Highly confined guiding of low-loss plasmon waves in hybrid metal-dielectric slot waveguides

Ultra-Low-Loss Mid-Infrared Plasmonic Waveguides Based on Multilayer Graphene Metamaterials

Manipulating optical signals in the mid-infrared (mid-IR) range is a highly desired task for applications in chemical sensing, thermal imaging, and subwavelength optical waveguiding. To guide highly confined mid-IR light in photonic chips, graphene-based plasmonics capable of breaking the optical diffraction limit offer a promising solution. However, the propagation lengths of these materials are, to date, limited to approximately 10 µm at the working frequency f = 20 THz. In this study, we proposed a waveguide structure consisting of multilayer graphene metamaterials (MLGMTs). The MLGMTs support the fundamental volume plasmon polariton mode by coupling plasmon polaritons at individual graphene sheets over a silicon nano-rib structure. Benefiting from the high conductivity of the MLGMTs, the guided mode shows ultralow loss compared with that of conventional graphene-based plasmonic waveguides at comparable mode sizes. The proposed design demonstrated propagation lengths of approximately 20 µm (four times the current limitations) at an extremely tight mode area of 10⁻⁶A₀, where A₀ is the diffraction-limited mode area. The dependence of modal characteristics on geometry and material parameters are investigated in detail to identify optimal device performance. Moreover, fabrication imperfections are also addressed to evaluate the robustness of the proposed structure. Moreover, the crosstalk between two adjacent present waveguides is also investigated to demonstrate the high mode confinement to realize high-density on-chip devices. The present design offers a potential waveguiding approach for building tunable and large-area photonic integrated circuits.

Ultra-compact electro-optic modulator based on alternative plasmonic material

We propose an ultra-compact electro-optic microring modulator based on a hybrid plasmonic waveguide. In comparison to previously proposed structures, the present structure utilizes aluminum-doped zinc oxide (AZO), rather than noble metals, for plasmon excitation. AZO can be used to simultaneously tune both the real and imaginary parts of the dielectric constant by changing the carrier concentration. The modulation depth and insertion loss of the microring modulator are 18.70 and 2.76 dB. The proposed modulator has a high modulation speed because its capacitance is 0.22 fF. This device could be used in high-density integrated optical circuits.

The Design and Research of a New Hybrid Surface Plasmonic Waveguide Nanolaser

Using the hybrid plasmonic waveguide (HPW) principle as a basis, a new planar symmetric Ag-dielectric-SiO₂ hybrid waveguide structure is designed and applied to nanolasers. First, the effects on the electric field distribution and the characteristic parameters of the waveguide structure of changes in the material, the nanometer radius, and the dielectric layer thickness were studied in detail using the finite element method with COMSOL Multiphysics software. The effects of two different dielectric materials on the HPW were studied. It was found that the waveguide performance could be improved effectively and the mode propagation loss was reduced when graphene was used as the dielectric, with the minimum effective propagation loss reaching 0.025. Second, the gain threshold and the quality factor of a nanolaser based on the proposed hybrid waveguide structure were analyzed. The results showed that the nanolaser has a lasing threshold of 1.76 μm^-1 and a quality factor of 109 when using the graphene dielectric. A low-loss, low-threshold laser was realized, and the mode field was constrained by deep sub-wavelength light confinement. This structure has broad future application prospects in the integrated optics field and provides ideas for the development of subminiature photonic devices and high-density integrated circuits.

The effect of ALD-grown Al₂O₃ on the refractive index sensitivity of CVD gold-coated optical fiber sensors

The combined effect of nanoscale dielectric and metallic layers prepared by atomic layer deposition (ALD) and chemical vapor deposition (CVD) on the refractometric properties of tilted optical fiber Bragg gratings (TFBG) is studied. A high index intermediate layer made up of either 50 nm or 100 nm layers of Al2O3 (refractive index near 1.62) was deposited by ALD and followed by thin gold layers (30-65 nm) deposited from a known single-source gold (I) iminopyrrolidinate CVD precursor. The fabricated devices were immersed in different surrounding refractive indices (SRI) and the spectral transmission response of the TFBGs was measured. Preliminary results indicate that the addition of the dielectric Al2O3 pre-coating enhances the SRI sensitivity by up to 75% but this enhancement is highly dependent on the polarization and dielectric thickness. In fact, the sensitivity decreases by up to 50% for certain cases. These effects are discussed with support from TFBG simulations and models, by quantifying the penetration of the evanescently coupled light out of the fiber through the various coating layers. Additional characterization studies have been carried out on these samples to further correlate the optical behaviour of the coated TFBGs with the physical properties of the gold and Al2O3 layers, using atomic force microscopy x-ray photoelectron spectroscopy and an ensemble of other optical and x-ray absorption spectroscopy techniques. The purity, roughness, and morphology of gold thin films deposited by CVD onto the dielectric-TFBG surface are also provided.