1
|
Seravalli L, Esposito F, Bosi M, Aversa L, Trevisi G, Verucchi R, Lazzarini L, Rossi F, Fabbri F. Built-in tensile strain dependence on the lateral size of monolayer MoS 2 synthesized by liquid precursor chemical vapor deposition. NANOSCALE 2023; 15:14669-14678. [PMID: 37624579 DOI: 10.1039/d3nr01687k] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 08/26/2023]
Abstract
Strain engineering is an efficient tool to tune and tailor the electrical and optical properties of 2D materials. The built-in strain can be tuned during the synthesis process of a two-dimensional semiconductor, such as molybdenum disulfide, by employing different growth substrates with peculiar thermal properties. In this work, we demonstrate that the built-in strain of MoS2 monolayers, grown on a SiO2/Si substrate by liquid precursor chemical vapor deposition, is mainly dependent on the size of the monolayer. In fact, we identify a critical size equal to 20 μm, from which the built-in strain increases drastically. The built-in strain is the maximum for a 60 μm sized monolayer, leading to 1.2% tensile strain with a partial release of strain close to the monolayer triangular vertexes due to the formation of nanocracks. These findings also imply that the standard method for evaluation of the number of layers based on the Raman mode separation can become unreliable for highly strained monolayers with a lateral size above 20 μm.
Collapse
Affiliation(s)
- L Seravalli
- Institute of Materials for Electronics and Magnetism (IMEM-CNR), Parco Area delle Scienze 37/a, 43124 Parma, Italy
| | - F Esposito
- Institute of Materials for Electronics and Magnetism (IMEM-CNR), Parco Area delle Scienze 37/a, 43124 Parma, Italy
- Department of Mathematical, Physical and Computer Sciences, University of Parma, Parco Area delle Scienze 7/a, 43124 Parma, Italy
| | - M Bosi
- Institute of Materials for Electronics and Magnetism (IMEM-CNR), Parco Area delle Scienze 37/a, 43124 Parma, Italy
| | - L Aversa
- Institute of Materials for Electronics and Magnetism (IMEM-CNR), FBK Trento unit, Via alla Cascata 56/C, 38123 Povo, Trento, Italy
| | - G Trevisi
- Institute of Materials for Electronics and Magnetism (IMEM-CNR), Parco Area delle Scienze 37/a, 43124 Parma, Italy
| | - R Verucchi
- Institute of Materials for Electronics and Magnetism (IMEM-CNR), FBK Trento unit, Via alla Cascata 56/C, 38123 Povo, Trento, Italy
| | - L Lazzarini
- Institute of Materials for Electronics and Magnetism (IMEM-CNR), Parco Area delle Scienze 37/a, 43124 Parma, Italy
| | - F Rossi
- Institute of Materials for Electronics and Magnetism (IMEM-CNR), Parco Area delle Scienze 37/a, 43124 Parma, Italy
| | - F Fabbri
- NEST, Istituto Nanoscienze - CNR, Scuola Normale Superiore, Piazza San Silvestro 12, 56127 Pisa, Italy.
| |
Collapse
|
2
|
Ye Z, Tan C, Huang X, Ouyang Y, Yang L, Wang Z, Dong M. Emerging MoS 2 Wafer-Scale Technique for Integrated Circuits. NANO-MICRO LETTERS 2023; 15:38. [PMID: 36652150 PMCID: PMC9849648 DOI: 10.1007/s40820-022-01010-4] [Citation(s) in RCA: 14] [Impact Index Per Article: 14.0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Figures] [Subscribe] [Scholar Register] [Received: 10/25/2022] [Accepted: 12/14/2022] [Indexed: 06/17/2023]
Abstract
As an outstanding representative of layered materials, molybdenum disulfide (MoS2) has excellent physical properties, such as high carrier mobility, stability, and abundance on earth. Moreover, its reasonable band gap and microelectronic compatible fabrication characteristics makes it the most promising candidate in future advanced integrated circuits such as logical electronics, flexible electronics, and focal-plane photodetector. However, to realize the all-aspects application of MoS2, the research on obtaining high-quality and large-area films need to be continuously explored to promote its industrialization. Although the MoS2 grain size has already improved from several micrometers to sub-millimeters, the high-quality growth of wafer-scale MoS2 is still of great challenge. Herein, this review mainly focuses on the evolution of MoS2 by including chemical vapor deposition, metal-organic chemical vapor deposition, physical vapor deposition, and thermal conversion technology methods. The state-of-the-art research on the growth and optimization mechanism, including nucleation, orientation, grain, and defect engineering, is systematically summarized. Then, this review summarizes the wafer-scale application of MoS2 in a transistor, inverter, electronics, and photodetectors. Finally, the current challenges and future perspectives are outlined for the wafer-scale growth and application of MoS2.
