Opacity effect on extreme ultraviolet radiation from laser-produced tin plasmas

Analysis of extreme ultraviolet radiation and hydrodynamics simulation at the core of laser-produced nickel plasmas

The non-uniformity and transient nature of laser-produced plasma are critical factors that affect the analysis of the extreme ultraviolet spectra of highly charged ions and the diagnosis of plasma states. This paper systematically investigates the characteristics of extreme ultraviolet radiation and the hydrodynamic evolution of laser-produced nickel plasmas from two perspectives: high-spatio-temporal-resolution extreme-ultraviolet spectroscopic measurement and radiation hydrodynamics simulation. The consistency between the four-band experimental spectra and their theoretically simulated spectra confirms the accuracy of the atomic structure parameters and plasma state parameters. We also analyze the significant contribution of the 3d-4f double-excited state radiation to the spectral profile and discuss the influence of the self-absorption caused by plasma opacity on the characteristics of extreme ultraviolet radiation. The findings are crucial for accurately understanding the characteristics of extreme ultraviolet radiation, the hydrodynamic evolution, and the application of medium- and high-Z laser-produced plasma as a pulsed short-wavelength light source.

Water-window x-ray emission from laser-produced Au plasma under optimal target thickness and focus conditions

Optimal laser irradiation conditions for water-window (WW) x-ray emission (2.3-4.4 nm) from an Au plasma are investigated to develop a laboratory-scale WW x-ray source. A minimum Au target thickness of 1 µm is obtained for a laser intensity of ∼10^{13} W/cm^{2} by observing the intensity drop in the WW spectra. Au targets produced by thermal evaporation are found to have a higher conversion efficiency than commercial foil targets for WW x-ray radiation. In addition, optimal laser spots for fixed laser energies (240 and 650 mJ) are found for an Au target ∼1 mm in front of the focal point, where suitable conditions for plasma temperature and plume volume coupling are achieved. The mechanism of the optimal target thickness and spot size can be well explained using a radiation hydrodynamic simulation code.

Extreme ultraviolet light from a tin plasma driven by a 2-µm-wavelength laser

An experimental study of laser-produced plasmas is performed by irradiating a planar tin target by laser pulses, of 4.8 ns duration, produced from a KTP-based 2-µm-wavelength master oscillator power amplifier. Comparative spectroscopic investigations are performed for plasmas driven by 1-µm- and 2-µm-wavelength pulsed lasers, over a wide range of laser intensities spanning 0.5 - 5 × 10¹¹ W/cm ². Similar extreme ultraviolet (EUV) spectra in the 5.5-25.5 nm wavelength range and underlying plasma ionicities are obtained when the intensity ratio is kept fixed at I_1µm/I_2µm = 2.4(7). Crucially, the conversion efficiency (CE) of 2-µm-laser energy into radiation within a 2% bandwidth centered at 13.5 nm relevant for industrial applications is found to be a factor of two larger, at a 60 degree observation angle, than in the case of the denser 1-µm-laser-driven plasma. Our findings regarding the scaling of the optimum laser intensity for efficient EUV generation and CE with drive laser wavelength are extended to other laser wavelengths using available literature data.

Prominent radiative contributions from multiply-excited states in laser-produced tin plasma for nanolithography

Extreme ultraviolet (EUV) lithography is currently entering high-volume manufacturing to enable the continued miniaturization of semiconductor devices. The required EUV light, at 13.5 nm wavelength, is produced in a hot and dense laser-driven tin plasma. The atomic origins of this light are demonstrably poorly understood. Here we calculate detailed tin opacity spectra using the Los Alamos atomic physics suite ATOMIC and validate these calculations with experimental comparisons. Our key finding is that EUV light largely originates from transitions between multiply-excited states, and not from the singly-excited states decaying to the ground state as is the current paradigm. Moreover, we find that transitions between these multiply-excited states also contribute in the same narrow window around 13.5 nm as those originating from singly-excited states, and this striking property holds over a wide range of charge states. We thus reveal the doubly magic behavior of tin and the origins of the EUV light.

Extreme ultraviolet (EUV) light is entering use in nanolithography. Here the authors discuss experimental and theoretical results about the prominent role of multiply-excited states in highly charged tin ions in the mechanism of EUV light emission from laser-produced plasma.

