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Kim SH, Choi PK, Lee YB, Kim TS, Jo MS, Lee SY, Min HW, Yoon JB. An experimental and numerical study on adhesion force at the nanoscale. NANOSCALE ADVANCES 2024; 6:2013-2025. [PMID: 38633052 PMCID: PMC11019507 DOI: 10.1039/d3na01044a] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Grants] [Track Full Text] [Download PDF] [Figures] [Subscribe] [Scholar Register] [Received: 11/24/2023] [Accepted: 02/14/2024] [Indexed: 04/19/2024]
Abstract
Adhesion has attracted great interest in science and engineering especially in the field pertaining to nano-science because every form of physical contact is fundamentally a macroscopic observation of interactions between nano-asperities under the adhesion phenomenon. Despite its importance, no practical adhesion prediction model has been developed due to the complexity of examining contact between nano-asperities. Here, we scrutinized the contact phenomenon and developed a contact model, reflecting the physical sequence in which adhesion develops. For the first time ever, our model analyzes the adhesion force and contact properties, such as separation distance, contact location, actual contact area, and the physical deformation of the asperities, between rough surfaces. Through experiments using atomic force microscopy, we demonstrated a low absolute percentage error of 2.8% and 6.55% between the experimental and derived data for Si-Si and Mo-Mo contacts, respectively, and proved the accuracy and practicality of our model in the analysis of the adhesion phenomenon.
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Affiliation(s)
- Su-Hyun Kim
- School of Electrical Engineering, Korea Advanced Institute of Science and Technology (KAIST) 291 Daehak-ro, Yuseong-gu Daejeon 34141 Republic of Korea
- Samsung Electronics Co., Ltd. 1, Samsungjeonja-ro Hwaseong-si Gyeonggi-do 18448 Republic of Korea
| | - Pan-Kyu Choi
- School of Electrical Engineering, Korea Advanced Institute of Science and Technology (KAIST) 291 Daehak-ro, Yuseong-gu Daejeon 34141 Republic of Korea
- Samsung Electronics Co., Ltd. 1, Samsungjeonja-ro Hwaseong-si Gyeonggi-do 18448 Republic of Korea
| | - Yong-Bok Lee
- School of Electrical Engineering, Korea Advanced Institute of Science and Technology (KAIST) 291 Daehak-ro, Yuseong-gu Daejeon 34141 Republic of Korea
| | - Tae-Soo Kim
- School of Electrical Engineering, Korea Advanced Institute of Science and Technology (KAIST) 291 Daehak-ro, Yuseong-gu Daejeon 34141 Republic of Korea
| | - Min-Seung Jo
- School of Electrical Engineering, Korea Advanced Institute of Science and Technology (KAIST) 291 Daehak-ro, Yuseong-gu Daejeon 34141 Republic of Korea
| | - So-Young Lee
- School of Electrical Engineering, Korea Advanced Institute of Science and Technology (KAIST) 291 Daehak-ro, Yuseong-gu Daejeon 34141 Republic of Korea
| | - Hyun-Woo Min
- School of Electrical Engineering, Korea Advanced Institute of Science and Technology (KAIST) 291 Daehak-ro, Yuseong-gu Daejeon 34141 Republic of Korea
- Samsung Electronics Co., Ltd. 1, Samsungjeonja-ro Hwaseong-si Gyeonggi-do 18448 Republic of Korea
| | - Jun-Bo Yoon
- School of Electrical Engineering, Korea Advanced Institute of Science and Technology (KAIST) 291 Daehak-ro, Yuseong-gu Daejeon 34141 Republic of Korea
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Shi Y, Wu B, Sun S, Wu P. Peeling-Stiffening Self-Adhesive Ionogel with Superhigh Interfacial Toughness. ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2023:e2310576. [PMID: 38095148 DOI: 10.1002/adma.202310576] [Citation(s) in RCA: 2] [Impact Index Per Article: 2.0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 10/11/2023] [Revised: 12/03/2023] [Indexed: 12/20/2023]
Abstract
Self-adhesive materials that can directly adhere to diverse solid surfaces are indispensable in modern life and technologies. However, it remains a challenge to develop self-adhesive materials with strong adhesion while maintaining its intrinsic softness for efficient tackiness. Here, a peeling-stiffening self-adhesive ionogel that reconciles the seemingly contradictory properties of softness and strong adhesion is reported. The ionogel contains two ionophilic repeating units with distinct associating affinities, which allows to adaptively wet rough surface in the soft dissipating state for adhering, and to dramatically stiffen to the glassy state upon peeling. The corresponding modulus increases by 117 times driven by strain-rate-induced phase separation, which greatly suppresses crack propagation and results in a super high interfacial toughness of 8046 J m-2 . The self-adhesive ionogel is also transparent, self-healable, recyclable, and can be easily removed by simple moisture treatment. This strategy provides a new way to design high-performance self-adhesive materials for intelligent soft devices.
