Deformation of nanostructures on polymer molds during soft UV nanoimprint lithography

Soft thermal nanoimprint with a 10 nm feature size

Nanoimprinting with rigid molds offers almost unlimited pattern resolution, but it suffers from high sensitivity to defects, and is limited to pattering flat surfaces. These limitations can be addressed by nanoimprinting with soft molds. However, soft molds have been used so far with UV resists, and could not achieve a resolution and minimal feature size comparable to those of rigid molds. Here, we explore the miniaturization edge of soft nanoimprint molds, and demonstrate their compatibility with thermal imprint resists. To that end, we produced a pattern with 10 nm critical dimensions, using electron beam lithography, and used it to replicate nanoimprint molds by direct casting of an elastomer onto the patterned resist. We showed that the produced pattern can be faithfully transferred from the mold by thermal nanoimprinting. In addition, we showed that similar nanoimprint molds can also be produced by double replication, which includes nanoimprinting of a thermal resist with an ultrahigh resolution rigid mold, and replication of a soft mold from the imprint pattern. We also demonstrated our novel nanoimprinting approach in two unconventional applications: nanopatterning of a thermal resist on a lens surface, and direct nanoimprinting of chalcogenide glass. Our novel nanoimprint approach pushes the envelope of standard nanofabrication, and demonstrates its potential for numerous applications impossible up to now.

Selection of UV-resins for nanostructured molds for thermal-NIL

Nanoimprint molds made of soft polymeric materials have advantages of low demolding force and low fabrication cost over Si or metal-based hard molds. However, such advantages are often sacrificed by their reduced replication fidelity associated with the low mechanical strength. In this paper, we studied replication fidelity of different UV-resin molds copied from a Si master mold via UV nanoimprint lithography (NIL) and their thermal imprinting performance into a thermoplastic polymer. Four different UV-resins were studied: two were high surface energy UV-resins based on tripropyleneglycol diacrylate (TPGDA resin) and polypropyleneglycol diacrylate (PPGDA resin), and the other two were commercially available, low surface energy poly-urethane acrylate (PUA resin) and fluorine-containing (MD 700) UV-resins. The replication fidelity among the four UV-resins during UV nanoimprint lithograph from a Si master with sharp nanostructures was in the increasing order of (poorest) PUA resin < MD 700 < PPGDA resin < TPGDA resin (best). The results show that the high surface energy and small monomer size are keys to achieving good UV-resin filling into sharp nanostructures over the viscosity of the resin solution. When the four UV-resin molds were used for thermal-NIL into a thermoplastic polymer, the replication fidelity was in the increasing order of (poorest) MD 700 < TPGDA resin < PUA resin (best), which follows the same order of their Young's moduli. Our results indicate that the selection of an appropriate UV-resin for NIL molds requires consideration of the replication fidelities in the mold fabrication and the subsequent thermal-NIL into thermoplastic polymers.

Recent Progress of Imprinted Polymer Photonic Waveguide Devices and Applications

Polymers are promising materials for fabricating photonic integrated waveguide devices. Versatile functional devices can be manufactured using a simple process, with low cost and potential mass-manufacturing. This paper reviews the recent progress of polymer photonic integrated devices fabricated using the UV imprinting technique. The passive polymer waveguide devices for wavelength filtering, power splitting, and light collecting, and the active polymer waveguide devices based on the thermal-optic tuning effect, are introduced. Then, the electro-optic (EO) modulators, by virtue of the high EO coefficient of polymers, are described. Finally, the photonic biosensors, which are based on low-cost and biocompatible polymer platforms, are presented.

Micro-to-nano scale filling behavior of PMMA during imprinting

The filling behavior of polymers in narrow gaps or small pores is important for the dynamics of polymeric micro/nanostructure fabrication. Here, the filling behavior, the mechanical properties, and the stress versus strain relationship of 996 kD poly (methyl methacrylate) (PMMA) at a scale from micron to molecular confinement are measured. It has been found that the solid polymer exhibits elastic-plastic dominant deformation behavior at micron scale. As the scale reduces to submicron, the resistance to deformation of the polymeric solid has a pronounced reduction. A softening effect and the visco-dominant behavior which is always exhibited by melt flow is observed. In confinement conditions, an anomalous hardening effect is found. The modulus and the hardness of 996 kD PMMA have been found to increase dramatically. The stress-strain curve also exhibits an obvious hardening phenomenon which is contrary to the conventional shear thinning and deformation acceleration results. The results of this paper show that the PMMA can exhibit a change of “solid-fluid-solid” in mechanical character at micron to molecular confinement scale.

Effect of the molecular weight on deformation states of the polystyrene film by AFM single scanning

Nanobundles patterns can be formed on the surface of most thermoplastic polymers when the atomic force microscope (AFM)-based nanomechanical machining method is employed to scratch their surfaces. Such patterns are reviewed as three-dimensional sine-wave structures. In the present study, the single-line scratch test is used firstly to study different removal states of the polystyrene (PS) polymer with different molecular weights (MWs). Effects of the scratching direction and the scratching velocity on deformation of the PS film and the state of the removed materials are also investigated. Single-wear box test is then employed to study the possibility of forming bundle structures on PS films with different MWs. The experimental results show that the state between the tip and the sample plays a key role in the nano machining process. If the contact radius between the AFM tip and the polymer surface is larger than the chain end-to-end distance, it is designated as the "cutting" state that means the area of both side ridges is less than the area of the groove and materials are removed. If the contact radius is less than the chain end-to-end distance, it is designated as the "plowing" state that means the area of both side ridges is larger than the area of the groove and no materials are removed at all. For the perfect bundles formation on the PS film, the plowing state is ideal condition for the larger MW polymers because of the chains' entanglement.

Control of cell adhesion and neurite outgrowth by patterned gold nanoparticles with tunable attractive or repulsive surface properties

Guiding of neuronal cells on surfaces is required for the investigation of fundamental aspects of neurobiology, for tissue engineering, and for numerous bioelectronic applications. A modular method to establish nanostructured chemical templates for local deposition of gold nanoparticles is presented. A process comprising nanoimprint lithography, silanization, lift-off, and gold nanoparticle immobilization is used to fabricate the particle patterns. The chemical composition of the surface can be modified by in situ adsorption of cell-binding ligands to locally addressed particles. The versatility of this approach is demonstrated by inverting the binding affinity between rat cortical neurons and nanopatterned surfaces via wet-chemical means and thereby reversing the pattern of guided neurons.

Patterned self-assembly of gold nanoparticles on chemical templates fabricated by soft UV nanoimprint lithography

Chemical templates for the patterned immobilization of gold nanoparticles were fabricated by soft UV nanoimprint lithography. The template structures were fabricated by means of the consecutively performed process steps of nanoimprint lithography, reactive ion etching, chemical functionalization with amino groups, and lift-off of imprint resist. These chemical templates were used for the defined assembly of 20 nm diameter citrate stabilized gold nanoparticles from aqueous solution. By reducing the ionic strength of the solution, one- and zero-dimensional particle assemblies were generated on sub-100-nm template structures. By this means, the pattern resolution predefined by the lithography process could be easily enhanced by dilution of the nanoparticle solution.