Electrochemically Synthesized Tin/Lithium Alloy To Convert Laser Light to Extreme Ultraviolet Light

This paper describes lithium-tin alloys as a novel target material to enhance the efficiency of 13.5 nm extreme ultraviolet (EUV) light from generated laser-produced plasmas. Both lithium and tin exhibit EUV emission with the same peak at 13.5 nm. We show that lithium-tin (LiSn) alloys exhibit emission also at 13.5 nm and a mixture of tin and lithium emission by illuminating Nd:YAG laser (1 ns, 2.5 × 10¹⁰, 7.1 × 10¹⁰ W/cm²). The emission spectra and emission angular distribution by using phosphor imaging plates were analyzed to obtain the conversion efficiency from laser light to 13.5 nm light. The Li-Sn alloys were slightly higher than planar tin and between tin and lithium. It would be due to the suppression of self-absorption of 13.5 nm light by the tin plasma.

Emission of water-window soft x-rays under optically thin conditions using low-density foam targets

The effect of optical thickness in a bismuth water-window soft x-ray source is considered by comparing the emission from laser-produced plasmas of a 7.5% atomic density foam target and a solid-density target. The number of photons recorded in the 4 nm region was comparable for both targets at a plasma-initiating laser pulse duration of 6 ns. From experiments at different pulse durations of 150 ps and 6 ns, self-absorption (opacity) effects were found to be relatively small for bismuth plasmas as compared to those of tin, based on the same emission mechanism and which are used in 13.5 nm sources for extreme ultraviolet lithography.

Evolution analysis of EUV radiation from laser-produced tin plasmas based on a radiation hydrodynamics model

One of fundamental aims of extreme ultraviolet (EUV) lithography is to maximize brightness or conversion efficiency of laser energy to radiation at specific wavelengths from laser produced plasmas (LPPs) of specific elements for matching to available multilayer optical systems. Tin LPPs have been chosen for operation at a wavelength of 13.5 nm. For an investigation of EUV radiation of laser-produced tin plasmas, it is crucial to study the related atomic processes and their evolution so as to reliably predict the optimum plasma and experimental conditions. Here, we present a simplified radiation hydrodynamic model based on the fluid dynamic equations and the radiative transfer equation to rapidly investigate the evolution of radiation properties and dynamics in laser-produced tin plasmas. The self-absorption features of EUV spectra measured at an angle of 45° to the direction of plasma expansion have been successfully simulated and explained, and the evolution of some parameters, such as the plasma temperature, ion distribution and density, expansion size and velocity, have also been evaluated. Our results should be useful for further understanding of current research on extreme ultraviolet and soft X-ray source development for applications such as lithography, metrology and biological imaging.

Extreme ultraviolet spectrometer for the Shenguang III laser facility

An extreme ultraviolet spectrometer has been developed for high-energy density physics experiments at the Shenguang-III (SG-III) laser facility. Alternative use of two different varied-line-spacing gratings covers a wavelength range of 10-260 Å. A newly developed x-ray framing camera with single wide strip line is designed to record time-gated spectra with ~70 ps temporal resolution and 20 lp/mm spatial resolution. The width of the strip line is up to 20 mm, enhancing the capability of the spatial resolving measurements. All components of the x-ray framing camera are roomed in an aluminum air box. The whole spectrometer is mounted on a diagnostic instrument manipulator at the SG-III laser facility for the first time. A new alignment method for the spectrometer based on the superimposition of two laser focal spots is developed. The approaches of the alignment including offline and online two steps are described. A carbon spectrum and an aluminum spectrum have been successfully recorded by the spectrometer using 2400 l/mm and 1200 l/mm gratings, respectively. The experimental spectral lines show that the spectral resolution of the spectrometer is about 0.2 Å and 1 Å for the 2400 l/mm and 1200 l/mm gratings, respectively. A theoretical calculation was carried out to estimate the maximum resolving power of the spectrometer.

Development of Laser-Produced Tin Plasma-Based EUV Light Source Technology for HVM EUV Lithography

Since 2002, we have been developing a carbon dioxide (CO2) laser-produced tin (Sn) plasma (LPP) extreme ultraviolet (EUV) light source, which is the most promising solution because of the 13.5 nm wavelength high power (>200 W) light source for high volume manufacturing. EUV lithography is used for its high efficiency, power scalability, and spatial freedom around plasma. We believe that the LPP scheme is the most feasible candidate for the EUV light source for industrial use. We have several engineering data from our test tools, which include 93% Sn ionization rate, 98% Sn debris mitigation by a magnetic field, and 68% CO2 laser energy absorption rate. The way of dispersion of Sn by prepulse laser is key to improve conversion efficiency (CE). We focus on prepulsed laser pulsed duration. When we have optimized pulse duration from nanosecond to picosecond, we have obtained maximum 4.7% CE (CO2 laser to EUV; our previous data was 3.8%) at 2 mJ EUV pulse energy. Based on these data we are developing our first light source as our product: “GL200E.” The latest data and the overview of EUV light source for the industrial EUV lithography are reviewed in this paper.

