Atomic layer deposition of rhodium and palladium thin film using low-concentration ozone

Conformal Noble Metal High-Entropy Alloy Nanofilms by Atomic Layer Deposition for an Enhanced Hydrogen Evolution Reaction

The current synthesis methods of high-entropy alloy (HEA) thin-film coatings face huge challenges in facile preparation, precise thickness control, conformal integration, and affordability. These challenges are more specific and noteworthy for noble metal-based HEA thin films where the conventional sputtering methods encounter thickness control and high-cost issues (high-purity noble metal targets required). Herein, for the first time, we report a facile and controllable synthesis process of quinary HEA coatings consisting of noble metals (Rh, Ru, Pt, Pd, and Ir), by sequential atomic layer deposition (ALD) coupled with electrical Joule heating for post-alloying. Furthermore, the resulting quinary HEA thin film with a thickness of ∼50 nm and an atomic ratio of 20:15:21:18:27 shows promising potential as a platform for catalysis, exhibiting enhanced electrocatalytic hydrogen evolution reaction (HER) performances with lower overpotentials (e.g., from 85 to 58 mV in 0.5 M H₂SO₄) and higher stability (by retaining more than 92% of the initial current after 20 h with a current density of 10 mA/cm² in 0.5 M H₂SO₄) than other noble metal-based structure counterparts in this work. The enhanced material properties and device performances are attributed to the efficient electron transfer of HEA with the increased number of active sites. This work not only presents RhRuPtPdIr HEA thin films as promising HER catalysts but also sheds light on controllable fabrication of conformal HEA-coated complex structures toward a broad range of applications.

Development of Core-Shell Rh@Pt and Rh@Ir Nanoparticle Thin Film Using Atomic Layer Deposition for HER Electrocatalysis Applications

The efficiency of hydrogen gas generation via electrochemical water splitting has been mostly limited by the availability of electrocatalyst materials that require lower overpotentials during the redox reaction. Noble metals have been used extensively as electrocatalysts due to their high activity and low overpotentials. However, the use of single noble metal electrocatalyst is limited due to atomic aggregation caused by its inherent high surface energy, which results in poor structural stability, and, hence, poor electrocatalytic performance and long-term stability. In addition, using noble metals as electrocatalysts also causes the cost to be unnecessarily high. These limitations in noble metal electrocatalysts could be enhanced by combining two noble metals in a core-shell structure (e.g., Rh@Ir) as a thin film over a base substrate. This could significantly enhance electrocatalytic activity due to the following: (1) the modification of the electronic structure, which increases electrical conductivity; (2) the optimization of the adsorption energy; and (3) the introduction of new active sites in the core-shell noble metal structure. The current state-of-the-art employs physical vapor deposition (PVD) or other deposition techniques to fabricate core-shell noble metals on flat 2D substrates. This method does not allow 3D substrates with high surface areas to be used. In the present work, atomic layer deposition (ALD) was used to fabricate nanoparticle thin films of Rh@Ir and Rh@Pt in a core-shell structure on glassy carbon electrodes. ALD enables the fabrication of nanoparticle thin film on three-dimensional substrates (a 2D functional film on a 3D substrate), resulting in a significantly increased surface area for a catalytic reaction to take place; hence, improving the performance of electrocatalysis. The Rh@Pt (with an overpotential of 139 mV and a Tafel slope of 84.8 mV/dec) and Rh@Ir (with an overpotential of 169 mV and a Tafel slope of 112 mV/dec) core-shell electrocatalyst exhibited a better electrocatalytic performances compared to the single metal Rh electrocatalyst (with an overpotential of 300 mV and a Tafel slope of 190 mV/dec). These represented a 54% and a 44% improvement in performance, respectively, illustrating the advantages of core-shell thin film nanostructures in enhancing the catalytic performance of an electrocatalyst. Both electrocatalysts also exhibited good long-term stability in the harsh acidic electrolyte conditions when subjected to chronopotentiometry studies.

Noble metal alloy thin films by atomic layer deposition and rapid Joule heating

Metal alloys are usually fabricated by melting constituent metals together or sintering metal alloy particles made by high energy ball milling (mechanical alloying). All these methods only allow for bulk alloys to be formed. This manuscript details a new method of fabricating Rhodium-Iridium (Rh-Ir) metal alloy films using atomic layer deposition (ALD) and rapid Joule heating induced alloying that gives functional thin film alloys, enabling conformal thin films with high aspect ratios on 3D nanostructured substrate. In this work, ALD was used to deposit Rh thin film on an Al2O3 substrate, followed by an Ir overlayer on top of the Rh film. The multilayered structure was then alloyed/sintered using rapid Joule heating. We can precisely control the thickness of the resultant alloy films down to the atomic scale. The Rh-Ir alloy thin films were characterized using scanning and transmission electron microscopy (SEM/TEM) and energy dispersive spectroscopy (EDS) to study their microstructural characteristics which showed the morphology difference before and after rapid Joule heating and confirmed the interdiffusion between Rh and Ir during rapid Joule heating. The diffraction peak shift was observed by Grazing-incidence X-ray diffraction (GIXRD) indicating the formation of Rh-Ir thin film alloys after rapid Joule heating. X-ray photoelectron spectroscopy (XPS) was also carried out and implied the formation of Rh-Ir alloy. Molecular dynamics simulation experiments of Rh-Ir alloys using Large-Scale Atomic/Molecular Massively Parallel Simulator (LAMMPS) were performed to elucidate the alloying mechanism during the rapid heating process, corroborating the experimental results.

Adsorption and Reaction Mechanisms of Direct Palladium Synthesis by ALD Using Pd(hfac)2 and Ozone on Si (100) Surface

Palladium nanoparticles made by atomic layer deposition (ALD) normally involve formaldehyde or H2 as a reducing agent. Since formaldehyde is toxic and H2 is explosive, it is advantageous to remove this reducing step during the fabrication of palladium metal by ALD. In this work we have successfully used Pd(hfac)2 and ozone directly to prepare palladium nanoparticles, without the use of reducing or annealing agents. Density functional theory (DFT) was employed to explore the reaction mechanisms of palladium metal formation in this process. DFT results show that Pd(hfac)2 dissociatively chemisorbed to form Pd(hfac)* and hfac* on the Si (100) surface. Subsequently, an O atom of the ozone could cleave the C–C bond of Pd(hfac)* to form Pd* with a low activation barrier of 0.46 eV. An O atom of the ozone could also be inserted into the hfac* to form Pd(hfac-O)* with a lower activation barrier of 0.29 eV. With more ozone, the C–C bond of Pd(hfac-O)* could be broken to produce Pd* with an activation barrier of 0.42 eV. The ozone could also chemisorb on the Pd atom of Pd(hfac-O)* to form O3-Pd(hfac-O)*, which could separate into O-Pd(hfac-O)* with a high activation barrier of 0.83 eV. Besides, the activation barrier was 0.64 eV for Pd* that was directly oxidized to PdOx by ozone. Based on activation barriers from DFT calculations, it was possible to prepare palladium without reducing steps when ALD conditions were carefully controlled, especially the ozone parameters, as shown by our experimental results. The mechanisms of this approach could be used to prepare other noble metals by ALD without reducing/annealing agents.