Shear alignment and realignment of sphere-forming and cylinder-forming block-copolymer thin films

Stability and Elasticity of Ultrathin Sphere-Patterned Block Copolymer Films

Sphere-patterned ultrathin block copolymer films are potentially interesting for a variety of applications in nanotechnology. We use self-consistent field theory to investigate the elastic response of sphere monolayer films with respect to in-plane shear, in-plane extension, compression deformations, and bending. The relations between the in-plane elastic moduli are roughly compatible with the expectations for two-dimensional elastic systems with hexagonal symmetry, with one notable exception: The pure shear and the simple shear moduli differ from each other by roughly 20%. Even more importantly, the bending constants are found to be negative, indicating that free-standing block copolymer membranes made of only a sphere monolayer are inherently unstable above the glass transition. Our results are discussed in view of the experimental findings.

Well-Defined Nanostructures by Block Copolymers and Mass Transport Applications in Energy Conversion

With the speedy progress in the research of nanomaterials, self-assembly technology has captured the high-profile interest of researchers because of its simplicity and ease of spontaneous formation of a stable ordered aggregation system. The self-assembly of block copolymers can be precisely regulated at the nanoscale to overcome the physical limits of conventional processing techniques. This bottom-up assembly strategy is simple, easy to control, and associated with high density and high order, which is of great significance for mass transportation through membrane materials. In this review, to investigate the regulation of block copolymer self-assembly structures, we systematically explored the factors that affect the self-assembly nanostructure. After discussing the formation of nanostructures of diverse block copolymers, this review highlights block copolymer-based mass transport membranes, which play the role of “energy enhancers” in concentration cells, fuel cells, and rechargeable batteries. We firmly believe that the introduction of block copolymers can facilitate the novel energy conversion to an entirely new plateau, and the research can inform a new generation of block copolymers for more promotion and improvement in new energy applications.

Developing Anisotropy in Self-Assembled Block Copolymers: Methods, Properties, and Applications

Block copolymers (BCPs) self-assembly has continually attracted interest as a means to provide bottom-up control over nanostructures. While various methods have been demonstrated for efficiently ordering BCP nanodomains, most of them do not generically afford control of nanostructural orientation. For many applications of BCPs, such as energy storage, microelectronics, and separation membranes, alignment of nanodomains is a key requirement for enabling their practical use or enhancing materials performance. This review focuses on summarizing research progress on the development of anisotropy in BCP systems, covering a variety of topics from established aligning techniques, resultant material properties, and the associated applications. Specifically, the significance of aligning nanostructures and the anisotropic properties of BCPs is discussed and highlighted by demonstrating a few promising applications. Finally, the challenges and outlook are presented to further implement aligned BCPs into practical nanotechnological applications, where exciting opportunities exist.

Dynamic Ordering in High-χ Block Copolymer Lamellae Based on Cross-Sectional Orientational Alignment

Further development of next-generation block copolymer (BCP) lithography processes is contingent on comprehensive studies of the ordering dynamics of high-χ BCPs that can form sub-10 nm features on thin films. However, quantitative analyses of the degree of ordering on the surface and cross sections of thin films have been difficult to execute. To tackle this challenge, we employ a perpendicular lamella-forming high-χ BCP, poly(polyhedral oligomeric silsesquixone-block-2,2,2-trifluoroethyl methacrylate) (PMAPOSS-b-PTFEMA), and reveal that the high-χ PMAPOSS-b-PTFEMA requires three times the activation energy (E_a) compared to that of poly(styrene-block-methyl methacrylate) (PS-b-PMMA) for defect annihilation, at E_a = 2600 ± 420 kJ mol^-1, and a transition from a fast ordering regime with a growth exponent of Φ = 0.30 at lower orientational order parameters (ψ₂ < 0.36) to a slow ordering regime with Φ < 0.05 at ψ₂ > 0.36, where well-aligned lamellae restrict defect annihilations to enthalpically unfavorable glide mechanisms that require BCP intermixing.

Curvature as a Guiding Field for Patterns in Thin Block Copolymer Films

Experimental data on thin films of cylinder-forming block copolymers (BC)-free-standing BC membranes as well as supported BC films-strongly suggest that the local orientation of the BC patterns is coupled to the geometry in which the patterns are embedded. We analyze this phenomenon using general symmetry considerations and numerical self-consistent field studies of curved BC films in cylindrical geometry. The stability of the films against curvature-induced dewetting is also analyzed. In good agreement with experiments, we find that the BC cylinders tend to align along the direction of curvature at high curvatures. At low curvatures, we identify a transition from perpendicular to parallel alignment in supported films, which is absent in free-standing membranes. Hence both experiments and theory show that curvature can be used to manipulate and align BC patterns.

