The Effect of Thickness of ZnO Thin Films on Hydrophobic Self-Cleaning Properties

Hydrophilic ZnO thin films doped with ytterbium and europium oxide

Hydrophilic photocatalytically active ZnO and ZnO thin films doped with Yb₂O₃ and Eu₂O₃ (rare earth metal oxide, REM) with optical transmittance exceeding 76% in the visible light range (λ = 550 nm) were prepared by a combination of sol-gel technique, spin-coating and high temperature thermal treatment at 500 and 600 °C. The thin films were tested using advanced research methods, i.e.: morphology and topography and fractures along with approximate thickness values were investigated on scanning electron microscope (SEM), chemical composition was determined using X-ray Energy Dispersive Spectroscopy (X-ray Energy Spectroscopy), topography and roughness were measured on atomic force microscope (AFM), water contact angle values were determined by sitting water droplet method, optical properties of the fabricated materials were investigated using UV/Vis spectrophotometer. The decolorization efficiency of rhodamine B in aqueous solution was analyzed over a period of 190 min, obtaining degradation rates of: 54.7% and 43.1%, for ZnO and ZnO coatings doped with ytterbium oxide and europium oxide, respectively. The roughness of thin hybrid coatings did not exceed 50 nm, ensuring effective absorption of electromagnetic radiation by the layers. The methodology presented by the authors for the fabrication of thin hybrid films characterized by the key properties of self-cleaning coatings can be successfully applied to coatings of photovoltaic panels and architectural glass structures.

Preparation of Very Thin Zinc Oxide Films by Liquid Deposition Process: Review of Key Processing Parameters

We used sol-gel and spin-coating in the original configuration of a liquid deposition process to synthesize particularly thin ZnO films (<100 nm) with nano-granular morphology, high grain orientation and variable optical properties. The concentration of the zinc salt, the concentration of the chelating agent, the nature of the solvent and the substrate material have been identified as key parameters that determine the microstructure of the deposited layer and thus its final properties. The thorough and practical examination of the effects of the synthesis parameters evidenced a three-step growth mechanism for these ZnO thin films: (i) a reaction of precursors, (ii) a formation of nuclei, and (iii) a coalescence of nanoparticles under thermal annealing. The growth of these very thin films is thus conditioned by the interaction between the liquid phase and the substrate especially during the initial steps of the spin coating process. Such thin ZnO films with such nano-granular morphology may be of great interest in various applications, especially those requiring a large active surface area.