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Park SY, Lee S, Yang J, Kang MS. Patterning Quantum Dots via Photolithography: A Review. ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2023; 35:e2300546. [PMID: 36892995 DOI: 10.1002/adma.202300546] [Citation(s) in RCA: 4] [Impact Index Per Article: 4.0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 01/17/2023] [Revised: 02/28/2023] [Indexed: 06/18/2023]
Abstract
Pixelating patterns of red, green, and blue quantum dots (QDs) is a critical challenge for realizing high-end displays with bright and vivid images for virtual, augmented, and mixed reality. Since QDs must be processed from a solution, their patterning process is completely different from the conventional techniques used in the organic light-emitting diode and liquid crystal display industries. Although innovative QD patterning technologies are being developed, photopatterning based on the light-induced chemical conversion of QD films is considered one of the most promising methods for forming micrometer-scale QD patterns that satisfy the precision and fidelity required for commercialization. Moreover, the practical impact will be significant as it directly exploits mature photolithography technologies and facilities that are widely available in the semiconductor industry. This article reviews recent progress in the effort to form QD patterns via photolithography. The review begins with a general description of the photolithography process. Subsequently, different types of photolithographical methods applicable to QD patterning are introduced, followed by recent achievements using these methods in forming high-resolution QD patterns. The paper also discusses prospects for future research directions.
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Affiliation(s)
- Se Young Park
- Department of Chemical and Biomolecular Engineering, Sogang University, Seoul, 04107, South Korea
| | - Seongjae Lee
- School of Chemical and Biological Engineering, Seoul National University, Seoul, 08826, South Korea
| | - Jeehye Yang
- Department of Chemical and Biomolecular Engineering, Sogang University, Seoul, 04107, South Korea
| | - Moon Sung Kang
- Department of Chemical and Biomolecular Engineering, Sogang University, Seoul, 04107, South Korea
- Institute of Emergent Materials, Sogang University, Seoul, 04107, South Korea
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Maeng S, Park SJ, Lee J, Lee H, Choi J, Kang JK, Cho H. Direct photocatalytic patterning of colloidal emissive nanomaterials. SCIENCE ADVANCES 2023; 9:eadi6950. [PMID: 37585523 PMCID: PMC10431700 DOI: 10.1126/sciadv.adi6950] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 05/14/2023] [Accepted: 07/17/2023] [Indexed: 08/18/2023]
Abstract
We present a universal direct photocatalytic patterning method that can completely preserve the optical properties of perovskite nanocrystals (PeNCs) and other emissive nanomaterials. Solubility change of PeNCs is achieved mainly by a photoinduced thiol-ene click reaction between specially tailored surface ligands and a dual-role photocatalytic reagent, pentaerythritol tetrakis(3-mercaptopropionate) (PTMP), where the thiol-ene reaction is enabled at a low light intensity dose (~ 30 millijoules per square centimeter) by the strong photocatalytic activity of PeNCs. The photochemical reaction mechanism was investigated using various analyses at each patterning step. The PTMP also acts as a defect passivation agent for the PeNCs and even enhances their photoluminescence quantum yield (by ~5%) and photostability. Multicolor patterns of cesium lead halide (CsPbX3)PeNCs were fabricated with high resolution (<1 micrometer). Our method is widely applicable to other classes of nanomaterials including colloidal cadmium selenide-based and indium phosphide-based quantum dots and light-emitting polymers; this generality provides a nondestructive and simple way to pattern various functional materials and devices.
