Dynamic scaling in thin-film growth with irreversible step-edge attachment

Effects of Adsorbate Diffusion and Edges in a Transition from Particle to Dendritic Morphology during Silver Electrodeposition

During silver electrodeposition on Au nanoparticle (NP)-covered highly oriented pyrolitic graphite, a transition from an initial growth of microsized particles to the growth of dendrites with pine tree shape (nanotrees) is observed, which is an advancement for material growth with hierarchical surface roughness. Using kinetic Monte Carlo simulations of an electrodeposition model, those results are explained by the interplay of diffusive cation flux in the electrolyte and relaxation of adsorbed atoms by diffusion on quenched crystal surfaces. First, simulations on NP-patterned substrates show the initial growth of faceted silver particles, followed by the growth of nanotrees with shapes similar to the experiments. Next, simulations on electrodes with large prebuilt particles explain the preferential nanotree growth at corners and edges as a tip effect. Simulations on wide flat electrodes relate the nanotree width with two model parameters describing surface diffusion of silver atoms: maximal number of random hops (G) and probability of hop per neighbor (P). Finally, simulations with small electrode seeds confirm the transition from initially compact particles to the nucleation of nanotrees and provide estimates of the transition sizes as a function of those parameters. The simulated compact and dendritic deposits show dominant (111) surface orientation, as observed in experiments. Extrapolations of simulation results to match microparticle and nanotree sizes lead to G = 4 × 10¹¹ and P = 0.03, suggesting to interpret those sizes as diffusion lengths on the growing surfaces and giving diffusion coefficients 2 to 3 × 10^-13 m²/s for deposited silver atoms. These results may motivate studies to relate diffusion coefficients with atomic-scale interactions.

Temperature Effects in the Initial Stages of Heteroepitaxial Film Growth

Kinetic Monte Carlo simulations of a model of thin film heteroepitaxy are performed to investigate the effects of the deposition temperature in the initial growth stages. Broad ranges of the rates of surface processes are used to model materials with several activation energies and several temperature changes, in conditions of larger diffusivity on the substrate in comparison with other film layers. When films with the same coverage are compared, the roughness increases with the deposition temperature in the regimes of island growth, coalescence, and initial formation of the continuous films. Concomitantly, the position of the minimum of the autocorrelation function is displaced to larger sizes. These apparently universal trends are consequences of the formation of wider and taller islands, and are observed with or without Ehrlich-Schwöebel barriers for adatom diffusion at step edges. The roughness increase with temperature qualitatively matches the observations of recent works on the deposition of inorganic and organic materials. In thicker films, simulations with some parameter sets show the decrease of roughness with temperature. In these cases, a re-entrance of roughness may be observed in the initial formation of the continuous films.

Statistics of adatom diffusion in a model of thin film growth

We study the statistics of the number of executed hops of adatoms at the surface of films grown with the Clarke-Vvedensky (CV) model in simple cubic lattices. The distributions of this number N are determined in films with average thicknesses close to 50 and 100 monolayers for a broad range of values of the diffusion-to-deposition ratio R and of the probability ε that lowers the diffusion coefficient for each lateral neighbor. The mobility of subsurface atoms and the energy barriers for crossing step edges are neglected. Simulations show that the adatoms execute uncorrelated diffusion during the time in which they move on the film surface. In a low temperature regime, typically with Rε≲1, the attachment to lateral neighbors is almost irreversible, the average number of hops scales as 〈N〉∼R^{0.38±0.01}, and the distribution of that number decays approximately as exp[-(N/〈N〉)^{0.80±0.07}]. Similar decay is observed in simulations of random walks in a plane with randomly distributed absorbing traps and the estimated relation between 〈N〉 and the density of terrace steps is similar to that observed in the trapping problem, which provides a conceptual explanation of that regime. As the temperature increases, 〈N〉 crosses over to another regime when Rε^{3.0±0.3}∼1, which indicates high mobility of all adatoms at terrace borders. The distributions P(N) change to simple exponential decays, due to the constant probability for an adatom to become immobile after being covered by a new deposited layer. At higher temperatures, the surfaces become very smooth and 〈N〉∼Rε^{1.85±0.15}, which is explained by an analogy with submonolayer growth. Thus, the statistics of adatom hops on growing film surfaces is related to universal and nonuniversal features of the growth model and with properties of trapping models if the hopping time is limited by the landscape and not by the deposition of other layers.