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Affiliation(s)
- Yingkun Shi
- State Key Laboratory for Modification of Chemical Fibers and Polymer Materials, College of Chemistry and Chemical Engineering and Center for Advanced Low-dimension Materials, Donghua University, 2999 North Renmin Road, Shanghai, 201620, China
| | - Baohu Wu
- Jülich Centre for Neutron Science (JCNS) at Heinz Maier-Leibnitz Zentrum (MLZ) Forschungszentrum Jülich, Lichtenbergstr. 1, 85748, Garching, Germany
| | - Shengtong Sun
- State Key Laboratory for Modification of Chemical Fibers and Polymer Materials, College of Chemistry and Chemical Engineering and Center for Advanced Low-dimension Materials, Donghua University, 2999 North Renmin Road, Shanghai, 201620, China
| | - Peiyi Wu
- State Key Laboratory for Modification of Chemical Fibers and Polymer Materials, College of Chemistry and Chemical Engineering and Center for Advanced Low-dimension Materials, Donghua University, 2999 North Renmin Road, Shanghai, 201620, China
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Peng L, Hsu CC, Xiao C, Bonn D, Weber B. Controlling Macroscopic Friction through Interfacial Siloxane Bonding. PHYSICAL REVIEW LETTERS 2023; 131:226201. [PMID: 38101386 DOI: 10.1103/physrevlett.131.226201] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Received: 04/24/2023] [Accepted: 10/12/2023] [Indexed: 12/17/2023]
Abstract
Controlling macroscopic friction is crucial for numerous natural and industrial applications, ranging from forecasting earthquakes to miniaturizing semiconductor devices, but predicting and manipulating friction phenomena remains a challenge due to the unknown relationship between nanoscale and macroscopic friction. Here, we show experimentally that dry friction at multiasperity Si-on-Si interfaces is dominated by the formation of interfacial siloxane (Si─O─Si) bonds, the density of which can be precisely regulated by exposing plasma-cleaned silicon surfaces to dry nitrogen. Our results show how the bond density can be used to quantitatively understand and control the macroscopic friction. Our findings establish a unique connection between the molecular scale at which adhesion occurs, and the friction coefficient that is the key macroscopic parameter for industrial and natural tribology challenges.
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Affiliation(s)
- Liang Peng
- Van der Waals-Zeeman Institute, Institute of Physics, University of Amsterdam, Science Park 904, 1098 XH Amsterdam, The Netherlands
| | - Chao-Chun Hsu
- Van't Hoff Institute for Molecular Sciences, University of Amsterdam, 1098 XH Amsterdam, The Netherlands
| | - Chen Xiao
- Van der Waals-Zeeman Institute, Institute of Physics, University of Amsterdam, Science Park 904, 1098 XH Amsterdam, The Netherlands
- Advanced Research Center for Nanolithography (ARCNL), Science Park 106, 1098 XG Amsterdam, The Netherlands
| | - Daniel Bonn
- Van der Waals-Zeeman Institute, Institute of Physics, University of Amsterdam, Science Park 904, 1098 XH Amsterdam, The Netherlands
| | - Bart Weber
- Van der Waals-Zeeman Institute, Institute of Physics, University of Amsterdam, Science Park 904, 1098 XH Amsterdam, The Netherlands
- Advanced Research Center for Nanolithography (ARCNL), Science Park 106, 1098 XG Amsterdam, The Netherlands
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Terwisscha-Dekker H, Hogenelst T, Bliem R, Weber B, Bonn D. Why Teflon is so slippery while other polymers are not. Phys Rev E 2023; 107:024801. [PMID: 36932486 DOI: 10.1103/physreve.107.024801] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 05/13/2022] [Accepted: 01/19/2023] [Indexed: 06/18/2023]
Abstract
Polytetrafluoroethylene [PTFE (Teflon)] is a uniquely slippery polymer, with a coefficient of friction that is an order of magnitude lower than that of other polymers. Though known as nonsticky, PTFE leaves a layer of material behind on the substrate while sliding. Here, we use contact-sensitive fluorescent probes to image the sliding contact in situ: We show that slip happens at an internal PTFE-PTFE interface that has an unusually low shear strength of 0.8 MPa. This weak internal interface directly leads to low friction and enables transfer of the PTFE film to the substrate even in the absence of strong adhesion.
