Modeling of nonequilibrium surface growth by a limited-mobility model with distributed diffusion length

Temperature Effects in the Initial Stages of Heteroepitaxial Film Growth

Kinetic Monte Carlo simulations of a model of thin film heteroepitaxy are performed to investigate the effects of the deposition temperature in the initial growth stages. Broad ranges of the rates of surface processes are used to model materials with several activation energies and several temperature changes, in conditions of larger diffusivity on the substrate in comparison with other film layers. When films with the same coverage are compared, the roughness increases with the deposition temperature in the regimes of island growth, coalescence, and initial formation of the continuous films. Concomitantly, the position of the minimum of the autocorrelation function is displaced to larger sizes. These apparently universal trends are consequences of the formation of wider and taller islands, and are observed with or without Ehrlich-Schwöebel barriers for adatom diffusion at step edges. The roughness increase with temperature qualitatively matches the observations of recent works on the deposition of inorganic and organic materials. In thicker films, simulations with some parameter sets show the decrease of roughness with temperature. In these cases, a re-entrance of roughness may be observed in the initial formation of the continuous films.

Interplay of orientational order and roughness in simulated thin film growth of anisotropically interacting particles

Roughness and orientational order in thin films of anisotropic particles are investigated using kinetic Monte Carlo simulations on a cubic lattice. Anisotropic next-neighbor interactions between the lattice particles were chosen to mimic the effects of shape anisotropy in the interactions of disk- or rodlike molecules with van der Waals attractions. Increasing anisotropy leads first to a preferred orientation in the film (which is close to the corresponding equilibrium transition) while the qualitative mode of roughness evolution (known from isotropic systems) does not change. At strong anisotropies, an effective step-edge (Ehrlich-Schwoebel) barrier appears and a nonequilibrium roughening effect is found, accompanied by reordering in the film which can be interpreted as the nucleation and growth of domains of lying-down disks or rods. The information on order and roughness is combined into a diagram of dynamic growth modes.

Statistics of adatom diffusion in a model of thin film growth

We study the statistics of the number of executed hops of adatoms at the surface of films grown with the Clarke-Vvedensky (CV) model in simple cubic lattices. The distributions of this number N are determined in films with average thicknesses close to 50 and 100 monolayers for a broad range of values of the diffusion-to-deposition ratio R and of the probability ε that lowers the diffusion coefficient for each lateral neighbor. The mobility of subsurface atoms and the energy barriers for crossing step edges are neglected. Simulations show that the adatoms execute uncorrelated diffusion during the time in which they move on the film surface. In a low temperature regime, typically with Rε≲1, the attachment to lateral neighbors is almost irreversible, the average number of hops scales as 〈N〉∼R^{0.38±0.01}, and the distribution of that number decays approximately as exp[-(N/〈N〉)^{0.80±0.07}]. Similar decay is observed in simulations of random walks in a plane with randomly distributed absorbing traps and the estimated relation between 〈N〉 and the density of terrace steps is similar to that observed in the trapping problem, which provides a conceptual explanation of that regime. As the temperature increases, 〈N〉 crosses over to another regime when Rε^{3.0±0.3}∼1, which indicates high mobility of all adatoms at terrace borders. The distributions P(N) change to simple exponential decays, due to the constant probability for an adatom to become immobile after being covered by a new deposited layer. At higher temperatures, the surfaces become very smooth and 〈N〉∼Rε^{1.85±0.15}, which is explained by an analogy with submonolayer growth. Thus, the statistics of adatom hops on growing film surfaces is related to universal and nonuniversal features of the growth model and with properties of trapping models if the hopping time is limited by the landscape and not by the deposition of other layers.