Mechanism of nucleation and critical layer formation during In/GaAs droplet epitaxy

Independent Control Over Size and Surface Density of Droplet Epitaxial Nanostructures Using Ultra-Low Arsenic Fluxes

Modern and future nanoelectronic and nanophotonic applications require precise control of the size, shape and density of III-V quantum dots in order to predefine the characteristics of devices based on them. In this paper, we propose a new approach to control the size of nanostructures formed by droplet epitaxy. We reveal that it is possible to reduce the droplet volume independently of the growth temperature and deposition amount by exposing droplets to ultra-low group-V flux. We carry out a thorough study of the effect of arsenic pressure on the droplet characteristics and demonstrate that indium droplets with a large initial size (>100 nm) and a low surface density (<10⁸ cm^-2) are able to shrink to dimensions appropriate for quantum dot applications. Small droplets are found to be unstable and difficult to control, while larger droplets are more resistive to arsenic flux and can be reduced to stable, small-sized nanostructures (~30 nm). We demonstrate the growth conditions under which droplets transform into dots, ring and holes and describe a mechanism of this transformation depending on the ultra-low arsenic flux. Thus, we observe phenomena which significantly expand the capabilities of droplet epitaxy.

The structural symmetry of nanoholes upon droplet epitaxy

Nanoholes obtained by droplet epitaxy has been intensively investigated as an important material platform for the fabrication of nanodevices due to their unique topology. However, the final fabricated nanoholes are very difficult to achieve a highly symmetric circular structure, and usually have two or four gaps in the sidewall of the holes. Here we have presented a developed model to inquire into the reasons for the formation of the gaps at the periphery of nanoholes and discuss how to improve the structural symmetry of the nanoholes. It is found that the anisotropic interface diffusion of As atoms decomposed by substrate can result in the formation of the gaps. In order to improve the symmetry of final nanostructures, we can minimize the interval time between deposition of Ga droplets and open operation of As flux, and set up a multistep growth procedure by changing the intensity of As flux or growth temperature.

Anomalous behavior of In adatoms during droplet epitaxy on the AlGaAs surfaces

Semiconductor quantum dots (QDs) in the InAs/AlGaAs system are of great importance due to their promising optoelectronic and nanophotonic applications. However, control over emission wavelength governed by Al content in the matrix is still limited because of an influence of surface Al content on QD size and density. In this paper, we study the growth of In nanostructures by droplet epitaxy on various AlGaAs surfaces. We demonstrate that an increase in the Al content leads to a decrease in the droplet density and an increase in their size, which contradicts the Stranski-Krastanov QD growth. Using a hybrid analytical-Monte Carlo model, we explain this phenomenon by the fact that In adatoms acquire higher mobility on a first indium monolayer which is bound to surface Al atoms. This assumption is confirmed by the fact that a temperature decrease does not lead to a great increase in the critical thickness of droplet formation on the Al-containing surfaces whereas it changes considerably on the GaAs surface. Furthermore, the Al content influence on the formation of In droplets is much less significant than on the growth of InAs QDs by the Stranski-Krastanov mode. This gives an opportunity to use droplet epitaxy to control the matrix bandgap without considerable influence on the QD characteristics.

Resistive Switching of GaAs Oxide Nanostructures

The paper presents the results of experimental studies of the influence of the local anodic oxidation control parameters on the geometric parameters of oxide nanoscale structures (ONS) and profiled nanoscale structures (PNS) on the surface of epitaxial structures of silicon doped gallium arsenide with an impurity concentration of 5 × 10¹⁷ cm⁻³. X-ray photoelectron spectroscopy measurements showed that GaAs oxide consists of oxide phases Ga₂O₃ and As₂O₃, and the thickness of the Ga₂O₃ layer is 2–3 times greater than the thickness of As₂O₃ area—i.e., the oxidized GaAs region consists mainly of Ga₂O₃. The experimental studies of the influence of ONS thickness on the resistive switching effect were obtained. An increase in the ONS thickness from 0.8 ± 0.3 to 7.6 ± 0.6 nm leads to an increase in the switching voltage Uset from 2.8 ± 0.3 to 6.8 ± 0.9 V. The results can be used in the development of technological processes for the manufacturing of nano-electronic elements, such as ReRAM, as well as a high-efficiency quantum dot laser.

Type-II GaSb quantum dots grown on InAlAs/InP (001) by droplet epitaxy

GaSb quantum dots (QDs) have been grown by droplet epitaxy within InAlAs barrier layers on an InP (001) substrate. The droplet growth mode facilitates a larger size (average height ∼4.5 nm) and a lower density (∼6.3 × 10⁹ cm^-2) for the QDs than would be expected for the 4% lattice mismatch between GaSb and InAlAs. A type-II band alignment between the GaSb QDs and the InAlAs barriers is revealed by photoluminescence (PL) through a prominent blue-shift of ∼0.11 eV resulting from a six orders of magnitude increase in excitation power. Further confirmation of the type-II nature of these QDs is found through time-resolved PL studies showing a biexponential decay with a long carrier lifetime of ∼10.9 ns. These observations reveal new information for understanding the formation and properties of GaSb/InAlAs/InP QDs, which may be an optimum system for the development of both efficient memory cells and photovoltaic devices.