Sub-nanometer dimensions control of core/shell nanoparticles prepared by atomic layer deposition

Environmental gas sensors based on electroactive hybrid organic-inorganic nanocomposites using nanostructured materials

Advanced gas sensing devices are urgently demanded in the modern scientific world to control air pollution and protect human life. For this purpose, semiconducting electroactive materials can revolutionize the idea of conventional gas sensors. Chemi-resistive gas sensors based on electroactive hybrid organic-inorganic nanocomposites are incredibly promising gas sensing materials because they possess the advantages of excellent selectivity, high sensitivity, low response time, repeatability, high stability, cost-effectiveness, and simple fabrication techniques, and they can be operated at room temperature. This review emphasizes the recent developments of organic-inorganic hybrid nanocomposite-based electroactive gas sensors, including metal oxide nanocomposites, which are potential gas sensing materials due to the presence of numerous charge carriers. The review also focuses on nanostructured materials of different dimensions, such as semiconducting quantum dots, carbon dots, nanotubes, nanowires, and nanosheets, used for developing these gas sensing compounds and their significance and challenges. Some possible fabrication techniques for developing efficient gas sensors with different morphologies are discussed, with their probable sensing mechanism behind the detection of toxic vapours. Subsequently, a summary and possible outcome of this study, along with the various achievements and prospects in this field, are also discussed.

Crystallinity Effect on Electrical Properties of PEALD-HfO2 Thin Films Prepared by Different Substrate Temperatures

Hafnium oxide (HfO₂) thin film has remarkable physical and chemical properties, which makes it useful for a variety of applications. In this work, HfO₂ films were prepared on silicon through plasma enhanced atomic layer deposition (PEALD) at various substrate temperatures. The growth per cycle, structural, morphology and crystalline properties of HfO₂ films were measured by spectroscopic ellipsometer, grazing-incidence X-ray diffraction (GIXRD), X-ray reflectivity (XRR), field-emission scanning electron microscopy, atomic force microscopy and x-ray photoelectron spectroscopy. The substrate temperature dependent electrical properties of PEALD-HfO₂ films were obtained by capacitance-voltage and current-voltage measurements. GIXRD patterns and XRR investigations show that increasing the substrate temperature improved the crystallinity and density of HfO₂ films. The crystallinity of HfO₂ films has a major effect on electrical properties of the films. HfO₂ thin film deposited at 300 °C possesses the highest dielectric constant and breakdown electric field.

Chemical deposition of Cu2O films with ultra-low resistivity: correlation with the defect landscape

Cuprous oxide (Cu₂O) is a promising p-type semiconductor material for many applications. So far, the lowest resistivity values are obtained for films deposited by physical methods and/or at high temperatures (~1000 °C), limiting their mass integration. Here, Cu₂O thin films with ultra-low resistivity values of 0.4 Ω.cm were deposited at only 260 °C by atmospheric pressure spatial atomic layer deposition, a scalable chemical approach. The carrier concentration (7.10¹⁴−2.10¹⁸ cm⁻³), mobility (1–86 cm²/V.s), and optical bandgap (2.2–2.48 eV) are easily tuned by adjusting the fraction of oxygen used during deposition. The properties of the films are correlated to the defect landscape, as revealed by a combination of techniques (positron annihilation spectroscopy (PAS), Raman spectroscopy and photoluminescence). Our results reveal the existence of large complex defects and the decrease of the overall defect concentration in the films with increasing oxygen fraction used during deposition.

Cu₂O offers a lot of potential for several optoelectronic applications. Here, the authors present a low temperature, fast and scalable approach to deposit Cu₂O films with low resistivity, which is correlated to the defect landscape in the material.

Development of Core-Shell Rh@Pt and Rh@Ir Nanoparticle Thin Film Using Atomic Layer Deposition for HER Electrocatalysis Applications

