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Ntetsikas K, Ladelta V, Bhaumik S, Hadjichristidis N. Quo Vadis Carbanionic Polymerization? ACS POLYMERS AU 2023; 3:158-181. [PMID: 37065716 PMCID: PMC10103213 DOI: 10.1021/acspolymersau.2c00058] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 10/28/2022] [Revised: 12/02/2022] [Accepted: 12/02/2022] [Indexed: 12/24/2022]
Abstract
Living anionic polymerization will soon celebrate 70 years of existence. This living polymerization is considered the mother of all living and controlled/living polymerizations since it paved the way for their discovery. It provides methodologies for synthesizing polymers with absolute control of the essential parameters that affect polymer properties, including molecular weight, molecular weight distribution, composition and microstructure, chain-end/in-chain functionality, and architecture. This precise control of living anionic polymerization generated tremendous fundamental and industrial research activities, developing numerous important commodity and specialty polymers. In this Perspective, we present the high importance of living anionic polymerization of vinyl monomers by providing some examples of its significant achievements, presenting its current status, giving several insights into where it is going (Quo Vadis) and what the future holds for this powerful synthetic method. Furthermore, we attempt to explore its advantages and disadvantages compared to controlled/living radical polymerizations, the main competitors of living carbanionic polymerization.
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Affiliation(s)
- Konstantinos Ntetsikas
- Polymer Synthesis Laboratory, KAUST
Catalysis Center, Physical Sciences and Engineering Division, King Abdullah University of Science and Technology
(KAUST), Thuwal 23955, Kingdom of Saudi Arabia
| | - Viko Ladelta
- Polymer Synthesis Laboratory, KAUST
Catalysis Center, Physical Sciences and Engineering Division, King Abdullah University of Science and Technology
(KAUST), Thuwal 23955, Kingdom of Saudi Arabia
| | - Saibal Bhaumik
- Polymer Synthesis Laboratory, KAUST
Catalysis Center, Physical Sciences and Engineering Division, King Abdullah University of Science and Technology
(KAUST), Thuwal 23955, Kingdom of Saudi Arabia
| | - Nikos Hadjichristidis
- Polymer Synthesis Laboratory, KAUST
Catalysis Center, Physical Sciences and Engineering Division, King Abdullah University of Science and Technology
(KAUST), Thuwal 23955, Kingdom of Saudi Arabia
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2
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Pino G, Cummins C, Mantione D, Demazy N, Alvarez-Fernandez A, Guldin S, Fleury G, Hadziioannou G, Cloutet E, Brochon C. Design and Morphological Investigation of High-χ Catechol-Containing Styrenic Block Copolymers. Macromolecules 2022. [DOI: 10.1021/acs.macromol.2c00476] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.5] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/29/2022]
Affiliation(s)
- Guillaume Pino
- Université de Bordeaux, CNRS, Bordeaux INP, LCPO, UMR 5629, F-33600 Pessac, France
| | - Cian Cummins
- Université de Bordeaux, CNRS, Bordeaux INP, LCPO, UMR 5629, F-33600 Pessac, France
| | - Daniele Mantione
- POLYKEY Polymers, Joxe Mari Korta Center, Avda. Tolosa 72, 20018 Donostia-San Sebastian, Spain
| | - Nils Demazy
- Université de Bordeaux, CNRS, Bordeaux INP, LCPO, UMR 5629, F-33600 Pessac, France
| | - Alberto Alvarez-Fernandez
- Department of Chemical Engineering, University College London, Torrington Place, WC1E 6BT London, United Kingdom
| | - Stefan Guldin
- Department of Chemical Engineering, University College London, Torrington Place, WC1E 6BT London, United Kingdom
| | - Guillaume Fleury
- Université de Bordeaux, CNRS, Bordeaux INP, LCPO, UMR 5629, F-33600 Pessac, France
| | - Georges Hadziioannou
- Université de Bordeaux, CNRS, Bordeaux INP, LCPO, UMR 5629, F-33600 Pessac, France
| | - Eric Cloutet
- Université de Bordeaux, CNRS, Bordeaux INP, LCPO, UMR 5629, F-33600 Pessac, France
| | - Cyril Brochon
- Université de Bordeaux, CNRS, Bordeaux INP, LCPO, UMR 5629, F-33600 Pessac, France
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3
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Pula P, Leniart A, Majewski PW. Solvent-assisted self-assembly of block copolymer thin films. SOFT MATTER 2022; 18:4042-4066. [PMID: 35608282 DOI: 10.1039/d2sm00439a] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.5] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/15/2023]
Abstract
Solvent-assisted block copolymer self-assembly is a compelling method for processing and advancing practical applications of these materials due to the exceptional level of the control of BCP morphology and significant acceleration of ordering kinetics. Despite substantial experimental and theoretical efforts devoted to understanding of solvent-assisted BCP film ordering, the development of a universal BCP patterning protocol remains elusive; possibly due to a multitude of factors which dictate the self-assembly scenario. The aim of this review is to aggregate both seminal reports and the latest progress in solvent-assisted directed self-assembly and to provide the reader with theoretical background, including the outline of BCP ordering thermodynamics and kinetics phenomena. We also indicate significant BCP research areas and emerging high-tech applications where solvent-assisted processing might play a dominant role.
