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For: Liddle JA, Hoskins BD, Vladár AE, Villarrubia JS. Electron beam-based metrology after CMOS. APL Mater 2018;6:10.1063/1.5038249. [PMID: 30984475 PMCID: PMC6459207 DOI: 10.1063/1.5038249] [Citation(s) in RCA: 2] [Impact Index Per Article: 0.3] [Reference Citation Analysis] [What about the content of this article? (0)] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/14/2023]
Number Cited by Other Article(s)
1
Salvat-Pujol F, Villarrubia JS. Conventional vs. model-based measurement of patterned line widths from scanning electron microscopy profiles. Ultramicroscopy 2019;206:112819. [PMID: 31421625 PMCID: PMC6858966 DOI: 10.1016/j.ultramic.2019.112819] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.2] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 05/08/2019] [Revised: 07/26/2019] [Accepted: 07/29/2019] [Indexed: 11/28/2022]
2
Orji NG, Badaroglu M, Barnes BM, Beitia C, Bunday BD, Celano U, Kline RJ, Neisser M, Obeng Y, Vladar AE. Metrology for the next generation of semiconductor devices. NATURE ELECTRONICS 2018;1:10.1038/s41928-018-0150-9. [PMID: 31276101 PMCID: PMC6605074 DOI: 10.1038/s41928-018-0150-9] [Citation(s) in RCA: 96] [Impact Index Per Article: 16.0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 07/15/2018] [Accepted: 08/21/2018] [Indexed: 05/02/2023]
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