Localized surface plasmon sensing based investigation of nanoscale metal oxidation kinetics

Thermal and Plasmonic Stabilization of Silver Nanostructures Using a Bilayer Anchoring Technique

In this work, we demonstrate how to suppress the shape instability of silver (Ag) nanotriangular pyramids following high-temperature annealing without a coating or encapsulation, thus producing a more stable optical plasmonic system. Nanosphere lithography (NSL) was used to fabricate large-area arrays of nanotriangular pyramids of Ag on glass substrates. By using a combination of morphology and spectroscopic studies it was found that exposure of this system to high temperatures of 473 K and beyond in air led to a rapid change in nanostructure shape, and thus, the surface area, with a substantial change to the original plasmonic character. On the other hand, NSL nanotriangular pyramids made from bilayers of Ag on Co or Co on Ag showed much smaller changes in shape and area following annealing up to 573 K in air. In the case of pure Ag, the NSL nanotriangular pyramid changed into a more spherical shape with an overall decrease of ∼24% in its surface area following annealing at 573 K. This lead to a large blue shift of over ∼287 nm or ∼39% in the location of the dipolar plasmonic resonance. On the other hand, the triangular shape of Ag was retained in both the metal bilayer cases, with much smaller area changes of ∼10 and ∼9%, for the Ag deposit when on Co and when under Co, respectively. Consequently, the plasmonic shifts were substantially smaller, of ∼65 nm or about 9%, in these bilayer systems. The mechanism for this stabilization was attributed to the higher surface energy of Co and much lower diffusivity of Co as well as Ag on Co that resulted in an anchoring of the Ag shape to its original state. The plasmonic quality factor for the bimetal NSL nanotriangular pyramids also showed substantially improved stability over pure Ag, further indicating that this anchoring approach is a viable pathway to produce pristine Ag surfaces for high-temperature plasmonic applications.