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Affiliation(s)
- Przemyslaw Pula
- Department of Chemistry, University of Warsaw, Warsaw 02089, Poland.
| | - Arkadiusz Leniart
- Department of Chemistry, University of Warsaw, Warsaw 02089, Poland.
| | - Pawel W Majewski
- Department of Chemistry, University of Warsaw, Warsaw 02089, Poland.
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4
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Liu C, Wu M, Duan L, Yan N, Jiang W. Hierarchical colloidosomes self-assembled from block copolymer micelles via emulsion interfacial confinement. NANOTECHNOLOGY 2021; 33:045603. [PMID: 34666317 DOI: 10.1088/1361-6528/ac30f0] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.3] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 05/29/2021] [Accepted: 10/19/2021] [Indexed: 06/13/2023]
Abstract
Hierarchical self-assembly of polymeric building blocks into high-level colloidosomes is desirable to not only design novel nanostructures but also fabricate the complex artificial materials across many length scales with multifunctionality. Although great progress has been made in the designing the hierarchical colloidosomes, the fabrication of polymeric colloidosomes self-assembled from block copolymer (BCP) colloidal nanoparticles still remains challenge. Here, we report the fabrication of the hierarchical polymeric colloidosomes with typical hollow internal structures self-assembled from the polystyrene-block-poly (2-vinyl pyridine) (PS-b-P2VP) BCP spherical micelles through the emulsion interfacial confinement, which is constructed through the water-in-1-butanol emulsion system. Moreover, the hierarchical colloidosomes can disassemble into the original uniform spherical micelles under the acid aqueous solution, indicating that the colloidosomes possess good pH stimuli-responsibility. Finally, the stability of the colloidosomes can be greatly improved by cross-linking the P2VP corona of original spherical micelles, offering the effective templates for construction of the multifunctional materials. This finding provides a simple yet effective method for the fabrication of the hierarchical colloidosomes from the BCP building blocks.
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Affiliation(s)
- Changxu Liu
- School of Chemistry and Life Science, Changchun University of Technology, Changchun, 130012, People's Republic of China
- State Key Laboratory of Polymer Physics and Chemistry, Changchun Institute of Applied Chemistry, Chinese Academy of Sciences, Changchun 130022, People's Republic of China
| | - Ming Wu
- State Key Laboratory of Polymer Physics and Chemistry, Changchun Institute of Applied Chemistry, Chinese Academy of Sciences, Changchun 130022, People's Republic of China
| | - Lijie Duan
- School of Chemistry and Life Science, Changchun University of Technology, Changchun, 130012, People's Republic of China
| | - Nan Yan
- State Key Laboratory of Polymer Physics and Chemistry, Changchun Institute of Applied Chemistry, Chinese Academy of Sciences, Changchun 130022, People's Republic of China
| | - Wei Jiang
- State Key Laboratory of Polymer Physics and Chemistry, Changchun Institute of Applied Chemistry, Chinese Academy of Sciences, Changchun 130022, People's Republic of China
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5
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Ginige G, Song Y, Olsen BC, Luber EJ, Yavuz CT, Buriak JM. Solvent Vapor Annealing, Defect Analysis, and Optimization of Self-Assembly of Block Copolymers Using Machine Learning Approaches. ACS APPLIED MATERIALS & INTERFACES 2021; 13:28639-28649. [PMID: 34100583 DOI: 10.1021/acsami.1c05056] [Citation(s) in RCA: 5] [Impact Index Per Article: 1.7] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/12/2023]
Abstract
Self-assembly of block copolymers (BCPs) is an alternative patterning technique that promises high resolution and density multiplication with lower costs. The defectivity of the resulting nanopatterns remains too high for many applications in microelectronics and is exacerbated by small variations of processing parameters, such as film thickness, and fluctuations of solvent vapor pressure and temperature, among others. In this work, a solvent vapor annealing (SVA) flow-controlled system is combined with design of experiments (DOE) and machine learning (ML) approaches. The SVA flow-controlled system enables precise optimization of the conditions of self-assembly of the high Flory-Huggins interaction parameter (χ) hexagonal dot-array forming BCP, poly(styrene-b-dimethylsiloxane) (PS-b-PDMS). The defects within the resulting patterns at various length scales are then characterized and quantified. The results show that the defectivity of the resulting nanopatterned surfaces is highly dependent upon very small variations of the initial film thicknesses of the BCP, as well as the degree of swelling under the SVA conditions. These parameters also significantly contribute to the quality of the resulting pattern with respect to grain coarsening, as well as the formation of different macroscale phases (single and double layers and wetting layers). The results of qualitative and quantitative defect analyses are then compiled into a single figure of merit (FOM) and are mapped across the experimental parameter space using ML approaches, which enable the identification of the narrow region of optimum conditions for SVA for a given BCP. The result of these analyses is a faster and less resource intensive route toward the production of low-defectivity BCP dot arrays via rational determination of the ideal combination of processing factors. The DOE and machine learning-enabled approach is generalizable to the scale-up of self-assembly-based nanopatterning for applications in electronic microfabrication.