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Affiliation(s)
| | | | - Jaehwan Lee
- Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology (KAIST), 291, Daehak-ro, Yuseong-gu, Daejeon, Republic of Korea
| | - Hyungdoh Lee
- Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology (KAIST), 291, Daehak-ro, Yuseong-gu, Daejeon, Republic of Korea
| | - Jonghui Choi
- Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology (KAIST), 291, Daehak-ro, Yuseong-gu, Daejeon, Republic of Korea
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Morinaga M, Iwaki T, Tanaka H, Lagzi I, Nakanishi H. Patterning Perovskite Quantum Dots Using Photopolymerization. ACS APPLIED MATERIALS & INTERFACES 2023; 15:17152-17162. [PMID: 36811865 DOI: 10.1021/acsami.2c23162] [Citation(s) in RCA: 1] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/18/2023]
Abstract
All-inorganic cesium lead halide perovskite quantum dots (QDs) have several potential applications, owing to their unique optical and electronic properties. However, patterning perovskite QDs using conventional methods is difficult because of the ionic nature of QDs. Here, we demonstrate a unique approach, in which perovskite QDs are patterned in polymer films through the photocuring of monomers under patterned light illumination. The pattern illumination creates the transient polymer concentration difference, which drives the QDs to form patterns; hence controlling polymerization kinetics is essential for the generation of the QD pattern. For the patterning mechanism, a light projection system equipped with a digital micromirror device (DMD) is developed; thus, light intensity, an important factor to determine polymerization kinetics, is precisely controlled per position on the photocurable solution, resulting in the understanding of the mechanism and the formation of distinct QD patterns. The demonstrated approach assisted by the DMD-equipped projection system can form desired perovskite QD patterns solely by patterned light illumination, paving the way for the development of patterning methods for perovskite QDs and other nanocrystals.
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Affiliation(s)
- Mamoru Morinaga
- Department of Macromolecular Science and Engineering, Graduate School of Science and Technology, Kyoto Institute of Technology, Matsugasaki, Kyoto 606-8585, Japan
| | - Takuto Iwaki
- Department of Macromolecular Science and Engineering, Graduate School of Science and Technology, Kyoto Institute of Technology, Matsugasaki, Kyoto 606-8585, Japan
| | - Hayato Tanaka
- Department of Macromolecular Science and Engineering, Graduate School of Science and Technology, Kyoto Institute of Technology, Matsugasaki, Kyoto 606-8585, Japan
| | - István Lagzi
- ELKH-BME Condensed Matter Research Group, Budapest University of Technology and Economics, Budapest 1111, Hungary
- Department of Physics, Institute of Physics, Budapest University of Technology and Economics, Budapest 1111, Hungary
| | - Hideyuki Nakanishi
- Department of Macromolecular Science and Engineering, Graduate School of Science and Technology, Kyoto Institute of Technology, Matsugasaki, Kyoto 606-8585, Japan
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Direct in situ photolithography of perovskite quantum dots based on photocatalysis of lead bromide complexes. Nat Commun 2022; 13:6713. [PMID: 36344550 PMCID: PMC9640639 DOI: 10.1038/s41467-022-34453-9] [Citation(s) in RCA: 21] [Impact Index Per Article: 10.5] [Reference Citation Analysis] [Abstract] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 04/08/2022] [Accepted: 10/21/2022] [Indexed: 11/09/2022] Open
Abstract
Photolithography has shown great potential in patterning solution-processed nanomaterials for integration into advanced optoelectronic devices. However, photolithography of perovskite quantum dots (PQDs) has so far been hindered by the incompatibility of perovskite with traditional optical lithography processes where lots of solvents and high-energy ultraviolet (UV) light exposure are required. Herein, we report a direct in situ photolithography technique to pattern PQDs based on the photopolymerization catalyzed by lead bromide complexes. By combining direct photolithography with in situ fabrication of PQDs, this method allows to directly photolithograph perovskite precursors, avoiding the complicated lift-off processes and the destruction of PQDs by solvents or high-energy UV light, as PQDs are produced after lithography exposure. We further demonstrate that the thiol-ene free-radical photopolymerization is catalyzed by lead bromide complexes in the perovskite precursor solution, while no external initiators or catalysts are needed. Using direct in situ photolithography, PQD patterns with high resolution up to 2450 pixels per inch (PPI), excellent fluorescence uniformity, and good stability, are successfully demonstrated. This work opens an avenue for non-destructive direct photolithography of high-efficiency light-emitting PQDs, and potentially expands their application in various integrated optoelectronic devices. Perovskite nanomaterials may suffer degradation during conventional photolithography. Here, the authors report a non-destructive method for patterning perovskite quantum dots based on direct photopolymerization catalyzed by lead bromide complexes.