The efficiency of hydrogen gas generation via electrochemical water splitting has been mostly limited by the availability of electrocatalyst materials that require lower overpotentials during the redox reaction. Noble metals have been used extensively as electrocatalysts due to their high activity and low overpotentials. However, the use of single noble metal electrocatalyst is limited due to atomic aggregation caused by its inherent high surface energy, which results in poor structural stability, and, hence, poor electrocatalytic performance and long-term stability. In addition, using noble metals as electrocatalysts also causes the cost to be unnecessarily high. These limitations in noble metal electrocatalysts could be enhanced by combining two noble metals in a core-shell structure (e.g., Rh@Ir) as a thin film over a base substrate. This could significantly enhance electrocatalytic activity due to the following: (1) the modification of the electronic structure, which increases electrical conductivity; (2) the optimization of the adsorption energy; and (3) the introduction of new active sites in the core-shell noble metal structure. The current state-of-the-art employs physical vapor deposition (PVD) or other deposition techniques to fabricate core-shell noble metals on flat 2D substrates. This method does not allow 3D substrates with high surface areas to be used. In the present work, atomic layer deposition (ALD) was used to fabricate nanoparticle thin films of Rh@Ir and Rh@Pt in a core-shell structure on glassy carbon electrodes. ALD enables the fabrication of nanoparticle thin film on three-dimensional substrates (a 2D functional film on a 3D substrate), resulting in a significantly increased surface area for a catalytic reaction to take place; hence, improving the performance of electrocatalysis. The Rh@Pt (with an overpotential of 139 mV and a Tafel slope of 84.8 mV/dec) and Rh@Ir (with an overpotential of 169 mV and a Tafel slope of 112 mV/dec) core-shell electrocatalyst exhibited a better electrocatalytic performances compared to the single metal Rh electrocatalyst (with an overpotential of 300 mV and a Tafel slope of 190 mV/dec). These represented a 54% and a 44% improvement in performance, respectively, illustrating the advantages of core-shell thin film nanostructures in enhancing the catalytic performance of an electrocatalyst. Both electrocatalysts also exhibited good long-term stability in the harsh acidic electrolyte conditions when subjected to chronopotentiometry studies.

Tunable TiO2-BN-Pd nanofibers by combining electrospinning and atomic layer deposition to enhance photodegradation of acetaminophen

The demand for fresh and clean water sources is increasing globally, and there is a need to develop novel routes to eliminate micropollutants and other harmful species from water. Photocatalysis is a promising alternative green technology that has shown great performance in the degradation of persistent pollutants. Titanium dioxide is the most used catalyst owing to its attractive physico-chemical properties, but this semiconductor presents limitations in the photocatalysis process due to the high band gap and the fast recombination of the photogenerated carriers. Herein, a novel photocatalyst has been developed, based on titanium dioxide nanofibers (TiO₂ NFs) synthesized by electrospinning. The TiO₂ NFs were coated by atomic layer deposition (ALD) to grow boron nitride (BN) and palladium (Pd) on their surface. The UV-Vis spectroscopy measurements confirmed the increase of the band gap and the extension of the spectral response to the visible range. The obtained TiO₂/BN/Pd nanofibers were then tested for photocatalysis, and showed a drastic increase of acetaminophen (ACT) degradation (>90%), compared to only 20% degradation obtained with pure TiO₂ after 4 h of visible light irradiation. The high photocatalytic activity was attributed to the good dispersion of Pd NPs on TiO₂-BN nanofibers, leading to a higher transfer of photoexcited hole carriers and a decrease of photogenerated electron-charge recombination. To confirm its reusability, recycling tests on the hybrid photocatalyst TiO₂/BN/Pd have been performed, showing a good stability over 5 cycles under UV and visible light. In addition, toxicity tests as well as quenching tests were carried out to check the toxicity of the byproducts formed and to determine active species responsible for the degradation. The results presented in this work demonstrate the potential of TiO₂/BN/Pd nanomaterials, and open new prospects for the preparation of tunable photocatalysts.

Inherently Area-Selective Atomic Layer Deposition of Manganese Oxide through Electronegativity-Induced Adsorption

Manganese oxide (MnO_x) shows great potential in the areas of nano-electronics, magnetic devices and so on. Since the characteristics of precise thickness control at the atomic level and self-align lateral patterning, area-selective deposition (ASD) of the MnO_x films can be used in some key steps of nanomanufacturing. In this work, MnO_x films are deposited on Pt, Cu and SiO₂ substrates using Mn(EtCp)₂ and H₂O over a temperature range of 80–215 °C. Inherently area-selective atomic layer deposition (ALD) of MnO_x is successfully achieved on metal/SiO₂ patterns. The selectivity improves with increasing deposition temperature within the ALD window. Moreover, it is demonstrated that with the decrease of electronegativity differences between M (M = Si, Cu and Pt) and O, the chemisorption energy barrier decreases, which affects the initial nucleation rate. The inherent ASD aroused by the electronegativity differences shows a possible method for further development and prediction of ASD processes.

