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Gericke E, Melskens J, Wendt R, Wollgarten M, Hoell A, Lips K. Quantification of Nanoscale Density Fluctuations in Hydrogenated Amorphous Silicon. PHYSICAL REVIEW LETTERS 2020; 125:185501. [PMID: 33196241 DOI: 10.1103/physrevlett.125.185501] [Citation(s) in RCA: 2] [Impact Index Per Article: 0.5] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Received: 06/04/2020] [Accepted: 09/11/2020] [Indexed: 06/11/2023]
Abstract
The nanostructure of hydrogenated amorphous silicon (a-Si∶H) is studied by a combination of small-angle x-ray scattering (SAXS) and small-angle neutron scattering (SANS) with a spatial resolution of 0.8 nm. The a-Si∶H materials were deposited using a range of widely varied conditions and are representative for this class of materials. We identify two different phases that are embedded in the a-Si∶H matrix and quantified both according to their scattering cross sections. First, 1.2 nm sized voids (multivacancies with more than 10 missing atoms) which form a superlattice with 1.6 nm void-to-void distance are detected. The voids are found in concentrations as high as 6×10^{19} cm^{-3} in a-Si∶H material that is deposited at a high rate. Second, dense ordered domains (DOD) that are depleted of hydrogen with 1 nm average diameter are found. The DOD tend to form 10-15 nm sized aggregates and are largely found in all a-Si∶H materials considered here. These quantitative findings make it possible to understand the complex correlation between structure and electronic properties of a-Si∶H and directly link them to the light-induced formation of defects. Finally, a structural model is derived, which verifies theoretical predictions about the nanostructure of a-Si∶H.
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Affiliation(s)
- Eike Gericke
- Helmholtz-Zentrum Berlin, Institute for Nanospectroscopy, Hahn-Meitner-Platz 1, 14109 Berlin, Germany
- Humboldt-Universität zu Berlin, Department of Chemistry, Brook-Taylor-Str. 2, 12489 Berlin, Germany
| | - Jimmy Melskens
- Eindhoven University of Technology, Department of Applied Physics, PO Box 513, 5600 MB Eindhoven, Netherlands
| | - Robert Wendt
- Helmholtz-Zentrum Berlin, Institute for Nanospectroscopy, Hahn-Meitner-Platz 1, 14109 Berlin, Germany
| | - Markus Wollgarten
- Helmholtz-Zentrum Berlin, Institute Solar Fuels, Hahn-Meitner-Platz 1, 14109 Berlin, Germany
| | - Armin Hoell
- Helmholtz-Zentrum Berlin, Institute for Nanospectroscopy, Hahn-Meitner-Platz 1, 14109 Berlin, Germany
| | - Klaus Lips
- Helmholtz-Zentrum Berlin, Department Spins in Energy Conversion and Quantum Information Science (ASPIN), Hahn-Meitner-Platz 1, 14109 Berlin, Germany
- Freie Universität Berlin, Department of Physics, Arnimallee 14, 14195 Berlin, Germany
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Möser J, Lips K, Tseytlin M, Eaton GR, Eaton SS, Schnegg A. Using rapid-scan EPR to improve the detection limit of quantitative EPR by more than one order of magnitude. JOURNAL OF MAGNETIC RESONANCE (SAN DIEGO, CALIF. : 1997) 2017; 281:17-25. [PMID: 28500917 PMCID: PMC5556260 DOI: 10.1016/j.jmr.2017.04.003] [Citation(s) in RCA: 8] [Impact Index Per Article: 1.1] [Reference Citation Analysis] [Abstract] [Key Words] [MESH Headings] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 02/13/2017] [Revised: 04/03/2017] [Accepted: 04/04/2017] [Indexed: 05/31/2023]
Abstract
X-band rapid-scan EPR was implemented on a commercially available Bruker ELEXSYS E580 spectrometer. Room temperature rapid-scan and continuous-wave EPR spectra were recorded for amorphous silicon powder samples. By comparing the resulting signal intensities the feasibility of performing quantitative rapid-scan EPR is demonstrated. For different hydrogenated amorphous silicon samples, rapid-scan EPR results in signal-to-noise improvements by factors between 10 and 50. Rapid-scan EPR is thus capable of improving the detection limit of quantitative EPR by at least one order of magnitude. In addition, we provide a recipe for setting up and calibrating a conventional pulsed and continuous-wave EPR spectrometer for rapid-scan EPR.
