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Dong MM, He H, Wang CK, Fu XX. Two-dimensional MoSi 2As 4-based field-effect transistors integrating switching and gas-sensing functions. NANOSCALE 2023; 15:9106-9115. [PMID: 37133349 DOI: 10.1039/d3nr00637a] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/04/2023]
Abstract
Multifunctional nanoscale devices integrating multiple functions are of great importance for meeting the requirements of next-generation electronics. Herein, using first-principles calculations, we propose multifunctional devices based on the two-dimensional monolayer MoSi2As4, where a single-gate field-effect transistor (FET) and FET-type gas sensor are integrated. After introducing the optimizing strategies, such as underlap structures and dielectrics with a high dielectric constant (κ), we designed a 5 nm gate-length MoSi2As4 FET, whose performance fulfilled the key criteria of the International Technology Roadmap for Semiconductors (ITRS) for high-performance semiconductors. Under the joint adjustment of the underlap structure and high-κ dielectric material, the on/off ratio of the 5 nm gate-length FET reached up to 1.38 × 104. In addition, driven by the high-performance FET, the MoSi2As4-based FET-type gas sensor showed a sensitivity of 38% for NH3 and 46% for NO2. Moreover, the weak interaction between NH3 (NO2) and MoSi2As4 favored the recycling of the sensor. Furthermore, the sensitivity of the sensor could be effectively improved by the gate voltage, and was increased up to 67% (74%) for NH3 (NO2). Our work provides theoretical guidance for the fabrication of multifunctional devices combining a high-performance FET and sensitive gas sensor.
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Affiliation(s)
- Mi-Mi Dong
- Shandong Key Laboratory of Medical Physics and Image Processing & Shandong Provincial Engineering and Technical Center of Light Manipulations, School of Physics and Electronics, Shandong Normal University, Jinan 250358, China.
| | - Hang He
- Shandong Key Laboratory of Medical Physics and Image Processing & Shandong Provincial Engineering and Technical Center of Light Manipulations, School of Physics and Electronics, Shandong Normal University, Jinan 250358, China.
| | - Chuan-Kui Wang
- Shandong Key Laboratory of Medical Physics and Image Processing & Shandong Provincial Engineering and Technical Center of Light Manipulations, School of Physics and Electronics, Shandong Normal University, Jinan 250358, China.
| | - Xiao-Xiao Fu
- Shandong Key Laboratory of Medical Physics and Image Processing & Shandong Provincial Engineering and Technical Center of Light Manipulations, School of Physics and Electronics, Shandong Normal University, Jinan 250358, China.
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Wang Y, Bobev S. Synthesis and Crystal Structure of the Zintl Phases NaSrSb, NaBaSb and NaEuSb. MATERIALS (BASEL, SWITZERLAND) 2023; 16:1428. [PMID: 36837056 PMCID: PMC9959472 DOI: 10.3390/ma16041428] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Figures] [Subscribe] [Scholar Register] [Received: 01/25/2023] [Revised: 02/03/2023] [Accepted: 02/06/2023] [Indexed: 06/18/2023]
Abstract
This work details the synthesis and the crystal structures of the ternary compounds NaSrSb, NaBaSb and NaEuSb. They are isostructural and adopt the hexagonal ZrNiAl-type structure (space group P6¯2m; Pearson code hP9). The structure determination in all three cases was performed using single-crystal X-ray diffraction methods. The structure features isolated Sb3- anions arranged in layers stacked along the crystallographic c-axis. In the interstices, alkali and alkaline-earth metal cations are found in tetrahedral and square pyramidal coordination environments, respectively. The formal partitioning of the valence electrons adheres to the valence rules, i.e., Na+Sr2+Sb3-, Na+Ba2+Sb3- and Na+Eu2+Sb3- can be considered as Zintl phases with intrinsic semiconductor behavior. Electronic band structure calculations conducted for NaBaSb are consistent with this notion and show a direct gap of approx. 0.9 eV. Additionally, the calculations hint at possible inverted Dirac cones, a feature that is reminiscent of topological quantum materials.