Shear-induced parallel and transverse alignments of cylinders in thin films of diblock copolymers

Coarse-grained Langevin dynamics simulations were performed to investigate the alignment behavior of monolayer films of cylinder-forming diblock copolymers under steady shear, a structure of significant importance for many technical applications such as nanopatterning. The influences of shear conditions, the interactions involved in the films, and the initial morphology of the cylinder-forming phase were examined. Our results showed that above a critical shear rate, the cylinders can align either along the shearing direction or transverse (log-rolling) to the shearing direction depending on the relative strength between the interchain attraction in the cylinders (εAA) and the surface attraction of the confining walls with the film (εBW). To understand the underlying mechanism, the microscopic properties of the films under shear were systematically investigated. It was found that at low εAA/εBW, the majority blocks of the diblock polymer that are adsorbed on the confining walls prefer to move synchronously with the walls, inducing the cylinder-forming blocks to align along the flow direction. When εAA/εBW is above a threshold value, a strong attraction between the cylinder-forming blocks restrains their movement during shear, leading to the log-rolling motions of the cylinders. To predict the threshold εAA/εBW, we developed an approach based on equilibrium thermodynamics data and found good agreement with our shear simulations.

Ordering block copolymers with structured electrodes

We study the kinetics of alignment and registration of block copolymers in an inhomogeneous electric field by computer simulations of a soft, coarse-grained model. The two blocks of the symmetric diblock copolymers are characterized by different dielectric constants. First, we demonstrate that a combination of graphoepitaxy and a homogeneous electric field extends the maximal distance between the topographical guiding patterns that result in defect-free ordering compared to graphoepitaxy alone. In a second study, the electric field in the thin block copolymer film is fabricated by spatially structured electrodes on an isolating substrate arranged in a one-dimensional periodic array; no additional topographical guiding patterns are applied. The dielectrophoretic effect induces long-range orientational order of the lamellae and, additionally, registers the lamellar structure with the electrodes due to the field inhomogeneities at the edges of the structured electrodes. Thus, orientational and translational order is established by the inhomogeneous electric field. The simulations identify a process protocol of time-dependent electric potentials that suppresses defect formation by initially forming a sandwich-like structure and subsequently reorienting these lying into standing lamellae that are registered with the structure of the electrodes. This process-directed self-assembly results in large defect-free arrays of aligned and registered lamellae using electrodes with a saw-tooth period of 4 lamellar periodicities, L₀, and a spacing of 10L₀.

Rapid ordering of block copolymer thin films

Block-copolymers self-assemble into diverse morphologies, where nanoscale order can be finely tuned via block architecture and processing conditions. However, the ultimate usage of these materials in real-world applications may be hampered by the extremely long thermal annealing times-hours or days-required to achieve good order. Here, we provide an overview of the fundamentals of block-copolymer self-assembly kinetics, and review the techniques that have been demonstrated to influence, and enhance, these ordering kinetics. We discuss the inherent tradeoffs between oven annealing, solvent annealing, microwave annealing, zone annealing, and other directed self-assembly methods; including an assessment of spatial and temporal characteristics. We also review both real-space and reciprocal-space analysis techniques for quantifying order in these systems.

Reversible Switching of Block Copolymer Nanopatterns by Orthogonal Electric Fields

It is demonstrated that the orientation of striped patterns can be reversibly switched between two perpendicular in-plane orientations upon exposure to electric fields. The results on thin films of symmetric polystyrene-block-poly(2-vinyl pyridine) polymer in the intermediate segregation regime disclose two types of reorientation mechanisms from perpendicular to parallel relative to the electric field orientation. Domains orient via grain rotation and via formation of defects such as stretched undulations and temporal phase transitions. The contribution of additional fields to the structural evolution is also addressed to elucidate the generality of the observed phenomena. In particular solvent effects are considered. This study reveals the stabilization of the meta-stable in-plane oriented lamella due to sequential swelling and quenching of the film. Further, the reorientation behavior of lamella domains blended with selective nanoparticles is addressed, which affect the interfacial tensions of the blocks and hence introduce another internal field to the studied system. Switching the orientation of aligned block copolymer patterns between two orthogonal directions may open new applications of nanomaterials as switchable electric nanowires or optical gratings.

