The electronic properties of silicon nitride

Better band gaps for wide-gap semiconductors from a locally corrected exchange-correlation potential that nearly eliminates self-interaction errors

This work constitutes a comprehensive and improved account of electronic-structure and mechanical properties of silicon-nitride ([Formula: see text] [Formula: see text]) polymorphs via van Leeuwen and Baerends (LB) exchange-corrected local density approximation (LDA) that enforces the exact exchange potential asymptotic behavior. The calculated lattice constant, bulk modulus, and electronic band structure of [Formula: see text] [Formula: see text] polymorphs are in good agreement with experimental results. We also show that, for a single electron in a hydrogen atom, spherical well, or harmonic oscillator, the LB-corrected LDA reduces the (self-interaction) error to exact total energy to  ∼10%, a factor of three to four lower than standard LDA, due to a dramatically improved representation of the exchange-potential.

Controllable immobilization of polyacrylamide onto glass slide: synthesis and characterization

A novel route was introduced to synthesize dense polyacrylamide (PAM) onto the glass slide surface. To investigate the surface chemistry of the PAM on the glass slides, X-ray photoelectron spectroscopy (XPS) was utilized to obtain detailed chemical state information on the PAM layer constituents. The XPS peak data were consistent with the presented model of the PAM on the glass slide surface. Scanning electron microscopy and atomic force microscope data indicated the presence of PAM on the glass slides, which consist of nodules. The results showed that PAM was successfully immobilized onto glass slides with a two-tier structure under aqueous condition and a monolayer structure under anhydrous condition. Compared with those under aqueous condition, the controllability of the molecular layer on glass slides and the reproducibility under anhydrous condition were much better, which makes anhydrous condition an advisable condition for the study of the reaction mechanisms of glass slides modified by PAM.

Interfacial Electronic Structure and Full Spectral Hamaker Constants of Si3N4 Intergranular Films from VUV and Sr-Veel Spectroscopy

The interfacial electronic structure, presented as the interband transition strength Jcv(ω) of the interatomic bonds, can be determined by Kramers Kronig (KK) analysis of vacuum ultraviolet (VUV) reflectance or spatially resolved valence electron energy loss (SR-VEEL) spectra. For the wetted interfaces in Si3N4, equilibrium thin glass films are formed whose thickness is determined by a force balance between attractive and repulsive force terms. KK analysis of Jcv(ω) to yield ξ(ξ) for the phases present, permits the direct calculation of the configuration-dependent Hamaker constants for the attractive vdW forces from the interfacial electronic structure.

Interband transition strengths and full spectral Hamaker constants for Si3N4 samples containing a SiYA1ON glass have been determined using SR-VEELS from grains and grain boundaries and compared with results from bulk VUV spectroscopy on separate samples of glass and nitride. The At2, Hamaker constant for Si3N4 with glass of the bulk composition is 8 zJ (zJ = 10−21 J) from the more established optical method. The EELS method permits the determination of vdW forces based upon actual local compositions and structure, which may differ noticeably from bulk standards. Current results show that full spectral Hamaker constants determined from VUV and SR-VEEL measurements of uniform bulk samples agree, but care must be taken in the single scattering and zero loss subtraction corrections, and more work is ongoing in this area. Still the results show that for the grain boundary films present in these polycrystalline Si3N4 samples the glass composition is of lower index of refraction. This can arise from increased oxygen content in the intergranular glass and leads to an increased value of the Hamaker constant (24 zJ) determined in situ from the SR-VEELS of a particular grain boundary film.

Global and local charge trapping in carbon nanotube field-effect transistors

The influences of trapped charges on carrier transport in carbon nanotubes (CNTs) are studied using CNT field-effect transistors with a partial top-gate and a global back-gate. Trapped charges induced by the global back-gate voltage sweeping (± 20 V) promote the device from 'ON' states to near 'OFF' states at zero gate voltage. The channel conductance and field-effect mobility of the device are significantly affected by the pre-trapped charges induced by global back-gate voltage pulses. When the partial top-gate is swept, the pre-trapped charges induced by the global back-gate voltage pulses change the conduction type of the device. In contrast, the pre-trapped charges induced by the partial top-gate voltage pulses could force the device to the 'ON' or 'OFF' state during the top-gate sweeping (± 4 V).

Structure determination of the Si3N4/Si(111)- (8 x 8) surface: a combined study of Kikuchi electron holography, scanning tunneling microscopy, and ab initio calculations

A comprehensive atomic model for the reconstructed surface of Si3N4 thin layer grown on Si(111) is presented. Kikuchi electron holography images clearly show the existence of adatoms on the Si3N4(0001)/Si(111)-(8x8) surface. Compared with the ab initio calculations, more than 30 symmetry-inequivalent atomic pairs in the outmost layers are successfully identified. Scanning tunneling microscopy (STM) images show diamond-shaped unit cells and nine adatoms in each cell. High-resolution STM images reveal extra features and are in good agreement with the partial charge density distribution obtained from total-energy calculations.