Modeling of nonequilibrium surface growth by a limited-mobility model with distributed diffusion length

Kinetic Monte Carlo (KMC) simulations are a well-established numerical tool to investigate the time-dependent surface morphology in molecular beam epitaxy experiments. In parallel, simplified approaches such as limited mobility (LM) models characterized by a fixed diffusion length have been studied. Here we investigate an extended LM model to gain deeper insight into the role of diffusional processes concerning the growth morphology. Our model is based on the stochastic transition rules of the Das Sarma-Tamborena model but differs from the latter via a variable diffusion length. A first guess for this length can be extracted from the saturation value of the mean-squared displacement calculated from short KMC simulations. Comparing the resulting surface morphologies in the sub- and multilayer growth regime to those obtained from KMC simulations, we find deviations which can be cured by adding fluctuations to the diffusion length. This mimics the stochastic nature of particle diffusion on a substrate, an aspect which is usually neglected in LM models. We propose to add fluctuations to the diffusion length by choosing this quantity for each adsorbed particle from a Gaussian distribution, where the variance of the distribution serves as a fitting parameter. We show that the diffusional fluctuations have a huge impact on cluster properties during submonolayer growth as well as on the surface profile in the high coverage regime. The analysis of the surface morphologies on one- and two-dimensional substrates during sub- and multilayer growth shows that the LM model can produce structures that are indistinguishable to the ones from KMC simulations at arbitrary growth conditions.

Effects of a kinetic barrier on limited-mobility interface growth models

The role played by a kinetic barrier originated by out-of-plane step edge diffusion, introduced by Leal et al. [J. Phys.: Condens. Matter 23, 292201 (2011)JCOMEL0953-898410.1088/0953-8984/23/29/292201], is investigated in the Wolf-Villain and Das Sarma-Tamborenea models with short-range diffusion. Using large-scale simulations, we observe that this barrier is sufficient to produce growth instability, forming quasiregular mounds in one and two dimensions. The characteristic surface length saturates quickly indicating a uncorrelated growth of the three-dimensional structures, which is also confirmed by a growth exponent β=1/2. The out-of-plane particle current shows a large reduction of the downward flux in the presence of the kinetic barrier enhancing, consequently, the net upward diffusion and the formation of three-dimensional self-assembled structures.

Crossover from compact to branched films in electrodeposition with surface diffusion

We study a model for thin film electrodeposition in which instability development by preferential adsorption and reduction of cations at surface peaks competes with surface relaxation by diffusion of the adsorbates. The model considers cations moving in a supported electrolyte, adsorption and reduction when they reach the film surface, and consequent production of mobile particles that execute activated surface diffusion, which is represented by a sequence of random hops to neighboring lattice sites with a maximum of G hop attempts (G≫1), a detachment probability ε<1 per neighboring particle, and a no-desorption condition. Computer simulations show the formation of a compact wetting layer followed by the growth of branched deposits. The maximal thickness z_{c} of that layer increases with G but is weakly affected by ε. A scaling approach describes the crossover from smooth film growth to unstable growth and predicts z_{c}∼G^{γ}, with γ=1/[2(1-ν)]≈0.43, where ν≈0.30 is the inverse of the dynamical exponent of the Villain-Lai-Das Sarma equation that describes the initial roughening. Using previous results for related deposition models, the thickness z_{c} can be predicted as a function of an activation energy for terrace surface diffusion and the temperature, and the small effects of the parameter ε are justified. These predictions are confirmed by the numerical results with good accuracy. We discuss possible applications, with a particular focus on the growth of multifuncional structures with stacking layers of different porosity.

Effects of film growth kinetics on grain coarsening and grain shape

We study models of grain nucleation and coarsening during the deposition of a thin film using numerical simulations and scaling approaches. The incorporation of new particles in the film is determined by lattice growth models in three different universality classes, with no effect of the grain structure. The first model of grain coarsening is similar to that proposed by Saito and Omura [Phys. Rev. E 84, 021601 (2011)PLEEE81539-375510.1103/PhysRevE.84.021601], in which nucleation occurs only at the substrate, and the grain boundary evolution at the film surface is determined by a probabilistic competition of neighboring grains. The surface grain density has a power-law decay, with an exponent related to the dynamical exponent of the underlying growth kinetics, and the average radius of gyration scales with the film thickness with the same exponent. This model is extended by allowing nucleation of new grains during the deposition, with constant but small rates. The surface grain density crosses over from the initial power law decay to a saturation; at the crossover, the time, grain mass, and surface grain density are estimated as a function of the nucleation rate. The distributions of grain mass, height, and radius of gyration show remarkable power law decays, similar to other systems with coarsening and particle injection, with exponents also related to the dynamical exponent. The scaling of the radius of gyration with the height h relative to the base of the grain show clearly different exponents in growth dominated by surface tension and growth dominated by surface diffusion; thus it may be interesting for investigating the effects of kinetic roughening on grain morphology. In growth dominated by surface diffusion, the increase of grain size with temperature is observed.

