Adsorption and electron-induced polymerization of methyl methacrylate on Ru(101¯0)

Electron-induced deposition using Fe(CO)4MA and Fe(CO)5 - effect of MA ligand and process conditions

The electron-induced decomposition of Fe(CO)4MA (MA = methyl acrylate), which is a potential new precursor for focused electron beam-induced deposition (FEBID), was investigated by surface science experiments under UHV conditions. Auger electron spectroscopy was used to monitor deposit formation. The comparison between Fe(CO)4MA and Fe(CO)5 revealed the effect of the modified ligand architecture on the deposit formation in electron irradiation experiments that mimic FEBID and cryo-FEBID processes. Electron-stimulated desorption and post-irradiation thermal desorption spectrometry were used to obtain insight into the fate of the ligands upon electron irradiation. As a key finding, the deposits obtained from Fe(CO)4MA and Fe(CO)5 were surprisingly similar, and the relative amount of carbon in deposits prepared from Fe(CO)4MA was considerably less than the amount of carbon in the MA ligand. This demonstrates that electron irradiation efficiently cleaves the neutral MA ligand from the precursor. In addition to deposit formation by electron irradiation, the thermal decomposition of Fe(CO)4MA and Fe(CO)5 on an Fe seed layer prepared by EBID was compared. While Fe(CO)5 sustains autocatalytic growth of the deposit, the MA ligand hinders the thermal decomposition in the case of Fe(CO)4MA. The heteroleptic precursor Fe(CO)4MA, thus, offers the possibility to suppress contributions of thermal reactions, which can compromise control over the deposit shape and size in FEBID processes.

Electron Energy Loss Processes in Methyl Methacrylate: Excitation and Bond Breaking

Details of electron-induced chemistry of methyl methacrylate (MMA) upon complexation are revealed by combining gas-phase 2D electron energy loss spectroscopy with electron attachment spectroscopy of isolated MMA and its clusters. We show that even though isolated MMA does not form stable parent anions, it efficiently thermalizes the incident electrons via intramolecular vibrational redistribution, leading to autodetachment of slow electrons. This autodetachment channel is reduced in clusters due to intermolecular energy transfer and stabilization of parent molecular anions. Bond breaking via dissociative electron attachment leads to an extensive range of anion products. The dominant OCH₃^- channel is accessible via core-excited resonances with threshold above 5 eV, despite the estimated thermodynamic threshold below 3 eV. This changes in clusters, where M_nOCH₃^- anions are observed in a lower-lying resonance due to neutral dissociation of the ¹(n, π*) state and electron self-scavenging. The present findings have implications for electron-induced chemistry in lithography with poly(methyl methacrylate).

Quantum-classical calculations of X-ray photoelectron spectra of polymers-Polymethyl methacrylate revisited

In this work, we apply quantum mechanics/molecular mechanics (QM/MM) approach to predict core-electron binding energies and chemical shifts of polymers, obtainable via X-ray photoelectron spectroscopy(XPS), using polymethyl methacrylate as a demonstration example. The results indicate that standard parametrizations of the quantum part (basis sets, level of correlation) and the molecular mechanics parts (decomposed charges, polarizabilities, and capping technique) are sufficient for the QM/MM model to be predictive for XPS of polymers. It is found that the polymer environment produces contributions to the XPS binding energies that are close to monotonous with the number of monomer units, totally amounting to approximately an eV decrease in binding energies. In most of the cases, the order of the shifts is maintained, and even the relative size of the differential shifts is largely preserved. The coupling of the internal core-hole relaxation to the polymer environment is found to be weak in each case, amounting only to one or two tenths of an eV. The main polymeric effect is actually well estimated already at the frozen orbital level of theory, which in turn implies a substantial computational simplification. These conclusions are best represented by the cases where the ionized monomer and its immediate surrounding are treated quantum mechanically. If the QM region includes only a single monomer, a couple of anomalies are spotted, which are referred to the QM/MM interface itself and to the neglect of a possible charge transfer.

Electron-induced interaction of selected hydrocarbons with TiO2 surfaces: the relevance to extreme ultraviolet lithography

The aim of this work is to characterize desorption induced by electronic transition processes that affect the reflectivity of TiO2-capped multilayer mirrors used in extreme ultraviolet (EUV) lithography. A low energy electron beam is employed to mimic excitations initiated by EUV radiation. Temperature programmed desorption, x-ray photoelectron spectroscopy, and low energy ion scattering are used to analyze the surface reactions. Carbon film growth on the TiO2(011) crystalline surface is measured during 10-100 eV electron bombardment in benzene or methyl methacrylate vapor over a wide range of pressures and temperatures near 300 K. Low energy secondary electrons excited by EUV photons contribute substantially to the carbon accumulation on clean TiO2 cap layers. For benzene on clean TiO2, secondary electron effects dominate in the initial stages of carbon accumulation, whereas for C-covered TiO2, direct excitations appear to dominate. We report on the adsorption energy, the steady-state coverage of the molecules on the surface and the cross sections for electron-stimulated dissociation: all key parameters for understanding and modeling the processes relating to the EUV lithography mirrors.