Electrode configurations in atmospheric pressure plasma jets: production of reactive species

Optimization of Atmospheric Pressure Plasma Jet with Single-Pin Electrode Configuration and Its Application in Polyaniline Thin Film Growth

This study systematically investigated an atmospheric pressure plasma reactor with a centered single pin electrode inside a dielectric tube for depositing the polyaniline (PANI) thin film based on the experimental case studies relative to variations in pin electrode configurations (cases I, II, and III), bluff-body heights, and argon (Ar) gas flow rates. In these cases, the intensified charge-coupled device and optical emission spectroscopy were analyzed to investigate the factors affecting intensive glow-like plasma generation for deposition with a large area. Compared to case I, the intense glow-like plasma of the cases II and III generated abundant reactive nitrogen species (RNSs) and excited argon radical species for fragmentation and recombination of PANI. In case III, the film thickness and deposition rate of the PANI thin film were about 450 nm and 7.5 nm/min, respectively. This increase may imply that the increase in the excited radical species contributes to the fragmentation and recombination due to the increase in RNSs and excited argon radicals during the atmospheric pressure (AP) plasma polymerization to obtain the PANI thin film. This intense glow-like plasma generated broadly by the AP plasma reactor can uniformly deposit the PANI thin film, which is confirmed by field emission-scanning electron microscopy and Fourier transform infrared spectroscopy.

Reproducibility of 'COST reference microplasma jets'

Atmospheric pressure plasmas have been ground-breaking for plasma science and technologies, due to their significant application potential in many fields, including medicinal, biological, and environmental applications. This is predominantly due to their efficient production and delivery of chemically reactive species under ambient conditions. One of the challenges in progressing the field is comparing plasma sources and results across the community and the literature. To address this a reference plasma source was established during the 'biomedical applications of atmospheric pressure plasmas' EU COST Action MP1101. It is crucial that reference sources are reproducible. Here, we present the reproducibility and variance across multiple sources through examining various characteristics, including: absolute atomic oxygen densities, absolute ozone densities, electrical characteristics, optical emission spectroscopy, temperature measurements, and bactericidal activity. The measurements demonstrate that the tested COST jets are mainly reproducible within the intrinsic uncertainty of each measurement technique.

Microplasmas for Advanced Materials and Devices

Microplasmas are low-temperature plasmas that feature microscale dimensions and a unique high-energy-density and a nonequilibrium reactive environment, which makes them promising for the fabrication of advanced nanomaterials and devices for diverse applications. Here, recent microplasma applications are examined, spanning from high-throughput, printing-technology-compatible synthesis of nanocrystalline particles of common materials types, to water purification and optoelectronic devices. Microplasmas combined with gaseous and/or liquid media at low temperatures and atmospheric pressure open new ways to form advanced functional materials and devices. Specific examples include gas-phase, substrate-free, plasma-liquid, and surface-supported synthesis of metallic, semiconducting, metal oxide, and carbon-based nanomaterials. Representative applications of microplasmas of particular importance to materials science and technology include light sources for multipurpose, efficient VUV/UV light sources for photochemical materials processing and spectroscopic materials analysis, surface disinfection, water purification, active electromagnetic devices based on artificial microplasma optical materials, and other devices and systems including the plasma transistor. The current limitations and future opportunities for microplasma applications in materials related fields are highlighted.