Smoothening in thin-film deposition on rough substrates

The evolution of the surface roughness W of a thin film deposited on a rough substrate is studied with a model of temperature-activated adatom diffusion, irreversible lateral aggregation, and no step energy barrier, in which the main parameter is the ratio R of diffusion and deposition rates. At sufficiently low temperatures (R≲10), the average number of adatom steps after adsorption is very small, thus W monotonically increases with time t due to an approximately uncorrelated deposition at short times. If the temperature is not very low (R∼10(3) or larger), smoothening occurs at short times and the Villain-Lai-Das Sarma (VLDS) growth equation governs the long time roughening, which is attained after a crossover time t(c) that increases with the correlation length ξ(i) of the substrate. Scaling arguments predict the dependence of t(c) on temperature and on the substrate production time and the scaling relation for the difference between the roughness of films deposited on rough and flat substrates, in good agreement with numerical results. The effect of temperature is not a direct extension of previous results on flat substrates because the short wavelength fluctuations delay the formation of terraces. For this reason, the effective energy obtained from the dependence of t(c) on R is 40% of the energy of activated adatom diffusion. A scaling law for the initial smoothening is proposed as W/W(i)=Ψ(t/t(c1)), with a crossover time t(c1)≡R(-θ)ξ(i)(z), where W(i) is the substrate roughness, θ≈0.4, and z is the VLDS dynamical exponent. It provides good data collapse if W is not very small and is suggested to be tested experimentally.

Random walk on lattices: graph-theoretic approach to simulating long-range diffusion-attachment growth models

Interest in thin-film fabrication for industrial applications have driven both theoretical and computational aspects of modeling its growth. One of the earliest attempts toward understanding the morphological structure of a film's surface is through a class of solid-on-solid limited-mobility growth models such as the Family, Wolf-Villain, or Das Sarma-Tamborenea models, which have produced fascinating surface roughening behaviors. These models, however, restrict the motion of an incidence atom to be within the neighborhood of its landing site, which renders them inept for simulating long-distance surface diffusion such as that observed in thin-film growth using a molecular-beam epitaxy technique. Naive extension of these models by repeatedly applying the local diffusion rules for each hop to simulate large diffusion length can be computationally very costly when certain statistical aspects are demanded. We present a graph-theoretic approach to simulating a long-range diffusion-attachment growth model. Using the Markovian assumption and given a local diffusion bias, we derive the transition probabilities for a random walker to traverse from one lattice site to the others after a large, possibly infinite, number of steps. Only computation with linear-time complexity is required for the surface morphology calculation without other probabilistic measures. The formalism is applied, as illustrations, to simulate surface growth on a two-dimensional flat substrate and around a screw dislocation under the modified Wolf-Villain diffusion rule. A rectangular spiral ridge is observed in the latter case with a smooth front feature similar to that obtained from simulations using the well-known multiple registration technique. An algorithm for computing the inverse of a class of substochastic matrices is derived as a corollary.

Normal dynamic scaling in the class of the nonlinear molecular-beam-epitaxy equation

The scaling of local height fluctuations is studied numerically in lattice growth models of the class of the nonlinear stochastic equation of Villain-Lai-Das Sarma (VLDS) in substrate dimensions d=1 and 2. In d=1, the average local slopes of the conserved restricted solid-on-solid (CRSOS) models converge to a finite value in the long-time limit, with power-law corrections in time whose exponents are close to 0.1. Other VLDS models in d=1, such as that of Das Sarma and Tamborenea, show a divergence of local slopes up to 10(6) monolayers, typical of anomalous roughening, but a comparison of roughness distributions shows that they scale as the linear fourth-order growth equation in those time scales. Normal scaling is also obtained in a modified VLDS equation with instability suppression, in contrast to recent numerical works. In d=2, a CRSOS model and a model with lateral aggregation of diffusing particles show normal scaling of the local slopes, also with small correction exponents. These results consistently show that the VLDS class has normal dynamic scaling in d=1 and 2, in agreement with the theoretical predictions of Phys. Rev. Lett. 94, 166103 (2005), and they show that the apparently anomalous features observed in previous works are effects of large scaling correction terms or crossover effects.