Surface functionalization on nanoparticles via atomic layer deposition

As an ultrathin film preparation method, atomic layer deposition (ALD) has recently found versatile applications in fields beyond semiconductors, such as energy, environment, catalysis and so on. The design, preparation and characterization of thin film applied in the emerging fields have attracted great interests. The development of ALD technique on particles opens up a broad horizon in the advanced nanofabrication. Pioneering applications are exploring conformal coating, porous coating and selective surface modification of nanoparticles. Conformal encapsulation of particles is a major application to protect materials with ultrathin films from being eroded by the external environment while keeping the original properties of the primary particles. Porous coating has been developed to simultaneously expose the particles' surface and provide nanopores, which is another important method that demonstrates its advantages in modification of electrode materials, catalysis and energy applications, etc. Selective ALD takes the method forward in order to precisely control the directionality of decoration sites on the particles and selectively passivate undesired facets, sites, or defects. Such methods provide practical strategies for atomic scale and precise surface functionalization on particles and greatly expand its potential applications.

Combining nanoparticles grown by ALD and MOFs for gas separation and catalysis applications

Supported metallic nanoparticles (NPs) are essential for many important chemical processes. In order to implement precisely tuned NPs in miniaturized devices by compatible processes, novel nanoengineering routes must be explored. Atomic layer deposition (ALD), a scalable vapor phase technology typically used for the deposition of thin films, represents a promising new route for the synthesis of supported metallic NPs. Metal–organic frameworks (MOFs) are a new exciting class of crystalline porous materials that have attracted much attention in the recent years. Since the size of their pores can be precisely adjusted, these nanomaterials permit highly selective separation and catalytic processes. The combination of NPs and MOF is an emerging area opening numbers of applications, which still faces considerable challenges, and new routes need to be explored for the synthesis of these NPs/MOF nanocomposites. The aim of this paper is double: first, it aims to briefly present the ALD route and its use for the synthesis of metallic NPs. Second, the combination of ALD-grown NPs and MOFs has been explored for the synthesis of Pd NPs/MOF ZIF-8, and several selected examples were ALD-grown NPs and MOFs have been combined and applied gas separation and catalysis will be presented.

Atomic layer deposition of Pd nanoparticles on self-supported carbon-Ni/NiO-Pd nanofiber electrodes for electrochemical hydrogen and oxygen evolution reactions

The most critical challenge in hydrogen fuel production is to develop efficient, eco-friendly, low-cost electrocatalysts for water splitting. In this study, self-supported carbon nanofiber (CNF) electrodes decorated with nickel/nickel oxide (Ni/NiO) and palladium (Pd) nanoparticles (NPs) were prepared by combining electrospinning, peroxidation, and thermal carbonation with atomic layer deposition (ALD), and then employed for hydrogen evolution and oxygen evolution reactions (HER/OER). The best CNF-Ni/NiO-Pd electrode displayed the lowest overpotential (63 mV and 1.6 V at j = 10 mA cm^-2), a remarkably small Tafel slope (72 and 272 mV dec^-1), and consequent exchange current density (1.15 and 22.4 mA cm^-2) during HER and OER, respectively. The high chemical stability and improved electrocatalytic performance of the prepared electrodes can be explained by CNF functionalization via Ni/NiO NP encapsulation, the formation of graphitic layers that cover and protect the Ni/NiO NPs from corrosion, and ALD of Pd NPs at the surface of the self-supported CNF-Ni/NiO electrodes.

Surface mobility and impact of precursor dosing during atomic layer deposition of platinum:in situmonitoring of nucleation and island growth

The nucleation rate and diffusion-driven growth of Pt nanoparticles are revealed within situX-ray fluorescence and scattering measurements during ALD: the particle morphology at a certain Pt loading is similar for high and low precursor exposures.

Controlling the growth of single crystal ZnO nanowires by tuning the atomic layer deposition parameters of the ZnO seed layer

Semiconducting nanowires (NWs) offer exciting prospects for a wide range of technological applications. The translation of NW science into technology requires reliable high quality large volume production. This study provides an in-depth investigation of the parameters using an atomic layer deposition system to grow zinc oxide (ZnO) seed layers followed by the chemical bath deposition (CBD) of ZnO NWs to demonstrate the low-cost production of uniform single crystal wurtzite phase ZnO NWs that is scalable to large area substrates. The seed layer texture and the morphology of the NWs grown were systematically investigated using atomic force microscopy as a function of the seed layer deposition parameters. It is shown that the NWs growth orientation can be controlled by tuning the seed layer deposition parameters while maintaining the same CBD conditions. Likewise, the diameters and the surface densities of the NWs varied from 23 to 56 nm and 40 to 327 NWs μm^-2, respectively. Significantly, the relationship between the seed layer structure and the NW density indicates a clear correlation between the density of seed layer surface features and the resulting surface NW density of NWs grown.

