman spectrum and Raman mapping reveal the monolayer structure of the transfer-free graphene, which has low defect density, high uniformity, and high coverage (>90%). The temperature-dependent (from 5 to 300 K) current-voltage (I-V) and resistance measurements are performed, showing the semiconductor properties of the transfer-free graphene. Moreover, the MR of the transfer-free graphene has been measured over a wide temperature range (5-300 K) under a magnetic field of 0 to 1 T. As a result of the Lorentz force dominating above 30 K, the transfer-free graphene exhibits positive MR values, reaching ∼8.7% at 300 K under a magnetic field (1 Tesla). On the other hand, MR values are negative below 30 K due to the predominance of the weak localization effect. Furthermore, the temperature-dependent MR values of transfer-free graphene are almost identical with and without a vacuum annealing process, indicating that there are low density of defects and impurities after graphene fabrication processes so as to apply in air-stable sensor applications. This study opens avenues to develop 2D nanomaterial-based sensors for commercial applications in future devices.
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Affiliation(s)
- Bo-Yu Chen
- Department of Electronic Engineering, Chung Yuan Christian University, Taoyuan, 32023, Taiwan
- Department of Physics, National Taiwan University, Taipei, 10617, Taiwan
| | - Bo-Wei Chen
- Department of Electronic Engineering, Chung Yuan Christian University, Taoyuan, 32023, Taiwan
| | - Wu-Yih Uen
- Department of Electronic Engineering, Chung Yuan Christian University, Taoyuan, 32023, Taiwan
| | - Chi Chen
- Research Center for Applied Science, Academia Sinica, Taipei, 11529, Taiwan
| | - Chiashain Chuang
- Department of Electronic Engineering, Chung Yuan Christian University, Taoyuan, 32023, Taiwan
- Research Center for Semiconductor Materials and Advanced Optics, Chung Yuan Christian University, Taoyuan, 32023, Taiwan
| | - Dung-Sheng Tsai
- Department of Electronic Engineering, Chung Yuan Christian University, Taoyuan, 32023, Taiwan
- Research Center for Semiconductor Materials and Advanced Optics, Chung Yuan Christian University, Taoyuan, 32023, Taiwan
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2
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Zebardastan N, Bradford J, Lipton-Duffin J, MacLeod J, Ostrikov KK, Tomellini M, Motta N. High quality epitaxial graphene on 4H-SiC by face-to-face growth in ultra-high vacuum. NANOTECHNOLOGY 2022; 34:105601. [PMID: 36562509 DOI: 10.1088/1361-6528/aca8b2] [Citation(s) in RCA: 3] [Impact Index Per Article: 1.5] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 09/01/2022] [Accepted: 12/05/2022] [Indexed: 06/17/2023]
Abstract
Epitaxial graphene on SiC is the most promising substrate for the next generation 2D electronics, due to the possibility to fabricate 2D heterostructures directly on it, opening the door to the use of all technological processes developed for silicon electronics. To obtain a suitable material for large scale applications, it is essential to achieve perfect control of size, quality, growth rate and thickness. Here we show that this control on epitaxial graphene can be achieved by exploiting the face-to-face annealing of SiC in ultra-high vacuum. With this method, Si atoms trapped in the narrow space between two SiC wafers at high temperatures contribute to the reduction of the Si sublimation rate, allowing to achieve smooth and virtually defect free single graphene layers. We analyse the products obtained on both on-axis and off-axis 4H-SiC substrates in a wide range of temperatures (1300 °C-1500 °C), determining the growth law with the help of x-ray photoelectron spectroscopy (XPS). Our epitaxial graphene on SiC has terrace widths up to 10μm (on-axis) and 500 nm (off-axis) as demonstrated by atomic force microscopy and scanning tunnelling microscopy, while XPS and Raman spectroscopy confirm high purity and crystalline quality.