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Affiliation(s)
- Hans Terwisscha-Dekker
- Van der Waals-Zeeman Institute, Institute of Physics, University of Amsterdam, Science Park 904, 1098 XH Amsterdam, the Netherlands
| | - Tadeus Hogenelst
- Van der Waals-Zeeman Institute, Institute of Physics, University of Amsterdam, Science Park 904, 1098 XH Amsterdam, the Netherlands
- Advanced Research Center for Nanolithography (ARCNL), Science Park 106, 1098 XG Amsterdam, the Netherlands
| | - Roland Bliem
- Van der Waals-Zeeman Institute, Institute of Physics, University of Amsterdam, Science Park 904, 1098 XH Amsterdam, the Netherlands
- Advanced Research Center for Nanolithography (ARCNL), Science Park 106, 1098 XG Amsterdam, the Netherlands
| | - Bart Weber
- Van der Waals-Zeeman Institute, Institute of Physics, University of Amsterdam, Science Park 904, 1098 XH Amsterdam, the Netherlands
- Advanced Research Center for Nanolithography (ARCNL), Science Park 106, 1098 XG Amsterdam, the Netherlands
| | - Daniel Bonn
- Van der Waals-Zeeman Institute, Institute of Physics, University of Amsterdam, Science Park 904, 1098 XH Amsterdam, the Netherlands
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Peng L, Hsia FC, Woutersen S, Bonn M, Weber B, Bonn D. Nonmonotonic Friction due to Water Capillary Adhesion and Hydrogen Bonding at Multiasperity Interfaces. PHYSICAL REVIEW LETTERS 2022; 129:256101. [PMID: 36608246 DOI: 10.1103/physrevlett.129.256101] [Citation(s) in RCA: 2] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Received: 05/30/2022] [Accepted: 11/09/2022] [Indexed: 06/17/2023]
Abstract
Capillary adhesion due to water adsorption from the air can contribute to friction, especially for smooth interfaces in humid environments. We show that for multiasperity (naturally oxidized) Si-on-Si interfaces, the friction coefficient goes through a maximum as a function of relative humidity. An adhesion model based on the boundary element method that takes the roughness of the interfaces into account reproduces this nonmonotonic behavior very well. Remarkably, we find the dry friction to be significantly lower than the lubricated friction with macroscopic amounts of water present. The difference is attributed to the hydrogen-bonding network across the interface. Accordingly, the lubricated friction increases significantly if the water is replaced by heavy water (D_{2}O) with stronger hydrogen bonding.