Altering the stability of nanoislands through core-shell supports

We follow the decay of two-dimensional Ag nanoclusters, called islands, on Cu-Ag core-shell supports by variable low temperature scanning tunneling microscopy in the temperature range between 160 and 260 K. We reveal two qualitatively different types of decay mechanisms, either linear in time, indicative of an interface-limited decay, or non-linear in time, indicative of diffusion-limited decay. In contrast to conventional decay on monometallic supports, the decay exponent of the diffusion-limited decay depends on temperature; it varies by one order of magnitude. Moreover, the decay rate decreases with increasing temperature. This unusual behaviour is traced back to the temperature-dependent shell of the core-shell support.

Development of a scanning probe microscopy integrated atomic layer deposition system for in situ successive monitoring of thin film growth

A dual chamber system integrated with atomic layer deposition (ALD) and atomic force microscopy (AFM) was developed for the successive monitoring of nanoparticles to thin film growth process. The samples were fabricated in the ALD chamber. A magnetic transmission rod enabled sample transferring between the ALD and the AFM test chambers without breaking the vacuum, avoiding possible surface morphology change when frequently varying the growth condition and oxidation under ambient condition. The sample transmission also avoids deposition and contamination on the AFM tip during the successive testing. The sample stage has machined a group of accurate location pinholes, ensuring the 10 μm² measurement consistency. As a demonstration, the platinum thin films with different thickness were fabricated by varying ALD cycles. The surface morphology was monitored successively during the deposition. Under vacuum with controlled oxygen partial pressure, the aging and sintering phenomenon of particles has been studied in the AFM testing chamber after high temperature treatment. The integrated AFM/ALD instrument is potentially a powerful system for monitoring the thin film preparation and characterization.

Boron Nitride as a Novel Support for Highly Stable Palladium Nanocatalysts by Atomic Layer Deposition

The ability to prepare controllable nanocatalysts is of great interest for many chemical industries. Atomic layer deposition (ALD) is a vapor phase technique enabling the synthesis of conformal thin films and nanoparticles (NPs) on high surface area supports and has become an attractive new route to tailor supported metallic NPs. Virtually all the studies reported, focused on Pd NPs deposited on carbon and oxide surfaces. It is, however, important to focus on emerging catalyst supports such as boron nitride materials, which apart from possessing high thermal and chemical stability, also hold great promises for nanocatalysis applications. Herein, the synthesis of Pd NPs on boron nitride (BN) film substrates is demonstrated entirely by ALD for the first time. X-ray photoelectron spectroscopy indicated that stoichiometric BN formed as the main phase, with a small amount of BNxOy, and that the Pd particles synthesized were metallic. Using extensive transmission electron microscopy analysis, we study the evolution of the highly dispersed NPs as a function of the number of ALD cycles, and the thermal stability of the ALD-prepared Pd/BN catalysts up to 750 °C. The growth and coalescence mechanisms observed are discussed and compared with Pd NPs grown on other surfaces. The results show that the nanostructures of the BN/Pd NPs were relatively stable up to 500 °C. Consequent merging has been observed when annealing the samples at 750 °C, as the NPs' average diameter increased from 8.3 ± 1.2 nm to 31 ± 4 nm. The results presented open up exciting new opportunities in the field of catalysis.

High-Performance Nanowire Hydrogen Sensors by Exploiting the Synergistic Effect of Pd Nanoparticles and Metal-Organic Framework Membranes

