Surface morphology of a modified ballistic deposition model

Scaling of roughness and porosity in thin film deposition with mixed transport mechanisms and adsorption barriers

Thin film deposition with particle transport mixing collimated and diffusive components and with barriers for adsorption are studied using numerical simulations and scaling approaches. Biased random walks on lattices are used to model the particle flux and the analogy with advective-diffusive transport is used to define a Peclet number P that represents the effect of the bias towards the substrate. An aggregation probability that relates the rates of adsorption and of the dominant transport mechanism plays the role of a Damkohler number D, where D≲1 is set to describe moderate to low adsorption rates. Very porous deposits with sparse branches are obtained with P≪1, whereas low porosity deposits with large height fluctuations at short scales are obtained with P≫1. For P≳1 in which the field bias is intense, an initial random deposition is followed by Kardar-Parisi-Zhang (KPZ) roughening. As the transport is displaced from those limiting conditions, the interplay of the transport and adsorption mechanisms establishes a condition to produce films with the smoothest surfaces for a constant deposited mass: with low adsorption barriers, a balance of random and collimated flux is required, whereas for high barriers the smoothest surfaces are obtained with P∼D^{1/2}. For intense bias, the roughness is shown to be a power law of P/D, whose exponent depends on the growth exponent β of the KPZ class, and the porosity has a superuniversal scaling as (P/D)^{-1/3}. We also study a generalized ballistic deposition model with slippery particle aggregation that shows the universality of these relations in growth with dominant collimated flux, particle adsorption at any point of the deposit, and negligible adsorbate diffusion, in contrast with the models where aggregation is restricted to the outer surface.

Surface properties and scaling behavior of a generalized ballistic deposition model

The surface exponents, scaling behavior, and bulk porosity of a generalized ballistic deposition (GBD) model are studied. In nature, there exist particles with varying degrees of stickiness ranging from completely nonsticky to fully sticky. Such particles may adhere to any one of the successively encountered surfaces, depending on a sticking probability that is governed by the underlying stochastic mechanism. The microscopic configurations possible in this model are much larger than those allowed in existing models of ballistic deposition and competitive growth models that seek to mix ballistic and random deposition processes. In this article, we find the scaling exponents for surface width and porosity for the proposed GBD model. In terms of scaled width W[over ̃] and scaled time t[over ̃], the numerical data collapse onto a single curve, demonstrating successful scaling with sticking probability p and system size L. Similar scaling behavior is also found for the porosity.

Transition from compact to porous films in deposition with temperature-activated diffusion

We study a thin-film growth model with temperature activated diffusion of adsorbed particles, allowing for the formation of overhangs and pores, but without detachment of adatoms or clusters from the deposit. Simulations in one-dimensional substrates are performed for several values of the diffusion-to-deposition ratio R of adatoms with a single bond and of the detachment probability ε per additional nearest neighbor, respectively, with activation energies are E(s) and E(b). If R and ε independently vary, regimes of low and high porosity are separated at 0.075≤ε(c)≤0.09, with vanishingly small porosity below that point and finite porosity for larger ε. Alternatively, for fixed values of E(s) and E(b) and varying temperature, the porosity has a minimum at T(c), and a nontrivial regime in which it increases with temperature is observed above that point. This is related to the large mobility of adatoms, resembling features of equilibrium surface roughening. In this high-temperature region, the deposit has the structure of a critical percolation cluster due to the nondesorption. The pores are regions enclosed by blobs of the corresponding percolating backbone, thus the distribution of pore size s is expected to scale as s(-τ̃) with τ̃≈1.45, in reasonable agreement with numerical estimates. Roughening of the outer interface of the deposits suggests Villain-Lai-Das Sarma scaling below the transition. Above the transition, the roughness exponent α≈0.35 is consistent with the percolation backbone structure via the relation α=2-d(B), where d(B) is the backbone fractal dimension.

Kinetic roughening and porosity scaling in film growth with subsurface lateral aggregation

We study surface and bulk properties of porous films produced by a model in which particles incide perpendicularly to a substrate, interact with deposited neighbors in its trajectory, and aggregate laterally with probability of order a at each position. The model generalizes ballisticlike models by allowing attachment to particles below the outer surface. For small values of a, a crossover from uncorrelated deposition (UD) to correlated growth is observed. Simulations are performed in 1+1 and 2+1 dimensions. Extrapolation of effective exponents and comparison of roughness distributions confirm Kardar-Parisi-Zhang roughening of the outer surface for a>0. A scaling approach for small a predicts crossover times as a(-2/3) and local height fluctuations as a(-1/3) at the crossover, independent of substrate dimension. These relations are different from all previously studied models with crossovers from UD to correlated growth due to subsurface aggregation, which reduces scaling exponents. The same approach predicts the porosity and average pore height scaling as a(1/3) and a(-1/3), respectively, in good agreement with simulation results in 1+1 and 2+1 dimensions. These results may be useful for modeling samples with desired porosity and long pores.

Nonuniversal effects in mixing correlated-growth processes with randomness: interplay between bulk morphology and surface roughening

To construct continuum stochastic growth equations for competitive nonequilibrium surface-growth processes of the type RD+X that mixes random deposition (RD) with a correlated-growth process X, we use a simplex decomposition of the height field. A distinction between growth processes X that do and do not create voids in the bulk leads to the definition of the effective probability p(eff) of the process X that is a measurable property of the bulk morphology and depends on the activation probability p of X in the competitive process RD+X. The bulk morphology is reflected in the surface roughening via nonuniversal prefactors in the universal scaling of the surface width that scales in p(eff). The equation and the resulting scaling are derived for X in either a Kardar-Parisi-Zhang or Edwards-Wilkinson universality class in (1+1) dimensions and are illustrated by an example of X being a ballistic deposition. We obtain full data collapse on its corresponding universal scaling function for all p∈(0;1]. We outline the generalizations to (1+n) dimensions and to many-component competitive growth processes.