Block copolymer thin films on corrugated substrates

Reordering transitions during annealing of block copolymer cylinder phases

While equilibrium block-copolymer morphologies are dictated by energy-minimization effects, the semi-ordered states observed experimentally often depend on the details of ordering pathways and kinetics. Here, we explore reordering transitions in thin films of block-copolymer cylinder-forming polystyrene-block-poly(methyl methacrylate). We observe several transient states as films order towards horizontally-aligned cylinders. In particular, there is an early-stage reorganization from randomly-packed cylinders into hexagonally-packed vertically-aligned cylinders; followed by a reorientation transition from vertical to horizontal cylinder states. These transitions are thermally activated. The growth of horizontal grains within an otherwise vertical morphology proceeds anisotropically, resulting in anisotropic grains in the final horizontal state. The size, shape, and anisotropy of grains are influenced by ordering history; for instance, faster heating rates reduce grain anisotropy. These results help elucidate aspects of pathway-dependent ordering in block-copolymer thin films.

Self-assembly of AB diblock copolymers under confinement into topographically patterned surfaces

Motivated by recent experiments of copolymer patterning by nanoimprinting, we investigate microphase separation and morphology for symmetric AB diblock copolymers with lamellar structure in bulk, confined between a flat bottom surface and a square-wave top surface by using the self-consistent field theory (SCFT). The efficient and high-order accurate pseudospectral method is adopted to numerically solve the SCFT equations in irregularly shaped domains with the help of the "masking" technique by embedding the confined domains of arbitrary shape within a larger rectangular computational cell. Our simulations reveal that the inverted T-style and trapezoid structures occurring in the relatively strong and weak surface fields, respectively, are following our topographically patterned surface. For neutral walls, when the thickness of the lower section is commensurate with the lamellae period of bulk block copolymers, the topographically patterned surface in this work leads to parallel lamellae, and completely parallel lamellae are favored when both the width and height of the upper section are equal to the lamellae bulk period. Furthermore, the prevalent structures are the parallel lamellae in the upper section combined with the perpendicular lamellae in the lower section. When the walls repel one of the block species, parallel lamellae occur in a wide range of film thicknesses compared to the case of neutral walls. To our knowledge, some new structures, however, such as square and partial square structures and reversed-T and trapezoid structures, have not been reported before under parallel surface confinement. In general, the required structures can be obtained by choosing the proper degree of spatial confinement, characterized by variations of the ratio of film thicknesses to bulk repeat period, and the block-substrate interactions. Moreover, we show that the confinement width of the lower section (or the period of the square wave) plays a critical role in microstructure formation. These findings provide a guide to designing novel microstructures involving symmetric diblock copolymers via topographically patterned surfaces and surface fields, relevant to nanoimprinting.

Parallel-local anodic oxidation of silicon surfaces by soft stamps

We investigate the fabrication of nanometric patterns on silicon surfaces by using the parallel-local anodic oxidation technique with soft stamps. This method yields silicon oxide nanostructures 15 nm high, namely at least five times higher than the nanostructures made with local anodic oxidation using atomic force microscopy, and thanks to the size of the stamp enables one to pattern the surface across a centimetre length scale. To implement this technique, we built a machine to bring the metallized polydimethylsiloxane stamp in contact with the silicon surface, subsequently inserted in a sealed chamber with controlled relative humidity. The oxide nanostructures are fabricated when a bias voltage of 36 V is applied between the stamp and the silicon for 2 min, with a relative humidity of 90%. The flexibility of the stamp enables a homogeneous conformal contact with the silicon surface, resulting in an excellent reproducibility of the process. Moreover, by means of two subsequent oxidations with the same stamp and just rotating the sample, we are able to fabricate complex nanostructures. Finally, a detailed study of the oxidation mechanism, also using a finite element analysis, has been performed to understand the underlying mechanism.

Guided self-assembly of diblock copolymer thin films on chemically patterned substrates

We study the guided self-assembly of symmetric/asymmetric diblock copolymer (BCP) films on heterogeneous substrates with chemically patterned surface by using a coarse-grained phase-separation model. During the procedure, the free energy employed for the BCP films was modeled by the Ginzburg-Landau free energy with nonlocal interaction, and the flat, chemically patterned surface was considered as a heterogeneous surface with short-range interaction with the BCP molecules. The resulting Cahn-Hilliard equation was solved by means of an efficient semi-implicit Fourier-spectral algorithm. Effects of pattern scale, surface chemical potential, and BCP asymmetry on the self-assembly process were explored in detail and compared with those without chemically patterned substrate surfaces. It was found that the morphology of both symmetric and asymmetric BCP films is strongly influenced by the commensurability between the unconstrained natural period lambda* of the bulk BCP and the artificial pattern period. Simulation shows that patterned surface with period close to lambda* leads to highly ordered morphology after self-assembly for both symmetric and asymmetric BCP films, and it also dramatically accelerates the guided self-assembly process. The present simulation is in a very good agreement with the recent experimental observation in BCP nanolithography. Finally, the present study also expects an innovative nanomanufacturing method to produce highly ordered nanodots based on the guided self-assembly of asymmetric BCP films on chemically patterned substrates.