Direct Immersion Annealing of Thin Block Copolymer Films

We demonstrate ordering of thin block copolymer (BCP) films via direct immersion annealing (DIA) at enhanced rate leading to stable morphologies. The BCP films are immersed in carefully selected mixtures of good and marginal solvents that can impart enhanced polymer mobility, while inhibiting film dissolution. DIA is compatible with roll-to-roll assembly manufacturing and has distinct advantages over conventional thermal annealing and batch processing solvent-vapor annealing methods. We identify three solvent composition-dependent BCP film ordering regimes in DIA for the weakly interacting polystyrene-poly(methyl methacrylate) (PS-PMMA) system: rapid short-range order, optimal long-range order, and a film instability regime. Kinetic studies in the "optimal long-range order" processing regime as a function of temperature indicate a significant reduction of activation energy for BCP grain growth compared to oven annealing at conventional temperatures. An attractive feature of DIA is its robustness to ordering other BCP (e.g. PS-P2VP) and PS-PMMA systems exhibiting spherical, lamellar and cylindrical ordering.

Wrinkles and splay conspire to give positive disclinations negative curvature

Recently, there has been renewed interest in the coupling between geometry and topological defects in crystalline and striped systems. Standard lore dictates that positive disclinations are associated with positive Gaussian curvature, whereas negative disclinations give rise to negative curvature. Here, we present a diblock copolymer system exhibiting a striped columnar phase that preferentially forms wrinkles perpendicular to the underlying stripes. In free-standing films this wrinkling behavior induces negative Gaussian curvature to form in the vicinity of positive disclinations.

Defects in the Self-Assembly of Block Copolymers and Their Relevance for Directed Self-Assembly

Block copolymer self-assembly provides a platform for fabricating dense, ordered nanostructures by encoding information in the chemical architecture of multicomponent macromolecules. Depending on the volume fraction of the components and chain topology, these macromolecules form a variety of spatially periodic microphases in thermodynamic equilibrium. The kinetics of self-assembly, however, often results in initial morphologies with defects, and the subsequent ordering is protracted. Different strategies have been devised to direct the self-assembly of copolymer materials by external fields to align and perfect the self-assembled nanostructures. Understanding and controlling the thermodynamics of defects, their response to external fields, and their dynamics is important because applications in microelectronics either require extremely low defect densities or aim at generating specific defects at predetermined locations to fabricate irregular device-oriented structures for integrated circuits. In this review, we discuss defect morphologies of block copolymers in the bulk and thin films, highlighting (a) analogies to and differences from defects in other crystalline materials, (b) the stability of defects and their dynamics, and (c) the influence of external fields.

Strain rate effects on symmetric diblock copolymer liquid bridges: order-induced stability of polymer fibres

Optical microscopy is used to study the effect of lamellar order on the evolution of polymer-melt bridges. Measurements are performed on symmetric diblock copolymers and linear homopolymers in the melt state. Diblock copolymer bridges measured in the disordered phase are shown to exhibit the same strain rate response as their homopolymer counterparts: shear thinning at low strain rates and shear thickening at high strain rates. However, when measured in the ordered phase, copolymer-melt bridges demonstrate an increased effective viscosity due to the lamellar order and a shear thinning response over the entire range of strain rates probed. The increased viscosity demonstrates an enhanced stability in lamellae forming diblock liquid bridges, presumed to be caused by the isotropic orientational order of lamellar domains that provide energy barriers to flow within the bridge. The shear thinning can be understood as an alignment of lamellae along the axis of the bridge due to flow, facilitating unimpeded diffusion of polymer out of the liquid bridge along lamellar boundaries.

A generalized method for alignment of block copolymer films: solvent vapor annealing with soft shear

One of the key issues associated with the utilization of block copolymer (BCP) thin films in nanoscience and nanotechnology is control of their alignment and orientation over macroscopic dimensions. We have recently reported a method, solvent vapor annealing with soft shear (SVA-SS), for fabricating unidirectional alignment of cylindrical nanostructures. This method is a simple extension of the common SVA process by adhering a flat, crosslinked poly(dimethylsiloxane) (PDMS) pad to the BCP thin film. The impact of processing parameters, including annealing time, solvent removal rate and the physical properties of the PDMS pad, on the quality of alignment quantified by the Herman's orientational factor (S) is systematically examined for a model system of polystyrene-block-polyisoprene-block-polystyrene (SIS). As annealing time increases, the SIS morphology transitions from isotropic rods to highly aligned cylinders. Decreasing the rate of solvent removal, which impacts the shear rate imposed by the contraction of the PDMS, improves the orientation factor of the cylindrical domains; this suggests the nanostructure alignment is primarily induced by contraction of PDMS during solvent removal. Moreover, the physical properties of the PDMS controlled by the crosslink density impact the orientation factor by tuning its swelling extent during SVA-SS and elastic modulus. Decreasing the PDMS crosslink density increases S; this effect appears to be primarily driven by the changes in the solubility of the SVA-SS solvent in the PDMS. With this understanding of the critical processing parameters, SVA-SS has been successfully applied to align a wide variety of BCPs including polystyrene-block-polybutadiene-block-polystyrene (SBS), polystyrene-block-poly(N,N-dimethyl-n-octadecylammonium p-styrenesulfonate) (PS-b-PSS-DMODA), polystyrene-block-polydimethylsiloxane (PS-b-PDMS) and polystyrene-block-poly(2-vinlypyridine) (PS-b-P2VP). These results suggest that SVA-SS is a generalizable method for the alignment of BCP thin films.

