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For: Flynn SP, Bogan J, Lundy R, Khalafalla KE, Shaw M, Rodriguez BJ, Swift P, Daniels S, O'Connor R, Hughes G, Kelleher SM. Nitrogen reactive ion etch processes for the selective removal of poly-(4-vinylpyridine) in block copolymer films. Nanotechnology 2018;29:355302. [PMID: 29873635 DOI: 10.1088/1361-6528/aacae4] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.2] [Reference Citation Analysis] [What about the content of this article? (0)] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/08/2023]
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1
Konefał M, Zhigunov A, Pavlova E, Černoch P, Pop-Georgievski O, Špírková M. Adjustable self-assembly in polystyrene-block-poly(4-vinylpyridine) dip-coated thin films. POLYMER 2019. [DOI: 10.1016/j.polymer.2019.05.057] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 10/26/2022]
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