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For: Liu Z, Gu X, Hwu J, Sassolini S, Olynick DL. Low-temperature plasma etching of high aspect-ratio densely packed 15 to sub-10 nm silicon features derived from PS-PDMS block copolymer patterns. Nanotechnology 2014;25:285301. [PMID: 24971641 DOI: 10.1088/0957-4484/25/28/285301] [Citation(s) in RCA: 2] [Impact Index Per Article: 0.2] [Reference Citation Analysis] [What about the content of this article? (0)] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/03/2023]
Number Cited by Other Article(s)
1
Böhme S, Arias-Zapata J, Garnier J, Girardot C, Legrain A, Zelsmann M. Annealing treatments of cylindrical siloxane-based block copolymers optimized for nanomanufacturing. MICRO AND NANO ENGINEERING 2018. [DOI: 10.1016/j.mne.2018.10.005] [Citation(s) in RCA: 2] [Impact Index Per Article: 0.3] [Reference Citation Analysis] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 10/28/2022]
2
Smith BD, Patil JJ, Ferralis N, Grossman JC. Catalyst Self-Assembly for Scalable Patterning of Sub 10 nm Ultrahigh Aspect Ratio Nanopores in Silicon. ACS APPLIED MATERIALS & INTERFACES 2016;8:8043-8049. [PMID: 26999295 DOI: 10.1021/acsami.6b01927] [Citation(s) in RCA: 3] [Impact Index Per Article: 0.4] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/05/2023]
3
Bazaka K, Jacob MV, Ostrikov KK. Sustainable Life Cycles of Natural-Precursor-Derived Nanocarbons. Chem Rev 2015;116:163-214. [PMID: 26717047 DOI: 10.1021/acs.chemrev.5b00566] [Citation(s) in RCA: 144] [Impact Index Per Article: 16.0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/29/2022]
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