Laser patterning of transparent polymers assisted by plasmon excitation

Flexible Conductive Polymer Film Grafted with Azo-Moieties and Patterned by Light Illumination with Anisotropic Conductivity

In this work, we present the method for the creation of an anisotropic electric pattern on thin poly(3,4-ethylenedioxythiophene): polystyrene sulfonate (PEDOT:PSS) films through PSS grafting by azo-containing moieties followed by light-induced polymers redistribution. Thin PEDOT:PSS films were deposited on the flexible and biodegradable polylactic acid (PLLA) substrates. The light-sensitive azo-groups were grafted to PSS using the diazonium chemistry followed by annealing in methanol. Local illumination of azo-grafted PEDOT:PSS films through the lithographic mask led to the conversion of azo-moieties in Z-configuration and further creation of the lateral gradient of azo-isomers along the film surface. The concentration gradient led to the migration of PSS away from the illuminated area, increasing the PEDOT chains' concentration and the corresponding increase of local electrical conductivity in the illuminated place. Utilization of mask with linear pattern results in the appearance of conductive PEDOT-rich and non-conductive PSS-rich lines on the film surface, and final, lateral anisotropy of electric properties. Our work gives an optical lithography-based alternative to common methods for the creation of anisotropic electric properties, based on the spatial confinement of conductive polymer structures or their mechanical strains.

Application of Plasmon-Induced Lithography for Creation of a Residual-Free Pattern and Simple Surface Modifications

Here, we propose a plasmon-induced redistribution of a thin polymer layer as a unique way for a residual layer-free lithographic approach. In particular, we demonstrate an ultrafast area-selective fabrication method using a low-intensity visible laser irradiation to direct the polymer mass flow, under the plasmon-active substrates. Plasmon-supported substrates were created by thermal annealing of Ag thin films and covered by thin polystyrene layers. Then, laser beam writing (LBW) was applied to introduce a surface tension gradient through the local plasmon heating. As a result, polystyrene was completely removed from the irradiated place, without any residual layer. The proposed approach does not require any additional development steps, such as solvent or plasma treatment. To demonstrate the advantages of the proposed technique, we implemented the LBW-patterned structures for further spatially selective surface functionalization, including the metal deposition, spontaneous thiol grafting, and electrochemical deposition of ordered polypyrrole array.