|
1
|
Mishra AK, Lee J, Kang S, Kim E, Choi C, Kim JK. Gallol-Based Block Copolymer with a High Flory–Huggins Interaction Parameter for Next-Generation Lithography. Macromolecules 2022. [DOI: 10.1021/acs.macromol.2c01633] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 12/13/2022]
Affiliation(s)
- Avnish Kumar Mishra
- National Creative Research Initiative Center for Hybrid Nano Materials By High-level Architectural Design of Block Copolymer, Department of Chemical Engineering, Pohang University of Science and Technology, Pohang37673, Republic of Korea
| | - Jaeyong Lee
- National Creative Research Initiative Center for Hybrid Nano Materials By High-level Architectural Design of Block Copolymer, Department of Chemical Engineering, Pohang University of Science and Technology, Pohang37673, Republic of Korea
| | - Sukwon Kang
- National Creative Research Initiative Center for Hybrid Nano Materials By High-level Architectural Design of Block Copolymer, Department of Chemical Engineering, Pohang University of Science and Technology, Pohang37673, Republic of Korea
| | - Eunseol Kim
- National Creative Research Initiative Center for Hybrid Nano Materials By High-level Architectural Design of Block Copolymer, Department of Chemical Engineering, Pohang University of Science and Technology, Pohang37673, Republic of Korea
| | - Chungryong Choi
- National Creative Research Initiative Center for Hybrid Nano Materials By High-level Architectural Design of Block Copolymer, Department of Chemical Engineering, Pohang University of Science and Technology, Pohang37673, Republic of Korea
| | - Jin Kon Kim
- National Creative Research Initiative Center for Hybrid Nano Materials By High-level Architectural Design of Block Copolymer, Department of Chemical Engineering, Pohang University of Science and Technology, Pohang37673, Republic of Korea
| |
Collapse
|
|
2
|
Angelopoulou PP, Moutsios I, Manesi GM, Ivanov DA, Sakellariou G, Avgeropoulos A. Designing high χ copolymer materials for nanotechnology applications: A systematic bulk vs. thin films approach. Prog Polym Sci 2022. [DOI: 10.1016/j.progpolymsci.2022.101625] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/19/2022]
|
|
3
|
Ma C, Han T, Efstathiou S, Marathianos A, Houck HA, Haddleton DM. Aggregation-Induced Emission Poly(meth)acrylates for Photopatterning via Wavelength-Dependent Visible-Light-Regulated Controlled Radical Polymerization in Batch and Flow Conditions. Macromolecules 2022; 55:9908-9917. [DOI: 10.1021/acs.macromol.2c01413] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 07/11/2022] [Revised: 10/04/2022] [Indexed: 11/13/2022]
Affiliation(s)
- Congkai Ma
- Department of Chemistry, University of Warwick, Coventry CV4 7AL, United Kingdom
| | - Ting Han
- Center for AIE Research, College of Materials Science and Engineering, Shenzhen University, Shenzhen 518060, China
| | - Spyridon Efstathiou
- Department of Chemistry, University of Warwick, Coventry CV4 7AL, United Kingdom
| | - Arkadios Marathianos
- Department of Chemistry, University of Warwick, Coventry CV4 7AL, United Kingdom
| | - Hannes A. Houck
- Department of Chemistry, University of Warwick, Coventry CV4 7AL, United Kingdom
| | - David M. Haddleton
- Department of Chemistry, University of Warwick, Coventry CV4 7AL, United Kingdom
| |
Collapse
|