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Boo BH, Liu Z, Koyano I. Pathway Studies in Si(2p) Inner-Shell Processes of H2Si(CH3)2 by Mass Spectrometry and the Photoion−Photoion Coincidence Method in the Range 24−133 eV. J Phys Chem A 2000. [DOI: 10.1021/jp991413t] [Citation(s) in RCA: 6] [Impact Index Per Article: 0.3] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/29/2022]
Affiliation(s)
- Bong Hyun Boo
- Department of Chemistry, Chungnam National University, Taejon 305-764, Korea, and Center for Molecular Science, 373-1 Kusung-dong, Yusung-gu, Taejon 305-701, Korea, and Department of Material Science, Himeji Institute of Technology, 1479-1 Kanaji, Kamigohri, Hyogo 678-12, Japan
| | - Zhaoyang Liu
- Department of Chemistry, Chungnam National University, Taejon 305-764, Korea, and Center for Molecular Science, 373-1 Kusung-dong, Yusung-gu, Taejon 305-701, Korea, and Department of Material Science, Himeji Institute of Technology, 1479-1 Kanaji, Kamigohri, Hyogo 678-12, Japan
| | - Inosuke Koyano
- Department of Chemistry, Chungnam National University, Taejon 305-764, Korea, and Center for Molecular Science, 373-1 Kusung-dong, Yusung-gu, Taejon 305-701, Korea, and Department of Material Science, Himeji Institute of Technology, 1479-1 Kanaji, Kamigohri, Hyogo 678-12, Japan
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Boo BH, Liu Z, Lee SY, Koyano I. Dissociative Multiple Ionization following Valence, Br(3d), and Si(2p) Inner Shell Photoexcitation of SiBr4 in the Range of 30−133 eV. J Phys Chem A 1998. [DOI: 10.1021/jp982313a] [Citation(s) in RCA: 9] [Impact Index Per Article: 0.3] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/30/2022]
Affiliation(s)
- Bong Hyun Boo
- Department of Chemistry, Chungnam National University, Taejon 305-764, Korea, and Center for Molecular Science, 373-1 Kusung-dong, Yusung-gu, Taejon 305-701, Korea; Department of Industrial Chemistry, Kyungpook National University, Taegu 702-701, Korea; and Department of Material Science, Himeji Institute of Technology, 1479-1 Kanaji, Kamigohri, Hyogo 678-12, Japan
| | - Zhaoyang Liu
- Department of Chemistry, Chungnam National University, Taejon 305-764, Korea, and Center for Molecular Science, 373-1 Kusung-dong, Yusung-gu, Taejon 305-701, Korea; Department of Industrial Chemistry, Kyungpook National University, Taegu 702-701, Korea; and Department of Material Science, Himeji Institute of Technology, 1479-1 Kanaji, Kamigohri, Hyogo 678-12, Japan
| | - Sang Yeon Lee
- Department of Chemistry, Chungnam National University, Taejon 305-764, Korea, and Center for Molecular Science, 373-1 Kusung-dong, Yusung-gu, Taejon 305-701, Korea; Department of Industrial Chemistry, Kyungpook National University, Taegu 702-701, Korea; and Department of Material Science, Himeji Institute of Technology, 1479-1 Kanaji, Kamigohri, Hyogo 678-12, Japan
| | - Inosuke Koyano
- Department of Chemistry, Chungnam National University, Taejon 305-764, Korea, and Center for Molecular Science, 373-1 Kusung-dong, Yusung-gu, Taejon 305-701, Korea; Department of Industrial Chemistry, Kyungpook National University, Taegu 702-701, Korea; and Department of Material Science, Himeji Institute of Technology, 1479-1 Kanaji, Kamigohri, Hyogo 678-12, Japan
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6
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Nagaoka S, Ohshita J, Ishikawa M, Takano K, Nagashima U, Takeuchi T, Koyano I. Site‐specific fragmentation following Si:2pcore‐level photoexcitation of F3SiCH2Si(CH3)3in the vapor phase. J Chem Phys 1995. [DOI: 10.1063/1.469342] [Citation(s) in RCA: 26] [Impact Index Per Article: 0.9] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/14/2022] Open
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7
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Ibuki T, Imamura T, Koyano I, Masuoka T, Brion CE. Dissociation of doubly charged CH2=CD2 and CH2=CF2 in the region of valence shell photoexcitation. J Chem Phys 1993. [DOI: 10.1063/1.464118] [Citation(s) in RCA: 11] [Impact Index Per Article: 0.4] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/14/2022] Open
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8
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Guo X, Cooper G, Chan WF, Burton GR, Brion C. Absolute oscillator strengths for the photoabsorption, photoionization and ionic photofragmentation of silicon tetrafluoride. I. The valence shell. Chem Phys 1992. [DOI: 10.1016/0301-0104(92)80161-n] [Citation(s) in RCA: 54] [Impact Index Per Article: 1.7] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/16/2022]
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9
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Guo Z, Cooper G, Chan WF, Burton GR, Brion C. Absolute oscillator strengths for the photoabsorption, photoionization and ionic photofragmentation of silicon tetrafluride. II. The Si 2p and 2s inner shells. Chem Phys 1992. [DOI: 10.1016/0301-0104(92)80162-o] [Citation(s) in RCA: 25] [Impact Index Per Article: 0.8] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/15/2022]
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10
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Core level photoionization mass spectroscopy of the fluoromethylsilanes, Si(CH3)xF4-x (x = 0–4), around the Si 2p ionization edges. Chem Phys 1991. [DOI: 10.1016/0301-0104(91)87065-4] [Citation(s) in RCA: 12] [Impact Index Per Article: 0.4] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/18/2022]
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11
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Imamura T, Brion CE, Koyano I, Ibuki T, Masuoka T. Dissociative single, double, and triple photoionization of silicon tetrafluoride in the valence shell and silicon 2p regions (hν=33–133 eV). J Chem Phys 1991. [DOI: 10.1063/1.460579] [Citation(s) in RCA: 33] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/14/2022] Open
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12
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Rosenberg RA, Wen C, Tan K, Chen J. Production of excited neutral and ionic photofragments following core‐level excitation in molecules. J Chem Phys 1990. [DOI: 10.1063/1.458554] [Citation(s) in RCA: 23] [Impact Index Per Article: 0.7] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/14/2022] Open
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13
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de Souza GGB, Morin P, Nenner I. Relaxation processes following excitation and ionization of SiF4in the vicinity of the silicon 2pthreshold. I. Electronic relaxation processes. J Chem Phys 1989. [DOI: 10.1063/1.456235] [Citation(s) in RCA: 40] [Impact Index Per Article: 1.1] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/15/2022] Open
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