Transmissive structural color filters using vertically coupled aluminum nanohole/nanodisk array with a triangular-lattice

Advances in Waveguide Bragg Grating Structures, Platforms, and Applications: An Up-to-Date Appraisal

A Bragg grating (BG) is a one-dimensional optical device that may reflect a specific wavelength of light while transmitting all others. It is created by the periodic fluctuation of the refractive index in the waveguide (WG). The reflectivity of a BG is specified by the index modulation profile. A Bragg grating is a flexible optical filter that has found broad use in several scientific and industrial domains due to its straightforward construction and distinctive filtering capacity. WG BGs are also widely utilized in sensing applications due to their easy integration and high sensitivity. Sensors that utilize optical signals for sensing have several benefits over conventional sensors that use electric signals to achieve detection, including being lighter, having a strong ability to resist electromagnetic interference, consuming less power, operating over a wider frequency range, performing consistently, operating at a high speed, and experiencing less loss and crosstalk. WG BGs are simple to include in chips and are compatible with complementary metal-oxide-semiconductor (CMOS) manufacturing processes. In this review, WG BG structures based on three major optical platforms including semiconductors, polymers, and plasmonics are discussed for filtering and sensing applications. Based on the desired application and available fabrication facilities, the optical platform is selected, which mainly regulates the device performance and footprint.

Internal nanocavity based high-resolution and stable structural colours fabricated by laser printing

Bioinspired structural colors are attracting increasing attention in photonics, display, labeling and so forth. High-resolution and stable coloration is significant but is challenging to be fabricated in a facile and low-cost way. Herein, multilayer architecture containing an internal nanocavity as the structural color unit is obtained conveniently by direct nanosecond laser printing in atmosphere condition. Arbitrary colorful patterns with submicron accuracy can be realized only by a single step. And such structural colors induced by inner structures in the interlayer are antipollutive, antioxidative and easy to clean.

Nanostructured Color Filters: A Review of Recent Developments

Color plays an important role in human life: without it life would be dull and monochromatic. Printing color with distinct characteristics, like hue, brightness and saturation, and high resolution, are the main characteristic of image sensing devices. A flexible design of color filter is also desired for angle insensitivity and independence of direction of polarization of incident light. Furthermore, it is important that the designed filter be compatible with the image sensing devices in terms of technology and size. Therefore, color filter requires special care in its design, operation and integration. In this paper, we present a comprehensive review of nanostructured color filter designs described to date and evaluate them in terms of their performance.

Direct Color Printing with an Electron Beam

The direct patterning of colors using the bombardment of a focused beam of electrons onto a thin-film stack consisting of poly(methyl methacrylate) coated with a thin nickel film is demonstrated. This direct electron-beam color printing approach creates variations in the height of a Fabry-Perot (FP) cavity, resulting directly in a color print without the need for prepatterned substrates, distinct from some direct laser writing methods. Notably, the resolution of the color prints is defined by the electron beam. Height measurements with ∼5 nm accuracy through color image analysis of an electron-beam-patterned FP cavity were carried out. This technique also introduces a reflectance-based measurement of the point exposure function of a focused electron beam, aiding in rapid proximity effect corrections. In addition, the grayscale lithographic nature of this process was used to produce blazed gratings and could enable the fabrication of other 2.5D nanostructures with precise height control.

Multilevel nanoimprint lithography with a binary mould for plasmonic colour printing

Pigment-free colouration based on plasmonic resonances has recently attracted considerable attention for potential in manufacturing and other applications. For plasmonic colour utilizing the metal-insulator-metal (MIM) configuration, the generated colour is not only dependent on the geometry and transverse dimensions, but also to the size of the vertical gap between the metal nanoparticles and the continuous metal film. The complexity of conventional fabrication methods such as electron beam lithography (EBL), however, limits the capacity to control this critical parameter. Here we demonstrate the straightforward production of plasmonic colour via UV-assisted nanoimprint lithography (NIL) with a simple binary mould and demonstrate the ability to control this gap distance in a single print by harnessing the nanofluidic behaviour of the polymer resist through strategic mould design. We show that this provides a further avenue for controlling the colour reflected by the resulting plasmonic pixels as an adjunct to the conventional approach of tailoring the transverse dimensions of the nanostructures. Our experimental results exhibit wide colour coverage of the CIE 1931 XY colour space through careful control of both the length and periodicity and the resulting vertical gap size of the structure during the nanoimprinting process. Furthermore, to show full control over the vertical dimension, we show that a fixed gap size can be produced by introducing complementary microcavities in the vicinity of the nanostructures on the original mould. This demonstrates a simple method for obtaining an additional degree of freedom in NIL not only for structural colouration but also for other industrial applications such as high-density memory, biosensors and manufacturing.

All-dielectric metasurface for high-performance structural color

The achievement of structural color has shown advantages in large-gamut, high-saturation, high-brightness, and high-resolution. While a large number of plasmonic/dielectric nanostructures have been developed for structural color, the previous approaches fail to match all the above criterion simultaneously. Herein we utilize the Si metasurface to demonstrate an all-in-one solution for structural color. Due to the intrinsic material loss, the conventional Si metasurfaces only have a broadband reflection and a small gamut of 78% of sRGB. Once they are combined with a refractive index matching layer, the reflection bandwidth and the background reflection are both reduced, improving the brightness and the color purity significantly. Consequently, the experimentally demonstrated gamut has been increased to around 181.8% of sRGB, 135.6% of Adobe RGB, and 97.2% of Rec.2020. Meanwhile, high refractive index of silicon preserves the distinct color in a pixel with 2 × 2 array of nanodisks, giving a diffraction-limit resolution.

Plasmonics for Biosensing

Techniques based on plasmonic resonance can provide label-free, signal enhanced, and real-time sensing means for bioparticles and bioprocesses at the molecular level. With the development in nanofabrication and material science, plasmonics based on synthesized nanoparticles and manufactured nano-patterns in thin films have been prosperously explored. In this short review, resonance modes, materials, and hybrid functions by simultaneously using electrical conductivity for plasmonic biosensing techniques are exclusively reviewed for designs containing nanovoids in thin films. This type of plasmonic biosensors provide prominent potential to achieve integrated lab-on-a-chip which is capable of transporting and detecting minute of multiple bio-analytes with extremely high sensitivity, selectivity, multi-channel and dynamic monitoring for the next generation of point-of-care devices.