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Affiliation(s)
- Gayashani Ginige
- Department of Chemistry, University of Alberta, 11227-Saskatchewan Drive, Edmonton, Alberta T6G 2G2, Canada
| | - Youngdong Song
- Department of Chemical and Biomolecular Engineering, Korea Advanced Institute of Science and Technology (KAIST), 291 Daehak-ro, Yuseong-gu, Daejeon 34141, Republic of Korea
| | - Brian C Olsen
- Department of Chemistry, University of Alberta, 11227-Saskatchewan Drive, Edmonton, Alberta T6G 2G2, Canada
| | - Erik J Luber
- Department of Chemistry, University of Alberta, 11227-Saskatchewan Drive, Edmonton, Alberta T6G 2G2, Canada
| | - Cafer T Yavuz
- Department of Chemical and Biomolecular Engineering, Korea Advanced Institute of Science and Technology (KAIST), 291 Daehak-ro, Yuseong-gu, Daejeon 34141, Republic of Korea
- KAUST Catalysis Center (KCC), Physical Sciences and Engineering (PSE), King Abdullah University of Science and Technology (KAUST), Thuwal 23955-6900, Saudi Arabia
- Advanced Membranes and Porous Materials Center (AMPM), Physical Sciences and Engineering (PSE), King Abdullah University of Science and Technology (KAUST), Thuwal 23955-6900, Saudi Arabia
| | - Jillian M Buriak
- Department of Chemistry, University of Alberta, 11227-Saskatchewan Drive, Edmonton, Alberta T6G 2G2, Canada
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Cheng LC, Simonaitis JW, Gadelrab KR, Tahir M, Ding Y, Alexander-Katz A, Ross CA. Imparting Superhydrophobicity with a Hierarchical Block Copolymer Coating. SMALL (WEINHEIM AN DER BERGSTRASSE, GERMANY) 2020; 16:e1905509. [PMID: 31808616 DOI: 10.1002/smll.201905509] [Citation(s) in RCA: 12] [Impact Index Per Article: 3.0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 09/26/2019] [Revised: 11/10/2019] [Indexed: 06/10/2023]
Abstract
A robust and transparent silica-like coating that imparts superhydrophobicity to a surface through its hierarchical multilevel self-assembled structure is demonstrated. This approach involves iterative steps of spin-coating, annealing, and etching of polystyrene-block-polydimethylsiloxane block copolymer thin films to form a tailored multilayer nanoscale topographic pattern with a water contact angle up to 155°. A model based on the hierarchical topography is developed to calculate the wetting angle and optimize the superhydrophobicity, in agreement with the experimental trends, and explaining superhydrophobicity arising through the combination of roughness at different lengthscales. Additionally, the mechanical robustness and optically passive properties of the resulting hydrophobic surfaces are demonstrated.