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Affiliation(s)
- Negar Zebardastan
- School of Chemistry and Physics, Queensland University of Technology, Brisbane 4000, QLD, Australia
- Centre for Materials Science, Queensland University of Technology, Brisbane 4000, QLD, Australia
| | - Jonathan Bradford
- School of Chemistry and Physics, Queensland University of Technology, Brisbane 4000, QLD, Australia
- School of Physics and Astronomy, University of Nottingham, Nottingham NG7 2RD, United Kingdom
| | - Josh Lipton-Duffin
- School of Chemistry and Physics, Queensland University of Technology, Brisbane 4000, QLD, Australia
- Centre for Materials Science, Queensland University of Technology, Brisbane 4000, QLD, Australia
| | - Jennifer MacLeod
- School of Chemistry and Physics, Queensland University of Technology, Brisbane 4000, QLD, Australia
- Centre for Materials Science, Queensland University of Technology, Brisbane 4000, QLD, Australia
| | - Kostya Ken Ostrikov
- School of Chemistry and Physics, Queensland University of Technology, Brisbane 4000, QLD, Australia
- Centre for Materials Science, Queensland University of Technology, Brisbane 4000, QLD, Australia
| | - Massimo Tomellini
- Dipartimento di Scienze eTecnologie Chimiche, Università degli Studi di Roma Tor Vergata, Via della Ricerca Scientifica, I-00133 Rome, Italy
- Istitutodi Struttura della Materia, CNR, Via Fosso del Cavaliere 100, I-00133 Rome, Italy
| | - Nunzio Motta
- School of Chemistry and Physics, Queensland University of Technology, Brisbane 4000, QLD, Australia
- Centre for Materials Science, Queensland University of Technology, Brisbane 4000, QLD, Australia
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3
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Panna AR, Hu IF, Kruskopf M, Patel DK, Jarrett DG, Liu CI, Payagala SU, Saha D, Rigosi AF, Newell DB, Liang CT, Elmquist RE. Graphene quantum Hall effect parallel resistance arrays. PHYSICAL REVIEW. B 2021; 103:10.1103/physrevb.103.075408. [PMID: 34263094 PMCID: PMC8276113 DOI: 10.1103/physrevb.103.075408] [Citation(s) in RCA: 3] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Abstract] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/29/2023]
Abstract
As first recognized in 2010, epitaxial graphene on SiC(0001) provides a platform for quantized Hall resistance (QHR) metrology unmatched by other two-dimensional structures and materials. Here we report graphene parallel QHR arrays, with metrologically precise quantization near 1000 Ω. These arrays have tunable carrier densities, due to uniform epitaxial growth and chemical functionalization, allowing quantization at the robust ν = 2 filling factor in array devices at relative precision better than 10-8. Broad tunability of the carrier density also enables investigation of the ν = 6 plateau. Optimized networks of QHR devices described in this work suppress Ohmic contact resistance error using branched contacts and avoid crossover leakage with interconnections that are superconducting for quantizing magnetic fields up to 13.5 T. Our work enables more direct scaling of resistance for quantized values in arrays of arbitrary network geometry.
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Affiliation(s)
- Alireza R Panna
- Physical Measurement Laboratory, National Institute of Standards and Technology (NIST), Gaithersburg, Maryland 20899-8171, USA
| | - I-Fan Hu
- Physical Measurement Laboratory, National Institute of Standards and Technology (NIST), Gaithersburg, Maryland 20899-8171, USA
- Department of Physics, National Taiwan University, Taipei 10617, Taiwan, Republic of China
| | - Mattias Kruskopf
- Physical Measurement Laboratory, National Institute of Standards and Technology (NIST), Gaithersburg, Maryland 20899-8171, USA
- Physikalisch-Technische Bundesanstalt, Bundesallee 100, 38116 Braunschweig, Germany
| | - Dinesh K Patel
- Physical Measurement Laboratory, National Institute of Standards and Technology (NIST), Gaithersburg, Maryland 20899-8171, USA
- Department of Physics, National Taiwan University, Taipei 10617, Taiwan, Republic of China
| | - Dean G Jarrett
- Physical Measurement Laboratory, National Institute of Standards and Technology (NIST), Gaithersburg, Maryland 20899-8171, USA
| | - Chieh-I Liu
- Physical Measurement Laboratory, National Institute of Standards and Technology (NIST), Gaithersburg, Maryland 20899-8171, USA
- Department of Chemistry and Biochemistry, University of Maryland, College Park, Maryland 20742, USA
| | - Shamith U Payagala
- Physical Measurement Laboratory, National Institute of Standards and Technology (NIST), Gaithersburg, Maryland 20899-8171, USA
| | - Dipanjan Saha
- Physical Measurement Laboratory, National Institute of Standards and Technology (NIST), Gaithersburg, Maryland 20899-8171, USA
| | - Albert F Rigosi