Collapse
Affiliation(s)
- Zimeng Ye
- College of Materials Science and Engineering, Sichuan University, Chengdu, 610065, People's Republic of China
| | - Chao Tan
- College of Materials Science and Engineering, Sichuan University, Chengdu, 610065, People's Republic of China
| | - Xiaolei Huang
- State Key Laboratory of Solidification Processing, Center of Advanced Lubrication and Seal Materials, Northwestern Polytechnical University, Xi'an, 710072, People's Republic of China
| | - Yi Ouyang
- Interdisciplinary Nanoscience Center, Aarhus University, 8000, Aarhus C, Denmark
| | - Lei Yang
- College of Materials Science and Engineering, Sichuan University, Chengdu, 610065, People's Republic of China
| | - Zegao Wang
- College of Materials Science and Engineering, Sichuan University, Chengdu, 610065, People's Republic of China.
| | - Mingdong Dong
- Interdisciplinary Nanoscience Center, Aarhus University, 8000, Aarhus C, Denmark.
| |
Collapse
|
3
|
Seravalli L, Bosi M. A Review on Chemical Vapour Deposition of Two-Dimensional MoS 2 Flakes. MATERIALS (BASEL, SWITZERLAND) 2021; 14:7590. [PMID: 34947186 PMCID: PMC8704647 DOI: 10.3390/ma14247590] [Citation(s) in RCA: 5] [Impact Index Per Article: 1.7] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Download PDF] [Figures] [Subscribe] [Scholar Register] [Received: 10/28/2021] [Revised: 12/02/2021] [Accepted: 12/07/2021] [Indexed: 12/13/2022]
Abstract
Two-dimensional (2D) materials such as graphene, transition metal dichalcogenides, and boron nitride have recently emerged as promising candidates for novel applications in sensing and for new electronic and photonic devices. Their exceptional mechanical, electronic, optical, and transport properties show peculiar differences from those of their bulk counterparts and may allow for future radical innovation breakthroughs in different applications. Control and reproducibility of synthesis are two essential, key factors required to drive the development of 2D materials, because their industrial application is directly linked to the development of a high-throughput and reliable technique to obtain 2D layers of different materials on large area substrates. Among various methods, chemical vapour deposition is considered an excellent candidate for this goal thanks to its simplicity, widespread use, and compatibility with other processes used to deposit other semiconductors. In this review, we explore the chemical vapour deposition of MoS2, considered one of the most promising and successful transition metal dichalcogenides. We summarize the basics of the synthesis procedure, discussing in depth: (i) the different substrates used for its deposition, (ii) precursors (solid, liquid, gaseous) available, and (iii) different types of promoters that favour the growth of two-dimensional layers. We also present a comprehensive analysis of the status of the research on the growth mechanisms of the flakes.
Collapse
Affiliation(s)
- Luca Seravalli
- IMEM-CNR, Parco Area delle Scienze 37A, 43124 Parma, Italy
| | - Matteo Bosi
- IMEM-CNR, Parco Area delle Scienze 37A, 43124 Parma, Italy
| |
Collapse
|
4
|
Seravalli L, Bosi M, Fiorenza P, Panasci SE, Orsi D, Rotunno E, Cristofolini L, Rossi F, Giannazzo F, Fabbri F. Gold nanoparticle assisted synthesis of MoS 2 monolayers by chemical vapor deposition. NANOSCALE ADVANCES 2021; 3:4826-4833. [PMID: 36134320 PMCID: PMC9418562 DOI: 10.1039/d1na00367d] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.3] [Reference Citation Analysis] [Abstract] [Track Full Text] [Download PDF] [Figures] [Subscribe] [Scholar Register] [Received: 05/18/2021] [Accepted: 06/30/2021] [Indexed: 06/16/2023]
Abstract
The use of metal nanoparticles is an established paradigm for the synthesis of semiconducting one-dimensional nanostructures. In this work we study their effect on the synthesis of two-dimensional semiconducting materials, by using gold nanoparticles for chemical vapor deposition growth of two-dimensional molybdenum disulfide (MoS2). In comparison with the standard method, the employment of gold nanoparticles allows us to obtain large monolayer MoS2 flakes, up to 20 μm in lateral size, even if they are affected by the localized overgrowth of MoS2 bilayer and trilayer islands. Important modifications of the optical and electronic properties of MoS2 triangular domains are reported, where the photoluminescence intensity of the A exciton is strongly quenched and a shift to a positive threshold voltage in back-gated field effect transistors is observed. These results indicate that the use of gold nanoparticles influences the flake growth and properties, indicating a method for possible localized synthesis of two-dimensional materials, improving the lateral size of monolayers and modifying their properties.
