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Yun SY, Han JK, Choi YK. A Nanoscale Bistable Resistor for an Oscillatory Neural Network. NANO LETTERS 2024; 24:2751-2757. [PMID: 38259042 DOI: 10.1021/acs.nanolett.3c04539] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 01/24/2024]
Abstract
Coupled oscillators construct an oscillatory neural network (ONN) by mimicking the interactions among neurons in the human brain. This work demonstrates a fully CMOS-based oscillator consisting of a bistable resistor (biristor), which shares a structure identical with that of a metal-oxide-semiconductor field-effect transistor, except for the use of a gate electrode. The biristor-based oscillator (birillator) generates oscillating voltage signals in the form of spikes due to a single transistor latch phenomenon. When two birillators are connected with a coupling capacitor, they become synchronized with a phase difference of 180°. These coupled oscillation characteristics are experimentally investigated for an ONN. As practical applications of the ONN with coupled birillators, edge detection and vertex coloring are conducted by encoding information into phase differences between them. The proposed fully CMOS-based birillators are advantageous for low power consumption, high CMOS compatibility, and a compact footprint area.
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Affiliation(s)
- Seong-Yun Yun
- School of Electrical Engineering, Korea Advanced Institute of Science and Technology (KAIST), 291 Daehak-ro, Yuseong-gu, Daejeon 34141, Republic of Korea
| | - Joon-Kyu Han
- System Semiconductor Engineering and Department of Electronic Engineering, Sogang University, 35 Baekbeom-ro, Mapo-gu, Seoul 04107, Republic of Korea
| | - Yang-Kyu Choi
- School of Electrical Engineering, Korea Advanced Institute of Science and Technology (KAIST), 291 Daehak-ro, Yuseong-gu, Daejeon 34141, Republic of Korea
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Das SK, Nandi SK, Marquez CV, Rúa A, Uenuma M, Puyoo E, Nath SK, Albertini D, Baboux N, Lu T, Liu Y, Haeger T, Heiderhoff R, Riedl T, Ratcliff T, Elliman RG. Physical Origin of Negative Differential Resistance in V 3 O 5 and Its Application as a Solid-State Oscillator. ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2023; 35:e2208477. [PMID: 36461165 DOI: 10.1002/adma.202208477] [Citation(s) in RCA: 6] [Impact Index Per Article: 6.0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 09/15/2022] [Revised: 11/28/2022] [Indexed: 06/17/2023]
Abstract
Oxides that exhibit an insulator-metal transition can be used to fabricate energy-efficient relaxation oscillators for use in hardware-based neural networks but there are very few oxides with transition temperatures above room temperature. Here the structural, electrical, and thermal properties of V3 O5 thin films and their application as the functional oxide in metal/oxide/metal relaxation oscillators are reported. The V3 O5 devices show electroforming-free volatile threshold switching and negative differential resistance (NDR) with stable (<3% variation) cycle-to-cycle operation. The physical mechanisms underpinning these characteristics are investigated using a combination of electrical measurements, in situ thermal imaging, and device modeling. This shows that conduction is confined to a narrow filamentary path due to self-confinement of the current distribution and that the NDR response is initiated at temperatures well below the insulator-metal transition temperature where it is dominated by the temperature-dependent conductivity of the insulating phase. Finally, the dynamics of individual and coupled V3 O5 -based relaxation oscillators is reported, showing that capacitively coupled devices exhibit rich non-linear dynamics, including frequency and phase synchronization. These results establish V3 O5 as a new functional material for volatile threshold switching and advance the development of robust solid-state neurons for neuromorphic computing.
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Affiliation(s)
- Sujan Kumar Das
- Research School of Physics, The Australian National University, Canberra, ACT, 2601, Australia
- Department of Physics, Jahangirnagar University, Dhaka, 1342, Bangladesh
| | - Sanjoy Kumar Nandi
- Research School of Physics, The Australian National University, Canberra, ACT, 2601, Australia
| | | | - Armando Rúa
- Department of Physics, University of Puerto Rico, Mayaguez, PR, 00681, USA
| | - Mutsunori Uenuma
- Information Device Science Laboratory, Nara Institute of Science and Technology (NAIST), Nara, 630-0192, Japan
| | - Etienne Puyoo
- Université Lyon, INSA Lyon, CNRS, Ecole Centrale de Lyon, Université Claude Bernard Lyon 1, CPE Lyon, INL, UMR5270, Villeurbanne, 69621, France
| | - Shimul Kanti Nath
- Research School of Physics, The Australian National University, Canberra, ACT, 2601, Australia
- Department of Electrical, Electronic and Computer Engineering, The University of Western Australia, Crawley, WA, 6009, Australia
| | - David Albertini
- Université Lyon, INSA Lyon, CNRS, Ecole Centrale de Lyon, Université Claude Bernard Lyon 1, CPE Lyon, INL, UMR5270, Villeurbanne, 69621, France
| | - Nicolas Baboux
- Université Lyon, INSA Lyon, CNRS, Ecole Centrale de Lyon, Université Claude Bernard Lyon 1, CPE Lyon, INL, UMR5270, Villeurbanne, 69621, France
| | - Teng Lu
- Research School of Chemistry, The Australian National University, Canberra, ACT, 2601, Australia
| | - Yun Liu
- Research School of Chemistry, The Australian National University, Canberra, ACT, 2601, Australia
| | - Tobias Haeger
- Institute of Electronic Devices, Wuppertal Center for Smart Materials & Systems, University of Wuppertal, Rainer-Gruenter-Strasse 21, 42119, Wuppertal, Germany
| | - Ralf Heiderhoff
- Institute of Electronic Devices, Wuppertal Center for Smart Materials & Systems, University of Wuppertal, Rainer-Gruenter-Strasse 21, 42119, Wuppertal, Germany
| | - Thomas Riedl
- Institute of Electronic Devices, Wuppertal Center for Smart Materials & Systems, University of Wuppertal, Rainer-Gruenter-Strasse 21, 42119, Wuppertal, Germany
