Plasma characterization of a microwave discharge ion source with mirror magnetic field configuration

Spectroscopic evaluation of vibrational temperature and electron density in reduced pressure radio frequency nitrogen plasma

Abstract

The optical emission spectroscopy technique is used to determine the vibrational temperature of the second positive band system,$$ N_{2} (C,\upsilon^{^{\prime}} - B,\upsilon^{^{\prime\prime}}$$ N 2 ( C , υ ′ - B , υ ″ ) in the wavelength range 367.1–380.5 nm by using the line-ratio and Boltzmann plot methods. The electron temperature is evaluated from the intensity ratio of the selected molecular bands corresponding to $$N_{2}^{ + } (B,\upsilon - X, \upsilon^{^{\prime}} , $$ N 2 + ( B , υ - X , υ ′ , 391.44 nm), and, $$N_{2} (C,\upsilon^{^{\prime}} - B,\upsilon^{^{\prime\prime}}$$ N 2 ( C , υ ′ - B , υ ″ , 375.4 nm) transitions, respectively. The selected bands have a different threshold of excitation energies and thus serve as a sensitive indicator of the electron energy distribution function (EEDF). The electron density has been determined from the intensity ratio of the molecular transitions corresponding to $$N_{2}^{ + } (B,\upsilon - X, \upsilon^{^{\prime}} , $$ N 2 + ( B , υ - X , υ ′ , 391.44 nm), and, $$ N_{2} (C,\upsilon^{^{\prime}} - B,\upsilon^{^{\prime\prime}}$$ N 2 ( C , υ ′ - B , υ ″ , 380.5 nm) for different levels of pressure and radio frequency power. The results show that the vibrational temperature decreases with increasing nitrogen fill pressure and radio frequency power. However, the electron temperature increases with radio frequency power and reduces with fill pressure. The electron density increases both with nitrogen fill pressure and radio frequency power that attributes to the effective collisional transfer of energy producing electron impact ionization. Plasma parameters show a significant dependence on discharge conditions and can be fine-tuned for specific surface treatments.

Article Highlights

Design and development of a compact ion implanter and plasma diagnosis facility based on a 2.45 GHz microwave ion source

A project on developing a 2.45 GHz microwave ion source based compact ion implanter and plasma diagnostic facility has been taken up by the Central University of Punjab, Bathinda. It consists of a double-wall ECR plasma cavity, a four-step ridge waveguide, an extraction system, and an experimental beam chamber. The mechanical design has been carried out in such a way that both types of experiments, plasma diagnosis and ion implantation, can be easily accommodated simultaneously and separately. To optimize microwave coupling to the ECR plasma cavity, a four-step ridge waveguide is designed. Microwave coupling simulation for the ECR plasma cavity has been performed at different power inputs using COMSOL Multiphysics. An enhanced electric field profile has been obtained at the center of the ECR plasma cavity with the help of a four-step ridge waveguide compared to the WR284 waveguide. The magnetic field distribution for two magnetic rings and the extraction system's focusing properties have been simulated using the computer simulation technique. A tunable axial magnetic field profile has been obtained with a two permanent magnetic ring arrangement. The dependency of the beam emittance and beam current on accelerating voltages up to 50 kV has been simulated with different ions. It shows that ion masses have a great impact on the beam emittance and output current. This facility has provision for in situ plasma diagnosis using a Langmuir probe and optical emission spectroscopy setups. This system will be used for ion implantation, surface patterning, and studies of basic plasma sciences.