Collapse
Affiliation(s)
- L Seravalli
- Institute for Materials for Electronics and Magnetism (IMEM-CNR) Parco Area delle Scienze 37/a 43124 Parma Italy
| | - M Bosi
- Institute for Materials for Electronics and Magnetism (IMEM-CNR) Parco Area delle Scienze 37/a 43124 Parma Italy
| | - P Fiorenza
- Institute for Microelectronics and Microsystems (CNR-IMM) Z. I. VIII Strada 5 95121 Catania Italy
| | - S E Panasci
- Institute for Microelectronics and Microsystems (CNR-IMM) Z. I. VIII Strada 5 95121 Catania Italy
| | - D Orsi
- Department of Mathematical, Physical and Computer Sciences, University of Parma Parco Area delle Scienze 7/a 43124 Parma Italy
| | - E Rotunno
- Istituto Nanoscienze-CNR via G Campi 213/a 41125 Modena Italy
| | - L Cristofolini
- Department of Mathematical, Physical and Computer Sciences, University of Parma Parco Area delle Scienze 7/a 43124 Parma Italy
| | - F Rossi
- Institute for Materials for Electronics and Magnetism (IMEM-CNR) Parco Area delle Scienze 37/a 43124 Parma Italy
| | - F Giannazzo
- Institute for Microelectronics and Microsystems (CNR-IMM) Z. I. VIII Strada 5 95121 Catania Italy
| | - F Fabbri
- NEST, Istituto Nanoscienze - CNR, Scuola Normale Superiore Piazza San Silvestro 12 56127 Pisa Italy
| |
Collapse
|
5
|
Magnozzi M, Pflug T, Ferrera M, Pace S, Ramó L, Olbrich M, Canepa P, Ağircan H, Horn A, Forti S, Cavalleri O, Coletti C, Bisio F, Canepa M. Local Optical Properties in CVD-Grown Monolayer WS 2 Flakes. THE JOURNAL OF PHYSICAL CHEMISTRY. C, NANOMATERIALS AND INTERFACES 2021; 125:16059-16065. [PMID: 34484552 PMCID: PMC8411805 DOI: 10.1021/acs.jpcc.1c04287] [Citation(s) in RCA: 2] [Impact Index Per Article: 0.7] [Reference Citation Analysis] [Abstract] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 05/14/2021] [Revised: 06/25/2021] [Indexed: 06/10/2023]
Abstract
Excitons dominate the light absorption and re-emission spectra of monolayer transition-metal dichalcogenides (TMD). Microscopic investigations of the excitonic response in TMD almost invariably extract information from the radiative recombination step, which only constitutes one part of the picture. Here, by exploiting imaging spectroscopic ellipsometry (ISE), we investigate the spatial dependence of the dielectric function of chemical vapor deposition (CVD)-grown WS2 flakes with a microscopic lateral resolution, thus providing information about the spatially varying, exciton-induced light absorption in the monolayer WS2. Comparing the ISE results with imaging photoluminescence spectroscopy data, the presence of several correlated features was observed, along with the unexpected existence of a few uncorrelated characteristics. The latter demonstrates that the exciton-induced absorption and emission features are not always proportional at the microscopic scale. Microstructural modulations across the flakes, having a different influence on the absorption and re-emission of light, are deemed responsible for the effect.
