Quantifying patterns in optical micrographs of one- and two-dimensional ellipsoidal particle assemblies

Manipulating the morphology of colloidal particles via ion beam irradiation: A route to anisotropic shaping

Ion beam irradiation of spherical colloidal particles is a viable route to induce particle deformation, especially to get anisotropic shapes. Even though less common in comparison with dry etching techniques, different types of morphological changes can be attained depending on the process parameters (angle of incidence, energy, fluence of the ion beam, type of ion, temperature) and on particle material and initial particle arrangement (crystalline or disordered, made up of isolated or closely-packed particles). The technique can be harnessed to get anisotropic deformation of spherical colloidal particles into an ellipsoidal shape, but also to tailor the interstices between closely-packed colloidal particles, to get particle necking and coalescence as well as particle rearrangement. As such, particle deformation based on ion irradiation can find diverse applications from synthesis of ellipsoidal particles to modified templates for colloidal lithography. In this review, we examine in detail the principles and models of colloidal particle shaping via ion beam irradiation, the influence of process parameters on particle morphology and the applications of irradiated particles.

Playing with sizes and shapes of colloidal particles via dry etching methods

Monolayers of self-assembled quasi-spherical colloidal particles are essential building blocks in the field of materials science and engineering. More typically, they are used as a template for the fabrication of nanostructures if they serve, for instance, as a mask for deposition of new material on the surface on which particles are assembled or for etching of the material underneath; in this case, they are removed afterwards. This is what occurs in colloidal or nanosphere lithography. In some other cases, they are not used as a sacrificial material but they are incorporated in the final structure because they are inherently interesting for their properties. Independently of their specific use and application, different strategies have been devised in order to modify size and shape of colloidal particles, so as to enrich the variety of attainable patterns and to tailor the properties of the final structures and materials. In this review, we will focus on one of the most widespread methods to shape spherical colloidal particles, i.e. dry etching techniques. We will follow the development of such approaches until recent days, so as to trace an extensive panorama of the diverse parameters that can be harnessed to achieve specific morphological changes and highlight the characteristic features of the variants of this method. We will finally discuss how particles modified via dry etching can be used for patterning or can be resuspended in solvents for very diverse applications.