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Affiliation(s)
- Liang Peng
- Van der Waals-Zeeman Institute, Institute of Physics, University of Amsterdam, Science Park 904, 1098 XH Amsterdam, Netherlands
| | - Feng-Chun Hsia
- Van der Waals-Zeeman Institute, Institute of Physics, University of Amsterdam, Science Park 904, 1098 XH Amsterdam, Netherlands
- Advanced Research Center for Nanolithography (ARCNL), Science Park 106, 1098 XG Amsterdam, Netherlands
| | - Sander Woutersen
- Van der Waals-Zeeman Institute, Institute of Physics, University of Amsterdam, Science Park 904, 1098 XH Amsterdam, Netherlands
| | - Mischa Bonn
- Van der Waals-Zeeman Institute, Institute of Physics, University of Amsterdam, Science Park 904, 1098 XH Amsterdam, Netherlands
- Molecular Spectroscopy Department, Max Planck Institute for Polymer Research, Ackermannweg 10, Mainz 55128, Germany
| | - Bart Weber
- Van der Waals-Zeeman Institute, Institute of Physics, University of Amsterdam, Science Park 904, 1098 XH Amsterdam, Netherlands
- Advanced Research Center for Nanolithography (ARCNL), Science Park 106, 1098 XG Amsterdam, Netherlands
| | - Daniel Bonn
- Van der Waals-Zeeman Institute, Institute of Physics, University of Amsterdam, Science Park 904, 1098 XH Amsterdam, Netherlands
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On the Effect of a Rate-Dependent Work of Adhesion in the Detachment of a Dimpled Surface. APPLIED SCIENCES-BASEL 2021. [DOI: 10.3390/app11073107] [Citation(s) in RCA: 5] [Impact Index Per Article: 1.7] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 11/16/2022]
Abstract
Patterned surfaces have proven to be a valuable design to enhance adhesion, increasing hysteresis and the detachment stress at pull-off. To obtain high adhesive performance, soft materials are commonly, used, which easily conform to the countersurface, such as soft polymers and elastomers. Such materials are viscoelastic; i.e., they show rate-dependent properties. Here, the detachment of two half spaces is studied, one being flat and the other having a dimple in the limit of short range adhesion and a power law rate-dependent work of adhesion, as observed by several authors. Literature results have suggested that the dimpled surface would show pressure-sensitive adhesion, showing two possible adhered states, one weak, in partial contact, and one strong when full contact is achieved. By accounting for a power law rate-dependent work of adhesion, the “weak state” may be much stronger than it was in the purely elastic case, and hence the interface may be much more tough to separate. We study the pull-off detachment stress of the dimpled surface, showing that it weakly depends on the preload, but it is strongly affected by the dimensionless unloading rate. Finally, possible implications of the presented results in the detachment of soft materials from rough substrates are discussed.
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Abstract
When an elastomer approaches or retracts from an adhesive indenter, the elastomer’s surface can suddenly become unstable and reshape itself quasi-discontinuously, e.g., when small-scale asperities jump into or snap out of contact. Such dynamics lead to a hysteresis between approach and retraction. In this study, we quantify numerically and analytically the ensuing unavoidable energy loss for rigid indenters with flat, Hertzian and randomly rough profiles. The range of adhesion turns out to be central, in particular during the rarely modeled approach to contact. For example, negligible traction on approach but quite noticeable adhesion for nominal plane contacts hinges on the use of short-range adhesion. Central attention is paid to the design of cohesive-zone models for the efficient simulation of dynamical processes. Our study includes a Griffith’s type analysis for the energy lost during fracture and regeneration of a flat interface. It reveals that the leading-order corrections of the energy loss are due to the finite-range adhesion scale at best, with the third root of the linear mesh size, while leading-order errors in the pull-off force disappear linearly.
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Abstract
It is known that in the presence of surface roughness, adhesion can lead to distinct paths of loading and unloading for the area–load and penetration–load relationships, thus causing hysteretic loss. Here, we investigate the effects that the surface roughness parameters have on such adhesive hysteresis loss. We focus on the frictionless normal contact between soft elastic bodies and, for this reason, we model adhesion according to Johnson, Kendall, and Roberts (JKR) theory. Hysteretic energy loss is found to increase linearly with the true area of contact, while the detachment force is negligibly influenced by the maximum applied load reached at the end of the loading phase. Moreover, for the micrometric roughness amplitude hrms considered in the present work, adhesion hysteresis is found to be affected by the shorter wavelengths of roughness. Specifically, hysteresis losses decrease with increasing fractal dimension and cut-off frequency of the roughness spectrum. However, we stress that a different behavior could occur in other ranges of roughness amplitude.
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