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Yang J, Lee M, Park SY, Park M, Kim J, Sitapure N, Hahm D, Rhee S, Lee D, Jo H, Jo YH, Lim J, Kim J, Shin TJ, Lee DC, Kwak K, Kwon JS, Kim B, Bae WK, Kang MS. Nondestructive Photopatterning of Heavy-Metal-Free Quantum Dots. ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2022; 34:e2205504. [PMID: 35985813 DOI: 10.1002/adma.202205504] [Citation(s) in RCA: 18] [Impact Index Per Article: 9.0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 06/16/2022] [Revised: 08/09/2022] [Indexed: 06/15/2023]
Abstract
Electroluminescence from quantum dots (QDs) is a suitable photon source for futuristic displays offering hyper-realistic images with free-form factors. Accordingly, a nondestructive and scalable process capable of rendering multicolored QD patterns on a scale of several micrometers needs to be established. Here, nondestructive direct photopatterning for heavy-metal-free QDs is reported using branched light-driven ligand crosslinkers (LiXers) containing multiple azide units. The branched LiXers effectively interlock QD films via photo-crosslinking native aliphatic QD surface ligands without compromising the intrinsic optoelectronic properties of QDs. Using branched LiXers with six sterically engineered azide units, RGB QD patterns are achieved on the micrometer scale. The photo-crosslinking process does not affect the photoluminescence and electroluminescence characteristics of QDs and extends the device lifetime. This nondestructive method can be readily adapted to industrial processes and make an immediate impact on display technologies, as it uses widely available photolithography facilities and high-quality heavy-metal-free QDs with aliphatic ligands.
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Affiliation(s)
- Jeehye Yang
- Department of Chemical and Biomolecular Engineering, Sogang University, Seoul, 04107, Republic of Korea
| | - Myeongjae Lee
- Department of Chemistry, Korea University, Seoul, 02841, Republic of Korea
| | - Se Young Park
- Department of Chemical and Biomolecular Engineering, Sogang University, Seoul, 04107, Republic of Korea
| | - Myoungjin Park
- Samsung Display Research Center, Samsung Display, Yongin, 17113, Republic of Korea
| | - Jonghoon Kim
- Samsung Display Research Center, Samsung Display, Yongin, 17113, Republic of Korea
| | - Niranjan Sitapure
- Department of Chemical Engineering, Texas A&M University, College Station, TX, 77843, USA
| | - Donghyo Hahm
- SKKU Advanced Institute of Nanotechnology (SAINT), School of Nano Science & Technology, Sungkyunkwan University (SKKU), Suwon, 16419, Republic of Korea
| | - Seunghyun Rhee
- SKKU Advanced Institute of Nanotechnology (SAINT), School of Nano Science & Technology, Sungkyunkwan University (SKKU), Suwon, 16419, Republic of Korea
- Division of Advanced Materials, Korea Research Institute of Chemical Technology (KRICT), Daejeon, 34113, Republic of Korea
| | - Daeyeon Lee
- Department of Chemistry, Graduate School of Semiconductor Materials and Device Engineering Graduate School of Carbon Neutrality, Ulsan National Institute of Science and Technology (UNIST), Ulsan, 44919, Republic of Korea
| | - Hyunwoo Jo
- Department of Chemical and Biomolecular Engineering, Sogang University, Seoul, 04107, Republic of Korea
| | - Yong Hyun Jo
- Department of Chemical and Biomolecular Engineering, Sogang University, Seoul, 04107, Republic of Korea
| | - Jaemin Lim
- SKKU Advanced Institute of Nanotechnology (SAINT), School of Nano Science & Technology, Sungkyunkwan University (SKKU), Suwon, 16419, Republic of Korea
| | - Jungwook Kim
- Department of Chemical and Biomolecular Engineering, Sogang University, Seoul, 04107, Republic of Korea
