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Smalley JST, Ren X, Lee JY, Ko W, Joo WJ, Park H, Yang S, Wang Y, Lee CS, Choo H, Hwang S, Zhang X. Subwavelength pixelated CMOS color sensors based on anti-Hermitian metasurface. Nat Commun 2020; 11:3916. [PMID: 32764547 PMCID: PMC7413260 DOI: 10.1038/s41467-020-17743-y] [Citation(s) in RCA: 6] [Impact Index Per Article: 1.5] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 12/18/2019] [Accepted: 07/14/2020] [Indexed: 11/09/2022] Open
Abstract
The demand for essential pixel components with ever-decreasing size and enhanced performance is central to current optoelectronic applications, including imaging, sensing, photovoltaics and communications. The size of the pixels, however, are severely limited by the fundamental constraints of lightwave diffraction. Current development using transmissive filters and planar absorbing layers can shrink the pixel size, yet there are two major issues, optical and electrical crosstalk, that need to be addressed when the pixel dimension approaches wavelength scale. All these fundamental constraints preclude the continual reduction of pixel dimensions and enhanced performance. Here we demonstrate subwavelength scale color pixels in a CMOS compatible platform based on anti-Hermitian metasurfaces. In stark contrast to conventional pixels, spectral filtering is achieved through structural color rather than transmissive filters leading to simultaneously high color purity and quantum efficiency. As a result, this subwavelength anti-Hermitian metasurface sensor, over 28,000 pixels, is able to sort three colors over a 100 nm bandwidth in the visible regime, independently of the polarization of normally-incident light. Furthermore, the quantum yield approaches that of commercial silicon photodiodes, with a responsivity exceeding 0.25 A/W for each channel. Our demonstration opens a new door to sub-wavelength pixelated CMOS sensors and promises future high-performance optoelectronic systems.
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Affiliation(s)
- Joseph S T Smalley
- Nano-Scale Science and Engineering Center (NSEC), 3112 Etcheverry Hall, University of California Berkeley, Berkeley, CA, 94720, USA
| | - Xuexin Ren
- Nano-Scale Science and Engineering Center (NSEC), 3112 Etcheverry Hall, University of California Berkeley, Berkeley, CA, 94720, USA
| | - Jeong Yub Lee
- Samsung Advanced Institute of Technology, Samsung Electronics Co. Ltd., Samsung-ro 130, Yeongtong-gu, Suwon-si, Gyeonggi-do, 16678, Korea
| | - Woong Ko
- Samsung Advanced Institute of Technology, Samsung Electronics Co. Ltd., Samsung-ro 130, Yeongtong-gu, Suwon-si, Gyeonggi-do, 16678, Korea
| | - Won-Jae Joo
- Samsung Advanced Institute of Technology, Samsung Electronics Co. Ltd., Samsung-ro 130, Yeongtong-gu, Suwon-si, Gyeonggi-do, 16678, Korea
| | - Hongkyu Park
- Samsung Advanced Institute of Technology, Samsung Electronics Co. Ltd., Samsung-ro 130, Yeongtong-gu, Suwon-si, Gyeonggi-do, 16678, Korea
| | - Sui Yang
- Nano-Scale Science and Engineering Center (NSEC), 3112 Etcheverry Hall, University of California Berkeley, Berkeley, CA, 94720, USA
| | - Yuan Wang
- Nano-Scale Science and Engineering Center (NSEC), 3112 Etcheverry Hall, University of California Berkeley, Berkeley, CA, 94720, USA
| | - Chang Seung Lee
- Samsung Advanced Institute of Technology, Samsung Electronics Co. Ltd., Samsung-ro 130, Yeongtong-gu, Suwon-si, Gyeonggi-do, 16678, Korea
| | - Hyuck Choo
- Samsung Advanced Institute of Technology, Samsung Electronics Co. Ltd., Samsung-ro 130, Yeongtong-gu, Suwon-si, Gyeonggi-do, 16678, Korea
| | - Sungwoo Hwang
- Samsung Advanced Institute of Technology, Samsung Electronics Co. Ltd., Samsung-ro 130, Yeongtong-gu, Suwon-si, Gyeonggi-do, 16678, Korea
| | - Xiang Zhang
- Nano-Scale Science and Engineering Center (NSEC), 3112 Etcheverry Hall, University of California Berkeley, Berkeley, CA, 94720, USA.
- Faculties of Sciences and Engineering, University of Hong Kong, Hong Kong, China.
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