Mixed-morphology and mixed-orientation block copolymer bilayers

Three-dimensional block copolymer structures with long-range order and mixed symmetries.

Orientational order in cylinder-forming block copolymer thin films

Shear can impart a high degree of orientational order to supported block copolymer thin films containing one or more layers of cylindrical microdomains, leading to a striped pattern with a period of tens of nanometers extending over macroscopic (centimeter-squared) areas. Though the as-deposited films have a polygrain structure, after shearing at sufficiently high stresses the only defects which remain are isolated dislocations, and the orientational order can be quite high (nematic or twofold orientational order parameter >0.99, as measured by tapping-mode atomic force microscopy). The effect of isolated dislocations on orientational order is adequately captured by an isotropic elastic continuum model of the structure surrounding the dislocation, producing a linear decrease of order parameter with dislocation density. Even at zero dislocation density, however, the order parameter does not quite reach unity, due to small-amplitude undulations of the cylinders about their axes which persist in the transverse direction over several cylinder periods.

Domain patterns in a diblock copolymer-diblock copolymer mixture with oscillatory particles

We investigate the orientational order transition of striped patterns in microphase structures of diblock copolymer-diblock copolymer mixtures in the presence of periodic oscillatory particles. Under certain conditions, although the macrophase separation of a system is almost isotropic, microphase separation of one diblock copolymer takes place and becomes anisotropic gradually. By changing the oscillatory frequency and amplitude, the orientational order transition of a striped microphase structure from the state parallel to the oscillatory direction to the state perpendicular to the oscillatory direction is observed. We also find that the order transition occurs when we change the initial composition ratio. Furthermore, we examine the domain size and the orientational order parameter of microstructure in the process of orientational order transition. The results may provide guidance for experimentalists. This model system can also give a simple way to realize orientational order transition of soft materials by changing the oscillatory field.

Dynamics of dislocations in a two-dimensional block copolymer system with hexagonal symmetry

Block copolymer thin films have attracted considerable attention for their ability to self-assemble into nanometre-scale architectures. Recent advances in the use of block copolymer thin films as nano-lithographic masks have driven research efforts in order to have better control of long-range ordering in the plane of the film. Irrespective of the method of sample preparation, different quasi-two-dimensional systems with hexagonal symmetry unavoidably contain translational defects, called dislocations. Dislocations control the process of coarsening in the nano/meso-scales and provide one of the most important mechanisms of length-scale selection in hexagonal patterns. Although in the last decade the nonlinear dynamics of topological defects in quasi-two-dimensional systems has witnessed significant progress, still little is known about the role of external fields on the creation and annihilation mechanisms involved in the relaxation process towards equilibrium states. In this paper, the dynamics of dislocations in non-optimal hexagonal patterns is studied in the framework of the Ohta-Kawasaki model for a diblock copolymer. Measurements of the climb and glide velocities as a function of the wave vector deformation reveal the main mechanisms of relaxation associated with the motion of dislocations.

Controlling Order in Block Copolymer Thin Films for Nanopatterning Applications

An attractive “unconventional” lithographic technique to pattern periodic, sub-100 nm features uses self-assembled block copolymer thin films as etch masks. Unfortunately, as-cast films lack the orientational and positional order of the microphase-separated domains that are necessary for many desired applications. Reviewed herein are techniques developed to guide the self-assembly process in thin films, which permit varying degrees of control over the patterns formed by the microdomains. Techniques that can control the out-of-plane order of the microdomains are first summarized. Then, techniques that control the lateral ordering are reviewed, beginning with those that generate large defect-free grains, then those that impart orientational order to the microdomains, and finally those that can control both the orientation and position of individual microdomains. Each technique is summarized with experimental examples and discussions regarding the mechanism of the guided self-assembly process.