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Affiliation(s)
| | - Svilen Bobev
- Department of Chemistry and Biochemistry, University of Delaware, Newark, DE 19716, USA
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Li X, Yuan P, Li L, Liu T, Shen C, Jiang Y, Song X, Li J, Xia C. Promising ultra-short channel transistors based on OM 2S (M = Ga, In) monolayers for high performance and low power consumption. NANOSCALE 2022; 15:356-364. [PMID: 36503932 DOI: 10.1039/d2nr04840j] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/17/2023]
Abstract
It is hoped that two-dimensional (2D) semiconductors overcome the short channel effect and continue Moore's law. However, 2D material-based ultra-short channel devices still face the challenge of simultaneously achieving high-performance (HP) and low-power (LP) consumption. Here, we theoretically designed monolayer OM2S (M = Ga, In)-based metal-oxide-semiconductor field-effect transistors (MOSFETs), considering the gate length from 1 to 5 nm, doping concentration and underlap structure. We found that in HP (LP) applications, the on-state current exceeds 1000 (500) μA μm-1 under a 1 nm (2 nm) gate length, surpassing the needs of the International Technology Roadmap for Semiconductors (ITRS) in 2028. The subthreshold swing is close to the Boltzmann tyranny (60 mV dec-1) even as the gate length shrinks to 2 nm. The energy-delay product is two orders lower than 1.02 × 10-28 J s μm-1, indicating extraordinary high-speed manipulation and low-energy expending. Therefore, monolayer OM2S has great application in ultra-short scale devices with HP and LP consumption, and can be taken as a candidate to extend Moore's Law.
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Affiliation(s)
- Xueping Li
- College of Electronic and Electrical Engineering, Henan Normal University, Xinxiang, Henan 453007, China
- Department of physics, Henan Normal University, Xinxiang 453007, China.
| | - Peize Yuan
- College of Electronic and Electrical Engineering, Henan Normal University, Xinxiang, Henan 453007, China
| | - Lin Li
- Department of physics, Henan Normal University, Xinxiang 453007, China.
| | - Ting Liu
- Department of physics, Henan Normal University, Xinxiang 453007, China.
| | - Chenhai Shen
- Department of physics, Henan Normal University, Xinxiang 453007, China.
| | - Yurong Jiang
- Department of physics, Henan Normal University, Xinxiang 453007, China.
| | - Xiaohui Song
- Department of physics, Henan Normal University, Xinxiang 453007, China.
| | - Jingbo Li
- Institute of Semiconductors, South China Normal University, Guangzhou 510631, China
| | - Congxin Xia
- Department of physics, Henan Normal University, Xinxiang 453007, China.
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Shi B, Tang H, Song Z, Li J, Xu L, Liu S, Yang J, Sun X, Quhe R, Yang J, Lu J. Phase transition and topological transistors based on monolayer Na 3Bi nanoribbons. NANOSCALE 2021; 13:15048-15057. [PMID: 34533149 DOI: 10.1039/d1nr02221k] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/13/2023]
Abstract
Recently, a topological-to-trivial insulator quantum-phase transition induced by an electric field has been experimentally reported in monolayer (ML) and bilayer (BL) Na3Bi. A narrow ML/BL Na3Bi nanoribbon is necessary to fabricate a high-performance topological transistor. By using the density functional theory method, we found that wider ML Na3Bi nanoribbons (>7 nm) are topological insulators, featured by insulating bulk states and dissipationless metallic edge states. However, a bandgap is opened for extremely narrow ML Na3Bi nanoribbons (<4 nm) due to the quantum confinement effect, and its size increases with the decrease in width. In the topological insulating ML Na3Bi nanoribbons, a bandgap is opened in the metallic edge states under an external displacement electric field, with strength (∼1.0 V Å-1) much smaller than the reopened displacement electric field in ML Na3Bi (3 V Å-1). An ultrashort ML Na3Bi zigzag nanoribbon topological transistor switched by the electrical field was calculated using first-principles quantum transport simulation. It shows an on/off current/conductance ratio of 4-71 and a large on-state current of 1090 μA μm-1. Therefore, a proof of the concept of topological transistors is presented.
