Influence of the molecular weight and imprint conditions on the formation of capillary bridges in nanoimprint lithography

The implementation of thermal and UV nanoimprint lithography for selective area epitaxy

Semiconductor nanowires (NWs) in horizontal configuration could provide a path for scalable NW-based devices. Bottom-up large-scale manufacturing of these nanostructures by selective area epitaxy (SAE) relies on precise nanopatterning of various shapes on the growth masks. Electron beam lithography offers an extraordinary accuracy suited for the purpose. However, this technique is not economically viable for large production as it has a low throughput and requires high investment and operational costs. Nanoimprint lithography (NIL) has the potential to reduce fabrication time and costs significantly while requiring less sophisticated equipment. In this work, we utilize both thermal and UV NIL for patterning substrates for SAE, elucidating the advantages and disadvantages of each lithography technique. We demonstrate the epitaxial growth of Ge and GaAs NWs on these substrates, where we observe high-quality mono-crystalline structures. Even though both processes can produce small uniform structures suitable for SAE, our results show that UV NIL proves to be superior and enables reliable and efficient patterning of sub-100 nm mask features at the wafer scale.

Guiding Chart for Initial Layer Choice with Nanoimprint Lithography

When nanoimprint serves as a lithography process, it is most attractive for the ability to overcome the typical residual layer remaining without the need for etching. Then, 'partial cavity filling' is an efficient strategy to provide a negligible residual layer. However, this strategy requires an adequate choice of the initial layer thickness to work without defects. To promote the application of this strategy we provide a 'guiding chart' for initial layer choice. Due to volume conservation of the imprint polymer this guiding chart has to consider the geometric parameters of the stamp, where the polymer fills the cavities only up to a certain height, building a meniscus at its top. Furthermore, defects that may develop during the imprint due to some instability of the polymer within the cavity have to be avoided; with nanoimprint, the main instabilities are caused by van der Waals forces, temperature gradients, and electrostatic fields. Moreover, practical aspects such as a minimum polymer height required for a subsequent etching of the substrate come into play. With periodic stamp structures the guiding chart provided will indicate a window for defect-free processing considering all these limitations. As some of the relevant factors are system-specific, the user has to construct his own guiding chart in praxis, tailor-made to his particular imprint situation. To facilitate this task, all theoretical results required are presented in a graphical form, so that the quantities required can simply be read from these graphs. By means of examples, the implications of the guiding chart with respect to the choice of the initial layer are discussed with typical imprint scenarios, nanoimprint at room temperature, at elevated temperature, and under electrostatic forces. With periodic structures, the guiding chart represents a powerful and straightforward tool to avoid defects in praxis, without in-depth knowledge of the underlying physics.

RAFT miniemulsion polymerisation of benzyl methacrylate using non-ionic surfactant

RAFT miniemulsion polymerisation of benzyl methacrylate using a non-ionic surfactant affords latexes with controllable molar mass, narrow molar mass distributions and tuneable particle diameter.

Brillouin spectroscopy studies of two-component polymerizable liquid system: 2,2-bis[4-(2-hydroxymethacryloxypropoxy)phenyl]propane/benzyl methacrylate

Brillouin spectroscopy was used to investigate viscoelastic properties of a two-component system consisting of a high viscosity liquid (HVL) and a low viscosity liquid (LVL), both able to polymerize. The model liquids were: 2,2-bis[4-(2-hydroxymethacryloxypropoxy)phenyl]propane (abbreviated as bis-GMA, HVL) and benzyl methacrylate (BzMA, LVL). The viscosity of the system was regulated by changing the monomer ratio. Hypersonic velocity and attenuation coefficient were investigated in a temperature range covering viscoelastic relaxation process. The dependence of the longitudinal viscosity on the system composition was determined. Additionally, the Brillouin studies were accompanied by some supplementary experimental methods, like low frequency shear viscosity measurements and observations of phase transitions by differential scanning calorimetry (DSC). The investigated monomer mixtures were then polymerized in a light-induced process and the polymerization kinetic curves were measured to find the possible correlation between the viscoelastic properties of the monomer mixture (as observed by Brillouin spectroscopy) and the polymerization course.

3D visualization of mold filling stages in thermal nanoimprint by white light interferometry and atomic force microscopy

A method for continuous 3D visualization of the mold filling at a microscopic level during a thermoplastic nanoimprint process was developed. It is based on superposition of micrographs of a series of different stages of imprint. It was applied to two common 3D microscopies with different resolution limitations. Due to advanced image processing, the animated movie sequence, available as supplementary multimedia information in the online version of this journal, gives an unprecedented insight into the complex polymer flow and shows how voids are forming and vanishing during the imprint process around micropillars. The method has advantages over current real-time methods and can be used as an analytical tool for optimization of processes and improvement of stamp design down to the sub-10 nm nanometer range.