| | - Tae Joo Shin
- UNIST Central Research Facilities, Graduate School of Semiconductor Material and Devices Engineering, Ulsan National Institute of Science and Technology (UNIST), Ulsan, 44919, Republic of Korea
| | - Doh C Lee
- Department of Chemical and Biomolecular Engineering, KAIST Institute for the Nanocentury, Korea Advanced Institute of Science and Technology (KAIST), Daejeon, 34141, Republic of Korea
| | - Kyungwon Kwak
- Department of Chemistry, Korea University, Seoul, 02841, Republic of Korea
| | - Joseph S Kwon
- Department of Chemical Engineering, Texas A&M University, College Station, TX, 77843, USA
| | - BongSoo Kim
- Department of Chemistry, Graduate School of Semiconductor Materials and Device Engineering Graduate School of Carbon Neutrality, Ulsan National Institute of Science and Technology (UNIST), Ulsan, 44919, Republic of Korea
| | - Wan Ki Bae
- SKKU Advanced Institute of Nanotechnology (SAINT), School of Nano Science & Technology, Sungkyunkwan University (SKKU), Suwon, 16419, Republic of Korea
| | - Moon Sung Kang
- Department of Chemical and Biomolecular Engineering, Sogang University, Seoul, 04107, Republic of Korea
- Institute of Emergent Materials, Sogang University, Seoul, 04107, Republic of Korea
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Sun W, Li F, Tao J, Li P, Zhu L, Li J, Lv J, Wang W, Liang J, Zhong H. Micropore filling fabrication of high resolution patterned PQDs with a pixel size less than 5 μm. NANOSCALE 2022; 14:5994-5998. [PMID: 35389395 DOI: 10.1039/d2nr01115h] [Citation(s) in RCA: 2] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/14/2023]
Abstract
PQDs are promising color converters for micro-LED applications. Here we report the micropore filling fabrication of high resolution patterned PQDs with a pixel size of 2 μm using a template with SU8 micropores.
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Affiliation(s)
- Wenchao Sun
- State Key Laboratory of Applied Optics, Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, Changchun, Jilin 130033, China.
- University of Chinese Academy of Sciences, Beijing 100049, China
| | - Fei Li
- QD LAB, Hefei Innovation Research Institute of Beihang University, Hefei, Anhui, 230001, China
| | - Jin Tao
- State Key Laboratory of Applied Optics, Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, Changchun, Jilin 130033, China.
| | - Panyuan Li
- State Key Laboratory of Applied Optics, Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, Changchun, Jilin 130033, China.
- University of Chinese Academy of Sciences, Beijing 100049, China
| | - Licai Zhu
- State Key Laboratory of Applied Optics, Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, Changchun, Jilin 130033, China.
- University of Chinese Academy of Sciences, Beijing 100049, China
| | - Jiwei Li
- State Key Laboratory of Applied Optics, Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, Changchun, Jilin 130033, China.
- University of Chinese Academy of Sciences, Beijing 100049, China
| | - Jinguang Lv
- State Key Laboratory of Applied Optics, Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, Changchun, Jilin 130033, China.
| | - Weibiao Wang
- State Key Laboratory of Applied Optics, Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, Changchun, Jilin 130033, China.
| | - Jingqiu Liang
- State Key Laboratory of Applied Optics, Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, Changchun, Jilin 130033, China.
| | - Haizheng Zhong
- QD LAB, Hefei Innovation Research Institute of Beihang University, Hefei, Anhui, 230001, China
- School of Materials Science and Engineering, Beijing Institute of Technology, Beijing, 100081, China.
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