Perpendicularly aligned nanodomains on versatile substrates via rapid thermal annealing assisted by liquid crystalline ordering in block copolymer films

Self-Assembly of Hierarchical High-χ Fluorinated Block Copolymers with an Orthogonal Smectic-within-Lamellae 3 nm Sublattice and Vertical Surface Orientation

Hierarchical structure-within-structure assemblies offer a route toward increasingly complex and multifunctional materials while pushing the limits of block copolymer self-assembly. We present a detailed study of the self-assembly of a series of fluorinated high-χ block copolymers (BCPs) prepared via postmodification of a single poly(styrene)-block-poly(glycidyl methacrylate) (S-b-G) parent polymer with the fluorinated alkylthiol pendent groups containing 1, 6, or 8 fluorinated carbons (termed trifluoro-ethanethiol (TFET), perfluoro-octylthiol (PFOT), and perfluoro-decylthiol (PFDT), respectively). Bulk X-ray scattering of thermally annealed samples demonstrates hierarchical molecular assembly with phase separation between the two blocks and within the fluorinated block. The degree of ordering within the fluorinated block is highly sensitive to synthetic variation; a lamellar sublattice was formed for S-b-GPFOT and S-b-GPFDT. Thermal analyses of S-b-GPFOT reveal that the fluorinated block exhibits liquid crystal-like ordering. The complex thin-film self-assembly behavior of an S-b-GPFOT polymer was investigated using real-space (atomic force microscopy and scanning electron microscopy) and reciprocal-space (resonant soft X-ray scattering (RSoXS), grazing incidence small- and wide-angle scattering) measurements. After thermal annealing in nitrogen or vacuum, films thicker than 1.5 times the primary lattice spacing exhibit a 90-degree grain boundary, exposing a thin layer of vertical lamellae at the free interface, while exhibiting horizontal lamellae on the preferential (polystyrene brush) substrate. RSoXS measurements reveal the near-perfect orthogonality between the primary and sublattice orientations, demonstrating hierarchical patterning at the nanoscale.

Tunable Thin Film Periodicities by Controlling the Orientation of Cylindrical Domains in Side Chain Liquid Crystalline Block Copolymers

A facile approach to block copolymer (BCP) domain orientation control in thin films has been demonstrated by employing a BCP with liquid crystalline semifluorinated side chains by tuning the composition of the copolymers of the bottom surface layer (BSL). 1H,1H,2H,2H-Perfluorodecanethiol was attached to a precursor polymer, polystyrene-block-poly(glycidyl methacrylate) (PS-b-PGMA), to obtain a novel BCP with a C8F17-containing liquid crystal (LC) side chain (PS-b-P8FMA). Anisotropic hexagonally packed cylinder domains in a bulk state were first characterized by transmission electron microscopy (TEM) and small angle X-ray scattering (SAXS). The observed morphology transition of BCPs with different fluorinated side chain lengths of –CF3, –C4F9, and –C6F13 suggested the decisive effects of LC side chain ordering on the anisotropic nanostructures. In the thin film study, poly(methyl methacrylate-random-2,2,2-trifluoroethyl methacrylate-random-methacrylic acid) (PMMA-ran-PTFEMA-ran-PMAA) solution was used as BSLs for tuning the desired periodicities. The surface free energy (SFE) of BSL was simply tailored by changing the composition of comonomers. In atomic force microscopy (AFM) characterization, long-range ordered perpendicularly oriented BCP domains in a hexagonally packed array or parallel oriented BCP domains as striation patterns were easily fabricated on non-preferential or preferential BSL, respectively. The study presents a novel approach to tunable thin film periodicities without changing or modifying BCPs, which is desired in next-generation BCP lithography.

Controlled self-assembly of block copolymers in printed sub-20 nm cross-bar structures

Directed self-assembly (DSA) of block copolymers (BCPs) has garnered much attention due to its excellent pattern resolution, simple process, and good compatibility with many other lithography methods for useful nanodevice applications. Here, we present a BCP-based multiple nanopatterning process to achieve three-dimensional (3D) pattern formation of metal/oxide hybrid nanostructures. We employed a self-assembled sub-20 nm SiO _x line pattern as a master mold for nanotransfer printing (nTP) to generate a cross-bar array. By using the transfer-printed cross-bar structures as BCP-guiding templates, we can obtain well-ordered BCP microdomains in the distinct spaces of the nanotemplates through a confined BCP self-assembly process. We also demonstrate the morphological evolution of a cylinder-forming BCP by controlling the BCP film thickness, showing a clear morphological transition from cylinders to spheres in the designated nanospaces. Furthermore, we demonstrate how to control the number of BCP spheres within the cross-bar 3D pattern by adjusting the printing angle of the multiple nTP process to provide a suitable area for spontaneous BCP accommodation. This multiple-patterning-based approach is applicable to useful 3D nanofabrication of various devices with complex hybrid nanostructures.