Highly-efficient growth of cobalt nanostructures using focused ion beam induced deposition under cryogenic conditions: application to electrical contacts on graphene, magnetism and hard masking

Scanning Nitrogen-Vacancy Magnetometry of Focused-Electron-Beam-Deposited Cobalt Nanomagnets

Focused-electron-beam-induced deposition is a promising technique for patterning nanomagnets in a single step. We fabricate cobalt nanomagnets in such a process and characterize their content, saturation magnetization, and stray magnetic field profiles by using a combination of transmission electron microscopy and scanning nitrogen-vacancy (NV) magnetometry. We find agreement between the measured stray field profiles and saturation magnetization with micromagnetic simulations. We further characterize magnetic domains and grainy stray magnetic fields in the nanomagnets and their halo side-deposits. This work may aid in the evaluation of Co nanomagnets produced through focused electron-beam-induced deposition for applications in spin qubits, magnetic field sensing, and magnetic logic.

Low-resistivity, high-resolution W-C electrical contacts fabricated by direct-write focused electron beam induced deposition

Background: The use of a focused ion beam to decompose a precursor gas and produce a metallic deposit is a widespread nanolithographic technique named focused ion beam induced deposition (FIBID). However, such an approach is unsuitable if the sample under study is sensitive to the somewhat aggressive exposure to the ion beam, which induces the effects of surface amorphization, local milling, and ion implantation, among others. An alternative strategy is that of focused electron beam induced deposition (FEBID), which makes use of a focused electron beam instead, and in general yields deposits with much lower metallic content than their FIBID counterparts. Methods: In this work, we optimize the deposition of tungsten-carbon (W-C) nanowires by FEBID to be used as electrical contacts by assessing the impact of the deposition parameters during growth, evaluating their chemical composition, and investigating their electrical response. Results: Under the optimized irradiation conditions, the samples exhibit a metallic content high enough for them to be utilized for this purpose, showing a room-temperature resistivity of 550 μΩ cm and maintaining their conducting properties down to 2 K. The lateral resolution of such FEBID W-C metallic nanowires is 45 nm. Conclusions: The presented optimized procedure may prove a valuable tool for the fabrication of contacts on samples where the FIBID approach is not advised.

High-Throughput Direct Writing of Metallic Micro- and Nano-Structures by Focused Ga+ Beam Irradiation of Palladium Acetate Films

Metallic nanopatterns are ubiquitous in applications that exploit the electrical conduction at the nanoscale, including interconnects, electrical nanocontacts, and small gaps between metallic pads. These metallic nanopatterns can be designed to show additional physical properties (optical transparency, plasmonic effects, ferromagnetism, superconductivity, heat evacuation, etc.). For these reasons, an intense search for novel lithography methods using uncomplicated processes represents a key on-going issue in the achievement of metallic nanopatterns with high resolution and high throughput. In this contribution, we introduce a simple methodology for the efficient decomposition of Pd3(OAc)6 spin-coated thin films by means of a focused Ga+ beam, which results in metallic-enriched Pd nanostructures. Remarkably, the usage of a charge dose as low as 30 μC/cm2 is sufficient to fabricate structures with a metallic Pd content above 50% (at.) exhibiting low electrical resistivity (70 μΩ·cm). Binary-collision-approximation simulations provide theoretical support to this experimental finding. Such notable behavior is used to provide three proof-of-concept applications: (i) creation of electrical contacts to nanowires, (ii) fabrication of small (40 nm) gaps between large metallic contact pads, and (iii) fabrication of large-area metallic meshes. The impact across several fields of the direct decomposition of spin-coated organometallic films by focused ion beams is discussed.

Cryo-Focused Ion Beam-Induced Deposition of Tungsten–Carbon Nanostructures Using a Thermoelectric Plate

Focused Ion Beam-Induced Deposition (FIBID) is a single-step nanopatterning technique that applies a focused beam of ions to induce the decomposition of a gaseous precursor. The processing rate of FIBID increases by two orders of magnitude when the process is performed at cryogenic temperatures (Cryo-FIBID): the precursor forms a condensed layer on the surface of the cooled substrate, greatly enhancing the amount of material available for decomposition. Cryo-FIBID has been achieved so far by making use of liquid nitrogen-based cooling circuits, which require the passage of a flowing gas as a cooling agent. Here, the Cryo-FIBID of the W(CO)6 precursor is performed using a coolant-free thermoelectric plate utilizing the Peltier effect. Performed at −60 ∘C, the procedure yields a W–C-based material with structural and electrical properties comparable to those of its counterpart grown in coolant-based Cryo-FIBID. The use of the thermoelectric plate significantly reduces the vibrations and sample drift induced by the flow of passing coolant gas and allows for the fabrication of similar nanostructures. In summary, the reported process represents a further step towards the practical implementation of the Cryo-FIBID technique, and it will facilitate its use by a broader research community.