| | - Thomas Ratcliff
- Research School of Physics, The Australian National University, Canberra, ACT, 2601, Australia
| | - Robert Glen Elliman
- Research School of Physics, The Australian National University, Canberra, ACT, 2601, Australia
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Kim G, In JH, Kim YS, Rhee H, Park W, Song H, Park J, Kim KM. Self-clocking fast and variation tolerant true random number generator based on a stochastic mott memristor. Nat Commun 2021; 12:2906. [PMID: 34006879 PMCID: PMC8131590 DOI: 10.1038/s41467-021-23184-y] [Citation(s) in RCA: 12] [Impact Index Per Article: 4.0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 11/29/2020] [Accepted: 04/14/2021] [Indexed: 11/09/2022] Open
Abstract
The intrinsic stochasticity of the memristor can be used to generate true random numbers, essential for non-decryptable hardware-based security devices. Here, we propose a novel and advanced method to generate true random numbers utilizing the stochastic oscillation behavior of a NbOx mott memristor, exhibiting self-clocking, fast and variation tolerant characteristics. The random number generation rate of the device can be at least 40 kb s−1, which is the fastest record compared with previous volatile memristor-based TRNG devices. Also, its dimensionless operating principle provides high tolerance against both ambient temperature variation and device-to-device variation, enabling robust security hardware applicable in harsh environments. Obtaining true random numbers is of great importance for cryptography, however, it can be challenging to obtain a large bit rate. Here, the authors make use of the oscillating behaviour of a Mott memristor, which exhibit rapid oscillations, and therefore a large bit rate, alongside impressive endurance.
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Affiliation(s)
- Gwangmin Kim
- Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology (KAIST), Daejeon, Republic of Korea
| | - Jae Hyun In
- Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology (KAIST), Daejeon, Republic of Korea
| | - Young Seok Kim
- Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology (KAIST), Daejeon, Republic of Korea
| | - Hakseung Rhee
- Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology (KAIST), Daejeon, Republic of Korea
| | - Woojoon Park
- Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology (KAIST), Daejeon, Republic of Korea
| | - Hanchan Song
- Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology (KAIST), Daejeon, Republic of Korea
| | - Juseong Park
- Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology (KAIST), Daejeon, Republic of Korea
| | - Kyung Min Kim
- Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology (KAIST), Daejeon, Republic of Korea.
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Nandi SK, Nath SK, El-Helou AE, Li S, Ratcliff T, Uenuma M, Raad PE, Elliman RG. Electric Field- and Current-Induced Electroforming Modes in NbO x. ACS APPLIED MATERIALS & INTERFACES 2020; 12:8422-8428. [PMID: 31989818 DOI: 10.1021/acsami.9b20252] [Citation(s) in RCA: 9] [Impact Index Per Article: 2.3] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/10/2023]
Abstract
Electroforming is used to initiate the memristive response in metal/oxide/metal devices by creating a filamentary conduction path in the oxide film. Here, we use a simple photoresist-based detection technique to map the spatial distribution of conductive filaments formed in Nb/NbOx/Pt devices, and correlate these with current-voltage characteristics and in situ thermoreflectance measurements to identify distinct modes of electroforming in low- and high-conductivity NbOx films. In low-conductivity films, the filaments are randomly distributed within the oxide film, consistent with a field-induced weakest-link mechanism, while in high-conductivity films they are concentrated in the center of the film. In the latter case, the current-voltage characteristics and in situ thermoreflectance imaging show that electroforming is associated with current bifurcation into regions of low and high current density. This is supported by finite element modeling of the current distribution and shown to be consistent with predictions of a simple core-shell model of the current distribution. These results clearly demonstrate two distinct modes of electroforming in the same material system and show that the dominant mode depends on the conductivity of the film, with field-induced electroforming dominant in low-conductivity films and current bifurcation-induced electroforming dominant in high-conductivity films.
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Affiliation(s)
- Sanjoy Kumar Nandi
- Department of Electronic Materials Engineering, Research School of Physics , The Australian National University , Canberra , ACT 2601 , Australia
| | - Shimul Kanti Nath
- Department of Electronic Materials Engineering, Research School of Physics , The Australian National University , Canberra , ACT 2601 , Australia
| | - Assaad E El-Helou
- Department of Mechanical Engineering , Southern Methodist University , Dallas , Texas 75275 , United States
| | - Shuai Li
- Department of Electronic Materials Engineering, Research School of Physics , The Australian National University , Canberra , ACT 2601 , Australia
- Université Paris-Sud, Université Paris-Saclay , Unité Mixte de Physique, CNRS, Thales , 91120 Palaiseau , France
| | - Thomas Ratcliff
- Department of Electronic Materials Engineering, Research School of Physics , The Australian National University , Canberra , ACT 2601 , Australia
| | - Mutsunori Uenuma
- Information Device Science Laboratory , Nara Institute of Science and Technology (NAIST) , 8916-5, Takayamacho, Ikoma , Nara 630-0192 , Japan
| | - Peter E Raad
- Department of Mechanical Engineering , Southern Methodist University , Dallas , Texas 75275 , United States
| | - Robert G Elliman
- Department of Electronic Materials Engineering, Research School of Physics , The Australian National University , Canberra , ACT 2601 , Australia
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