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Affiliation(s)
- Bowen Shi
- State Key Laboratory for Mesoscopic Physics and Department of Physics, Peking University, Beijing 100871, P. R. China.
| | - Hao Tang
- State Key Laboratory for Mesoscopic Physics and Department of Physics, Peking University, Beijing 100871, P. R. China.
| | - Zhigang Song
- Computational Research Division, Lawrence Berkeley National Laboratory, Berkeley, CA 94720, USA
| | - Jingzhen Li
- State Key Laboratory for Mesoscopic Physics and Department of Physics, Peking University, Beijing 100871, P. R. China.
| | - Lianqiang Xu
- School of Physics and Electronic Information Engineering, Engineering Research Center of Nanostructure and Functional Materials, Ningxia Normal University, Guyuan, Ningxia 756000, P. R. China
| | - Shiqi Liu
- State Key Laboratory for Mesoscopic Physics and Department of Physics, Peking University, Beijing 100871, P. R. China.
| | - Jie Yang
- State Key Laboratory for Mesoscopic Physics and Department of Physics, Peking University, Beijing 100871, P. R. China.
| | - Xiaotian Sun
- College of Chemistry and Chemical Engineering, and Henan Key Laboratory of Function-Oriented Porous Materials, Luoyang Normal University, Luoyang 471934, P. R. China
| | - Ruge Quhe
- State Key Laboratory of Information Photonics and Optical Communications and School of Science, Beijing University of Posts and Telecommunications, Beijing 100876, P. R. China
| | - Jinbo Yang
- State Key Laboratory for Mesoscopic Physics and Department of Physics, Peking University, Beijing 100871, P. R. China.
- Collaborative Innovation Center of Quantum Matter, Beijing 100871, P. R. China
- Beijing Key Laboratory for Magnetoelectric Materials and Devices (BKL-MEMD), Beijing 100871, P. R. China
| | - Jing Lu
- State Key Laboratory for Mesoscopic Physics and Department of Physics, Peking University, Beijing 100871, P. R. China.
- Collaborative Innovation Center of Quantum Matter, Beijing 100871, P. R. China
- Beijing Key Laboratory for Magnetoelectric Materials and Devices (BKL-MEMD), Beijing 100871, P. R. China
- Peking University Yangtze Delta Institute of Optoelectronics, Peking University, Nantong 226010, P. R. China
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Guo X, Yu R, Jiang J, Ma Z, Zhang X. Two-dimensional topological insulators exfoliated from Na 3Bi-like Dirac semimetals. Phys Chem Chem Phys 2021; 23:10545-10550. [PMID: 33900337 DOI: 10.1039/d1cp00736j] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.3] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/21/2022]
Abstract
Topological insulation is widely predicted in two-dimensional (2D) materials realized by epitaxial growth or van der Waals (vdW) exfoliation. Such 2D topological insulators (TI's) host many interesting physical properties such as the quantum spin Hall effect and superconductivity. Here, we extend the search of 2D TI's into the exfoliatable non-vdW 2D crystals. We find that three-dimensional Dirac semimetals A3Bi (A = Na, K, Rb) (P3[combining macron]c1) can be exfoliated into 2D materials with exfoliation energies of 0.479-0.990 J m-2. Our careful examination of the topological invariants of exfoliated A3Bi monolayers/multilayers by using two well-established approaches reveals that bilayer and tetralayer Na3Bi are 2D TI's. It is found that the band gap of 2D TI's can be significantly increased by external strain. We further find that the predicted 2D TI's possess interesting hidden Rashba-like spin textures. Our results suggest a new arena to search for two-dimensional topological insulators and spintronic materials.
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Affiliation(s)
- Xiaoqiu Guo
- Key Laboratory of Optoelectronic Devices and Systems of Ministry of Education and Guangdong Province, College of Physics and Optoelectronic Engineering, Shenzhen University, Shenzhen, 518060, China.
| | - Ruixin Yu
- Key Laboratory of Optoelectronic Devices and Systems of Ministry of Education and Guangdong Province, College of Physics and Optoelectronic Engineering, Shenzhen University, Shenzhen, 518060, China.
| | - Jingwen Jiang
- Key Laboratory of Optoelectronic Devices and Systems of Ministry of Education and Guangdong Province, College of Physics and Optoelectronic Engineering, Shenzhen University, Shenzhen, 518060, China.
| | - Zhuang Ma
- Key Laboratory of Optoelectronic Devices and Systems of Ministry of Education and Guangdong Province, College of Physics and Optoelectronic Engineering, Shenzhen University, Shenzhen, 518060, China.
| | - Xiuwen Zhang
- Key Laboratory of Optoelectronic Devices and Systems of Ministry of Education and Guangdong Province, College of Physics and Optoelectronic Engineering, Shenzhen University, Shenzhen, 518060, China.
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