- Physical Measurement Laboratory, National Institute of Standards and Technology (NIST), Gaithersburg, Maryland 20899-8171, USA
| | - David B Newell
- Physical Measurement Laboratory, National Institute of Standards and Technology (NIST), Gaithersburg, Maryland 20899-8171, USA
| | - Chi-Te Liang
- Department of Physics, National Taiwan University, Taipei 10617, Taiwan, Republic of China
| | - Randolph E Elmquist
- Physical Measurement Laboratory, National Institute of Standards and Technology (NIST), Gaithersburg, Maryland 20899-8171, USA
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Manetoresistance of Ultralow-Hole-Density Monolayer Epitaxial Graphene Grown on SiC. MATERIALS 2019; 12:ma12172696. [PMID: 31450728 PMCID: PMC6747865 DOI: 10.3390/ma12172696] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.2] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Download PDF] [Figures] [Subscribe] [Scholar Register] [Received: 07/26/2019] [Revised: 08/15/2019] [Accepted: 08/21/2019] [Indexed: 11/23/2022]
Abstract
Silicon carbide (SiC) has already found useful applications in high-power electronic devices and light-emitting diodes (LEDs). Interestingly, SiC is a suitable substrate for growing monolayer epitaxial graphene and GaN-based devices. Therefore, it provides the opportunity for integration of high-power devices, LEDs, atomically thin electronics, and high-frequency devices, all of which can be prepared on the same SiC substrate. In this paper, we concentrate on detailed measurements on ultralow-density p-type monolayer epitaxial graphene, which has yet to be extensively studied. The measured resistivity ρxx shows insulating behavior in the sense that ρxx decreases with increasing temperature T over a wide range of T (1.5 K ≤ T ≤ 300 K). The crossover from negative magnetoresistivity (MR) to positive magnetoresistivity at T = 40 K in the low-field regime is ascribed to a transition from low-T quantum transport to high-T classical transport. For T ≥ 120 K, the measured positive MR ratio [ρxx(B) − ρxx(B = 0)]/ρxx(B = 0) at B = 2 T decreases with increasing T, but the positive MR persists up to room temperature. Our experimental results suggest that the large MR ratio (~100% at B = 9 T) is an intrinsic property of ultralow-charge-density graphene, regardless of the carrier type. This effect may find applications in magnetic sensors and magnetoresistance devices.
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Hang DR, Sun DY, Chen CH, Wu HF, Chou MMC, Islam SE, Sharma KH. Facile Bottom-up Preparation of WS 2-Based Water-Soluble Quantum Dots as Luminescent Probes for Hydrogen Peroxide and Glucose. NANOSCALE RESEARCH LETTERS 2019; 14:271. [PMID: 31399837 PMCID: PMC6689045 DOI: 10.1186/s11671-019-3109-5] [Citation(s) in RCA: 6] [Impact Index Per Article: 1.2] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Figures] [Subscribe] [Scholar Register] [Received: 05/23/2019] [Accepted: 07/29/2019] [Indexed: 06/10/2023]
Abstract
Photoluminescent zero-dimensional (0D) quantum dots (QDs) derived from transition metal dichalcogenides, particularly molybdenum disulfide, are presently in the spotlight for their advantageous characteristics for optoelectronics, imaging, and sensors. Nevertheless, up to now, little work has been done to synthesize and explore photoluminescent 0D WS2 QDs, especially by a bottom-up strategy without using usual toxic organic solvents. In this work, we report a facile bottom-up strategy to synthesize high-quality water-soluble tungsten disulfide (WS2) QDs through hydrothermal reaction by using sodium tungstate dihydrate and L-cysteine as W and S sources. Besides, hybrid carbon quantum dots/WS2 QDs were further prepared based on this method. Physicochemical and structural analysis of QD hybrid indicated that the graphitic carbon quantum dots with diameters about 5 nm were held onto WS2 QDs via electrostatic attraction forces. The resultant QDs show good water solubility and stable photoluminescence (PL). The excitation-dependent PL can be attributed to the polydispersity of the synthesized QDs. We found that the PL was stable under continuous irradiation of UV light but can be quenched in the presence of hydrogen peroxide (H2O2). The obtained WS2-based QDs were thus adopted as an electrodeless luminescent probe for H2O2 and for enzymatic sensing of glucose. The hybrid QDs were shown to have a more sensitive LOD in the case of glucose sensing. The Raman study implied that H2O2 causes the partial oxidation of QDs, which may lead to oxidation-induced quenching. Overall, the presented strategy provides a general guideline for facile and low-cost synthesis of other water-soluble layered material QDs and relevant hybrids in large quantity. These WS2-based high-quality water-soluble QDs should be promising for a wide range of applications in optoelectronics, environmental monitoring, medical imaging, and photocatalysis.
