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Chin HT, Wang DC, Wang H, Muthu J, Khurshid F, Chen DR, Hofmann M, Chuang FC, Hsieh YP. Confined VLS Growth of Single-Layer 2D Tungsten Nitrides. ACS APPLIED MATERIALS & INTERFACES 2024; 16:1705-1711. [PMID: 38145463 DOI: 10.1021/acsami.3c13286] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 12/26/2023]
Abstract
Two-dimensional (2D) metal nitrides have garnered significant interest due to their potential applications in future electronics and quantum systems. However, the synthesis of such materials with sufficient uniformity and at relevant scales remains an unaddressed challenge. This study demonstrates the potential of confined growth to control and enhance the morphology of 2D metal nitrides. By restricting the reaction volume of vapor-liquid-solid reactions, an enhanced precursor concentration was achieved that reduces the nucleation density, resulting in larger grain sizes and suppression of multilayer growth. Detailed characterization reveals the importance of balancing the energetic and kinetic aspects of tungsten nitride formation toward this ability. The introduction of a promoter enabled the realization of large-scale, single-layer tungsten nitride with a uniform and high interfacial quality. Finally, our advance in morphology control was applied to the production of edge-enriched 2D tungsten nitrides with significantly enhanced hydrogen evolution ability, as indicated by an unprecedented Tafel slope of 55 mV/dec.
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Affiliation(s)
- Hao-Ting Chin
- Molecular Science and Technology Program, Taiwan International Graduate Program, Academia Sinica, Taipei 106, Taiwan
- International Graduate Program of Molecular Science and Technology, National Taiwan University, Taipei 10617, Taiwan
- Institute of Atomic and Molecular Sciences, Academia Sinica, Taipei 106, Taiwan
| | - Deng-Chi Wang
- Department of Physics, National Sun Yat-Sen University, Kaohsiung 80424, Taiwan
| | - Hao Wang
- Department of Physics, National Taiwan University, Taipei 106, Taiwan
| | - Jeyavelan Muthu
- Department of Physics, National Taiwan University, Taipei 106, Taiwan
- Nano Science and Technology Program, Taiwan International Graduate Program, Academia Sinica, Taipei 106, Taiwan
| | - Farheen Khurshid
- Department of Physics, National Taiwan University, Taipei 106, Taiwan
| | - Ding-Rui Chen
- Molecular Science and Technology Program, Taiwan International Graduate Program, Academia Sinica, Taipei 106, Taiwan
- International Graduate Program of Molecular Science and Technology, National Taiwan University, Taipei 10617, Taiwan
- Institute of Atomic and Molecular Sciences, Academia Sinica, Taipei 106, Taiwan
| | - Mario Hofmann
- Department of Physics, National Taiwan University, Taipei 106, Taiwan
| | - Feng-Chuan Chuang
- Department of Physics, National Sun Yat-Sen University, Kaohsiung 80424, Taiwan
- Center for Theoretical and Computational Physics, National Sun Yat-sen University, Kaohsiung 80424, Taiwan
- Physics Division, National Center for Theoretical Sciences, Taipei 10617, Taiwan
| | - Ya-Ping Hsieh
- Institute of Atomic and Molecular Sciences, Academia Sinica, Taipei 106, Taiwan
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Tannic acid- and cation-mediated interfacial self-assembly and epitaxial growth of fullerene (nC60) and kaolinite binary graphitic aggregates. J Colloid Interface Sci 2019; 556:717-725. [DOI: 10.1016/j.jcis.2019.08.106] [Citation(s) in RCA: 3] [Impact Index Per Article: 0.6] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 06/07/2019] [Accepted: 08/28/2019] [Indexed: 12/15/2022]
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Palczynski K, Herrmann P, Heimel G, Dzubiella J. Characterization of step-edge barrier crossing of para-sexiphenyl on the ZnO (101[combining macron]0) surface. Phys Chem Chem Phys 2016; 18:25329-25341. [PMID: 27711631 DOI: 10.1039/c6cp05251g] [Citation(s) in RCA: 5] [Impact Index Per Article: 0.6] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/21/2022]
Abstract