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Affiliation(s)
- J Möser
- Berlin Joint EPR Lab, Institut für Nanospektroskopie, Helmholtz-Zentrum Berlin für Materialien und Energie GmbH, Kékuléstr. 5, 12489 Berlin, Germany.
| | - K Lips
- Berlin Joint EPR Lab, Institut für Nanospektroskopie, Helmholtz-Zentrum Berlin für Materialien und Energie GmbH, Kékuléstr. 5, 12489 Berlin, Germany
| | - M Tseytlin
- Department of Biochemistry, 1 Medical Center Drive, West Virginia University, Morgantown, WV 26506, USA
| | - G R Eaton
- Department of Chemistry and Biochemistry, University of Denver, Denver, CO 80208, USA
| | - S S Eaton
- Department of Chemistry and Biochemistry, University of Denver, Denver, CO 80208, USA
| | - A Schnegg
- Berlin Joint EPR Lab, Institut für Nanospektroskopie, Helmholtz-Zentrum Berlin für Materialien und Energie GmbH, Kékuléstr. 5, 12489 Berlin, Germany.
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Yang J, Fang H, Gao Y. Effect of Water Adsorption on the Photoluminescence of Silicon Quantum Dots. J Phys Chem Lett 2016; 7:1788-1793. [PMID: 27117881 DOI: 10.1021/acs.jpclett.6b00574] [Citation(s) in RCA: 5] [Impact Index Per Article: 0.6] [Reference Citation Analysis] [Abstract] [MESH Headings] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 06/05/2023]
Abstract
The optical properties of silicon quantum dots (Si QDs) are strongly influenced by circumjacent surface-adsorbed molecules, which would highly affect their applications; however, water, as the ubiquitous environment, has not received enough attention yet. We employed the time-dependent density functional calculations to investigate the water effect of photoluminescence (PL) spectra for Si QDs. In contrast with the absorption spectra, PL spectra exhibit distinct characteristics. For Si32H38, PL presents the single maximum in the dry and humid environment, while the emission spectrum displays a dual-band fluorescence spectroscopy in the low-humidity environment. This phenomenon is also observed in the larger Si QDs. The distinct character in spectroscopy is dominated by the stretching of the Si-Si bond, which could be explained by the self-trapped exciton model. Our results shed light on the Si-water interaction that is important for the development of optical devices based on Si-coated surfaces.
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Affiliation(s)
- Jinrong Yang
- Division of Interfacial Water and Key Laboratory of Interfacial Physics and Technology, Shanghai Institute of Applied Physics, Chinese Academy of Sciences , Shanghai 201800, China
- University of Chinese Academy of Sciences , Beijing 100049, China
| | - Haiping Fang
- Division of Interfacial Water and Key Laboratory of Interfacial Physics and Technology, Shanghai Institute of Applied Physics, Chinese Academy of Sciences , Shanghai 201800, China
- Shanghai Science Research Center, Chinese Academy of Sciences , Shanghai 201204, China
| | - Yi Gao
- Division of Interfacial Water and Key Laboratory of Interfacial Physics and Technology, Shanghai Institute of Applied Physics, Chinese Academy of Sciences , Shanghai 201800, China
- Shanghai Science Research Center, Chinese Academy of Sciences , Shanghai 201204, China
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Dagenais P, Lewis LJ, Roorda S. Dominant structural defects in amorphous silicon. JOURNAL OF PHYSICS. CONDENSED MATTER : AN INSTITUTE OF PHYSICS JOURNAL 2015; 27:345004. [PMID: 26234363 DOI: 10.1088/0953-8984/27/34/345004] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/04/2023]
Abstract
The nature of disorder in amorphous silicon (a-Si) is explored by investigating the spatial arrangement and energies of coordination defects in a numerical model. Spatial correlations between structural defects are examined on the basis of a parameter that quantifies the probability for two sites to share a bond. Pentacoordinated atoms are found to be the dominant coordination defects. They show a tendency to cluster, and about 17% of them are linked through three-membered rings. As for tricoordinated sites, they are less numerous, and tend to be distant by at least two bond lengths. Typical local geometries associated to under and overcoordinated atoms are extracted from the model and described using partial bond angle distributions. An estimate of the formation energies of structural defects is provided. Using molecular-dynamics calculations, we simulate the implantation of high-energy atoms in the initial structure in order to study the effect of relaxation on the coordination defects and their environments.