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Affiliation(s)
- Da-Ren Hang
- Department of Materials and Optoelectronic Science, National Sun Yat-sen University, Kaohsiung, 80424 Taiwan
- Center of Crystal Research, National Sun Yat-sen University, Kaohsiung, 80424 Taiwan
| | - De-You Sun
- Department of Materials and Optoelectronic Science, National Sun Yat-sen University, Kaohsiung, 80424 Taiwan
| | - Chun-Hu Chen
- Department of Chemistry, National Sun Yat-sen University, Kaohsiung, 80424 Taiwan
| | - Hui-Fen Wu
- Department of Chemistry, National Sun Yat-sen University, Kaohsiung, 80424 Taiwan
| | - Mitch M. C. Chou
- Department of Materials and Optoelectronic Science, National Sun Yat-sen University, Kaohsiung, 80424 Taiwan
- Center of Crystal Research, National Sun Yat-sen University, Kaohsiung, 80424 Taiwan
| | - Sk Emdadul Islam
- Department of Materials and Optoelectronic Science, National Sun Yat-sen University, Kaohsiung, 80424 Taiwan
| | - Krishna Hari Sharma
- Department of Materials and Optoelectronic Science, National Sun Yat-sen University, Kaohsiung, 80424 Taiwan
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Kruskopf M, Rigosi AF, Panna AR, Marzano M, Patel D, Jin H, Newell DB, Elmquist RE. Next-generation crossover-free quantum Hall arrays with superconducting interconnections. METROLOGIA 2019; 56:10.1088/1681-7575/ab3ba3. [PMID: 32116392 PMCID: PMC7047890 DOI: 10.1088/1681-7575/ab3ba3] [Citation(s) in RCA: 3] [Impact Index Per Article: 0.6] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/29/2023]
Abstract
This work presents precision measurements of quantized Hall array resistance devices using superconducting, crossover-free, multiple interconnections as well as graphene split contacts. These new techniques successfully eliminate the accumulation of internal resistances and leakage currents that typically occur at interconnections and crossing leads between interconnected devices. As a result, a scalable quantized Hall resistance array is obtained with a nominal value that is as precise and stable as that from single-element quantized Hall resistance standards.
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Affiliation(s)
- Mattias Kruskopf
- National Institute of Standards and Technology (NIST), Gaithersburg, MD 20899, USA
- Joint Quantum Institute, University of Maryland, College Park, MD 20742, USA
| | - Albert F Rigosi
- National Institute of Standards and Technology (NIST), Gaithersburg, MD 20899, USA
| | - Alireza R Panna
- National Institute of Standards and Technology (NIST), Gaithersburg, MD 20899, USA
| | - Martina Marzano
- Politecnico di Torino, Istituto Nazionale di Ricerca Metrologica, Turin, Italy
| | - Dinesh Patel
- Department of Physics, National Taiwan University, Taipei 10617, Taiwan
| | - Hanbyul Jin
- National Institute of Standards and Technology (NIST), Gaithersburg, MD 20899, USA
- Joint Quantum Institute, University of Maryland, College Park, MD 20742, USA
| | - David B Newell
- National Institute of Standards and Technology (NIST), Gaithersburg, MD 20899, USA
| | - Randolph E Elmquist
- National Institute of Standards and Technology (NIST), Gaithersburg, MD 20899, USA
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Rigosi AF, Kruskopf M, Hill HM, Jin H, Wu BY, Johnson PE, Zhang S, Berilla M, Hight Walker AR, Hacker CA, Newell DB, Elmquist RE. Gateless and reversible carrier density tunability in epitaxial graphene devices functionalized with chromium tricarbonyl. CARBON 2019; 142:10.1016/j.carbon.2018.10.085. [PMID: 31097837 PMCID: PMC6512977 DOI: 10.1016/j.carbon.2018.10.085] [Citation(s) in RCA: 5] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Abstract] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/30/2023]
Abstract
Monolayer epitaxial graphene (EG) has been shown to have clearly superior properties for the development of quantized Hall resistance (QHR) standards. One major difficulty with QHR devices based on EG is that their electrical properties drift slowly over time if the device is stored in air due to adsorption of atmospheric molecular dopants. The crucial parameter for device stability is the charge carrier density, which helps determine the magnetic flux density required for precise QHR measurements. This work presents one solution to this problem of instability in air by functionalizing the surface of EG devices with chromium tricarbonyl -Cr(CO)3. Observations of carrier density stability in air over the course of one year are reported, as well as the ability to tune the carrier density by annealing the devices. For low temperature annealing, the presence of Cr(CO)3 stabilizes the electrical properties and allows for the reversible tuning of the carrier density in millimeter-scale graphene devices close to the Dirac point. Precision measurements in the quantum Hall regime show no detrimental effect on the carrier mobility.