Mass transport processes of conjugated organic molecules (COMs) on inorganic surfaces are essential elements in thin film deposition for hybrid optoelectronic devices. Defects and in particular surface step-edges dictate the molecular nucleation and growth morphology, which itself determine many physical properties of the resulting hybrid interface. Here, we explore the detailed molecular kinetics and transport rates of a single physisorbed para-sexiphenyl (p-6P) molecule crossing a step-edge (a "hetero-Ehrlich-Schwoebel barrier") on the inorganic ZnO (101[combining macron]0) surface by a combination of all-atom molecular dynamics simulations and passage time theory. We determine temperature- and charge-dependent (free) energy landscapes, position-dependent diffusion coefficients, and ultimately the mean first passage time over the step-edges. We find two completely different step-edge crossing mechanisms, the occurrence and rates of which simultaneously depend on both electrostatic and thermal molecule-surface coupling. In weakly coupled systems, the molecule crosses the step relatively quickly (in nanoseconds) by log-roll mechanisms while for strongly coupled systems, it crosses relatively slowly (in microseconds) in a strictly perpendicular fashion. In the latter process, "internal friction" from intramolecular bending and torsional degrees of freedom contribute a significant corrugation to the overall crossing barrier. Furthermore, we show that crossing pathways can also change qualitatively with step-edge height. The great complexity in hetero-barrier crossing of COMs (in contrast to simple atoms) revealed in this study has implications on the interpretation and possible control of nucleation and growth mechanisms at surface defects in hybrid systems.
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Affiliation(s)
- Karol Palczynski
- Institut für Weiche Materie und Funktionale Materialien, Helmholtz-Zentrum Berlin für Materialien und Energie, Hahn-Meitner Platz 1, 14109 Berlin, Germany. and Institut für Physik, Humboldt-Universität zu Berlin, Newtonstr. 15, 12489 Berlin, Germany
| | - Philipp Herrmann
- Institut für Physik, Humboldt-Universität zu Berlin, Newtonstr. 15, 12489 Berlin, Germany
| | - Georg Heimel
- Institut für Physik, Humboldt-Universität zu Berlin, Newtonstr. 15, 12489 Berlin, Germany
| | - Joachim Dzubiella
- Institut für Weiche Materie und Funktionale Materialien, Helmholtz-Zentrum Berlin für Materialien und Energie, Hahn-Meitner Platz 1, 14109 Berlin, Germany. and Institut für Physik, Humboldt-Universität zu Berlin, Newtonstr. 15, 12489 Berlin, Germany
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Chen P, Wang TY, Luo MF. A statistical simulation approach for early stage thin-film growth from vapor-deposited atoms. J Chem Phys 2007; 127:144714. [DOI: 10.1063/1.2790435] [Citation(s) in RCA: 3] [Impact Index Per Article: 0.2] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/14/2022] Open
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Kyuno K, Ehrlich G. Cluster diffusion and dissociation in the kinetics of layer growth: An atomic view. PHYSICAL REVIEW LETTERS 2000; 84:2658-2661. [PMID: 11017293 DOI: 10.1103/physrevlett.84.2658] [Citation(s) in RCA: 4] [Impact Index Per Article: 0.2] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Received: 10/08/1999] [Indexed: 05/23/2023]
Abstract
Data on diffusion and dissociation of single Pt clusters on Pt(111), available for the first time from field ion microscope observations, are used to make predictions about nanoscale phenomena by solving the mean-field differential equations for growth. In the submonolayer regime, cluster dissociation is found to be much more important than diffusion of clusters in reducing the saturation island density. Cluster dissociation also significantly affects the nucleation of a second layer on top of existing clusters and must be considered on an equal footing with interlayer transport over cluster edges.
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Affiliation(s)
- K Kyuno
- Materials Research Laboratory and Department of Materials Science and Engineering, University of Illinois at Urbana-Champaign, Urbana, Illinois 61801, USA
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