Herein, we report the fabrication of hydrogen gas sensors with enhanced sensitivity and excellent selectivity. The sensor device is based on the strategic combination of ZnO nanowires (NWs) decorated with palladium nanoparticles (Pd NPs) and a molecular sieve metal-organic framework (MOF) nanomembrane (ZIF-8). The Pd NPs permit the sensors to reach maximal signal responses, whereas the ZIF-8 overcoat enables for an excellent selectivity. Three steps were employed for the fabrication: (i) coating of a miniaturized sensor with vapor-grown ZnO NWs, (ii) decoration of these NWs with Pd NPs by atomic layer deposition, and (iii) partial solvothermal conversion of the tuned NWs surface to ZIF-8 nanomembrane. The microstructure and composition investigations of the ZIF-8/Pd/ZnO nanostructured materials confirmed the presence of both metallic Pd NPs and uniform ZIF-8 thin membrane layer. The integration of these nanomaterials within a miniaturized sensor device enabled the assessment of their performance for H₂ detection at concentrations as low as 10 ppm in the presence of various gases such as C₆H₆, C₇H₈, C₂H₅OH, and CH₃COCH₃. Remarkably high-response signals of 3.2, 4.7, and 6.7 ( R_a/ R_g) have been measured for H₂ detection at only 10, 30, and 50 ppm, whereas no noticeable response toward other tested gases was detected, thus confirming the excellent H₂ selectivity obtained with such a sensor design. The results obtained showed that the performance of gas sensors toward H₂ gas can be greatly increased by both the addition of Pd NPs and the use of ZIF-8 coating, acting as a molecular sieve membrane. Furthermore, the presented strategy could be extended toward the sensing of other species by a judicious choice of both the metallic NPs and MOF materials with tuned properties for specific molecule detection, thus opening a new avenue for the preparation of highly selective sensing devices.

Plasma-assisted atomic layer deposition of conformal Pt films in high aspect ratio trenches

To date, conventional thermal atomic layer deposition (ALD) has been the method of choice to deposit high-quality Pt thin films grown typically from (MeCp)PtMe₃ vapor and O₂ gas at 300 °C. Plasma-assisted ALD of Pt using O₂ plasma can offer several advantages over thermal ALD, such as faster nucleation and deposition at lower temperatures. In this work, it is demonstrated that plasma-assisted ALD at 300 °C also allows for the deposition of highly conformal Pt films in trenches with high aspect ratio ranging from 3 to 34. Scanning electron microscopy inspection revealed that the conformality of the deposited Pt films was 100% in trenches with aspect ratio (AR) up to 34. These results were corroborated by high-precision layer thickness measurements by transmission electron microscopy for trenches with an aspect ratio of 22. The role of the surface recombination of O-radicals and the contribution of thermal ALD reactions is discussed.

Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation

Area-selective atomic layer deposition (ALD) is envisioned to play a key role in next-generation semiconductor processing and can also provide new opportunities in the field of catalysis. In this work, we developed an approach for the area-selective deposition of metal oxides on noble metals. Using O₂ gas as co-reactant, area-selective ALD has been achieved by relying on the catalytic dissociation of the oxygen molecules on the noble metal surface, while no deposition takes place on inert surfaces that do not dissociate oxygen (i.e., SiO₂, Al₂O₃, Au). The process is demonstrated for selective deposition of iron oxide and nickel oxide on platinum and iridium substrates. Characterization by in situ spectroscopic ellipsometry, transmission electron microscopy, scanning Auger electron spectroscopy, and X-ray photoelectron spectroscopy confirms a very high degree of selectivity, with a constant ALD growth rate on the catalytic metal substrates and no deposition on inert substrates, even after 300 ALD cycles. We demonstrate the area-selective ALD approach on planar and patterned substrates and use it to prepare Pt/Fe₂O₃ core/shell nanoparticles. Finally, the approach is proposed to be extendable beyond the materials presented here, specifically to other metal oxide ALD processes for which the precursor requires a strong oxidizing agent for growth.

Boron Nitride Nanoporous Membranes with High Surface Charge by Atomic Layer Deposition

In this work, we report the design and the fine-tuning of boron nitride single nanopore and nanoporous membranes by atomic layer deposition (ALD). First, we developed an ALD process based on the use of BBr₃ and NH₃ as precursors in order to synthesize BN thin films. The deposited films were characterized in terms of thickness, composition, and microstructure. Next, we used the newly developed process to grow BN films on anodic aluminum oxide nanoporous templates, demonstrating the conformality benefit of BN prepared by ALD, and its scalability for the manufacturing of membranes. For the first time, the ALD process was then used to tune the diameter of fabricated single transmembrane nanopores by adjusting the BN thickness and to enable studies of the fundamental aspects of ionic transport on a single nanopore. At pH = 7, we estimated a surface charge density of 0.16 C·m^-2 without slip and 0.07 C·m^-2 considering a reasonable slip length of 3 nm. Molecular dynamics simulations performed with experimental conditions confirmed the conductivities and the sign of surface charges measured. The high ion transport results obtained and the ability to fine-tune nanoporous membranes by such a scalable method pave the way toward applications such as ionic separation, energy harvesting, and ultrafiltration devices.