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Affiliation(s)
- Li-Chen Cheng
- Department of Materials Science and Engineering, Massachusetts Institute of Technology, Cambridge, MA, 02139, USA
| | - John W Simonaitis
- Department of Electrical Engineering and Computer Science, Massachusetts Institute of Technology, Cambridge, MA, 02139, USA
| | - Karim R Gadelrab
- Department of Materials Science and Engineering, Massachusetts Institute of Technology, Cambridge, MA, 02139, USA
| | - Mukarram Tahir
- Department of Materials Science and Engineering, Massachusetts Institute of Technology, Cambridge, MA, 02139, USA
| | - Yi Ding
- Department of Materials Science and Engineering, Massachusetts Institute of Technology, Cambridge, MA, 02139, USA
| | - Alfredo Alexander-Katz
- Department of Materials Science and Engineering, Massachusetts Institute of Technology, Cambridge, MA, 02139, USA
| | - Caroline A Ross
- Department of Materials Science and Engineering, Massachusetts Institute of Technology, Cambridge, MA, 02139, USA
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7
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Shi LY, Lee S, Cheng LC, Huang H, Liao F, Ran R, Yager KG, Ross CA. Thin Film Self-Assembly of a Silicon-Containing Rod–Coil Liquid Crystalline Block Copolymer. Macromolecules 2019. [DOI: 10.1021/acs.macromol.8b01938] [Citation(s) in RCA: 23] [Impact Index Per Article: 4.6] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 12/14/2022]
Affiliation(s)
- Ling-Ying Shi
- College of Polymer Science and Engineering, State Key Laboratory of Polymer Materials Engineering, Sichuan University, Chengdu 610065, China
- Department of Materials Science and Engineering, Massachusetts Institute of Technology, 77 Massachusetts Avenue, Cambridge, Massachusetts 02139, United States
| | - Sangho Lee
- Department of Materials Science and Engineering, Massachusetts Institute of Technology, 77 Massachusetts Avenue, Cambridge, Massachusetts 02139, United States
| | - Li-Chen Cheng
- Department of Materials Science and Engineering, Massachusetts Institute of Technology, 77 Massachusetts Avenue, Cambridge, Massachusetts 02139, United States
| | - Hejin Huang
- Department of Materials Science and Engineering, Massachusetts Institute of Technology, 77 Massachusetts Avenue, Cambridge, Massachusetts 02139, United States
| | - Fen Liao
- College of Polymer Science and Engineering, State Key Laboratory of Polymer Materials Engineering, Sichuan University, Chengdu 610065, China
| | - Rong Ran
- College of Polymer Science and Engineering, State Key Laboratory of Polymer Materials Engineering, Sichuan University, Chengdu 610065, China
| | - Kevin G. Yager
- Center for Functional Nanomaterials, Brookhaven National Laboratory, Upton, New York 11973, United States
| | - Caroline A. Ross
- Department of Materials Science and Engineering, Massachusetts Institute of Technology, 77 Massachusetts Avenue, Cambridge, Massachusetts 02139, United States
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8
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High molecular weight block copolymer lithography for nanofabrication of hard mask and photonic nanostructures. J Colloid Interface Sci 2019; 534:420-429. [DOI: 10.1016/j.jcis.2018.09.040] [Citation(s) in RCA: 20] [Impact Index Per Article: 4.0] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 08/08/2018] [Revised: 09/07/2018] [Accepted: 09/12/2018] [Indexed: 11/22/2022]
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Cheng LC, Gadelrab KR, Kawamoto K, Yager KG, Johnson JA, Alexander-Katz A, Ross CA. Templated Self-Assembly of a PS- Branch-PDMS Bottlebrush Copolymer. NANO LETTERS 2018; 18:4360-4369. [PMID: 29877712 DOI: 10.1021/acs.nanolett.8b01389] [Citation(s) in RCA: 29] [Impact Index Per Article: 4.8] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/21/2023]
Abstract
The self-assembly of block copolymers (BCPs) with novel architectures offers tremendous opportunities in nanoscale patterning and fabrication. Here, the thin film morphology, annealing kinetics, and topographical templating of an unconventional Janus-type "PS- branch-PDMS" bottlebrush copolymer (BBCP) are described. In the Janus-type BBCP, each segment of the bottlebrush backbone connects two immiscible side chain blocks. Thin films of a Janus-type BBCP with Mn = 609 kg/mol exhibited 22 nm period cylindrical microdomains with long-range order under solvent vapor annealing, and the effects of as-cast film thickness, solvent vapor pressure, and composition of the binary mixture of solvent vapors are described. The dynamic self-assembly process was characterized using in situ grazing-incidence X-ray scattering. Templated self-assembly of the BBCP within lithographically patterned substrates was demonstrated, showing distinct pattern orientation and dimensions that differ from conventional BCPs. Self-consistent field theory is used to elucidate details of the templated self-assembly behavior within confinement.