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Affiliation(s)
- Paule Dagenais
- Département de Physique et Regroupement Québécois sur les Matériaux de Pointe (RQMP), Université de Montréal, C.P. 6128, Succursale Centre-Ville, Montréal, QC H3C 3J7, Canada
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Aging mechanisms in amorphous phase-change materials. Nat Commun 2015; 6:7467. [DOI: 10.1038/ncomms8467] [Citation(s) in RCA: 177] [Impact Index Per Article: 19.7] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 09/08/2014] [Accepted: 05/12/2015] [Indexed: 01/27/2023] Open
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Nehrkorn J, Schnegg A, Holldack K, Stoll S. General magnetic transition dipole moments for electron paramagnetic resonance. PHYSICAL REVIEW LETTERS 2015; 114:010801. [PMID: 25615456 DOI: 10.1103/physrevlett.114.010801] [Citation(s) in RCA: 16] [Impact Index Per Article: 1.8] [Reference Citation Analysis] [Abstract] [MESH Headings] [Track Full Text] [Subscribe] [Scholar Register] [Received: 10/13/2014] [Indexed: 06/04/2023]
Abstract
We present general expressions for the magnetic transition rates in electron paramagnetic resonance (EPR) experiments of anisotropic spin systems in the solid state. The expressions apply to general spin centers and arbitrary excitation geometry (Voigt, Faraday, and intermediate). They work for linear and circular polarized as well as unpolarized excitation, and for crystals and powders. The expressions are based on the concept of the (complex) magnetic transition dipole moment vector. Using the new theory, we determine the parities of ground and excited spin states of high-spin (S=5/2) Fe(III) in hemin from the polarization dependence of experimental EPR line intensities.
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Affiliation(s)
- Joscha Nehrkorn
- Berlin Joint EPR Laboratory, Institut für Silizium-Photovoltaik, Helmholtz-Zentrum Berlin für Materialien und Energie, D-12489 Berlin, Germany
| | - Alexander Schnegg
- Berlin Joint EPR Laboratory, Institut für Silizium-Photovoltaik, Helmholtz-Zentrum Berlin für Materialien und Energie, D-12489 Berlin, Germany
| | - Karsten Holldack
- Institut für Methoden und Instrumentierung der Forschung mit Synchrotronstrahlung, Helmholtz-Zentrum Berlin für Materialien und Energie, D-12489 Berlin, Germany
| | - Stefan Stoll
- Department of Chemistry, University of Washington, Seattle, Washington 98195, USA
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Lipka T, Kiepsch M, Trieu HK, Müller J. Hydrogenated amorphous silicon photonic device trimming by UV-irradiation. OPTICS EXPRESS 2014; 22:12122-12132. [PMID: 24921332 DOI: 10.1364/oe.22.012122] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/03/2023]
Abstract
A method to compensate for fabrication tolerances and to fine-tune individual photonic circuit components is inevitable for wafer-scale photonic systems even with most-advanced CMOS-fabrication tools. We report a cost-effective and highly accurate method for the permanent trimming of hydrogenated amorphous silicon photonic devices by UV-irradiation. Microring resonators and Mach-Zehnder-interferometers were utilized as photonic test devices. The MZIs were tuned forth and back over their complete free spectral range of 5.5 nm by locally trimming the two MZI-arms. The trimming range exceeds 8 nm for compact ring resonators with trimming accuracies of 20 pm. Trimming speeds of ≥ 10 GHz/s were achieved. The components did not show any substantial device degradation.
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