One-dimensional space resolving flat-field holographic grating soft x-ray framing camera spectrograph for laser plasma diagnostics

A 1D space resolving x-ray spectrum diagnostic system has been developed to study the radiation opacity of hot plasma on SG-II laser facility. The diagnostic system consists of a 2400 lines/mm flat-field holographic grating and a gated microchannel plate coupled with an optical CCD and covers the wavelength range of 5-50 Å. The holographic grating was compared with a ruled one by measuring the emission spectra from a laser-produced molybdenum plasma. The results indicate that the holographic grating possesses better sensitivity than the ruled grating having nearly similar spectral resolution. The spectrograph has been used in radiative opacity measurement of Fe plasma. Simultaneous measurements of the backlight source and the transmission spectrum in appointed time range in one shot have been accomplished successfully with the holographic grating spectrometer. The 2p-3d transition absorption of Fe plasma near 15.5 Å in has been observed clearly.

Detailed investigations on radiative opacity and emissivity of tin plasmas in the extreme-ultraviolet region

Radiative opacity and emissivity of tin plasmas at average ionization degree of about 10 was investigated in detail by using a fully relativistic detailed level accounting approach, in which main physical effects on the opacity were carefully taken into account. Among these physical effects, configuration interaction, in particular core-valence electron correlations, plays an important role on the determination of accurate atomic data required in the calculation of opacity. It results in a strong narrowing of lines from all transition arrays and strong absorption is located in a narrow wavelength region of 12.5-14 nm for Sn plasmas. Using a complete accurate atomic data, we investigated the opacity of Sn plasmas at a variety of physical condition. Among the respective ions of Xe6+-Xe15+ , Xe10+ has the largest absorption cross section at 13.5 nm, while the favorable physical condition for maximal absorption at 13.5 nm do not mean that Xe10+ has the largest fraction. Comparison with other theoretical results showed that a complete set of consistent accurate atomic data, which lacks very much, is essential to predict accurate opacity. Our atomic model is useful and can be applied to interpret opacity experiments. Further benchmark experiments are urgently needed to clarify the physical effects on the opacity of Sn plasmas.

Response-time improved hydrothermal-method-grown ZnO scintillator for soft x-ray free-electron laser timing-observation

For pump and probe experiments in x-ray free-electron laser (XFEL) facilities, accurate timing synchronization between short-wavelength femtosecond pulses from XFELs and short optical pulses from other light sources is required. For this purpose, the response time of a hydrothermal-method-grown ZnO is improved by over one order of magnitude via intentional iron ion doping. The fluorescence rise- and decay-time constants are measured to be less than 10 and 100 ps, respectively. Owing to its intense fluorescence even for single pulse XFEL excitation, the timing jitter of the soft x-ray pulse and timing electronics are evaluated to be less than 70 ps.

Diagnostic development in precise opacity measurement of radiatively heated Al plasma on Shenguang II laser facility

Simultaneous measurements of the self-emission spectrum, the backlighting source spectrum, and the transmission spectrum in one shot, which reduce the experimental uncertainties from shot-to-shot fluctuation, are essential for precise opacity experiments. In order to achieve precise absorption spectrum of Al plasmas, a special half sample sandwich target was designed and short backlighter was used to provide time- and space-resolving diagnostics on the Shenguang II high power laser facility. In the measurement, a cylindrical cavity with CH foam baffles was used to provide a clean x-ray radiation environment for sample heating. The x-ray source spectrum, the transmission spectrum, and the self-emission spectrum of the soft x-ray heated Al sample were recorded in one shot with a penta-erythritol tetrakis (hydroxymethy) methane C(CH(2)OH)(4) (PET) crystal spectrometer by using the point-projection method. Experimental results have been compared with the calculation results of a detailed level accounting opacity code.

Effect of focal spot size on in-band 13.5 nm extreme ultraviolet emission from laser-produced Sn plasma

The effect of focal spot size on in-band 13.5 nm extreme ultraviolet (EUV) emission from laser-produced Sn plasmas was investigated for an EUV lithography light source. Almost constant in-band conversion efficiency from laser to 13.5 nm EUV light was noted with focal spot sizes from 60 to 500 microm. This effect may be explained by the opacity of Sn plasmas. Optical interferometry showed that the EUV emission must pass through a longer plasma with higher density when the focal spot is large, and strong reabsorption of EUV light was confirmed by a dip located at 13.5 nm in the spectrum.