Low-Coherence Interferometric Fiber-Optic Sensors with Potential Applications as Biosensors

Fiber-optic Fabry-Pérot interferometers (FPI) can be applied as optical sensors, and excellent measurement sensitivity can be obtained by fine-tuning the interferometer design. In this work, we evaluate the ability of selected dielectric thin films to optimize the reflectivity of the Fabry-Pérot cavity. The spectral reflectance and transmittance of dielectric films made of titanium dioxide (TiO₂) and aluminum oxide (Al₂O₃) with thicknesses from 30 to 220 nm have been evaluated numerically and compared. TiO₂ films were found to be the most promising candidates for the tuning of FPI reflectivity. In order to verify and illustrate the results of modelling, TiO₂ films with the thickness of 80 nm have been deposited on the tip of a single-mode optical fiber by atomic layer deposition (ALD). The thickness, the structure, and the chemical properties of the films have been determined. The ability of the selected TiO₂ films to modify the reflectivity of the Fabry-Pérot cavity, to provide protection of the fibers from aggressive environments, and to create multi-cavity interferometric sensors in FPI has then been studied. The presented sensor exhibits an ability to measure refractive index in the range close to that of silica glass fiber, where sensors without reflective films do not work, as was demonstrated by the measurement of the refractive index of benzene. This opens up the prospects of applying the investigated sensor in biosensing, which we confirmed by measuring the refractive index of hemoglobin and glucose.

Size- and composition-controlled Pt–Sn bimetallic nanoparticles prepared by atomic layer deposition

An atomic layer deposition (ALD) based recipe is demonstrated for the fully-tailored synthesis of Pt–Sn bimetallic nanoparticles.

Interfacial strain and defects in asymmetric Fe-Mn oxide hybrid nanoparticles

Asymmetric Fe-Mn oxide hybrid nanoparticles have been obtained by a seed-mediated thermal decomposition-based synthesis route. The use of benzyl ether as the solvent was found to promote the orientational growth of Mn1-xO onto the iron oxide nanocube seeds yielding mainly dimers and trimers whereas 1-octadecene yields large nanoparticles. HRTEM imaging and HAADF-STEM tomography performed on dimers show that the growth of Mn1-xO occurs preferentially along the edges of iron oxide nanocubes where both oxides share a common crystallographic orientation. Fourier filtering and geometric phase analysis of dimers reveal a lattice mismatch of 5% and a large interfacial strain together with a significant concentration of defects. The saturation magnetization is lower and the coercivity is higher for the Fe-Mn oxide hybrid nanoparticles compared to the iron oxide nanocube seeds.

Atomic layer deposition of Pd and Pt nanoparticles for catalysis: on the mechanisms of nanoparticle formation

The deposition of Pd and Pt nanoparticles by atomic layer deposition (ALD) has been studied extensively in recent years for the synthesis of nanoparticles for catalysis. For these applications, it is essential to synthesize nanoparticles with well-defined sizes and a high density on large-surface-area supports. Although the potential of ALD for synthesizing active nanocatalysts for various chemical reactions has been demonstrated, insight into how to control the nanoparticle properties (i.e. size, composition) by choosing suitable processing conditions is lacking. Furthermore, there is little understanding of the reaction mechanisms during the nucleation stage of metal ALD. In this work, nanoparticles synthesized with four different ALD processes (two for Pd and two for Pt) were extensively studied by transmission electron spectroscopy. Using these datasets as a starting point, the growth characteristics and reaction mechanisms of Pd and Pt ALD relevant for the synthesis of nanoparticles are discussed. The results reveal that ALD allows for the preparation of particles with control of the particle size, although it is also shown that the particle size distribution is strongly dependent on the processing conditions. Moreover, this paper discusses the opportunities and limitations of the use of ALD in the synthesis of nanocatalysts.

Synthesis of core/shell structured Pd3Au@Pt/C with enhanced electrocatalytic activity by regioselective atomic layer deposition combined with a wet chemical method

Core/shell structured Pd₃Au@Pt/C created by regioselective atomic layer deposition combined with a wet chemical method demonstrates improved electrocatalytic activity toward formic acid oxidation and oxygen reduction compared with commercial Pt/C.