Exposure Characteristics of Nanoparticles as Process By-products for the Semiconductor Manufacturing Industry

Interaction, transformation and toxicity assessment of particles and additives used in the semiconducting industry

Chemical mechanical planarization (CMP) is a widely used technique for the manufacturing of integrated circuit chips in the semiconductor industry. The process generates large amounts of waste containing engineered particles, chemical additives, and chemo-mechanically removed compounds. The environmental and health effects associated with the release of CMP materials are largely unknown and have recently become of significant concern. Using a zebrafish embryo assay, we established toxicity profiles of individual CMP particle abrasives (SiO₂ and CeO₂), chemical additives (hydrogen peroxide, proline, glycine, nicotinic acid, and benzotriazole), as well as three model representative slurries and their resulting waste. These materials were characterized before and after use in a typical CMP process in order to assess changes that may affect their toxicological profile and alter their surface chemistry due to polishing. Toxicity outcome in zebrafish is discussed in relation with the physicochemical characteristics of the abrasive particles and with the type and concentration profile of the slurry components pre and post-polishing, as well as the interactions between particle abrasives and additives. This work provides toxicological information of realistic CMP slurries and their polishing waste, and can be used as a guideline to predict the impact of these materials in the environment.

Pro-Inflammatory and Pro-Fibrogenic Effects of Ionic and Particulate Arsenide and Indium-Containing Semiconductor Materials in the Murine Lung

We have recently shown that the toxicological potential of GaAs and InAs particulates in cells is size- and dissolution-dependent, tending to be more pronounced for nano- vs micron-sized particles. Whether the size-dependent dissolution and shedding of ionic III-V materials also apply to pulmonary exposure is unclear. While it has been demonstrated that micron-sized III-V particles, such as GaAs and InAs, are capable of inducing hazardous pulmonary effects in an occupational setting as well as in animal studies, the effect of submicron particles (e.g., the removal of asperities during processing of semiconductor wafers) is unclear. We used cytokine profiling to compare the pro-inflammatory effects of micron- and nanoscale GaAs and InAs particulates in cells as well as the murine lung 40 h and 21 days after oropharyngeal aspiration. Use of cytokine array technology in macrophage and epithelial cell cultures demonstrated a proportionally higher increase in the levels of matrix metalloproteinase inducer (EMMPRIN), macrophage migration inhibitory factor (MIF), and interleukin 1β (IL-1β) by nanosized (n) GaAs and n-InAs as well as As(III). n-GaAs and n-InAs also triggered higher neutrophil counts in the bronchoalveolar lavage fluid (BALF) of mice than micronscale particles 40 h post-aspiration, along with increased production of EMMPRIN and MIF. In contrast, in animals sacrificed 21 days after exposure, only n-InAs induced fibrotic lung changes as determined by increased lung collagen as well as increased levels of TGF-β1 and PDGF-AA in the BALF. A similar trend was seen for EMMPRIN and matrix metallopeptidase (MMP-9) levels in the BALF. Nano- and micron-GaAs had negligible subacute effects. Importantly, the difference between the 40 h and 21 days data appears to be biopersistence of n-InAs, as demonstrated by ICP-OES analysis of lung tissue. Interestingly, an ionic form of In, InCl₃, also showed pro-fibrogenic effects due to the formation of insoluble In(OH)₃ nanostructures. All considered, these data indicate that while nanoscale particles exhibit increased pro-inflammatory effects in the lung, most effects are transient, except for n-InAs and insoluble InCl₃ species that are biopersistent and trigger pro-fibrotic effects. These results are of potential importance for the understanding the occupational health effects of III-V particulates.

Characterization and exposure measurement for indium oxide nanofibers generated as byproducts in the LED manufacturing environment

This article aimed to elucidate the physicochemical characteristics and exposure concentration of powder and airborne particles as byproducts generated from indium tin oxide thin film process by an electron beam evaporation method during maintenance in light-emitting diode manufacturing environment. The chemical composition, size, shape, and crystal structure of powder and airborne particles as byproducts were investigated using a scanning electron microscope equipped with energy dispersive spectrometer, and an X-ray diffractometer. The number and mass concentration measurements of airborne particles were performed by using an optical particle counter of direct-reading aerosol monitor and an inductively coupled plasma-mass spectrometry after sampling, respectively. The airborne particles are composed of oxygen and indium. On the other hand, the powder byproducts consist mostly of oxygen and indium, but tin was found as a minor component. The shapes of the airborne and powder byproducts were fiber type. The length and diameter of fibrous particles were approximately 500-2,000 nm and 30-50 nm, respectively. The powder byproducts indicated indium oxide nanofibers with a rhombohedral structure. On the other hand, the indium oxide used as a source material in the preparation of ITO target showed spherical morphology with a body-centered cubic structure, and it was the same as that of the pure crystalline indium oxide powder. During maintenance, the number concentrations ranged from 350-75,693 particles/ft(3), and arithmetic mean±standard deviation and geometric mean±geometric standard deviation were 11,624±15,547 and 4,846±4.12 particles/ft(3), respectively. Meanwhile, under the same conditions, the airborne mass concentrations of the indium based on respirable particle size (3.5 µm cut-point 50%) were 0.09-0.19 µg/m(3). Physicochemical characteristics of nanoparticle can affect toxicity so the fact that shape and crystal structure have changed is important. Thus, nanoparticle occupational toxicology greatly needs observations like this.