Spectroscopic imaging of surfaces-Sum frequency generation microscopy (SFGM) combined with compressive sensing (CS) technique

Integration of conventional surface science techniques with surface-sensitive azimuthal and polarization dependent femtosecond-resolved sum frequency generation spectroscopy

Experimental insight into the elementary processes underlying charge transfer across interfaces has blossomed with the wide-spread availability of ultra-high vacuum (UHV) setups that allow the preparation and characterization of solid surfaces with well-defined molecular adsorbates over a wide range of temperatures. Within the last 15 years, such insights have extended to charge transfer heterostructures containing solids overlain by one or more atomically thin two dimensional materials. Such systems are of wide potential interest both because they appear to offer a path to separate surface reactivity from bulk chemical properties and because some offer completely novel physics, unrealizable in bulk three dimensional solids. Thick layers of molecular adsorbates or heterostructures of 2D materials generally preclude the use of electrons or atoms as probes. However, with linear photon-in/photon-out techniques, it is often challenging to assign the observed optical response to a particular portion of the interface. We and prior workers have demonstrated that by full characterization of the symmetry of the second order nonlinear optical susceptibility, i.e., the χ(2), in sum frequency generation (SFG) spectroscopy, this problem can be overcome. Here, we describe an UHV system built to allow conventional UHV sample preparation and characterization, femtosecond and polarization resolved SFG spectroscopy, the azimuthal sample rotation necessary to fully describe χ(2) symmetry, and sufficient stability to allow scanning SFG microscopy. We demonstrate these capabilities in proof-of-principle measurements on CO adsorbed on Pt(111) and on the clean Ag(111) surface. Because this setup allows both full characterization of the nonlinear susceptibility and the temperature control and sample preparation/characterization of conventional UHV setups, we expect it to be of great utility in the investigation of both the basic physics and applications of solid, 2D material heterostructures.

Unraveling the structure-property relationship of a chalcone-based push-pull molecule for optical limiting application in high-powered laser

In this work, the optical limiting response of a highly π-conjugated push-pull chalcone derivative (2E)-3-(2,3-dimethoxyphenyl)-1-(3-nitrophenyl)prop-2-en-1-one (abbreviated as 3DPNP) has been investigated. The structure-property relationship of 3DPNP was explored through spectroscopic investigation and quantum chemical computations. The existence of weak-non-covalent interactions and charge transfer species that responsible for the chemical stability of 3DPNP were studied by AIM and NBO analyses. The quantitative and qualitative analysis of vibrational and electronic contribution to non-linear optical (NLO) response of 3DPNP were discussed in detail. The normal vibrational modes associated with a change in the dipole moment, polarizability, first- and second-order hyperpolarizabilities of 3DPNP were identified using DFT calculations followed by potential energy distribution (PED) analysis using Gaussian 09 W software and Gar2ped program, respectively. The changes in the NLO parameters with respect to the varying frequencies and electric dipole fields were studied. The abrupt changes in the NLO properties were noticed when the frequency doubled, confirming the second harmonic generation (SHG) efficiency of 3DPNP. From the non-linear absorption and refraction studies through the z-scan experiment, the optical limiting threshold value of 3DPNP is determined to be 3.26 kJ/cm2, which shows the suitability of the material for optical limiting applications in the continuous wave (CW) laser regime.

Focus-engineered sub-diffraction imaging in infrared-sensitive third-order sum frequency generation microscope

We experimentally demonstrate sub-diffraction imaging in infrared-sensitive third-order sum frequency generation (TSFG) microscope using focal-field engineering technique. The TSFG interaction studied here makes use of two mid infrared photons and a single 1040 nm pump photon to generate up-converted visible photons. Focal field engineering scheme is implemented using a Toraldo-style single annular phase mask imprinted on the 1040 nm beam using a spatial light modulator. The effect of focal field engineered excitation beam on the non-resonant-TSFG process is studied by imaging isolated silicon sub-micron disks and periodic grating structures. Maximum reduction in the measured TSFG central-lobe size by ∼43% with energy in the central lobe of 35% is observed in the presence of phase mask. Maximum contrast improvement of 30% is observed for periodic grating structures. Furthermore, to validate the infrared sensitivity of the focus engineered TSFG microscope, we demonstrate imaging of amorphous Germanium-based guided-mode resonance structures, and polystyrene latex beads probed near the O-H vibrational region. We also demonstrate the utility of the focus engineered TSFG microscope for high resolution imaging of two-dimensional layered material. Focus-engineered TSFG process is a promising imaging modality that combines infrared selectivity with improved resolution and contrast, making it suitable for nanostructure and surface layer imaging.