Ethylene-bridged polysilsesquioxane/hollow silica particle hybrid film for thermal insulation material

Recent Advances on Porous Siliceous Materials Derived from Waste

In recent years, significant efforts have been made in view of a transition from a linear to a circular economy, where the value of products, materials, resources, and waste is maintained as long as possible in the economy. The re-utilization of industrial and agricultural waste into value-added products, such as nanostructured siliceous materials, has become a challenging topic as an effective strategy in waste management and a sustainable model aimed to limit the use of landfill, conserve natural resources, and reduce the use of harmful substances. In light of these considerations, nanoporous silica has attracted attention in various applications owing to the tunable pore dimensions, high specific surface areas, tailorable structure, and facile post-functionalization. In this review, recent progress on the synthesis of siliceous materials from different types of waste is presented, analyzing the factors influencing the size and morphology of the final product, alongside different synthetic methods used to impart specific porosity. Applications in the fields of wastewater/gas treatment and catalysis are discussed, focusing on process feasibility in large-scale productions.

Distinct insight into the use of difunctional double-decker silsesquioxanes as building blocks for alternating A–B type macromolecular frameworks

A distinct look at known, hydrosilylation reactions used for the formation of DDSQ-based linear A–B alternating macromolecular systems with DPn > 1000 is presented. Selected physicochemical properties of obtained hybrid co-polymers were determined.

Development of Highly Water-Permeable Robust PSQ-Based RO Membranes by Introducing Hydroxyethylurea-Based Hydrophilic Water Channels

Copolymerization of bis[3-(triethoxysilyl)propyl]amine (BTESPA) and N-(2-hydroxyethyl)-N'-[3-(triethoxysilyl)propyl]urea (HETESPU) provided highly permeable robust reverse osmosis (RO) membranes that have an organically bridged polysilsesquioxane (PSQ) structure. The RO experiments with NaCl aqueous solution (2000 ppm) indicated that the introduction of hydroxyethylurea groups markedly improved the permeability of water (1.86 × 10^-12 m³/m²sPa) to approximately 19 times higher than that of a membrane prepared via the BTESPA homopolymerization, with NaCl rejection remaining nearly unchanged (96%). This is the highest water permeability obtained so far for PSQ-based membranes that show higher than 90% NaCl rejection. The improvement of water permeability is likely due to aggregation through hydrogen bonding in the PSQ layer, which can be regarded as a hydrophilic water channel.

Robust and Transparent Antifogging Polysilsesquioxane Film Containing a Hydroxy Group

Poly(glycidyloxypropyl)silsesquioxane (PGPS) was successfully synthesized by hydrolysis and polycondensation using the nitrogen flow method. A poly(3-(2,3-dihydroxypropoxypropyl)silsesquioxane) (PSQ-OH) film was prepared via two routes. In route A, PSQ-OH was prepared by the hydrolysis of the epoxy group of PGPS in an aqueous hydrochloric acid (HCl)/tetrahydrofuran solution, affording a diol group; then, PSQ-OH was coated on a glass substrate and heated. The antifogging performance of the PSQ-OH film was evaluated in terms of water uptake (WU) and scratch resistance. The obtained PSQ-OH film exhibited a low WU of 5% and a scratch resistance of 1.6. In route B, PGPS was coated on a glass substrate and immersed in a 0.5 mol/L aqueous sulfuric acid solution for 1-15 h at room temperature, producing a diol group. The solid-state ¹³C nuclear magnetic resonance spectrum indicated that the epoxy group was completely hydrolyzed after immersion for 15 h. The WU of the PSQ-OH film prepared via route B increased from 5 to 19% with the increase in the immersion time and was higher than that of the PSQ-OH film prepared via route A. The PSQ-OH film on a glass substrate retained transparency under water vapor exposure at 60 °C. The PSQ-OH film prepared via route B exhibited a high scratch resistance of 2.7-3.6, similar to that of a poly(3-(2-aminoethylaminopropyl)silsesquioxane) film. The scratch resistance of the PSQ-OH film was 5-7 times higher than that of the poly(vinyl alcohol) film. The PSQ-OH film was uniform with no pinholes and cracks. The PSQ-OH film was transparent and colorless and exhibited a high transmittance of >90% in the wavelength range of 400-800 nm. Overall, the prepared PSQ-OH film exhibits good antifogging, transparency, and mechanical properties.