Collapse
Affiliation(s)
- Michele Magnozzi
- OptMatLab,
Dipartimento di Fisica, Università
di Genova, via Dodecaneso 33, 16146 Genova, Italy
- Istituto
Nazionale di Fisica Nucleare, Sezione di Genova, via Dodecaneso 33, 16146 Genova, Italy
| | - Theo Pflug
- Laserinstitut
Hochschule Mittweida, Technikumplatz 17, 09648 Mittweida, Germany
- Technische
Universität Chemnitz, Reichenhainer Str. 70, 09126 Chemnitz, Germany
| | - Marzia Ferrera
- OptMatLab,
Dipartimento di Fisica, Università
di Genova, via Dodecaneso 33, 16146 Genova, Italy
| | - Simona Pace
- Center
for Nanotechnology Innovation IIT@NEST, Piazza San Silvestro 12, 56127 Pisa, Italy
- Graphene
Labs, Istituto Italiano di Tecnologia, Via Morego 30, 16163 Genova, Italy
| | - Lorenzo Ramó
- OptMatLab,
Dipartimento di Fisica, Università
di Genova, via Dodecaneso 33, 16146 Genova, Italy
| | - Markus Olbrich
- Laserinstitut
Hochschule Mittweida, Technikumplatz 17, 09648 Mittweida, Germany
| | - Paolo Canepa
- OptMatLab,
Dipartimento di Fisica, Università
di Genova, via Dodecaneso 33, 16146 Genova, Italy
| | - Hasret Ağircan
- Center
for Nanotechnology Innovation IIT@NEST, Piazza San Silvestro 12, 56127 Pisa, Italy
- Engineering
Department, Istanbul Technical University, Maslak 34467, Istanbul, Turkey
| | - Alexander Horn
- Laserinstitut
Hochschule Mittweida, Technikumplatz 17, 09648 Mittweida, Germany
| | - Stiven Forti
- Center
for Nanotechnology Innovation IIT@NEST, Piazza San Silvestro 12, 56127 Pisa, Italy
| | - Ornella Cavalleri
- OptMatLab,
Dipartimento di Fisica, Università
di Genova, via Dodecaneso 33, 16146 Genova, Italy
| | - Camilla Coletti
- Center
for Nanotechnology Innovation IIT@NEST, Piazza San Silvestro 12, 56127 Pisa, Italy
- Graphene
Labs, Istituto Italiano di Tecnologia, Via Morego 30, 16163 Genova, Italy
| | | | - Maurizio Canepa
- OptMatLab,
Dipartimento di Fisica, Università
di Genova, via Dodecaneso 33, 16146 Genova, Italy
| |
Collapse
|
6
|
Mouloua D, Kotbi A, Deokar G, Kaja K, El Marssi M, EL Khakani MA, Jouiad M. Recent Progress in the Synthesis of MoS 2 Thin Films for Sensing, Photovoltaic and Plasmonic Applications: A Review. MATERIALS (BASEL, SWITZERLAND) 2021; 14:3283. [PMID: 34198592 PMCID: PMC8231843 DOI: 10.3390/ma14123283] [Citation(s) in RCA: 14] [Impact Index Per Article: 4.7] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Download PDF] [Figures] [Subscribe] [Scholar Register] [Received: 05/16/2021] [Revised: 06/08/2021] [Accepted: 06/10/2021] [Indexed: 11/16/2022]
Abstract
In the surge of recent successes of 2D materials following the rise of graphene, molybdenum disulfide (2D-MoS2) has been attracting growing attention from both fundamental and applications viewpoints, owing to the combination of its unique nanoscale properties. For instance, the bandgap of 2D-MoS2, which changes from direct (in the bulk form) to indirect for ultrathin films (few layers), offers new prospects for various applications in optoelectronics. In this review, we present the latest scientific advances in the field of synthesis and characterization of 2D-MoS2 films while highlighting some of their applications in energy harvesting, gas sensing, and plasmonic devices. A survey of the physical and chemical processing routes of 2D-MoS2 is presented first, followed by a detailed description and listing of the most relevant characterization techniques used to study the MoS2 nanomaterial as well as theoretical simulations of its interesting optical properties. Finally, the challenges related to the synthesis of high quality and fairly controllable MoS2 thin films are discussed along with their integration into novel functional devices.
Collapse
Affiliation(s)
- Driss Mouloua
- Laboratory of Physics of Condensed Matter, University of Picardie Jules Verne, 33 Saint Leu, 80039 Amiens, France; (D.M.); (A.K.); (M.E.M.)
- Institut National de la Recherche Scientifique, Centre-Énergie, Matériaux et Télécommunications, 1650, Blvd, Lionel–Boulet, Varennes, QC J3X-1S2, Canada
| | - Ahmed Kotbi
- Laboratory of Physics of Condensed Matter, University of Picardie Jules Verne, 33 Saint Leu, 80039 Amiens, France; (D.M.); (A.K.); (M.E.M.)
| | - Geetanjali Deokar
- Physical Science and Engineering Division, Kaust University, Thuwal 23955-6900, Saudi Arabia;
| | - Khaled Kaja
- Laboratoire National de métrologie et d’essais (LNE), 29 av. Roger Hannequin, 78197 Trappes, France;
| | - Mimoun El Marssi
- Laboratory of Physics of Condensed Matter, University of Picardie Jules Verne, 33 Saint Leu, 80039 Amiens, France; (D.M.); (A.K.); (M.E.M.)
| | - My Ali EL Khakani
- Institut National de la Recherche Scientifique, Centre-Énergie, Matériaux et Télécommunications, 1650, Blvd, Lionel–Boulet, Varennes, QC J3X-1S2, Canada
| | - Mustapha Jouiad
- Laboratory of Physics of Condensed Matter, University of Picardie Jules Verne, 33 Saint Leu, 80039 Amiens, France; (D.M.); (A.K.); (M.E.M.)
| |
Collapse
|