Wong PS, Liang BL, Tatebayashi J, Xue L, Nuntawong N, Kutty MN, Brueck SRJ, Huffaker DL. Fabrication and characteristics of broad-area light-emitting diode based on nanopatterned quantum dots.
NANOTECHNOLOGY 2009;
20:035302. [PMID:
19417291 DOI:
10.1088/0957-4484/20/3/035302]
[Citation(s) in RCA: 1] [Impact Index Per Article: 0.1] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/27/2023]
Abstract
The device fabrication and integration of nanopatterned quantum dots (PQDs) are realized through the demonstration of a broad-area light-emitting diode with PQD active region. The device involves two growth processes, first to form PQDs by selective-area epitaxy on an SiO(2) mask and then to complete the device structure after mask removal. Linear current-voltage characteristics are observed with sharp turn-on, low leakage current and low forward resistance. Electroluminescence spectra show PQD intraband structure and low quenching of emission from 77 K to room temperature. Light-current measurements demonstrate external quantum efficiency per PQD comparable to self-assembled QDs, thus providing a possible route toward individually addressable single QD devices.
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