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Affiliation(s)
| | | | | | - Kevin G Yager
- Center for Functional Nanomaterials , Brookhaven National Laboratory , Upton , New York 11973 , United States
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Lee S, Cheng LC, Gadelrab KR, Ntetsikas K, Moschovas D, Yager KG, Avgeropoulos A, Alexander-Katz A, Ross CA. Double-Layer Morphologies from a Silicon-Containing ABA Triblock Copolymer. ACS NANO 2018; 12:6193-6202. [PMID: 29856599 DOI: 10.1021/acsnano.8b02851] [Citation(s) in RCA: 14] [Impact Index Per Article: 2.3] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/21/2023]
Abstract
A combined experimental and self-consistent-field theoretical (SCFT) investigation of the phase behavior of poly(stryrene- b-dimethylsiloxane- b-styrene) (PS- b-PDMS- b-PS, or SDS32) thin films during solvent vapor annealing is presented. The morphology of the triblock copolymer is described as a function of the as-cast film thickness and the ratio of two different solvent vapors, toluene and heptane. SDS32 formed terraced bilayer morphologies even when the film thickness was much lower than the commensurate thickness. The morphology transitioned between bilayer cylinders, bilayer perforated lamellae, and bilayer lamellae, including mixed structures such as a perforated lamella on top of a layer of in-plane cylinders, as the heptane fraction during solvent annealing increased. SCFT modeling showed the same morphological trends as a function of the block volume fraction. In comparison with diblock PS- b-PDMS with the same molecular weight, the SDS32 offers a simple route to produce a diversity of well-ordered bilayer structures with smaller feature sizes, including the formation of bilayer perforated lamellae over a large process window.
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Affiliation(s)
- Sangho Lee
- Department of Materials Science and Engineering , Massachusetts Institute of Technology , Cambridge , Massachusetts 02139 , United States
| | - Li-Chen Cheng
- Department of Materials Science and Engineering , Massachusetts Institute of Technology , Cambridge , Massachusetts 02139 , United States
| | - Karim R Gadelrab
- Department of Materials Science and Engineering , Massachusetts Institute of Technology , Cambridge , Massachusetts 02139 , United States
| | - Konstantinos Ntetsikas
- Department of Materials Science Engineering , University of Ioannina , University Campus-Dourouti , 45110 Ioannina , Greece
| | - Dimitrios Moschovas
- Department of Materials Science Engineering , University of Ioannina , University Campus-Dourouti , 45110 Ioannina , Greece
| | - Kevin G Yager
- Center for Functional Nanomaterials , Brookhaven National Laboratory , Upton , New York 11973 , United States
| | - Apostolos Avgeropoulos
- Department of Materials Science Engineering , University of Ioannina , University Campus-Dourouti , 45110 Ioannina , Greece
| | - Alfredo Alexander-Katz
- Department of Materials Science and Engineering , Massachusetts Institute of Technology , Cambridge , Massachusetts 02139 , United States
| | - Caroline A Ross
- Department of Materials Science and Engineering , Massachusetts Institute of Technology , Cambridge , Massachusetts 02139 , United States
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Yang Q, Loos K. Perpendicular Structure Formation of Block Copolymer Thin Films during Thermal Solvent Vapor Annealing: Solvent and Thickness Effects. Polymers (Basel) 2017; 9:E525. [PMID: 30965824 PMCID: PMC6418618 DOI: 10.3390/polym9100525] [Citation(s) in RCA: 10] [Impact Index Per Article: 1.4] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 09/25/2017] [Revised: 10/13/2017] [Accepted: 10/13/2017] [Indexed: 11/26/2022] Open
Abstract
Solvent vapor annealing of block copolymer (BCP) thin films can produce a range of interesting morphologies, especially when the perpendicular orientation of micro-domains with respect to the substrate plays a role. This, for instance, allows BCP thin films to serve as useful templates for nanolithography and hybrid materials preparation. However, precise control of the arising morphologies is essential, but in most cases difficult to achieve. In this work, we investigated the solvent and thickness effects on the morphology of poly(styrene-b-2 vinyl pyridine) (PS-b-P2VP) thin films with a film thickness range from 0.4 L₀ up to 0.8 L₀. Ordered perpendicular structures were achieved. One of the main merits of our work is that the phase behavior of the ultra-high molecular weight BCP thin films, which hold a 100-nm sized domain distance, can be easily monitored via current available techniques, such as scanning electron microscope (SEM), atomic force microscope (AFM), and transmission electron microscope (TEM). Systematic monitoring of the self-assembly behavior during solvent vapor annealing can thus provide an experimental guideline for the optimization of processing conditions of related BCP films systems.
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Affiliation(s)
- Qiuyan Yang
- Macromolecular Chemistry & New Polymeric Materials, Zernike Institute for Advanced Materials, University of Groningen, Nijenborgh 4, 9747 AG Groningen, The Netherlands.
| | - Katja Loos
- Macromolecular Chemistry & New Polymeric Materials, Zernike Institute for Advanced Materials, University of Groningen, Nijenborgh 4, 9747 AG Groningen, The Netherlands.
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