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Affiliation(s)
- Albert F. Rigosi
- National Institute of Standards and Technology (NIST), Gaithersburg, MD 20899, USA
| | - Mattias Kruskopf
- National Institute of Standards and Technology (NIST), Gaithersburg, MD 20899, USA
- Joint Quantum Institute, University of Maryland, College Park, MD 20742, USA
| | - Heather M. Hill
- National Institute of Standards and Technology (NIST), Gaithersburg, MD 20899, USA
| | - Hanbyul Jin
- National Institute of Standards and Technology (NIST), Gaithersburg, MD 20899, USA
- Joint Quantum Institute, University of Maryland, College Park, MD 20742, USA
| | - Bi-Yi Wu
- National Institute of Standards and Technology (NIST), Gaithersburg, MD 20899, USA
- Graduate Institute of Applied Physics, National Taiwan University, Taipei 10617, Taiwan
| | - Philip E. Johnson
- National Institute of Standards and Technology (NIST), Gaithersburg, MD 20899, USA
| | - Siyuan Zhang
- National Institute of Standards and Technology (NIST), Gaithersburg, MD 20899, USA
- Theiss Research, La Jolla, CA 92037, United States
| | - Michael Berilla
- National Institute of Standards and Technology (NIST), Gaithersburg, MD 20899, USA
| | | | - Christina A. Hacker
- National Institute of Standards and Technology (NIST), Gaithersburg, MD 20899, USA
| | - David B. Newell
- National Institute of Standards and Technology (NIST), Gaithersburg, MD 20899, USA
| | - Randolph E. Elmquist
- National Institute of Standards and Technology (NIST), Gaithersburg, MD 20899, USA
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Kruskopf M, Elmquist RE. Epitaxial graphene for quantum resistance metrology. METROLOGIA 2018; 55:10.1088/1681-7575/aacd23. [PMID: 30996479 PMCID: PMC6463316 DOI: 10.1088/1681-7575/aacd23] [Citation(s) in RCA: 18] [Impact Index Per Article: 3.0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/29/2023]
Abstract
Graphene-based quantised Hall resistance standards promise high precision for the unit ohm under less exclusive measurement conditions, enabling the use of compact measurement systems. To meet the requirements of metrological applications, national metrology institutes developed large-area monolayer graphene growth methods for uniform material properties and optimized device fabrication techniques. Precision measurements of the quantized Hall resistance showing the advantage of graphene over GaAs-based resistance standards demonstrate the remarkable achievements realized by the research community. This work provides an overview over the state-of-the-art technologies in this field.
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Affiliation(s)
- Mattias Kruskopf
- National Institute of Standards and Technology, Fundamental Electrical Measurements, 100 Bureau Drive, Gaithersburg, MD, United States of America
- University of Maryland, Joint Quantum Institute, College Park, MD, United States of America
| | - Randolph E Elmquist
- National Institute of Standards and Technology, Fundamental Electrical Measurements, 100 Bureau Drive, Gaithersburg, MD, United States of America
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